(19)
(11) EP 1 945 829 A1

(12)

(43) Date of publication:
23.07.2008 Bulletin 2008/30

(21) Application number: 06823435.0

(22) Date of filing: 09.11.2006
(51) International Patent Classification (IPC): 
C23C 14/02(2006.01)
B24B 37/00(2006.01)
 C23C 14/34(2006.01)
G03F 1/00(2006.01)
(86) International application number:
PCT/JP2006/322787
(87) International publication number:
WO 2007/055401 (18.05.2007 Gazette 2007/20)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

(30) Priority: 10.11.2005 JP 2005325769

(71) Applicant: Asahi Glass Company, Limited
Chiyoda-ku Tokyo 100-8405 (JP)

(72) Inventor:
  • SUGIYAMA, Takashi
    Chiyoda-ku, Tokyo 100-8405 (JP)

(74) Representative: Müller-Boré & Partner Patentanwälte 
Grafinger Strasse 2
81671 München
81671 München (DE)

   


(54) METHOD FOR DEPOSITING REFLECTIVE MULTILAYER FILM OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND METHOD FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY