EXPOSURE METHOD, METHOD FOR FORMING PROJECTING AND RECESSED PATTERN, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT - Patent 1842100

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EP 1 842 100 A1

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(43)	Date of publication:
	10.10.2007 Bulletin 2007/41

(21)	Application number: 06701442.3

(22)	Date of filing: 24.01.2006

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International Patent Classification (IPC):

G03F 7/20^(2006.01)

(86)	International application number:
	PCT/JP2006/301381

(87)	International publication number:
	WO 2006/078073 (27.07.2006 Gazette 2006/30)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

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Priority:

24.01.2005 JP 2005015799

(71)	Applicant: FUJIFILM Corporation
	Minato-ku Tokyo 106-8620 (JP)

(72)	Inventors:
	HODOSAWA, Yoshihito c/o FUJIFILM Corporation Shizuoka 418-8666 (JP) EGAMI, Chikara Shizuoka 4311104 (JP)

(74)	Representative: Klunker, Hans-Friedrich
	Patentanwälte Klunker . Schmitt-Nilson . Hirsch Winzererstrasse 106 80797 München 80797 München (DE)

(54)	EXPOSURE METHOD, METHOD FOR FORMING PROJECTING AND RECESSED PATTERN, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT