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<SDOBI lang="en"><B000><eptags><B001EP>......DE....FRGB..IT................................................................................</B001EP><B005EP>J</B005EP><B007EP>DIM360 Ver 2.41 (21 Oct 2013) -  2999001/0</B007EP></eptags></B000><B100><B110>1881094</B110><B120><B121>CORRECTED EUROPEAN PATENT SPECIFICATION</B121></B120><B130>B8</B130><B132EP>B1</B132EP><B140><date>20140827</date></B140><B150><B151>W1</B151><B153>72</B153><B155><B1551>de</B1551><B1552>Bibliographie</B1552><B1551>en</B1551><B1552>Bibliography</B1552><B1551>fr</B1551><B1552>Bibliographie</B1552></B155></B150><B190>EP</B190></B100><B200><B210>06732533.2</B210><B220><date>20060512</date></B220><B240><B241><date>20071112</date></B241><B242><date>20130806</date></B242></B240><B250>ja</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>2005139451</B310><B320><date>20050512</date></B320><B330><ctry>JP</ctry></B330><B310>2005231877</B310><B320><date>20050810</date></B320><B330><ctry>JP</ctry></B330><B310>2005231966</B310><B320><date>20050810</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>20140827</date><bnum>201435</bnum></B405><B430><date>20080123</date><bnum>200804</bnum></B430><B450><date>20140416</date><bnum>201416</bnum></B450><B452EP><date>20131220</date></B452EP><B480><date>20140827</date><bnum>201435</bnum></B480></B400><B500><B510EP><classification-ipcr sequence="1"><text>C30B  29/40        20060101AFI20111019BHEP        </text></classification-ipcr><classification-ipcr sequence="2"><text>C30B   9/12        20060101ALI20111019BHEP        </text></classification-ipcr><classification-ipcr sequence="3"><text>C30B  35/00        20060101ALI20111019BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>VERFAHREN UND VORRICHTUNG ZUR HERSTELLUNG EINES KRISTALLS EINES NITRIDS EINES ELEMENTS DER GRUPPE III</B542><B541>en</B541><B542>PROCESS AND APPARATUS FOR PRODUCING GROUP III ELEMENT NITRIDE CRYSTAL</B542><B541>fr</B541><B542>PROCEDE ET APPAREIL DE FABRICATION DE CRISTAUX DE NITRURE D'ELEMENTS DU GROUPE III,</B542></B540><B560><B561><text>JP-A- 2002 128 586</text></B561><B561><text>JP-A- 2003 238 296</text></B561><B561><text>JP-A- 2003 313 098</text></B561><B561><text>JP-A- 2003 313 098</text></B561><B562><text>SARAYAMA S. AND IWATA H.: 'Flux-ho ni yoru Kohinshitsu Chikka Gallium no Kessho Seicho (High Quality Crystal Growth of Gallium Nitride by Flux Method)' RICOH TECHNICAL REPORT vol. 30, December 2004, pages 9 - 19, XP003003066</text></B562><B565EP><date>20111024</date></B565EP></B560></B500><B700><B720><B721><snm>SARAYAMA, Seiji</snm><adr><str>26-10, Nishinakada 7-chome, Taihaku-ku,</str><city>Sendai-shi, Miyagi,  9811105</city><ctry>JP</ctry></adr></B721><B721><snm>IWATA, Hirokazu</snm><adr><str>15-2, Kamo 2-chome, Izumi-ku,</str><city>Sendai-shi, Miyagi, 9813122</city><ctry>JP</ctry></adr></B721><B721><snm>FUSE, Akihiro</snm><adr><str>3-10, Nachigaoka 1-chome,</str><city>Natori-shi, Miyagi, 9811244</city><ctry>JP</ctry></adr></B721></B720><B730><B731><snm>Ricoh Company, Ltd.</snm><iid>100208567</iid><irf>56 396 VI</irf><adr><str>3-6, Nakamagome 1-chome 
Ohta-ku</str><city>Tokyo 143-8555</city><ctry>JP</ctry></adr></B731></B730><B740><B741><snm>Schwabe - Sandmair - Marx</snm><iid>100060632</iid><adr><str>Patentanwälte 
Stuntzstraße 16</str><city>81677 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>DE</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>IT</ctry></B840><B860><B861><dnum><anum>JP2006309552</anum></dnum><date>20060512</date></B861><B862>ja</B862></B860><B870><B871><dnum><pnum>WO2006121152</pnum></dnum><date>20061116</date><bnum>200646</bnum></B871></B870><B880><date>20080123</date><bnum>200804</bnum></B880></B800></SDOBI>
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