A semiconductor materials inspection system

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EP 2 009 676 B8

(12)	CORRECTED EUROPEAN PATENT SPECIFICATION
	Note: Bibliography reflects the latest situation

(15)	Correction information:
	Corrected version no 1 (W1 B1)

(48)	Corrigendum issued on:
	21.11.2012 Bulletin 2012/47

(45)	Mention of the grant of the patent:
	17.10.2012 Bulletin 2012/42

(21)	Application number: 08161355.6

(22)	Date of filing: 08.05.2003

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International Patent Classification (IPC):

H01L 21/00^(2006.01)
H01L 27/15^(2006.01)
H01L 25/075^(2006.01)
A61L 2/26^(2006.01)
G01N 21/88^(2006.01)
F21K 99/00^(2010.01)

H01L 25/16^(2006.01)
H01L 33/00^(2010.01)
A61L 2/10^(2006.01)
A61L 9/20^(2006.01)
G03F 7/20^(2006.01)

(54)	A semiconductor materials inspection system Halbleitermaterial-Prüfsystem Systèmes d'inspection de matériaux à semi-conducteur

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

(43)	Date of publication of application:
	31.12.2008 Bulletin 2009/01

(62)	Application number of the earlier application in accordance with Art. 76 EPC:
	03724539.6 / 1508157

(73)	Proprietor: Phoseon Technology, Inc.
	Hillsboro, OR 97124 (US)

(72)	Inventors:
	Owen, Mark D. Beaverton, OR 97006 (US) McNeil, Tom Portland, OR 97229-1972 (US) Vlach, François Beaverton, OR 97006 (US)

(74)	Representative: Murgitroyd, George Edward
	Murgitroyd & Company Scotland House 165-169 Scotland Street Glasgow G5 8PL Glasgow G5 8PL (GB)

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References cited: :

EP-A- 1 158 761
WO-A-02/26270
JP-A- 10 223 633
US-A- 6 002 792

EP-A1- 1 001 460
WO-A-97/16679
US-A- 5 436 710
US-B1- 6 373 568

Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).