FIELD OF THE INVENTION
[0001] The present invention relates to a screen or panel as an element for medical radiographic
image formation, improved with respect to robustness, required for a frequently reused
element. More particularly said element is suitable for use in computed, as well as
in direct radiography.
BACKGROUND OF THE INVENTION
[0002] A well-known use of phosphors is in the production of X-ray images. In a conventional
radiographic system an X-ray radiograph is obtained by X-rays transmitted image-wise
through an object and converted into light of corresponding intensity in a so-called
intensifying screen (X-ray conversion screen) wherein phosphor particles absorb the
transmitted X-rays and convert them into visible light and/or ultraviolet radiation
to which a photographic film is more sensitive than to the direct impact of X-rays.
[0003] According to another method of recording and reproducing an X-ray pattern as disclosed
e.g. in
US-A 3,859,527 a special type of phosphor is used, known as a photostimulable phosphor, which being
incorporated in a panel, is exposed to incident pattern-wise modulated X-ray beam
and as a result thereof temporarily stores energy contained in the X-ray radiation
pattern. At some interval after the exposure, a beam of visible or infra-red light
scans the panel to stimulate the release of stored energy as light that is detected
and converted to sequential electrical signals which can be processed to produce a
visible image. For this purpose, the phosphor should store as much as possible of
the incident X-ray energy and emit as little as possible of the stored energy until
stimulated by the scanning beam. This is called "digital radiography" or "computed
radiography". In both kinds of radiography it is preferred to be able to choose the
phosphor that will be used on the basis of its speed and image quality over a long
time period without having to bother about its hygroscopicity, the more as such a
panel is normally reused over such a long time period.
[0004] Therefore it is highly desired to have the possibility of producing a phosphor panel,
be it for use in direct radiography or in computed radiography, that is impervious
to water vapour. In
US-A 4,741,993 a radiation image storage panel is disclosed having at least one stimulable phosphor
layer on a support and a protective layer provided on the stimulable phosphor layer,
wherein the protective layer comprises at least two layers of which regains under
a relative humidity of 90% on a sorption isotherm at 25°C are different by 0.5% or
more. According to that invention, a radiation image storage panel which has good
humidity resistance and can be used for a long term is obtained. Although a protective
layer as disclosed in
US-A 4,741,993 does provide good humidity protection, the need for providing phosphor panels with
even better humidity resistance has been a remaining object.
[0005] Image quality of computed radiography (CR) can be improved by scanning the storage
phosphor plate in transmission (see Fig.1) instead of in reflection. After making
the X-ray image by exposure, the CR imaging plate (IP) is scanned in transmission,
i.e. the NIP (needle image plate) is stimulated from the back or rear side and the
emission light is detected at the front side. For this reason a transparent substrate
is requested for the IP. For a transparent powder imaging plate a transparent plastic
substrate may be used.
[0006] Another way to improve image quality of CR is by scanning the storage phosphor plate
and collecting the PSL light both in transmission and in reflection. This technique
is commonly called dual side reading as has e.g. been described in
US-A's 6,344,657;
6,462,352;
6,465,794 and
6,479,834.
[0007] In the production of a needle imaging plate, however, a thermal vapor deposition
process is used, in which the substrate is subjected to temperatures of 150°C or more
for a time period varying from minutes to hours. Plastics are not dimensionally stable
at these temperatures. Hence, glass is a desired substrate for transparent needle
imaging plates (NIPs). As NIPs are hygroscopic, due to the presence of an alkali metal
halide matrix in the phosphor, a suitable protection against moisture degradation
is required. Therefore, NIPs are often covered with a poly p-xylylene layer, known
as a "parylene" layer. Use of parylene layers as humidity protective layers of hygroscopic
photo-stimulable phosphor screen layers has been disclosed in e.g.
US-Application 2003/0038249. Also in
DE-A-196 25 912 and
GB-A-2 287 864 phosphor screens containing a parylene layer are disclosed. Although screens prepared
according to the disclosures above do yield screens with an acceptable to even a very
good overall quality, the need for a phosphor screen combining good humidity resistance
and good resistance against physical damage, especially scratch resistance during
use remains present. This problem is posed the more after frequent use of desired
CsBr-based phosphor plates and as a result thereof the image quality thereof is reduced
as a function of time. When the plates have to be cleaned or when they are taken out
of the cassette the parylene layer, normally offering an adequate protection against
moisture for the hygroscopic CsBr-based phosphor, may be damaged because parylene
has a very low scratch resistance resulting again in a stability problem of the image
plate. Coating of a layer onto the parylene layer may thus be desirable as has e.g.
been described in
US-A 6,710,356. From that radiation cured polymeric layer coated onto said parylene layer in order
to further essentially prevent the phosphor plate against physical damage as a scratch
resistant layer it is known that, over a long period of frequent use, adhesion of
organic or inorganic polymer layers towards parylene coating is low. A remarkable
adhesion improvement has been attained as has been described in
US-A 7,193,226.
[0008] It was observed, however, that the adhesion between the glass substrate and parylene
was bad. As a consequence, although severe measures have been taken hitherto, water
may still diffuse into the NIP layer along the (side) edges, especially when the parylene
overlaps with the glass substrate over a small or limited distance. As a result the
NIP absorbs water at the edges and looses sensitivity very fast in the edge regions,
more particularly in hot and humid conditions. When the moisture sensitive phosphor
or scintillator layer has become deposited onto a glass support, an ever lasting problem
has thus been encountered, in that due to inadequate moisture stopping power of the
parylene coating at the borders of the glass support the phosphor layer becomes damaged
in that region, especially due to moisture, penetrating into the phosphor layer at
the insufficiently protected sites, as a consequence of initially insuffcient or degrading
adhesiveness of the parylene layer onto the glass support.
