| (84) |
Designated Contracting States: |
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DE FR GB |
| (30) |
Priority: |
04.01.2006 US 325609
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| (43) |
Date of publication of application: |
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15.10.2008 Bulletin 2008/42 |
| (60) |
Divisional application: |
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10191507.2 / 2295532 |
| (73) |
Proprietor: Agency for Science, Technology and Research |
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Singapore 138632 (SG) |
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| (72) |
Inventors: |
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- KAN, Shyi-herng
Singapore 138669 (SG)
- YING, Jackie, Y.
Singapore 138669 (SG)
- YU, Hanry
Singapore 138669 (SG)
- SCHUMACHER, Karl
Singapore 138669 (SG)
- NG, Susanne, San San
Singapore 138669 (SG)
- SUN, Wanxin
Singapore 138669 (SG)
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| (74) |
Representative: HOFFMANN EITLE |
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Patent- und Rechtsanwälte
Arabellastrasse 4 81925 München 81925 München (DE) |
| (56) |
References cited: :
WO-A-2005/108547 US-A1- 2004 219 184
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US-A1- 2004 067 546
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barrier utilizing an ultra-thin, nanofabricated silicon nitride membrane." LAB ON
A CHIP JAN 2005, vol. 5, no. 1, January 2005 (2005-01), pages 74-85, XP002437850 ISSN:
1473-0197
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