(19)
(11)
EP 1 756 329 A1
(12)
(43)
Date of publication:
28.02.2007
Bulletin 2007/09
(21)
Application number:
05747858.8
(22)
Date of filing:
20.05.2005
(51)
International Patent Classification (IPC):
C23C
16/40
(2006.01)
C23C
16/50
(2006.01)
(86)
International application number:
PCT/US2005/017747
(87)
International publication number:
WO 2005/113856
(
01.12.2005
Gazette 2005/48)
(84)
Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR
(30)
Priority:
20.05.2004
US 572813 P
(71)
Applicant:
Dow Global Technologies Inc.
Midland, MI 48674 (US)
(72)
Inventors:
DINEGA, Dmitry, P.
Midland, MI 48642 (US)
WEIKART, Christopher, M.
Midland, MI 48640 (US)
(74)
Representative:
Raynor, John et al
Beck Greener Fulwood House, 12 Fulwood Place,
London WC1V 6HR
London WC1V 6HR (GB)
(54)
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF METAL OXIDE