PROCESS FOR PRODUCTION OF InP MICROPARTICLE AND InP MICROPARTICLE DISPERSION SOLUTION PRODUCED BY THE PROCESS

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(11)

EP 1 862 431 A8

(12)	CORRECTED EUROPEAN PATENT APPLICATION
	published in accordance with Art. 158(3) EPC

(15)	Correction information:
	Corrected version no 1 (W1 A1)

(48)	Corrigendum issued on:
	02.07.2008 Bulletin 2008/27

(43)	Date of publication:
	05.12.2007 Bulletin 2007/49

(21)	Application number: 06729302.7

(22)	Date of filing: 10.03.2006

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International Patent Classification (IPC):

C01B 25/08^(2006.01)
C09K 11/70^(2006.01)

C09K 11/08^(2006.01)

(86)	International application number:
	PCT/JP2006/305312

(87)	International publication number:
	WO 2006/101015 (28.09.2006 Gazette 2006/39)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

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Priority:

23.03.2005 JP 2005083707

(71)	Applicant: HOYA CORPORATION
	Shinjuku-ku, Tokyo 161-0032 (JP)

(72)	Inventor:
	TOKUMITSU, Shuzo c/o Hoya Corporation Shinjuku-ku, Tokyo 1610032 (JP)

(74)	Representative: Albrecht, Thomas et al
	Kraus & Weisert Thomas-Wimmer-Ring 15 80539 München 80539 München (DE)

(54)	PROCESS FOR PRODUCTION OF InP MICROPARTICLE AND InP MICROPARTICLE DISPERSION SOLUTION PRODUCED BY THE PROCESS

(57) The invention is to provide a process for industrially advantageously producing InP fine particles having a nano-meter size efficiently in a short period of time and an InP fine particle dispersion, and there are provided a process for the production of InP fine particles by reacting an In raw material containing two or more In compounds with a P raw material containing at least one P compound in a solvent wherein the process uses, as said two or more In compounds, at least one first In compound having a group that reacts with a functional group of P compound having a P atom adjacent to an In atom to be eliminated with the functional group in the formation of an In-P bond and at least one second In compound having a lower electron density of In atom in the compound than said first In compound and Lewis base solvent as said solvent, and InP fine particles obtained by the process.