Field of the Invention:
[0001] The present invention relates to an apparatus and a method for the electrolytic treatment
of a plate-shaped product that is disposed in the apparatus. Such apparatuses and
methods can be used both in the production of printed circuit boards and printed circuit
foils and also in the production of semiconductor wafers, solar cells, photoelectric
cells and monitor plates.
Background of the Invention:
[0002] At present chip producers in the semi-conductor industry are working on the introduction
of so-called 65-nanometer structures (Computertechnik (10), 2007). Even smaller structures
of 45 nm are in the process of being developed. However, these dimensions too are
only intermediate steps on the road to even smaller structures. Based on the advancing
miniaturisation of semi-conductor components, new challenges are arising for the manufacturers
of printed circuit boards with chip-carriers to adapt their products to new conditions.
This means, for example, that current demands for structure dimensions of approx.
25 µm have to be realised if they want to stay in the market. At the same time, it
is already clear that in the near future dimensions will get even smaller. It is no
longer possible to realise such precision structures with the necessary quality using
today's conventional methods and apparatuses in printed circuit board production.
In the miniaturisation of structures, structures with irregular contours, even bridges
(short-circuits) or interrupts are considered. In addition, it has also been established
that the uniformity of the metal layers deposited is insufficient. This is not acceptable
as the electric characteristics of the circuits produced in this way will be impaired
in an unforeseeable manner, which means that the circuits will have to be thrown away.
[0003] The aforementioned requirements for the highly precise production of printed circuit
boards come with demands to be able to produce these printed circuit boards again
and again in very large quantities in as cost-effective manner as possible.
[0004] It is of particular significance, more especially for the production of very precise
structures with the aforementioned dimensions, to be able to create the metal layers
required for this with as uniform a layer thickness as possible. If not, non uniform
structure profiles (widths, flanks, heights) are formed setting limits to miniaturisation.
[0005] For the wet chemical treatment of work pieces, for instance for metallization or
for etching, the work pieces are brought into contact with a treatment fluid, for
example by immersion into a container containing the treatment fluid or by conducting
a jet of the treatment fluid onto the surface of the work piece. In doing so, the
work pieces can be guided through a treatment system in a batch-wise manner or also
by means of a continuous conveyor on which they are treated. During the treatment,
the work pieces can be retained in an upright position or in a horizontal position.
The latter is applicable in particular to plates in continuous transport. Printed
circuit boards, for example, are typically treated either in dip tanks in the upright
position or in a continuous conveyorized system in which the work pieces are held
in the horizontal position and are continuously conveyed (for example
WO 98/374 A2). In the latter case, the treatment fluid can be kept, for example, in a stationary
bath, the work pieces being guided through the said bath.
[0006] For electrodeposition, it is typically advantageous to set the treatment fluid used
for the metal deposition in motion for example by blowing in air, so that a sufficient
fluid exchange takes place at the surface of the work pieces to be treated and more
especially in small holes in the work pieces. In addition, nozzles can also be provided,
for example, for conducting treatment fluid to the work piece surfaces, with their
nozzle openings below the level of the fluid.
[0007] For example
US-A 4,622,917 discloses an apparatus for electroless metal plating, where a printed circuit board
is retained in the upright position in a bath container and, in doing so, is immersed
into a treatment fluid. Fluid distributors are disposed on both sides of the printed
circuit board, the said fluid distributors being separated from a treatment region
by defining walls, which face the printed circuit board and include a plurality of
holes, the printed circuit board being situated in the said treatment region. The
printed circuit board is moved back and forth during the treatment at right angles
to the fluid flow generated by the holes. The fluid distributors are used in an alternating
manner for incoming flow with the fluid and for removal by suction, one fluid distributor
being for the incoming flow of fluid to one side of the printed circuit board, whilst
the other fluid distributor sucks out fluid at the same time from the other side of
the printed circuit board. Consequently the fluid flows in an alternating manner into
the one or into the other direction. This method of operation is to achieve both a
uniform coating of the surface of the work piece and also of the hole walls in the
printed circuit board.
