TECHNICAL FIELD
[0001] The present invention relates to a method for electroplating with a tin-zinc alloy.
BACKGROUND ART
[0002] Because electroplating with tin-zinc alloys produces coatings that excel in corrosion
resistance, processability and solderability, this method has attracted attention
and been widely applied to automobile parts and electronic components. Alkali cyan
baths, pyrophosphoric acid baths, borofluoride baths, sulfonic acid baths and carboxylic
acid baths have been suggested for use as plating baths in electroplating with tin-zinc
alloys, and some of these baths have been practically used.
[0003] With the conventional methods using such electroplating baths, when the treatment
is carried out at a high current density to shorten the treatment time, coarse precipitates,
burns, and scorches appear in the plated layer and characteristics of the tin-zinc
alloy coating are degraded. As a result, the practical use of high-speed electroplating
is made difficult. The systems that are still used include a rack system (maximum
current density about 3 A/dm
2) in which the articles to be plated are treated upon mounting them on a jig and a
barrel system (maximum current density 1 A/dm
2) in which the articles to be plated are treated in a barrel. Further, when plating
with a tin-zinc alloy is performed within a short interval, a method by which tin
and zinc are electroplated separately and then alloyed and a melt plating method using
a molten salt of a tin-zinc alloy are used.
DISCLOSURE OF THE INVENTION
Problems That The Invention Is To Solve
[0004] It is an object of the present invention to provide an electroplating method enabling
the treatment of articles to be plated within a short interval that was difficult
to achieve with the conventional methods for electroplating with tin-zinc alloys.
Means For The Solution Of The Problems
[0005] The present invention is based on a discovery that electroplating with a tin-zinc
alloy can be carried out within a short interval by using a specific tin-zinc alloy
plating bath at a plating bath temperature and plating bath stirring rate above the
predetermined values.
[0006] Thus, the present invention provides a method for electroplating with a tin-zinc
alloy that is performed under the following conditions: a plating bath temperature
of 30 to 90°C, plating bath stirring rate of 5 to 300 m/min, and cathode current density
of 5 to 200 A/dm
2.
Effect of The Invention
[0007] With the present invention, electroplating with a tin-lead alloy can be carried out
within a short interval by using a specific tin-zinc alloy plating bath at a plating
bath temperature and plating bath stirring rate above the predetermined values.
BEST MODE FOR CARRYING OUT THE INVENTION
[0008] The temperature of the plating bath in the electroplating method in accordance with
the present invention is 30 to 90°C, preferably 40 to 60°C, and the stirring-rate
of the plating solution is 5 to 300 m/min, preferably 10 to 100 m/min. Stirring of
the plating solution is specifically carried out by a plating apparatus of a jet flow
system in which the solution is circulated with a pump or by a plating apparatus for
steel sheets. The plating apparatus can be made from any material, provided it has
heat resistance and chemical resistance, and metals such as stainless steel and titanium
or polyvinyl chloride, Teflon (registered trade name), and an ABS resin can be used.
Furthermore, a device enabling the stirring of the plating solution that is uniform
with respect to the entire plated article is preferred from the standpoint of increasing
the uniformity of the plated alloy composition and plated film thickness.
[0009] Any plating bath well known to a person skilled in the art can be used as the bath
for the tin-zinc alloy electroplating bath employed in the electroplating method in
accordance with the present invention, but a plating bath comprising a hydroxycarboxylic
acid or a salt thereof is preferred.
[0010] A compound having one or more hydroxyl groups and one or more carboxyl groups in
a molecule is preferred as the hydroxycarboxylic acid. Specific examples of such hydroxycarboxylic
acids include citric acid, tartaric acid, malic acid, glycolic acid, glyceric acid,
lactic acid, β-hydroxypropionic acid, and gluconic acid. The preferred among them
are citric acid, tartaric acid, malic acid, and gluconic acid. Specific examples of
hydroxycarboxylic acid salts include alkali metal salts (sodium, potassium, lithium
salts) alkaline earth metal salts (magnesium, calcium, barium salts, and the like),
divalent tin salts, zinc salts, ammonium salts, and organic amine salts (monomethylamine,
dimethylamine, trimethylamine, methylamine, isopropylamine, ethylenediamine, diethylenetriamine,
etc.) of the aforementioned hydroxycarboxylic acids. The preferred among them are
sodium salts, potassium salts, lithium salts, divalent tin salts, and zinc salts of
citric acid, tartaric acid, malic acid, and gluconic acid. These hydroxycarboxylic
acids and salts thereof may be used individually or in a mixture of two or more thereof,
and the concentration thereof in the plating bath is 0.25 to 3 mol/L, preferably 0.3
to 1.5 mol/L. When a hydroxycarboxylic acid salt is used as a divalent tin salt and/or
zinc salt, the hydroxycarboxylic acid which is a counterion of the metal ions also
constitutes part of the aforementioned concentration.
[0011] The pH of the plating bath comprising the hydroxycarboxylic acid or salt thereof
is preferably 2 to 10, more preferably 3 to 9. The pH of the plating bath can be adjusted
by using an alkaline compound such as a hydroxide and carbonate, or an acidic compound
such as an inorganic acid or organic acid. Specific examples of suitable compounds
include alkaline compounds such as sodium hydroxide, potassium hydroxide, lithium
hydroxide, sodium carbonate, potassium carbonate, lithium carbonate, and ammonia water
and acidic compounds such as sulfuric acid, hydrochloric acid, sulfamic acid, methanesulfonic
acid, and phenolsulfonic acid.
[0012] A plating bath comprising at least one species selected from the group consisting
of amphoteric surfactants and water-soluble compounds obtained by a reaction of an
aliphatic amine an organic acid ester, and phthalic anhydride also can be utilized
as the tin-zinc alloy electroplating bath used in the electroplating method in accordance
with the present invention. More specifically, for example, a water-soluble compound
can be used that is obtained by reacting 0.2 to 3 moles of an organic acid ester per
1 mole of an aliphatic amine for 10 to 60 min. at a temperature of 50 to 99°C and
then reacting phthalic anhydride with the obtained reactive product at a weight ratio
of 0.1 to 1 ; 1 for 30 to 180 min at a temperature of 60 to 130°C. Examples of suitable
amphoteric surfactants include imidazoline-type, betaine-type, alanine-type, glycine-type,
and amide-type surfactants. Examples of aliphatic amines suitable for the reaction
of the water-soluble compound include ethylenediamine, triethylenetetramine, isobutylamine,
3-methoxypropylamine, iminobispropylamine, diethylamine, hexamethylenetetramine, and
dimethylaminopropylamine. Examples of suitable organic acid esters include dimethyl
manolate, diethyl succinate, diethyl maleate, dimethyl fumarate, diethyl tartarate,
dimethyl malate, and diethyl tartronate. These water-soluble compounds and amphoteric
surfactants may be used individually or in a mixture of two or more thereof, and the
content thereof in the plating bath is 0.001 to 50 g/L, preferably 0.01 to 30 g/L.
[0013] The pH of the plating bath comprising at least one species selected from the group
consisting of amphoteric surfactants and water-soluble compounds obtained by a reaction
of an aliphatic amine, an organic acid ester, and phthalic anhydride is preferably
2 to 10, more preferably 3 to 9. The pH of the plating bath can be adjusted by using
an alkaline compound such as a hydroxide and carbonate, or an acidic compound such
as an inorganic acid or organic acid. Specific examples of suitable compounds include
alkaline compounds such as sodium hydroxide, potassium hydroxide, lithium hydroxide,
sodium carbonate, potassium carbonate, lithium carbonate, and ammonia water and acidic
compounds such as sulfuric acid, hydrochloric acid, sulfamic acid, methanesulfonic
acid, and phenolsulfonic acid.
[0014] Further, a plating bath comprising at least one species selected from the group consisting
of tertiary amine compounds and quaternary amine compounds also can be used as the
tin-zinc alloy electroplating bath employed in the electroplating method in accordance
with the present invention. Examples of tertiary amine compounds include imidazole
compounds and aliphatic amine compounds, and examples of quaternary amine compounds
include reaction products of tertiary amine compounds and halogenated alkyls. Specific
examples of tertiary amine compounds include imidazole compounds, such as imidazole,
1-methylimidazole, 1-ethylimidazole, 2-methylimidazole, 1-ethyl-2-methylimidazole,
1-oxymethylimidazole, 1-vinylimidazole, and 1, 5-dimethylimidazole, and aliphatic
amines such as monoethanolamine, diethanolamine, triethanolamine, dimethylamine, ethylenediamine,
diethylenetriamine, iminobispropylamine, triethylenetetramine, tetraethylenepentamine,
and N,N-bis-(3-aminopropyl)ethylenediamine. Further, specific examples of halogenated
alkyls that can be reacted with tertiary amine compounds include monochloroacetic
acid, benzyl chloride, chloroacetamide, 3-aminobenzylchloride, allyl chloride, dichlorethane,
monochloropropane, dichloroglycerin, ethylene chlorohydrine, and epichlorohydrine.
These tertiary amine compounds and quaternary amine compounds may be used individually
or in a mixture of two or more thereof, and the content thereof in the plating bath
is 0.1 to 30 g/L, preferably 0.2 to 20 g/L.
[0015] The pH of the plating bath comprising at least one species selected from the group
consisting of tertiary amine compounds and quaternary amine compounds is preferably
10 to 14, more preferably 12 to 14. The pH of the plating bath can be adjusted by
using an alkaline compound such as a hydroxide and carbonate. Specific examples of
suitable compounds include sodium hydroxide, potassium hydroxide, lithium hydroxide,
sodium carbonate, potassium carbonate, lithium carbonate, and ammonia water.
[0016] The plating bath used in the electroplating method in accordance with the present
invention can additionally contain at least one surfactant selected from the group
consisting of a nonionic surfactant, anionic surfactant, and cationic surfactant.
Introducing such surfactants into the plating bath enables denser precipitation at
a high current density and, therefore, makes it possible to implement more smoothly
the electroplating method in accordance with the present invention.
[0017] In the plating bath used in the plating method in accordance with the present invention,
the divalent tin ion concentration is 1 to 100 g/L, preferably 5 to 80 g/L, and the
zinc ion concentration is 0.2 to 80 g/L, preferably 1 to 50 g/L. Examples of sources
of such metal ions include various metal hydroxides, oxides, sulfates, chlorides,
sulfamates, pyrophosphates, hydroxycarboxylates, sulfonates, and amino acid salts.
Various metal oxides, sulfates, chlorides, and hydroxides are preferred. Specific
examples of hydroxycarboxylic acid salts are presented hereinabove. Specific examples
of sulfonates include alkanesulfonates, alkanolsulfonates, and phenolsulfonates. Specific
examples of alkanesulfonic acids include methanesulfonic acid, ethanesulfonic acid,
propanesulfonic acid, isopropanesulfonic acid, butanesulfonic acid, pentanesulfonic
acid, and hexanesulfonic acid. Specific examples of alkanolsulfonic acids include
2-hydroxyethanesulfonic acid, 3-hydroxypropanesulfonic acid, and 2-hydroxybutanesulfonic
acid. Specific examples of phenolsulfonic acids include phenolsulfonic acid, cresolsulfonic
acid, and dimethylphenolsulfonic acid. Specific examples of amino acids include glycine,
glutamic acid, and alanine.
[0018] In order to improve electric conduction during plating, alkali metal salts (sodium,
potassium, lithium salts), alkaline earth metal salts (magnesium, calcium, barium
salts), ammonium salts, and organic amine salts (monomethylamine, dimethylamine, trimethylamine,
methylamine, ispropylamine, ethylenediamine, diethylenetriamine, etc.) of sulfuric
acid, hydrochloric acid, sulfamic acid, pyrophosphoric acid, sulfonic acid, hydroxides
and carbonates can be introduced in the plating bath used in the electroplating method
in accordance with the present invention. Specific examples of such salts include
ammonium sulfate, ammonium chloride, sodium pyrophosphate, monomethyl sulfamine, sodium
hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, and among these
especially preferred are ammonium sulfate, ammonium chloride, potassium hydroxide,
and potassium carbonate. The content of these salts is 10 to 300 g/L, preferably 50
to 200 g/L.
