(19)
(11) EP 1 810 319 A1

(12)

(43) Date of publication:
25.07.2007 Bulletin 2007/30

(21) Application number: 05746147.7

(22) Date of filing: 27.05.2005
(51) International Patent Classification (IPC): 
H01L 21/02(2006.01)
(86) International application number:
PCT/KR2005/001584
(87) International publication number:
WO 2006/041250 (20.04.2006 Gazette 2006/16)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR

(30) Priority: 13.10.2004 KR 10200040081

(71) Applicant: Adaptive Plasma Technology Corp.
Icheon-si, Gyeonggi-do 467-813 (KR)

(72) Inventor:
  • KIM, Nam-hun, 804-302 Byeokjeokgol Dusan Apt.
    Suwon-si, Gyeonggi-do 442-470 (KR)

(74) Representative: Hirsch & AssociĆ©s 
58, avenue Marceau
75008 Paris
75008 Paris (FR)

   


(54) PLASMA SOURCE FOR UNIFORM PLASMA DISTRIBUTION IN PLASMA CHAMBER