(19)
(11) EP 1 938 367 A2

(12)

(43) Date of publication:
02.07.2008 Bulletin 2008/27

(21) Application number: 06814944.2

(22) Date of filing: 19.09.2006
(51) International Patent Classification (IPC): 
H01L 21/44(2006.01)
(86) International application number:
PCT/US2006/036479
(87) International publication number:
WO 2007/035731 (29.03.2007 Gazette 2007/13)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated Extension States:
AL BA HR MK RS

(30) Priority: 20.09.2005 US 230912
05.10.2005 US 243876

(71) Applicant: Enthone, Inc.
West Haven, CT 06516 (US)

(72) Inventors:
  • CHEN, Qingyun
    West Haven, CT 06516 (US)
  • VALVERDE, Charles
    West Haven, CT 06516 (US)
  • PANECCASIO, Vincent
    West Haven, CT 06516 (US)
  • PETROV, Nicolai
    West Haven, CT 06516 (US)
  • STRITCH, Daniel
    West Haven, CT 06516 (US)
  • WITT, Christian
    West Haven, CT 06516 (US)
  • HURTUBISE, Richard
    West Haven, CT 06516 (US)

(74) Representative: Stenger, Watzke & Ring 
Intellectual Property Am Seestern 8
40547 Düsseldorf
40547 Düsseldorf (DE)

   


(54) DEFECTIVITY AND PROCESS CONTROL OF ELECTROLESS DEPOSITION IN MICROELECTRONICS APPLICATIONS