[0019] The plating bath used in the electroplating method in accordance with the present
invention can contain water in addition to the above-described components and also
can contain additives that have been used as a brightener for tin and zinc. Examples
of suitable additives include synthetic polymers (polyvinyl alcohol, polyvinyl pyrrolidone,
polyethylene glycol, and the like), ketones (benzalacetone, acetophenone, and the
like), aliphatic aldehydes (formalin, acetaldehyde, crotonaldehyde, and the like),
aromatic aldehydes (vanillin, salicylaldehyde, orthochlorobenzaldehyde, and the like),
reaction products of unsaturated aliphatic aldehydes and amine compounds, sulfur compounds
(thiourea, mercaptobenzimidazole, and the like), and also Cu, Ni, Mn, Bi, In, and
the like. These additives are contained at 0.001 to 50 g/L, preferably 0.005 to 30
g/L. Furthermore, hydroxyphenyl compounds such as catechol, pyrogallol, hydroquinone,
sulfosalicylic acid, potassium dihydroxybenzenesulfonate and salts thereof and L-ascorbic
acid, sorbitol and the like also can be used as oxidation preventing agents for tin.
[0020] The articles to be plated by the plating method in accordance with the present invention
are metal materials such as Fe, Ni, Cu, or alloys based thereon, and the plating is
carried out by using them as cathodes. A carbon electrode and insoluble electrode
obtained by plating Pt on a Ti material or tin-zinc alloy can be used as a counter
electrode thereof. When an insoluble anode is used, the concentration of metals in
the plating bath that is being used can be maintained by directly dissolving the aforementioned
tin and zinc salts in the plating bath or by supplying an aqueous solution in which
tin and zinc salts are dissolved into a high concentration. The high-concentration
aqueous solution of the metals may contain the above-described hydroxycarboxylic acid
or salt thereof and an alkali hydroxide compound.
[0021] The cathode current density is 5 to 200 A/dm
2, preferably 10 to 120 A/dm
2. The film thickness can be within a wide range, but is generally 0.5 to 500 µm, preferably
2 to 20 µm.
[0022] Tin-zinc alloy plating can be performed within a wide range of alloy compositions
by changing the ratio of tin ions and zinc ions in the plating bath that is being
used. For example, tin-zinc alloy coatings with a zinc content of 3 to 15% can be
obtained on electronic components. When resistance to salt water or corrosion resistance
is to be improved, a tin-zinc alloy coating with a zinc content of 15 to 45% can be
obtained. Furthermore, when a film with high corrosion resistance that is to be exposed
to the atmosphere is obtained, a tin-zinc alloy coating with a zinc content of 50
to 90% can be produced.
[0023] With the plating method in accordance with the present invention, the article to
be plated is subjected to plating after a pretreatment conducted by the usual method.
At least one operation selected from immersion degreasing, pickling, electrolytic
washing, and activation is performed in the pretreatment process. After the plating,
the film obtained may be washed with water and dried, or can be further coated by
a chromating and conversion treatment, or with an inorganic or organic material by
the usual method.
[0024] The present invention will be described below based on embodiments thereof, but the
present invention is not limited to the embodiments, and the plating solution temperature,
flow rate of the plating solution, and the composition of the plating bath can be
freely changed according to the article to be plated.
Examples
Example 1
[0025] A steel sheet was pretreated and then electroplated by using the following plating
solution under the conditions of a plating bath temperature of 60°C and a plating
bath stirring rate of 50 m/min.
Tin (I) sulfate (as tin) |
30 g/L |
Zinc sulfate (as zinc) |
25 g/L |
Citric acid |
150 g/L (0.71 |
|
mole/L) |
Ammonium sulfate |
100 g/L |
Product obtained by reacting 1 mole of ethylene diamine and 1 mole of dimethyl malonate
for 60 mins. at 85°C and then reacting phthalic anhydride with the obtained product
at a weight ratio of 0.5:1 for 90 mins. at 95°C pH 4 (adjusted with ammonia water) |
10 mL/L |
Example 2
[0026] A steel sheet was pretreated, Nymin NAG-1001 manufactured by Nippon Oils & Fats Co.,
Ltd. was added as a nonionic surfactant at 5 g/L to the plating solution of Embodiment
1, and electroplating was conducted under the conditions of a plating bath temperature
of 60°C and a plating bath stirring rate of 30 m/min.
