(19)
(11) EP 1 830 384 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
19.09.2007 Bulletin 2007/38

(43) Date of publication A2:
05.09.2007 Bulletin 2007/36

(21) Application number: 07075242.3

(22) Date of filing: 27.05.2004
(51) International Patent Classification (IPC): 
H01J 37/30(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

(30) Priority: 28.05.2003 US 473810 P

(62) Application number of the earlier application in accordance with Art. 76 EPC:
04748613.9 / 1627412

(71) Applicant: MAPPER LITHOGRAPHY IP B.V.
2628 XK Delft (NL)

(72) Inventors:
  • Wieland, Marco Jan-Jaco
    2628 CJ Delft (NL)
  • Kruit, Pieter
    2611 EB Delft (NL)

(74) Representative: Bras, Pieter 
Octrooibureau Vriesendorp & Gaade B.V. P.O. Box 266
2501 AW Den Haag
2501 AW Den Haag (NL)

   


(54) Charged particle beamlet exposure system


(57) The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising:
- a first aperture means (3) comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam (2) for forming a charged particle beamlet;
- a lens system comprising at least one lens (4) for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens;
- a deflector means (5), substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, and
- a second aperture means (6) comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.







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