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(11) | EP 2 146 250 A8 |
| (12) | CORRECTED EUROPEAN PATENT APPLICATION |
| published in accordance with Art. 153(4) EPC |
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| (54) | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME |
| (57) A process which comprises applying a water-soluble resin composition comprising a
water-soluble vinyl resin, a compound having at least two amino groups in the molecule,
a solvent, and, if necessary, an additive such as a surfactant on a resist pattern
(2) formed on a substrate (1) to form a water-soluble resin film (3), modifying part
of the water-soluble resin film adjacent to the resist pattern through mixing to form
a water-insolubilized layer (4) which cannot be removed by water washing on the surface
of the resist pattern, and removing unmodified part of the water-soluble resin film
by water washing and which enables the effective scale-down of separation size and
hole opening size of a resist pattern to a level finer than the limit of resolution
of the wave length of exposure. It is preferable to use as the water-soluble vinyl
resin a homopolymer of a nitrogen-containing vinyl monomer such as acrylamine, vinylpyrrolidone
or vinylimidazole, a copolymer of two or more nitrogen-containing vinyl monomers,
or a copolymer of at least one nitrogen-containing vinyl monomer and at least one
nitrogen-free vinyl monomer.
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