[0008] In addition,
DE 41 33 561 A1 describes an apparatus for electroplating for the improved treatment of the surfaces
of printed circuit boards. In this apparatus a plurality of product items are secured
to a product carrier in the upright position. During the treatment the products are
subjected to either a vertical, linear up and down movement in an electroplating bath
and at the same time a horizontal, circular movement or a vertical, circular movement
and at the same time a horizontal, linear movement or a vertical, circular movement
and at the same time a horizontal, circular movement. In particular, this is to eliminate
air bubbles or gas bubbles forming as reaction products.
[0009] DE 43 22 378 A1, in addition, specifies a device for the surface treatment of printed circuit boards,
where the boards are conveyed in the horizontal operating position and, in doing so,
are treated. The board carries out a combination movement, which is composed from
two autonomous relative movements that are independent of one another with respect
to a treatment solution, wherein the board executes a first sliding continuous movement
in a longitudinally extending path in one transport direction in a horizontal plane
and, simultaneously with this, a second movement, which comprises powerfully pulsating
vibration oscillations in rapid succession. These vibration oscillations can be in
the plane of the board. This device is to strengthen the diffusion of the fluid situated
in bores and in the vicinity of said bores, and consequently provides for considerable
acceleration of the transport of the material to the boundary layer.
[0010] The named measures for moving the fluid have various disadvantages, the most important
of which being that the fluid movement does not have the desired effectiveness with
regard to the necessary uniformity of the effect of the treatment, both as regards
time and also at least partially as regards location. Above all, the documents mentioned
gave no reference to a uniform electrolytic treatment.
Object of the Invention:
[0011] Consequently, it is an object of the present invention to find means with which a
uniform effect of a treatment fluid on work pieces is obtained in electrolytic treatment.
More especially, it is an object to achieve uniformity in the effect of treatment
on the work pieces both with regard to its timely constancy and also with regard to
a uniform treatment over the entire surface of the work piece ,
e.g., to achieve a uniform distribution of layer thickness in a deposited metal layer.
In addition, it is another object of the present invention to find means with which
the effect can be adjusted in a controlled manner. In addition, it is another object
of the present invention to obtain an effective mass transfer on the surface and in
any small holes in the product and, to this end, to have the treatment fluid pass
through through-holes effectively and to provide blind holes and other structures
consistently effectively with fresh fluid. Consequently, a uniform flow over the treatment
surface of the product and of the bore holes, including the blind holes and other
structures, is to be guaranteed,
i.e., each surface element is supplied with the fluid in the time average in a substantially
equally strong manner. The uniform treatment of thinner and thinner foils must also
be made possible. In addition, the treatment is to make a faster treatment speed possible
In addition, it is another object of the present invention to guarantee a cost-effective
design of the means that are necessary for the realisation of the aforementioned objects.
In addition, it is another object of the present invention to obtain the aforementioned
requirements both for a conventional vertical manner of transport and for a continuous
conveyorized mode, where the product is guided either in vertical or horizontal orientation.
Yet another object of the present invention is to find an apparatus and a method for
the electrolytic treatment of a product, by means of which the aforementioned requirements
are achievable.
Description of the Invention:
[0012] These objects are achieved through the apparatus for the electrolytic treatment according
to claim 1 and the method for the electrolytic treatment according to claim 13. Preferred
specific embodiments of the invention are specified in the sub claims.
[0013] As far as the term "disposed situated opposite" is used in the description below
and in the claims, this refers to a spatial relationship between the object situated
opposite and the treatment surface of the product or respectively a treatment plane
in which the product or respectively the treatment plane is situated. The spatial
relationship is such that normal vectors extending from surface elements of the surface
of the product or respectively the treatment plane in which the product is situated,
meet the object disposed opposite, irrespective of whether any item is disposed between
the product and the respective object or not.
[0014] As far as the terms "plate-shaped product" and "plate-shaped work pieces" are used
synonymously in the description below and in the claims, this refers to objects, which
are produced in untreated or wet chemically treated form for various areas of application,
for example for the printed circuit board industry (printed circuit boards, printed
circuit foils), for the wafer technology, for producing metallized glass plates or
glass plates treated for other purposes, monitor plates and collectors, for photovoltaics
(photoelectric cells) or for sensor technology (photosensitive cells). Plate-shaped
products and work pieces are to be considered substantially as plate-shaped,
i.e., with a substantially planar treatment surface, the term "provided with a substantially
planar treatment surface" referring to the fact that the main faces of the product
or respectively the work pieces cannot extend precisely parallel to one another (for
example ≤± 10°) and that structures can be included on their main faces.
[0015] As far as the term "treatment surface" is used in the description below and in the
claims, this refers to the face on a top side of the product,
i.e., the surface of the product excluding any possible bore walls. The treatment surface
is different to a useful face. This latter simply includes the area that is useful
for the functional characteristics of the product,
i.e., for example excluding edges.
[0016] As far as the term "wet chemical treatment" is used in the description below and
in the claims, this refers to a surface treatment, which is carried out using chemical
fluids, for example chemical or electrolytic metal-plating, chemical or electrolytic
etching, chemical or electrolytic degreasing or electrolytic anodising. The term "electrolytic"
means a wet chemical surface treatment using electric current where, for example,
metal is deposited electrolytically, metal is dissolved or treated in any other manner
electrolytically, for instance electrolytically cleaned or anodised.
[0017] As far as the terms "oscillating (relative) movement" and "moving in an oscillating
manner" are used in the description below and in the claims, this refers to a movement
back and forth between two points.
[0018] The apparatus according to the invention and the method according to the invention
are for the electrolytic treatment of plate-shaped products, which are disposed in
the apparatus and include at least one substantially planar treatment surface, using
a treatment agent. The treatment agent is a treatment fluid.
[0019] The apparatus according to the invention is defined in claim 1.
[0020] According to another embodiment of the invention, instead of or additional to the
flow devices that each include at least one nozzle being provided in the apparatus
of the invention, one or a plurality of flow members may be provided in the apparatus
of the invention the flow members each comprising at least one paddle-like flow element.
Thus in general, there may be provided flow generating means which comprise either
the flow devices comprising nozzles or the flow members having the paddle-like flow
elements or both. Consequently, as far as in the description of the invention and
in the claims flow devices comprising nozzles are mentioned such description may also
apply to flow members comprising the paddle-like flow elements.
[0021] The product can preferably be immersed into the treatment agent during the treatment
operation. This may be achieved by disposing the device for retaining the product
such that the product can be immersed into the treatment agent during the treatment
operation.
[0022] The method according to the invention is defined in claim 13.
[0023] Also regarding the method of the invention, in an alternative embodiment of the invention,
instead of or additional to the flow devices being used in the method of the invention,
one or a plurality of flow members may be used in the method of the invention, the
flow members each comprising at least one paddle-like flow element.
[0024] Using the apparatus according to the invention and the method according to the invention,
a particularly uniform electrolytic treatment of the treatment surfaces of plate-shaped
work pieces is achieved. More especially, all treatment regions of a plate-shaped
work piece can be treated under practically the same conditions. This includes both
the outer treatment surfaces of the work pieces and also the holes, more especially
the blind holes and through-holes. This enables a very-constant layer-thickness in
the treatment such that even the most precise conductor structures (strip conductors,
pads) can be produced in a reliable manner. In addition, a high treatment speed can
also be guaranteed. This is managed through the use of a uniformly strong flow over
all the surface regions of the product.
[0025] The flow devices in the apparatus according to the invention are for conveying treatment
agent to the product. The flow devices, consequently, include nozzles, from which
the treatment agent can exit under pressure. Each flow device includes at least one
nozzle or is produced from at least one nozzle. The flow devices are provided with
treatment agent. This can occur more especially by means of supply devices, for instance
tubes, hoses, boxes or the like. The flow devices are provided with the treatment
agent, normally by means of pumps. In addition, the flow devices can be secured in
the apparatus. To this end, especially suitable securing means can be used, for example
a frame, to which at least one flow device can be secured.
[0026] The flow directed to the product may also be generated by a flow member having at
least one paddle-like flow element, said flow member being moved parallel to the product
(surface) in order to generate the fluid flow.
[0027] If such a flow member is used in an electrolytic cell, it can be disposed between
the product and the counter electrode, an anode for example. In this case, for the
construction thereof, it is to be paid attention to avoid screening off of the electric
field lines, which would otherwise lead to undesired differences with regard to thickness.
The prevention of the screening off of electric field lines can be achieved, on the
one hand, by blurring or evening out the screening effect through the movement of
the product relative to that of the flow member. In doing so the product and flow
member may also be moved at the same time. The product and the flow members should
in this case be moved relative to each other such that uniformity of the electric
field lines is achieved both with respect to time levelling and spatial levelling
of plating action. On the other hand, the parts located between the product and the
anode can be designed so as to be as thin as possible. This measure and the aforementioned
measure may be realized alternatively or they may both be realized. In another embodiment
the flow member may be disposed behind the anodes (as seen from the product), such
that the treatment fluid flows from the flow member to the product by passing through
the counter electrodes.
[0028] The counter electrodes are connected as anodes to the current supply if deposition
or cathodic degreasing is to be effected. If electrolytic etching is to be carried
out or anodising, the counter electrodes are cathodically polarised. The counter electrodes
are inert (resistant) relative to the treatment agent. These are so-called dimensionally
stable electrodes. If the counter electrodes are anodes, they are insoluble anodes.
These types of anodes can more especially be produced from a material that is resistant
to the treatment agent in the treatment conditions applied, for example from titanium
or tantalum, it being possible for the said material to be coated with another conductive
material in order to avoid possible passivation of the material if it undergoes anodic
polarisation. These types of coating materials are, for example, elements of the eighth
subgroup of the Periodic Table of Elements, above all platinum, iridium, ruthenium
and their oxides and mixed oxides.
[0029] In order to achieve a particularly uniform treatment of the work pieces, the counter
electrodes can be disposed between the flow devices and a respective treatment surface.
This prevents the flow devices deflecting or shielding the electric flux lines that
extend between the work piece and the counter electrodes, for the space between the
counter electrodes and a work piece is then free of nuisance structures. A homogeneous
flux line is therefore achieved. However, the openings of the nozzles themselves could
be situated in a region between a plane, which is formed by the rear side of a counter
electrode, and the treatment surface. The solution can be supplied to the nozzle openings
through the counter electrodes. In this case, the flow devices do not obstruct the
unimpeded formation of flux lines in the space between the counter electrodes and
the product as they are substantially situated outside the region.
[0030] To make the distribution of the layer thickness even more uniform during the electrolytic
deposition of metal on structured surfaces of the product, the spacing between the
counter electrodes (in this case: anodes) and the product is selected as small as
possible. For example, the said spacing can be less than 100 mm, more preferred less
than 50 mm and most of all preferred less than 25 mm. The spacing between the product
and the counter electrodes may be at least 1 mm, more preferably at least 5 mm and
most preferably at least 10 mm. The spacing between the product and the counter electrodes
may vary from counter electrode to counter electrode.
[0031] The counter electrodes can more especially be perforated, for instance they can be
in the form of perforated plates or, even more favourable, in the form of expanded
metal. In the case of expanded metal, two or more thicknesses are preferably laid
one on top of the other. For example, one thickness with longitudinally aligned meshes
then abuts against a thickness with transversally aligned meshes. By using expanded
metal, an enlarged specific surface area of the counter electrodes can be achieved
such that the current density at the counter electrodes is reduced. Polarisation effects,
consequently, cannot be so easily adjusted.