SUMMARY OF THE INVENTION
[0009] It is thus an object of the present invention to provide the moisture sensitive phosphors,
more preferably of the lanthanide doped alkali metal halide type, in a phosphor layer
of a screen, plate or panel for radiographic diagnostic images, coated onto a glass
support, with a protective parylene coating that is initially adequate and that does
not deteriorate in adhesiveness onto said glass support, so that images with an enabling
diagnostic value are obtained, even when the screen, plate or panel is frequently
reused, after exposure with X-rays and read-out of said plate or panel.
[0010] It is another object of the present invention to offer a transparent NIP that is
stable in hot, humid conditions and that does not undergo edge degradation.
[0011] The above-mentioned advantageous effects are realized by providing a CR or DR image
plate or panel having the specific characteristics set out in claim 1. Specific features
for preferred embodiments of the invention are set out in the dependent claims.
[0012] Further advantages and embodiments of the present invention will become apparent
from the following description.
BRIEF DESCRIPTION OF THE DRAWINGS
[0013]
Fig.1 shows (left side) the exposure and (right side) the scanning of the storage
phosphor plate in transmission, together with the detection of emitted light upon
photostimulation by a laser source.
Fig.2 shows a reference "Flat-Field" as obtained from the exposed comparative transparent
NIP from example 1.
Fig.3 shows a "Flat-Field" as obtained from the exposed comparative transparent NIP
from example 1 after 10 days of conditioning in a climatic chamber at 30°C and 80%
R.H.
Fig.4 shows the force to pull off the ParC® layer increasing by mechanical roughening of the glass and increasing with roughness
within one type of roughening.
Fig.5 provides a schematic representation of a NIP plate with an active phosphor area
and a non-covered area with roughened edges.
Fig.6 schematically shows the degree of overlap between glass and poly-p-xylylene
varying between 2 and 10 mm, wherein the ParC® was covered with a spray-coated polyurethane acrylate (PUA) top-coat, with 2 mm overlap
at both the right and the left edges.
Fig.7 shows "flat-field" images for a (fresh) reference screen and an inventive screen
after a one week conditioning in a climatic chamber at 30°C and 80%RH.
Fig.8 shows sensitivity profiles over the NIP as obtained for a (fresh) reference
screen and an inventive screen after a one week conditioning in a climatic chamber
at 30°C and 80%RH.
DETAILED DESCRIPTION OF THE INVENTION
[0014] The object as set forth hereinbefore has been fully achieved by increasing the specific
surface of the glass, available for interaction with the parylene top-coat. More particularly
the specific surface of the glass has been increased by increasing the roughness of
the glass support by chemical etching or by a mechanical treatment, such as e.g. sand-blasting.
[0015] As described in
US-Application 2003/0038249 a phosphor panel has been described wherein the panel further comprises a support
with a surface larger than said main surface of said phosphor layer, so that said
phosphor layer leaves a portion of said support free, and said layer A covers at least
a part said portion of said support left free by said phosphor layer. In the examples
the phosphor was deposited on a glass support.
[0016] Roughening may be carried out by using a SiC grinding medium having a grain number
between 400 and 1200. Roughening and subsequent etching of the surface of the layer
carrier may otherwise be performed.
[0017] A step of etching may be carried out using hydrofluoric acid, in a particular embodiment
in a 1:1 mixture of distilled water. Following a grinding or sand-blasting operation
the glass plate may be cleaned several times in distilled water, for example in an
ultrasonic bath, and may be finally immersed for, e.g., 3 to 10 minutes in an etching
bath, that preferably consists of a 1:1 mixture of H
2O and HF, and moved to and fro in the acid. Otherwise the method of using a chemical
such as sodium etching may not be applied as having a problem with safety.
[0018] One type of glass usable in the invention may be the typically termed "soda-lime"
glass. In general, soda-lime glass contains a percentage of sodium oxide and calcium
oxide dispersed in silicon dioxide (silica), which forms the major component of the
glass. Generally, during the etching process, the soda-lime components are dissolved
and removed by the etching solution leaving the skeletized glass structure remaining.
However, depending on the etching ability of the solution and the duration of the
etching treatment, the silica itself may also be dissolved to a certain extent.
Soda-lime glasses useful in the invention may contain from about 5 to about 45% by
weight of soda-lime with about 20 to about 25% by weight soda-lime preferred. While
such glasses are preferred for use in the present invention, it will be understood
by those skilled in the art that sheets and shapes of various other types of glass
well known to the art may be processed to achieve the unique glass structure described
herein and to thereby acquire the high clarity/low reflectivity/cleaning properties
taught by the present invention. For example, glasses containing other alkali or mineral
oxides such as potassium oxides, barium oxides, strontium oxides and aluminum oxides,
with or without a small percentage of lead, may also be used. Also, glasses which
have been tempered using conventional tempering treatments yield excellent results
when employed as support materials in the present invention and soda-lime glass as
in the instant description of the invention is only exemplary and is not limited thereto.
[0019] Prior to undergoing any etching, the surface of the glass must be cleaned to remove
any oils, greases and any other contaminants which may interfere with the etching
process. Any suitable heavy duty industrial glass cleaning solution may be used as
a cleaning agent, such as, for example, a 50/50 volume ratio solution of ammonia and
water. The glass to be treated is then generally immersed in the cleaning solution
at about 45° to about 65°C to assist the cleaning action, with the solution agitated
for about 10 minutes. After removal from the cleaning solution, the glass sheet is
then normally rinsed with clean water, at room temperature.
