Method and system for sample preparation

(19)

(11)

EP 2 060 898 A3

(12)	EUROPEAN PATENT APPLICATION

(88)	Date of publication A3:
	24.11.2010 Bulletin 2010/47

(43)	Date of publication A2:
	20.05.2009 Bulletin 2009/21

(21)	Application number: 08253663.2

(22)	Date of filing: 07.11.2008

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International Patent Classification (IPC):

G01N 1/32^(2006.01)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
	Designated Extension States:
	AL BA MK RS

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Priority:

08.11.2007 JP 2007290496

(71)	Applicant: JEOL Ltd.
	Akishima, Tokyo 196-8558 (JP)

(72)	Inventor:
	Kagaya, Yusuke Tokyo 190-0004 (JP)

(74)	Representative: Cross, Rupert Edward Blount
	Boult Wade Tennant Verulam Gardens 70 Gray's Inn Road London WC1X 8BT London WC1X 8BT (GB)

(54)	Method and system for sample preparation

(57) Method and system for preparing samples (15) for use in electron microscopy. The method and system use a focused ion beam (FIB) instrument (10) and a scanning electron microscope (20) to improve the time efficiency of the FIB instrument. The FIB instrument incorporates machining means for preparing thin-film samples by ion beam irradiation. The scanning electron microscope incorporates a gas supply means (22) and a manipulator (23) equipped with a probe (24). The gas supply means ejects gas (27) at the sample (15) after it has been shifted from the FIB instrument together with a sample holder. The sample is irradiated with an electron beam (EB) while the gas is ejected at the sample from the gas supply means under the condition where the probe is contacted with the sample. Thus, the sample is bonded to the probe.

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