Example 3
[0027] A steel sheet was pretreated and then electroplated by using the following plating
solution under the conditions of a plating bath temperature of 60°C and a plating
bath stirring rate of 30 m/min.
Potassium stannate (as tin) |
55 g/L |
Zinc oxide (as zinc) |
5 g/L |
Potassium hydroxide |
80 g/L |
Potassium carbonate |
100 g/L |
Product obtained by reacting 1 mole of 1-methyl imidazole and 1 mole of benzyl chloride
for 180 mins. at 85°C |
1 g/L |
Product obtained by reacting 1 mole of diethylene triamine and 1 mole of ethylene
chlorhydrine for 90 mins. at 100°C pH 14 |
1 g/L |
Example 4
[0028] A phosphorus bronze sheet was pretreated and then electroplated by using the following
plating solution under the conditions of a plating bath temperature of 50°C and a
plating bath stirring rate of 60 m/min.
Tin (I) sulfate (as tin) |
20 g/L |
Zinc sulfate (as zinc) |
7 g/L |
Citric acid |
120 g/L (0.57 mole/L) |
Ammonium sulfate |
80 g/L |
Product obtained by reacting 1 mole of triethylene tetramine and 1.2 mole of diethyl
succinate for 40 mins. at 80°C and then reacting phthalic anhydride with the obtained
product at a weight ratio of 0.7:1 for 120 mins. at 90°C |
10 mL/L |
Coconut oil alkyl-N-carboxyethyl-N- hydroxyethyl imidazolium betaine sodium pH 5.5
(adjusted with sodium hydroxide) |
5 g/L |
Examples 5
[0029] A phosphorus bronze sheet was pretreated and then electroplated by using the following
plating solution under the conditions of a plating bath temperature of 60°C and a
plating bath stirring rate of 60 m/min.
Tin methanesulfonate (as tin) |
30 g/L |
Zinc methanesulfonate (as zinc) |
15 g/L |
Sodium gluconate |
150 g/L (0.69 mole/L) |
Methanesulfonic acid |
100 g/L |
Product obtained by reacting I mole of ethylene diamine and 1 mole of dimethyl maleate
for 60 mins. at 90°C and then reacting phthalic anhydride with the obtained product
at a weight ratio of 0.5:1 for 150 mins. at 110°C |
8 mL/L |
Salicylaldehyde pH 6.2 (adjusted with sodium hydroxide) |
0.05 g/L |
Comparative Example 1
[0030] A steel sheet was pretreated and then electroplated by using the plating solution
of Embodiment 1 under the conditions of a plating bath temperature of 23°C and a plating
bath stirring rate of 50 m/min.
Comparative Example 2
[0031] A steel sheet was pretreated and then electroplated by using the plating solution
of Embodiment 1 under the conditions of a plating bath temperature of 60°C and a plating
bath stirring rate of 2 m/min.
Comparative Example 3
[0032] A steel sheet was pretreated and then electroplated by using the plating solution
of Embodiment 3 under the conditions of a plating bath temperature of 60°C and a plating
bath stirring rate of 3 m/min.
[0033] The plated precipitate state, alloy composition (wt.%) of the precipitated film,
treatment time, and film thickness in Examples 1 to 5 and Comparative Examples 1 to
3 are shown in Tables 1 to 2.
Table 1
|
Example 1 |
Example 2 |
Example 3 |
Plated precip itate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
Plated precip itate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness {µm} |
Plated, precip itate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
10A/dm2 |
○ |
70/30 |
120 |
8.8 |
○ |
70/30 |
120 |
8.8 |
○ |
45/55 |
240 |
7.0 |
20A/dm2 |
○ |
70/30 |
60 |
8.8 |
○ |
70/30 |
60 |
8.8 |
○ |
45/55 |
120 |
6.5 |
30A/dm2 |
○ |
70/30 |
40 |
8.8 |
○ |
70/30 |
40 |
8.8 |
○ |
40/60 |
80 |
4.9 |
40A/dm2 |
○ |
72/28 |
30 |
8.9 |
○ |
70/30 |
30 |
8.8 |
Δ |
40/60 |
60 |
3.5 |
50A/dm2 |
○ |
72/28 |
25 |
8.9 |
○ |
70/30 |
25 |
8.7 |
× |
- |
48 |
- |
60A/dm2 |
○ |
75/25 |
20 |
8.0 |
○ |
75/25 |
20 |
8.1 |
× |
- |
40 |
- |
70A/dm2 |
○ |
75/25 |
17 |
7.8 |
○ |
75/25 |
17 |
8.0 |
× |
- |
34 |
- |
80A/dm2 |
○ |
75/25 |
15 |
7.6 |
○ |
75/25 |
15 |
7.8 |
× |
- |
30 |
- |
90A/dm2 |
Δ |
85/15 |
13 |
7.4 |
○ |
82/18 |
13 |
7.6 |
× |
- |
27 |
- |
100A/dm2 |
Δ |
85/15 |
12 |
6.9 |
○ |
82/18 |
12 |
7.2 |
× |
- |
24 |
- |
The treatment time is measured in seconds in all the above cases.
