(19)
(11) EP 1 789 605 A2

(12)

(88) Date of publication A3:
21.09.2006

(43) Date of publication:
30.05.2007 Bulletin 2007/22

(21) Application number: 05764564.0

(22) Date of filing: 07.07.2005
(51) International Patent Classification (IPC): 
C23C 16/455(2006.01)
C23C 16/509(2006.01)
(86) International application number:
PCT/US2005/024165
(87) International publication number:
WO 2006/017136 (16.02.2006 Gazette 2006/07)
(84) Designated Contracting States:
CH DE LI

(30) Priority: 12.07.2004 US 587173 P
12.10.2004 US 962936
22.12.2004 US 21416
02.06.2005 US 143506

(71) Applicant: Applied Materials, Inc.
Santa Clara, CA 95054 (US)

(72) Inventors:
  • CHOI, Soo, Young
    Fremont, CA 94539 (US)
  • PARK, Beom, Soo
    San Jose, CA 95119 (US)
  • WHITE, John, M.
    Hayward, CA 94541 (US)
  • TINER, Robin, L.
    Santa Cruz, CA 95065 (US)

(74) Representative: Zimmermann & Partner 
Postfach 33 09 20
80069 München
80069 München (DE)

   


(54) PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER CURVATURE