[0020] The surface of the glass may further undergo a pre-etching step in order to remove
a weathered surface layer which is usually comprised of surface oxides. This pre-treatment
step enhances the wetting with the treatment chemicals. A typical soda-lime glass
sheet, including about 23% soda-lime, may be pre-etched in an acid solution comprising
e.g. about 0.5 to about 12.0 % of hydrofluoric acid, with about 2 to about 4% preferred.
After such a pre-etching step, the glass is rinsed with water at about 25°C and thereafter
diffusion etched using a diffusion etching solution, the glass being treated for between
15 seconds to 25 minutes, depending on temperature and concentration. The aqueous
solution that may diffusion etch may include a strong fluoride ion agent, such as
hydrogen fluoride, and a weak fluoride ion agent, such as ammonium fluoride. The said
agents may be combined with a "moderator" which may control the activity of the fluoride
ions in solution. The "moderator" e.g. may be an organic hydroxy group or an ester
group containing compound, including at least one hydroxy or ester group. Generally,
the glass is treated by contacting the sheet with an aqueous solution. In one embodiment,
the sheet is immersed in the solution, which can be either in a one dip or in a multi
dip operation. The time per dip may range from seconds to minutes depending on the
concentrations, processing temperatures, and glass to be treated. It is preferable
to utilize multiple dips for providing a finer etched structure with greater uniformity.
[0021] Control of the processing temperatures is very important in order to achieve the
proper surface structure in the present invention. Generally, temperatures between
0°C and 35°C are preferred for the diffusion etching treatment. While such etching
may be carried out above and below this range, below 0°C the reaction rate is unnecessarily
slowed, while above 35°C the reaction rate may cause more severe etching than desired.
Generally, the lower temperatures are preferred because at the lower reaction rates,
it takes longer to etch the glass, enhancing control of the etching process and therefore
providing a more finely etched surface structure which tends to yield a glass with
increased clarity.
[0022] In order to adhere a particular fluorine-containing polymer film to a substrate support,
following methods may be applied:
- 1) a method for physically roughening a surface of substrate by e.g. sand blasting;
- 2) a method for surface-treating a fluorine-containing resin film by chemical treatment
such as e.g. sodium etching, plasma treatment, photochemical treatment;
- 3) a method for adhering by using an adhesive, and other methods as has e.g. been
described in US-A 6,716,497.
[0023] With respect to the methods 1 and 2 above, surface-treating steps are required, and
the steps are complicated and productivity is poor. Also kinds and shapes of substrate
supports are restricted. Further the obtained adhesive force is insufficient, and
heat resistance which the fluorine-containing resin inherently possesses is easily
lowered. Also the method of using a chemical such as sodium etching has a problem
with safety as already mentioned hereinbefore. Use of an adhesive in the third method,
as e.g. a usual hydrocarbon type (non-fluorine-containing) adhesive does not have
enough adhesive power and its heat resistance is insufficient. Thus a hydrocarbon
type adhesive cannot stand under conditions for adhering a fluorine-containing polymer
film which requires molding and processing at high temperature, and peeling due to
decomposition of the adhesive and coloring occur. Since the above-mentioned composite
material produced by using an adhesive also is insufficient in heat resistance, chemical
resistance and water resistance of its adhesive layer, it cannot maintain adhesive
force due to a change in temperature and environment, and lacks in reliability.
[0024] In another embodiment the "texturing" of the glass substrate may be carried out,
as described in
US-A 6,715,318 using a known mechanical polishing method, with precisely controlled operational
conditions. However, in the case of a glass substrate having a glass or a crystallized
glass, the texturing may be carried out more simply by roughening the glass substrate
surface by etching.
When etching, in theory the surface of a multi-component glass substrate should be
etched uniformly. Although irregular or abnormal evenness of etching patterns on microscopic
scale are not desired, there may be some unevenness as, in general, the composition
of the surface layer of a glass substrate is not necessarily uniform on a microscopic
scale, and moreover, more particularly during polishing, abrasive grains may be pushed
strongly against the glass substrate surface, may adhere thereto or become embedded
therein, and hence at such sites, it will look as if the glass substrate support surface
is irregular. There may thus be parts of the glass support substrate surface that
are easily dissolved by an etching solution and parts that are not so easily dissolved,
and as a result the etching may proceed not so uniformly as desired.
[0025] As in
US-A 6,471,880 a process may be provided for etching glass objects by a chemical treatment. The
process includes (a) at least one stage of chemical treatment of e.g. a glass support,
and (b) at least one stage of rinsing said glass support etched by the treatment of
step (a) with an aqueous solution of one or more alkali metal or alkaline earth metal
cation salts. The chemical etching solution employed in stage (a) is e.g. obtained
by mixing a composition comprising from 20% to 99% by weight of potassium bifluoride,
from 1% to 80% by weight of at least one water-soluble divalent or trivalent cation
salt selected from divalent and trivalent cation salts; and optionally one or more
of the following compounds, i.e. up to 15% by weight of ammonium bifluoride, sodium
bifluoride in a proportion by weight of less than or equal to that of potassium bifluoride,
provided that, when the composition comprises both ammonium bifluoride and sodium
bifluoride, the total amount of these two bifluorides does not exceed that of potassium
bifluoride, from 5% to 60% by weight of at least one water-insoluble filler chosen
from inorganic and organic products which are stable in an acidic medium, or from
0.2% to 6% by weight of one or more surface-active agents which are stable in an acidic
medium.
[0026] Minutely roughening a surface of a substrate glass support, by an etching method
for the purpose of enhancing adhesion of a coating film to the surface of the said
substrate glass support may moreover be applied as has been described in
US-A 5,242,544. An easily vaporizable material such as a fat or wax may be used, and the substrate
surface be scattered with numerous microscopic droplets of the masking material by
exposing the substrate surface to vapor of such masking material and simultaneously
to vapor of another material, e.g. water or an alcohol, which is immiscible with the
masking material and serves the purpose of preventing agglomeration of droplets of
the masking material on the substrate surface. After having etched the substrate with
a suitable etching fluid, the masking material is removed. As the result the etched
surface of the substrate is scattered with numerous microscopic islets.
[0027] As a glass support PARSOL
® green may e.g. be used, said glass type belonging to the range of colored glass substrates
sold by Saint-Gobain Vitrage under the trade name "PARSOL", which have various thermal
properties and colors. With respect thereto reference can be made to the glasses described
in the
PCT patent application WO 93/07095 and in the French patent application
92/15537 filed December 23, 1992, in the name of Saint-Gobain Vitrage International. Making use of glass substrates
already having a certain functionality is very advantageous, because in this way it
is possible to synergistically combine both esthetic and thermal effects of the substrate
on the one hand and the stack of thin layers on the other.
[0028] With respect to the particular organic polymeric protective layer, overlapping the
phosphor layer and the glass support, incompletely covering said glass support as
in the present invention, general information in literature with respect to poly-p-xylylene
or "parylene" polymer films can be found in e.g.
Martin H. Kaufman, Herman F. Mark, and Robert B. Mesrobian, "Preparation, Properties
and Structure of Polyhydrocarbons derived from p-Xylene and Related Compounds," vol.
XIII, 1954, pp. 3-20 (no date) and
Andreas Griener, "Poly (1,4-xylylene)s: Polymer Films by Chemical Vapour Deposition,"
1997, vol. 5, No. 1, Jan., 1997, pp. 12-16. "Parylene", a generic name for thermoplastic polymers and copolymers based on p-xylylene
and substituted p-xylylene monomers, has been shown to possess suitable physical,
chemical, electrical, and thermal properties for use in integrated circuits. Deposition
of such polymers by vapourisation and decomposition of a stable dimer, followed by
deposition and polymerisation of the resulting reactive monomer, is discussed by
Ashok K. Sharma in "Parylene-C at Subambient Temperatures", published in the Journal
of Polymer Science: Part A: Polymer Chemistry, Vol. 26, at pages 2953-2971 (1988). "Parylene" polymers are typically identified as Parylene-N, Parylene-C, and Parylene-F
corresponding to non-substituted p-xylylene, chlorinated p-xylylene, and fluorinated
p-xylylene, respectively. Properties of such polymeric materials, including their
low dielectric constants, are further discussed by
R. Olson in "Xylylene Polymers", published in the Encyclopedia of Polymer Science
and Engineering, Volume 17, Second Edition, at pages 990-1024 (1989). Parylene-N is deposited from non-substituted p-xylyene at temperatures below about
70-90°C.
[0029] The substituted dimers are typically cracked at temperatures which degrade the substituted
p-xylylene monomers, and the parylene-C and parylene-F films must be deposited at
temperatures substantially lower than 30°C.
[0030] In a preferred embodiment according to the present invention the protective coating
is adhered to the phosphor screen or panel and to the glass support by chemical vapour
deposition (CVD) and the vapour deposited film is thus a vacuum deposited polymeric
film and more particularly a poly-p-xylylene film. A poly-p-xylylene has repeating
units in the range from 10 to 10000, wherein each repeating unit has an aromatic nuclear
group, whether or not substituted. Each substituent group, if present, can be the
same or different and can be any inert organic or inorganic group which can normally
be substituted on aromatic nuclei. Illustrations of such substituent groups are alkyl,
aryl, alkenyl, amino, cyano, carboxyl, alkoxy, hydroxylalkyl, carbalkoxy and like
radicals as well as inorganic radicals such as hydroxyl, nitro, halogen and other
similar groups which are normally substitutable on aromatic nuclei. Particularly preferred
of the substituted groups are those simple hydrocarbon groups such as the lower alkyl
such as methyl, ethyl, propyl, butyl, hexyl and halogen groups particularly chlorine,
bromine, iodine and fluorine as well as the cyano group and hydrogen. Applied on screens
or panels, in part (the largest part) on the phosphor layer and on the glass support
(the smallest part) as in the present invention, these polymers are formed on phosphor
screens or panels by pyrolysis and vapour deposition of a di-p-xylylene. These materials
are the subject of several US-Patents such as
US-A 3,117,168 entitled "Alkylated Di-p-Xylylenes",
US-A 3,155,712 entitled "Cyanated Di-p-Xylylenes" and
US-A 3,300,332 entitled "Coated Particulate Material and Method for Producing Same". Pyrolysis of
the vaporous di-p-xylylene occurs upon heating the dimer from about 450°C to about
700°C and preferably about 550°C to about 700°C. Regardless of the pressure employed
pyrolysis of the starting di-p-xylylene begins at about 450°C. At temperatures above
700°C cleavage of the constituent groups may occur, resulting in a tri- or polyfunctional
species causing cross-linking of highly branched polymers. It is preferred that reduced
or sub-atmosphere pressures are employed for pyrolysis to avoid localized hot spots.
