| (19) |
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(11) |
EP 1 739 484 A8 |
| (12) |
CORRECTED EUROPEAN PATENT APPLICATION |
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Note: Bibliography reflects the latest situation |
| (15) |
Correction information: |
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Corrected version no 1 (W1 A2) |
| (48) |
Corrigendum issued on: |
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09.05.2007 Bulletin 2007/19 |
| (43) |
Date of publication: |
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03.01.2007 Bulletin 2007/01 |
| (22) |
Date of filing: 18.04.2001 |
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| (51) |
International Patent Classification (IPC):
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| (84) |
Designated Contracting States: |
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DE |
| (30) |
Priority: |
19.04.2000 JP 2000117803
01.05.2000 JP 2000131995
01.05.2000 JP 2000131996
30.11.2000 JP 2000364310
04.12.2000 JP 2000368412
05.12.2000 JP 2000369415
25.01.2001 JP 2001016537
|
| (62) |
Application number of the earlier application in accordance with Art. 76 EPC: |
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01109621.1 / 1148387 |
| (71) |
Applicant: LASTRA S.P.A. |
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I-25025 Manerbio (IT) |
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| (72) |
Inventors: |
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- Urano, Toshiyuki
Kanagawa (JP)
- Kohori, Kazuhiro
Kanagawa (JP)
- Okamoto, Hideaki
Kanagawa (JP)
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| (74) |
Representative: Goedeweeck, Rudi |
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AGFA-GEVAERT
Corporate IP Department 3800,
Patent Administration,
Septestraat 27
2640 Mortsel
2640 Mortsel (BE) |
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Remarks: |
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This application was filed on 27 - 09 - 2006 as a divisional application to the application
mentioned under INID code 62. |
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| (54) |
Photosensitive lithographic printing plate and method for making a prinitng plate. |
(57) A photosensitive lithographic printing plate comprises a photosensitive layer and
a protective layer formed in this order on a support, wherein the photosensitive layer
has a maximum peak of spectral sensitivity within a wavelength range ranging from
390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate
for image formation at a wavelength of 410 nm (S410) is at most 100 µJ/cm
2, and the relation between the minimum exposure for image formation at a wavelength
of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410
nm (S410) is 0<S410/S450≤0.1.