(19)
(11) EP 1 838 424 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
22.04.2015 Bulletin 2015/17

(45) Mention of the grant of the patent:
11.03.2015 Bulletin 2015/11

(21) Application number: 05820878.6

(22) Date of filing: 14.11.2005
(51) International Patent Classification (IPC): 
G03F 7/00(2006.01)
B29C 33/58(2006.01)
 B29C 33/62(2006.01)
B82Y 10/00(2011.01)
(86) International application number:
PCT/US2005/041156
(87) International publication number:
WO 2006/057843 (01.06.2006 Gazette 2006/22)

(54)

Method for reducing adhesion forces between an imprinting material and a mold, and use of an imprinting composition

Verfahren zur Reduzierung der Haftungskräfte zwischen einem Imprint-Material und einem Formwerkzeug, sowie Benutzung eines Imprint-Materials

Procédé pour réduire les forces d'adhésion entre un matériau pour l'imprinting et un moule, ainsi que l'utilisation d'un matériau pour l'imprinting

(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

(30) Priority: 24.11.2004 US 631029 P
15.12.2004 US 12375
15.12.2004 US 12374
28.02.2005 US 68171
28.02.2005 US 68397
28.02.2005 US 68174
05.10.2005 US 244428

(43) Date of publication of application:
03.10.2007 Bulletin 2007/40

(73) Proprietor: Canon Nanotechnologies, Inc.
Austin, TX 78758-3605 (US)

(72) Inventors:
  • XU, Frank, Y.
    Round Rock, TX 78664 (US)
  • FLETCHER, Edward, B.
    Austin, TX 78729 (US)
  • TRUSKETT, Van, N.
    Austin, TX 78731 (US)
  • MILLER, Michael, N.
    Austin, TX 78759 (US)

(74) Representative: Ponzellini, Gianmarco et al
PGA S.r.l. Via Mascheroni, 31
20145 Milano
20145 Milano (IT)


(56) References cited: : 
US-A1- 2003 166 814
   
  • BENDER M ET AL: "Multiple Imprinting in UV-based Nanoimprint Lithography: Related Material Issues", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 61-62, 1 January 2002 (2002-01-01), pages 407-413, XP002341777, ISSN: 0167-9317, DOI: DOI:10.1016/S0167-9317(02)00470-7
  • ZHAOHUI S ET AL: "Surface activity of perfluorodecanoyl end-capped poly(ethylene oxide) and associated adsorption behavior to the air-water interface", POLYMER, ELSEVIER SCIENCE PUBLISHERS B.V, GB, vol. 39, no. 19, 1 September 1998 (1998-09-01), pages 4655-4664, XP004124585, ISSN: 0032-3861, DOI: DOI:10.1016/S0032-3861(97)10318-4
  • BONGIOVANNI R ET AL: "High resolution XPS investigation of photocured films containing perfluoropolyether acrylates", POLYMER, ELSEVIER SCIENCE PUBLISHERS B.V, GB, vol. 41, no. 2, 1 January 2000 (2000-01-01), pages 409-414, XP004190004, ISSN: 0032-3861, DOI: DOI:10.1016/S0032-3861(99)00203-7
  • BAILEY T. ET AL.: 'Step ans flash imprint lithography: Template surface treatment and analysis' J. VAC. SCI. TECHNOL. vol. 18, no. 6, 2000, pages 3572 - 3577, XP002279175
  • BENDER M. E.: 'Multiple imprinting in UV-based nanoimprint lithography: related materials issues' MICOELECTRONIC ENGINEERING vol. 61-62, 2002, pages 407 - 413, XP002341777
  • August 2001, THE UNIVERSITY OF TEXAS, AUSTIN article COLBURN M. E.: 'Dissertation for the degree of Doctor of Philosophy (chapter 3, pg 40-62)', XP001202198
  • 'DuPont Zonyl Fluorochemical Intermediates', [Online] 21 June 2003, pages 1 - 16, XP003000254 Retrieved from the Internet: <URL:www.dupont.com/zonyl/pdf/intermediates .pdf>
  • 'DuPont Zonyl UR', [Online] 21 June 2003, XP003000255 Retrieved from the Internet: <URL:www.dupont.com/zonyl/pdf/UR.pdf>
  • 'DuPont Zonyl FSN', [Online] 24 August 2003, pages 1 - 2, XP003000256 Retrieved from the Internet: <URL:www.dupont.com/zonyl/pdf/FSN.pdf>
  • 'Masurf FS-230', [Online] 05 April 2004, pages 1 - 2, XP003000257 Retrieved from the Internet: <URL:eee.masonsurfactants.com/Products/Masu rf_FS_230.htm>
   
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