For most operations pressures within the range of 0.0001 to 10 millimetres of Hg are
practically used. However desired greater pressures may be employed. Likewise inert
inorganic vapour diluents such as nitrogen, argon, carbon dioxide and the like can
be employed to vary the optimum temperature of operation or to change the total effective
pressure of the system. The diradicals formed in the manner described above are made
to impinge upon the surface of the particulate material having surface temperatures
below 200°C and below the condensation temperature of the diradicals present thereby
condensing thereon and spontaneously polymerising.
[0031] As a basic agent the commercially available di-p-xylylene composition sold by the
Union Carbide Co. under the trademark "Parylene" is thus preferred. The preferred
compositions for the protective moistureproof protective layer covering the phosphor
screens or panels thus are the unsubstituted "Parylene N", the monochlorine substituted
"Parylene C", the dichlorine substituted "Parylene D" and the "Parylene HT" (a completely
fluorine substituted version of Parylene N, opposite to the other "parylenes" resistant
to heat up to a temperature of 400°C and also resistant to ultra-violet radiation,
moisture resistance being about the same as the moisture resistance of "Parylene C"
as described in the note about "High Performance Coating for Electronics Resist Hydrocarbons
and High Temperature" written by Guy Hall, Specialty Coating Systems, Indianapolis,
available via www.scscookson.com. Technology Letters have also been made available
by Specialty Coating Systems, Cookson Company, as e.g. the one about "Solvent Resistance
of the Parylenes", wherein the effect of a wide variety of organic solvents on Parylenes
N, C, and D was investigated. In a preferred embodiment in the present invention said
parylene layer is a halide-containing layer and more preferably said parylene layer
is selected from the group consisting of a parylene D, a parylene C and a parylene
HT layer.
[0032] According to the present invention a CR image plate or DR scintillator plate or panel
having a glass support and having said glass support covered, in part, with a phosphor
or scintillator layer coated thereupon, wherein said phosphor or scintillator layer
and part of the said glass support left free from being covered by said phosphor or
scintillator layer are coated with an organic polymeric protective layer, characterized
in that said glass support is roughened up to an R
a value of more than 0.5 µm, upon at least part of the side onto which the phosphor
or scintillator layer is coated onto said support.
[0033] In another embodiment the image plate or panel according to the present invention
is characterized in that said glass support is roughened up to an R
a value of 1.0 µm or more.
[0034] Said R
a value, expressing the surface roughness attained by roughening the glass support,
is measured by means of a perthometer. This instrument is built in order to microscopically
follow the surface irregularities consisting of a series of "hills" and "valleys".
The Ra value thus expresses the average height of these respective "high" and "low"
points of the surface, i.e., a high Ra value indicates a rough surface, whereas a
low Ra value indicates a smooth surface. The European standard DIN 4768 provides additional
details of the surface roughness test.
[0035] In a still more particular embodiment the glass support of the image plate or panel
according to the present invention has in addition, roughened upstanding edges.
[0036] According to the present invention, said organic polymeric protective layer overlaps
the surface of said glass support onto which the phosphor layer is provided over a
distance of at least 2 mm.
[0037] For the image plate or panel according to the present invention, the preferred organic
polymeric protective layer is a poly-p-xylylene layer.
[0038] In a more particular embodiment according to the present invention, in the image
plate or panel said organic layer is covered with a polyurethane acrylate layer. In
favour of a good adhesion onto said "parylene" layer, in the image plate or panel
according to the present invention, between said poly p-xylylene layer and said polyurethane
acrylate layer, an organic coating layer is present, having at least one phosphoric
acid ester compound.
[0039] That polyurethane acrylate layer, acting as a second protective layer is coated by
adding at least one ester compound of phosphoric acid to an organic coating solution,
followed by curing said panel by UV and/or electron beam exposure, wherein said at
least one phosphoric acid ester compound is represented by the general formula (I)
hereinafter:

wherein each of R
1, R
2 and R
3 are same or different, and are selected from the group consisting of hydrogen, a
saturated or unsaturated, substituted or unsubstituted aliphatic group and a substituted
or unsubstituted aromatic group.
[0040] Said phosphoric acid ester compound providing good adhesion onto the parylene layer
is, more particularly, selected from the group of compounds consisting of methacryl-ethyl
phosphate, acrylethyl phosphate, di-methacrylethyl phosphate, methacrylethyl-methacrylpropyl-phosphate,
di-acrylethyl phosphate, methacrylpropyl phosphate, acrylpropyl phosphate, dimethacrylpropyl
phosphate, methacrylethyl-methacryl-propyl phosphate, dodecyl-polyethyleenglycolphosphate,
polyethylene glycol-tridecylether phosphate, monoalkylphenyl- polyethyleenglycol phosphate,
dioctylphenyl-polyethyleenglycol phosphate, 2-(phosphonoxy) ethyl-2-propenoate, 4-(phosphonoxy)
butyl-2-propenoate, and phosphinicobis(oxy-2,1-ethane diyl)-di-2-propenoate, , tris-acryloyl-oxyethyl
phosphate, nonylphenol ethoxylate phosphate, phenol ethoxylate phosphate, diethyl(ethoxycarbonyl-methane)phosphonate,
ethoxylated fatty alcohol phosphate E, ethoxylated tridecyl phosphate mixture, mixture
of mono,di,tri-tridecylethyleneglycol phosphate, polyethylene glycol tridecyl ether
phosphate, diethyl ethyl phosphonate, dimethyl propyl phosphonate, diethyl N,N - bis(2-hydroxyethyl)
amino methyl phosphonate, phosphonic acid methyl(5-methyl-2-methyl-1,3,2-dioxaphosphorinan-5-y)
ester,P,P'-dioxide, phosphonic acid, methyl(5-methyl-2-methyl-1,3,2-dioxaphosphorinan-5-yl)methyl,
methyl ester,P-oxide, triethyl phosphate, 2-ethylhexyl diphenyl phosphate, iso-decyl
diphenyl phosphate, iso propylated triphenyl phosphate, iso propylated triphenyl phos-phate,
iso butylated triphenyl phosphate, triphenyl phosphate, cresyl diphenyl phosphate,
tributyl phosphate and tricresyl phosphate.
