(19)
(11) EP 1 824 945 A1

(12)

(43) Date of publication:
29.08.2007 Bulletin 2007/35

(21) Application number: 04811473.0

(22) Date of filing: 19.11.2004
(51) International Patent Classification (IPC): 
C09K 13/06(2006.01)
(86) International application number:
PCT/US2004/038761
(87) International publication number:
WO 2006/054996 (26.05.2006 Gazette 2006/21)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LU MC NL PL PT RO SE SI SK TR

(71) Applicant: Honeywell International Inc.
Morristown, NJ 07962 (US)

(72) Inventors:
  • YELLOWAGA, Deborah L., Honeywell International Inc
    Morristown, NJ 07962 (US)
  • PALMER, Ben, Honeywell International Inc.
    Morristown, NJ 07962 (US)
  • STARZYNSKI, John S., Honeywell International Inc.
    Morristown, NJ 07962 (US)
  • MCFARLAND, John A., Honeywell International Inc.
    Morristown, NJ 07962 (US)
  • LOWE, Marie,
    Gilbert AZ 85296, (US)

(74) Representative: Hucker, Charlotte Jane 
Gill Jennings & Every LLP Broadgate House 7 Eldon Street
London EC2M 7LH
London EC2M 7LH (GB)

   


(54) SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF