(19)
(11) EP 1 831 430 A2

(12)

(43) Date of publication:
12.09.2007 Bulletin 2007/37

(21) Application number: 05854872.8

(22) Date of filing: 20.12.2005
(51) International Patent Classification (IPC): 
C23F 1/00(2006.01)
H01L 21/306(2006.01)
(86) International application number:
PCT/US2005/046226
(87) International publication number:
WO 2006/069085 (29.06.2006 Gazette 2006/26)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR MK YU

(30) Priority: 21.12.2004 US 637897 P
24.05.2005 US 137200
03.11.2005 US 266167

(71) Applicant: Applied Materials, Inc.
Santa Clara, CA 95054 (US)

(72) Inventors:
  • KAO, Chien-Teh
    Sunnyvale, CA 94086 (US)
  • CHOU, Jing-Pei (Connie)
    Sunnyvale, CA 94087 (US)
  • UMOTOY, Salvador P.
    Antioch, CA 94509 (US)
  • CHANG, Mei
    Saratoga, CA 95070 (US)
  • YUAN, Xiaoxiong (John)
    Cupertino, CA 95014 (US)
  • CHANG, Yu
    San Jose, CA 95129 (US)
  • LU, Xinliang
    Sunnyvale, CA 94086 (US)
  • PHAN, See-Eng
    San Jose, CA 95129 (US)
  • KUANG, William
    Sunnyvale, CA 94086 (US)
  • TZU, Gwo-Chuan
    Sunnyvale, CA 94086 (US)
  • OR, David T.
    San Jose, CA 95117 (US)

(74) Representative: Bayliss, Geoffrey Cyril 
BOULT WADE TENNANT, Verulam Gardens 70 Gray's Inn Road
London WC1X 8BT
London WC1X 8BT (GB)

   


(54) AN IN-SITU CHAMBER CLEAN PROCESS TO REMOVE BY-PRODUCT DEPOSITS FROM CHEMICAL VAPOR ETCH CHAMBER