(19)
(11) EP 1 756 329 A1

(12)

(43) Date of publication:
28.02.2007 Bulletin 2007/09

(21) Application number: 05747858.8

(22) Date of filing: 20.05.2005
(51) International Patent Classification (IPC): 
C23C 16/40(2006.01)
C23C 16/50(2006.01)
(86) International application number:
PCT/US2005/017747
(87) International publication number:
WO 2005/113856 (01.12.2005 Gazette 2005/48)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

(30) Priority: 20.05.2004 US 572813 P

(71) Applicant: Dow Global Technologies Inc.
Midland, MI 48674 (US)

(72) Inventors:
  • DINEGA, Dmitry, P.
    Midland, MI 48642 (US)
  • WEIKART, Christopher, M.
    Midland, MI 48640 (US)

(74) Representative: Raynor, John et al
Beck Greener Fulwood House, 12 Fulwood Place,
London WC1V 6HR
London WC1V 6HR (GB)

   


(54) PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF METAL OXIDE