(19)
(11) EP 1 959 473 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
03.09.2008 Bulletin 2008/36

(43) Date of publication A2:
20.08.2008 Bulletin 2008/34

(21) Application number: 08157352.9

(22) Date of filing: 13.02.2004
(51) International Patent Classification (IPC): 
H01J 1/28(2006.01)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR
Designated Extension States:
AL MK

(30) Priority: 14.02.2003 US 447975 P

(62) Application number of the earlier application in accordance with Art. 76 EPC:
04711065.5 / 1593140

(71) Applicant: Mapper Lithography IP B.V.
2628 XK Delft (NL)

(72) Inventors:
  • Kruit, Pieter
    2611 EB, DELFT (NL)
  • Steenbrink, Stijn Willem Herman Karel
    2628 XK, DELFT (NL)

(74) Representative: De Hoop, Eric et al
Octrooibureau Vriesendorp & Gaade B.V. Dr Kuyperstraat 6
2514 BB Den Haag
2514 BB Den Haag (NL)

   


(54) Dispenser Cathode


(57) A dispenser cathode which comprises an emission surface (4), a reservoir for material releasing (2), when heated, work-function-lowering particles, and at least one passage (7) for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area (9) and at least one non-emission area (8) covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.







Search report