○ : dense and smooth precipitate
Δ : local occurrence of coarse precipitate
× : powder-like coarse precipitate |
Table 2
|
Example 4 |
Example 5 |
Plated precipitate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
Plated precipitate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
10A/dm2 |
○ |
88/12 |
120 |
9.4 |
○ |
85/15 |
120 |
9.0 |
20A/dm2 |
○ |
90/10 |
60 |
9.2 |
○ |
80/20 |
60 |
8.5 |
30A/dm2 |
○ |
90/10 |
40 |
9.2 |
○ |
80/20 |
40 |
8.5 |
40A/dm2 |
○ |
90/10 |
30 |
9.2 |
○ |
80/20 |
30 |
8.0 |
50A/dm2 |
○ |
90/10 |
25 |
9.0 |
○ |
80/20 |
25 |
7.9 |
60A/dm2 |
○ |
90/10 |
20 |
8.6 |
○ |
85/15 |
20 |
7.6 |
70A/dm2 |
Δ |
91/9 |
17 |
7.2 |
○ |
84/16 |
17 |
7.3 |
80A/dm2 |
Δ |
91/9 |
15 |
6.4 |
○ |
88/12 |
15 |
6.0 |
90A/dm2 |
× |
- |
13 |
- |
○ |
90/10 |
13 |
5.4 |
100A/dm2 |
× |
- |
12 |
- |
Δ |
95/5 |
12 |
4.2 |
The treatment time is measured in seconds in all the above cases.
○ : dense and smooth precipitate
Δ : local occurrence of coarse precipitate
× : powder-like coarse precipitate |
Table 3
|
Comparative Example 1 |
Comparative Example 2 |
Comparative Example 3 |
|
Plated precip itate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
Plated precip itate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
Plated precip itate state |
Sn/Zn (wt.%) |
Treatment time |
Film thickness (µm) |
10A/dm2 |
○ |
48/52 |
120 |
5.6 |
○ |
66/34 |
120 |
4.2 |
Δ |
45/55 |
120 |
3.2 |
2OA/dm2 |
○ |
52/48 |
60 |
4.2 |
× |
- |
60 |
- |
× |
- |
60 |
- |
30A/dm2 |
Δ |
52/48 |
40 |
2.9 |
× |
- |
40 |
- |
× |
- |
40 |
- |
40A/dm2 |
× |
- |
30 |
- |
× |
- |
30 |
- |
× |
- |
30 |
- |
50A/dm2 |
× |
- |
25 |
- |
× |
- |
25 |
- |
× |
- |
25 |
- |
60A/dm2 |
× |
- |
20 |
- |
× |
- |
20 |
- |
× |
- |
20 |
- |
70A/dm2 |
× |
- |
17 |
- |
× |
- |
17 |
- |
× |
- |
17 |
- |
80A/dm2 |
× |
- |
15 |
- |
× |
- |
15 |
- |
× |
- |
15 |
- |
90A/dm2 |
× |
- |
13 |
- |
× |
- |
13 |
- |
× |
- |
13 |
- |
100A/dm2 |
× |
- |
12 |
- |
× |
- |
12 |
- |
× |
- |
12. |
- |
The treatment time is measured in seconds in all the above cases.
○ : dense and smooth precipitate
Δ : local occurrence of coarse precipitate
× : powder-like coarse precipitate |