[0041] In the method of preparing an image plate or panel according to the present invention,
said glass support is roughened up by chemical etching or by a mechanical treatment.
More in particular, said mechanical treatment is performed by sand blasting. According
to the method of the present invention, in a still more particular embodiment sand
blasting is performed under pressure with aluminum oxide or glass beads. In another
embodiment according to the method of the present invention said chemical etching
is performed by a fluoride containing agent.
[0042] In the method of preparing an image plate or panel according to the present invention,
said poly-p-xylylene layer is coated onto said phosphor or scintillator layer by chemical
vapor deposition.
[0043] In another embodiment according to the method of the present invention said poly-p-xylylene
layer is coated onto said phosphor or scintillator layer by a laminating step. In
that case a foil of parylene is prepared by the steps of chemical vapor deposition
of p-xylylene onto glass, pretreated with an easy-peel release agent, followed by
peeling off said foil and laminating said foil onto the phosphor or scintillator layer
and the portion of the roughened glass support left free from being covered by said
phosphor or scintillator layer. It is recommended to perform said laminating step
by a step of heating said laminate foil or layer while being laminated onto the phosphor
or scintillator layer. In another embodiment said laminating step is followed by a
step of heating said laminate layer in order to make it sticking onto the phosphor
or scintillator layer and on the roughened glass support. The foil or layer normally
has a thickness in the range from 1 µm up to 10 µm. Heating of said foil, during or
after laminating, is advantageously performed with a radiation source having an emission
spectrum in the range 1000°K to 3500°K and a power density of 12000 W/m
2, at a distance in the range from 5 cm to 20 cm from said laminate foil or layer.
In another embodiment heating is performed in an oven and laminating proceeds by means
of a heated plate in the said oven. In still another embodiment heating is performed
by means of rollers, at least one of which is heated, and wherein laminating proceeds
between said rollers or after said rollers. Heating steps as mentioned hereinbefore
are performed at a temperature in the range from 100°C up to 200°C. When applying
such a method of laminating a thin foil of parylene onto the phosphor or scintillator
layer in a screen or panel as in the present invention, upon said laminated parylene
layer as an organic polymeric protection layer, a second protective layer is advantageously
coated by chemical vapour deposition of e.g. a second poly-p-xylylene layer.
[0044] Whatever a method is applied in order to coat the "parylene" layer, i.e. by chemical
vapour deposition or laminating or both by laminating followed by chemical vapour
deposition, in the method according to the present invention, as an additional organic
coating layer between the outermost poly-p-xylylene layer and the further applied
anti-abrasive or scratch-free polyurethane acrylate layer, such an additional organic
coating layer is applied directly by a coating solution containing film-forming nitrocellulose,
ethylcellulose, cellulose acetate or poly(meth)acrylic resin as organic solvent-soluble
polymer wherein removing said solvent is performed by evaporation.
[0045] In a particular embodiment according to the method of the present invention, said
polyurethane acrylate layer is applied by spray coating.
[0046] According to the method of the present invention said phosphor or scintillator layer
is a binderless layer, deposited by vapour deposition of raw materials selected from
the group consisting of one or more matrix compound(s), one or more dopant compound(s)
and a combination thereof, aligned in parallel, having needle-shaped form and oriented
under an angle in a range between 60° and 90° with respect to said glass support.
As matrix compound(s) alkali metal halide salts and as dopant(s) lanthanides or non-matrix
monovalent ions are preferred, in order to prepare a lanthanide doped alkali metal
halide phosphor or scintillator such as e.g. CsBr:Eu, CsI:Na, CsI:Tl and RbBr:Tl,
without being limited thereto. In case of laminating the "parylene" layer onto such
needle-shaped phosphor or scintillator layer in CR image plate or DR scintillator
plate or panel respectively, said phosphor or scintillator layer with vapour deposited
needles and a space or gap in form of voids between said needles, covered with a protective
layer composed of such an organic polymeric compound, in favour of image sharpness,
advantageously fills said space or gap partially with said organic polymeric compound
over a depth of not more than 1 µm, while the rest of said space or gap is filled
with a gaseous compound.
[0047] In another embodiment according to the method of the present invention said phosphor
or scintillator layer is coated as a binder medium layer of a ground needle-shaped
phosphor or scintillator in non-aligned powdery form or as a binder medium layer of
a powdery phosphor. In that case the phosphor or scintillator, apart from being a
lanthanide or otherwise doped alkali metal halide phosphor or scintillator may also
be a lanthanide doped alkaline earth metal halide phosphor or scintillator such as
a europium doped barium fluorohalide type phosphor, such as e.g. BaFBr:Eu, BaFBr(I):Eu,
Ba(Sr)FBr:Eu, Ba(Sr)FBr(I):Eu, without being limited thereto.
[0048] In still another embodiment according to the method of the present invention said
phosphor or scintillator layer is coated by solidifying a molten binderless layer
of ground or vapour deposited phosphors or scintillators, thus forming a crystalline
layer comprising said phosphor in a homogeneously solidified form. In that case use
may be made of lanthanide or otherwise doped alkali metal halide as well as lanthanide
doped alkaline earth metal halide phosphors or scintillators.
Examples
[0049] While the present invention will hereinafter be described in connection with preferred
embodiments thereof, it will be understood that it is not intended to limit the invention
to those embodiments.
Sample preparation
[0050] A 750 µm thick CsBr:Eu
2+ phosphor layer was deposited on an 8 mm thick "Parsol
® green" glass substrate by thermal vapour deposition.
[0051] The glass support was placed in a vacuum evaporation apparatus. Subsequently the
stimulable phosphor raw materials, CsBr and EuOBr, were charged in a crucible, used
as an evaporation source. The crucible was introduced in the vacuum chamber and high
vacuum was created.
[0052] Next, argon gas was introduced while keeping the pumps on, in order to maintain the
vacuum, thereby providing a pressure of about 3 Pa at most. The evaporation source
was heated to an evaporation temperature of about 700°C, so that the CsBr:Eu was evaporating
and condensing onto the rotating substrate which was suspended above the evaporation
crucible. The deposition was stopped when a thickness for the stimulable phosphor
layer of 750 µm was attained.
The phosphor layer was subsequently annealed for 4 hours at 170°C in air in order
to improve the PSL activity.
[0053] In order to protect the CsBr:Eu
2+ layer from moisture a 10 µm "ParC
® " (Parylene C) coating was applied by chemical vapour deposition. The NIP was finished
with a 3 µm scratch-resistant, spray-coated protective layer of poly-urethane acrylate.
Experiments:
[0054] A first prototype Flat-panel NIP showed strong degradation starting from the edges
as there was found a poor adhesion between the glass substrate and the parylene top-coat
so that water could diffuse into the NIP layer at the edges, especially when the parylene
layer did overlap with the glass substrate over a limited distance only. This was
recognized to be the cause of degradation of the phosphor layer, starting from the
edges.
[0055] In the experiments described below, attempts have been done in order to investigate
whether edge degradation could be avoided by promoting the adhesion between the glass
and the parylene interface by mechanically roughening the glass.
Comparative example 1
[0056] A transparent NIP prototype, R45-0507-01, was produced with an active area of 432
mm x 432 mm on a smooth Parsol
® -green glass substrate (size 450 mm x 450 mm). The overlap between the ParC
® and the glass substrate was about 1mm. A poly-urethane acrylate scratch-resistant
top-coat was applied on top of the parylene moisture barrier layer.
[0057] Flat-field images were made. The term "flat field" should be understood herein as
"uniformly exposed", i.e. exposed with a constant intensity and with a homogeneous
energy distribution over the active area of the NIP, wherein in a standard procedure
use is made therefore of RQA 5 (International Electrotechnical Commission - IEC61267:1994)
beam quality. The thus homogeneously exposed NIP was scanned in transmission with
a prototype scanning device allowing such scanning in transmission. The scanning device
was calibrated under normal room conditions (22°C, 45% R.H. - relative humidity).
[0058] Fig. 2 shows the resulting flat-field image as reference image.
[0059] Comparative example 1 transparent NIP was subjected to a climatic test. It was stored
in a climatic chamber or conditioning room at a temperature of 30°C and a relative
humidity of 80% for a period of ten days.
[0060] After the climatic testing period a flat-field image was made in the same way as
the reference flat-field image. The result is shown in Fig.3.
[0061] From the sensitivity profile before and after climatic changes, it was concluded
for the comparative test that the sensitivity in central region of the NIP dropped
to about 89% of the original value. However there was a continuous image plate degradation
starting at the four corners of the image plate and expanding concentrically towards
the center. The sensitivity degradation in the four corners was more than 80% at the
end of the experiment.
The image plate did not recover when the climatic conditions were changed to standard
conditions (22°C; 40-50% RH).
Inventive Examples
[0062] The region of the Parsol
® green glass substrate just outside of the transparent NIP active area was sand-blasted
with different pressures, making use therefore of aluminum oxide particles or glass
beads as roughening agents. The roughness (Ra) was measured and the glass was covered
with a 10 µm ParC
® layer. For each type of roughening, the force to pull off a 26 mm wide ParC
® strip was measured with a manometer.
[0063] The results are listed in the Table 1 below. The figure in the last column of the
Table 1 shows that the force to pull off the parC
® layer.
Table 1
Roughening |
Ra (µm) |
Force (grams) |
No |
< 0.01 |
2 |
A1203 - EKF 150 4 bar |
3.41 |
85 |
A1203 - EKF 151 1 bar |
1.18 |
25 |
A1203 - EKF 152 2 bar |
1.94 |
52.5 |
A1203 - EKF 150 4 bar |
3.11 |
70 |
Glass beads 4 bar |
5.39 |
75 |
[0064] It is clear from the result in the Table 1 that the force to pull off the ParC
® layer was improved by mechanical roughening of the glass and increased with increasing
roughness within one type of roughening as has also been shown in the Fig.4.
[0065] In order to investigate the effect on stability and, more particularly, edge stability,
CR flat-panels with an active area of 18 cm x 24 cm were made on 25 cm x 25 cm Parsol
® -green glass substrates with roughened edges. The edges were roughened by sand-blasting
with aluminium oxide type EKF150 with a pressure of 4 bar according to the schedule
in Fig.5, giving a schematic representation of a NIP plate with an active phosphor
area and a non-covered area with roughened edges.
[0066] The degree of overlap of glass by Parylene was varied between 2 and 10 mm. The Parylene
was covered with a spray-coated PUA top-coat, with 2 mm overlap at both the right
and the left edges as shown in Fig.6.
[0067] The NIPs were subjected to the above described standard climatic stability test.
Before placing the NIPs in the climatic chamber at 30°C; 80% R.H., reference flat-field
images were made by by read-out in reflection after homogeneous RQA5 exposure. After
2, 7 and 30 days of exposure to the hot, humid climatic conditions respectively, new
flat-field images were made.
[0068] A homogeneous sensitivity drop of ca. 10% was observed over the complete NIP area.
No strong degradation of the edges was observed, as can be seen in the flat-field
images below in the Table 2.
Table 2
NIP |
% sensitivity drop after 7 days |
R_25_0611_01 |
10.25 |
R_25_0611_02 |
10.19 |
R_25_0611_03 |
9.86 |
R_25_0611_04 |
10.08 |
R_25_0611_05 |
11.43 |
R_25_0611_06 |
8.07 |
[0069] From these experiments it was concluded that no significant edge degradation occurred
within one week (Fig.7) and that a more or less homogeneous sensitivity drop of about
10% was observed (Fig.8) after keeping the NIP's for 1 week at 30C/80% RH.
[0070] Making the glass sufficiently rough and having an overlap of at least 2 mm between
glass and parylene was shown to be sufficient in order to avoid edge degradation.
Advantageous effects of the present invention
[0071] Making the glass substrate support sufficiently rough and having between glass and
the parylene layer an overlap of at least 2 mm, providing glass substrates with roughened
edges is a sufficient measure in order to avoid edge degradation. Forces to pull off
the parylene layer have been shown to be remarkably improved by mechanical roughening
of the glass and to be increased by increasing its roughness within one type of roughening
method, as, e.g. within the sandblasting method.
[0072] Covering the parylene layer with a spray-coated polyurethane acrylate, moreover offers
an additional protection, more in particular against scratches and damaging after
frequent reuse.
[0073] It is further concluded that no significant edge degradation is observed as well
as an acceptable sensitivity drop of about 10%, as observed after keeping NIPs for
one week in a severe climatic conditing room at 30°C and at a high relative humidity
of 80%, when making the glass sufficiently rough and having an overlap of the glass
by parylene of at least 2 mm in order to avoid edge degradation.
[0074] Having described in detail preferred embodiments of the current invention, it will
now be apparent to those skilled in the art that numerous modifications can be made
therein without departing from the scope of the invention as defined in the appending
claims.
1. A CR image plate or DR scintillator plate or panel having a glass support and having
said glass support covered, in part, with a phosphor or scintillator layer coated
thereupon, wherein said phosphor or scintillator layer and part of the said glass
support left free from being covered by said phosphor or scintillator layer are coated
with an organic polymeric protective layer, characterized in that said glass support is roughened up to an Ra value of more than 0.5 µm, upon at least part of the side onto which the phosphor
or scintillator layer is coated onto said support.
2. Image plate or panel according to claim 1, characterized in that said glass support is roughened up to an Ra value of 1.0 µm or more.
3. Image plate or panel according to claim 1 or 2, wherein said glass support has in
addition, roughened upstanding edges.
4. Image plate or panel according to any one of the claims 1 to 3, wherein said organic
polymeric protective layer overlaps the surface of said glass support onto which the
phosphor layer is provided over a distance of at least 2 mm.
5. Image plate or panel according to any one of the claims 1 to 4, wherein said organic
polymeric protective layer is a poly-p-xylylene layer.
6. Image plate or panel according to any one of the claims 1 to 5, wherein said organic
layer is covered with a polyurethane acrylate layer.
7. Image plate or panel according to claim 6, wherein between said poly p-xylylene layer
and said polyurethane acrylate layer, an organic coating layer is present, having
at least one phosphoric acid ester compound.
8. Method of preparing an image plate or panel according to any one of the claims 1 to
4, wherein said glass support is roughened by chemical etching or by a mechanical
treatment.
9. Method of preparing an image plate or panel according to any one of the claims 5 to
7, wherein said glass support is roughened by chemical etching or by a mechanical
treatment.
10. Method according to claim 8 or 9, wherein said mechanical treatment is performed by
sand blasting.
11. Method according to claim 8 or 9, wherein said chemical etching is performed by treating
with a fluoride containing agent.
12. Method according to any one of the claims 9 to 11, wherein said poly-p-xylylene layer
has been coated onto said phosphor or scintillator layer by chemical vapor deposition.
13. Method according to any one of the claims 9 to 12, wherein said poly-p-xylylene layer
has been coated onto said phosphor or scintillator layer by a laminating step.
14. Method according to any one of the claims 9 to 13, wherein said organic coating layer
between said poly-p-xylylene layer and said polyurethane acrylate layer is applied
directly by a coating solution containing film-forming nitrocellulose, ethylcellulose,
cellulose acetate or poly(meth)acrylic resin as organic solvent-soluble polymer and
removing said solvent by evaporation.
15. Method according to any one of the claims 9 to 14, wherein said polyurethane acrylate
layer is applied by spray coating.
16. Method according to any one of the claims 8 to 15, wherein said phosphor or scintillator
layer is a binderless layer, deposited by vapour deposition of raw materials selected
from the group consisting of one or more matrix compound(s), one or more dopant compound(s)
and a combination thereof, aligned in parallel, having needle-shaped form and oriented
under an angle in a range between 60° and 90° with respect to said glass support.
17. Method according to any one of the claims 8 to 15, wherein said phosphor or scintillator
layer is coated as a binder medium layer of a ground needle-shaped phosphor or scintillator
in non-aligned powdery form or as a binder medium layer of a powdery phosphor.
18. Method according to any one of the claims 8 to 15, wherein said phosphor or scintillator
layer is coated by solidifying a molten binderless layer of ground or vapour deposited
phosphors or scintillators.