[0032] The counter electrodes may also be segmented to form electrode segments, wherein
each segment is supplied with electric current by its own current/voltage source und
can thus be operated with an individual electric current/voltage, independent from
the other electrode segments. For example, one counter electrode may be segmented
to form 2, 3, 4 or 5 electrode segments. In one possible embodiment the segments may
be arranged to be concentric to each other. The border lines delimiting adjacent segments
may be circular, oval or rectangular. In an alternative embodiment the segments may
be shaped to be defined by star-shaped or similarly serrated border lines or undulated
border lines, such that, in combination with the movement of the product relative
to the counter electrodes, screening off of the electric field lines is compensated
for. Consequently soft transitions are achieved between the segments with respect
to metal deposition or etching behaviour. All these measures serve to achieve a uniform
thickness on the product in consequence of metal plating or etching.
[0033] A relative movement of the counter electrodes parallel to the product, with a fixed
flow device opposite the product at the same time, can also result in a making the
treatment sufficiently uniform. The movement parameters can be identical to those
of the product.
[0034] In addition, the counter electrodes can be provided with holes, enabling an unimpeded
passage of the treatment agent jet. For example, the counter electrodes can have openings
at the positions where nozzles are situated in the flow devices in order to guarantee
that a treatment agent jet exiting from a nozzle can pass the counter electrode unimpeded.
[0035] In this case, the counter electrodes and the flow devices can preferably be disposed
rigidly one relative to the other,
i.e., disposed so as to be unchangeable one relative to another, which means that their
spacing is also constant. Consequently, the openings in the anodes can be relatively
small, which means that any disturbance to the homogeneity of the electric field is
minimal. However, if the counter electrodes and the flow devices are secured rigidly
one relative to another, there is only a relative movement between the flow devices
and the counter electrodes, on the one side, and the product, on the other.
[0036] On order to obtain extensive improvements to treatment constancy in the electrolytic
treatment, the openings on the inside (sleeves) in the counter electrodes can be coated
so as to be conductive. This guarantees that electric flux lines contact the treatment
surface of the product at a constant density even at these openings.
[0037] The counter electrodes can be contacted to the current supply in the edge region
of the electrodes. Preferably the counter electrodes are contacted uniformly over
the entire surface thereof. Especially preferably the counter electrodes are contacted
in a central region thereof. This makes possible a more uniform thickness distribution
of metal being deposited for example.
[0038] The counter electrodes may be designed to form a planar member. Alternatively, the
counter electrodes may be arched for example, such that the central regions thereof
are located at a smaller distance to a plate-shaped product to be treated than the
edge region of the counter electrodes. This allows to achieve a more uniform thickness
of metal being deposited.
[0039] The means for generating the relative movement and the flow devices are preferably
designed such that all regions on at least one treatment surface during the treatment
are contacted at least once by a jet exiting from one of the nozzles (in terms of
a first contact of the jet on the treatment surface). As an alternative or more preferred,
the means for generating the relative movement and the flow devices are designed such
that all regions on at least one treatment surface may each be impinged in the time
average with the same amount and intensity of treatment fluid. This will also obtain
further uniformity of the treatment effect.
[0040] The relative movement between the product and the flow device can be achieved through
exclusive movement of the product (fixed flow device), through exclusive movement
of the flow device (fixed product) or also through simultaneous movement of product
and flow device. As an alternative, the relative movement can also be achieved by
exclusive movement of the counter electrodes. More especially, the product or the
flow devices or the product and the flow devices can be moved in two directions that
are orthogonal one relative to the other (biaxial) parallel to a treatment surface.
In a preferred specific embodiment of the invention, the means for generating the
relative movement are designed such that exclusively the product is moved.
[0041] If the product is moved, this movement is transferred to the product by means of
a frame, to which the product is secured. For example, the frame can be moved by means
of a drive and an eccentric suspension of the frame. The frame can also be used to
transfer the electric current. The said frame and consequently the product are designed
in such a manner between the general electrodes and consequently in such a manner
between the flow devices, that the guiding of the plate centrally between the counter
electrodes is guaranteed, which means that a uniform spacing between product and nozzle
is guaranteed over the entire surface.
[0042] According to the invention, the relative movement is an oscillating movement. This
specific embodiment of the invention can be used, above all, in developments in which
the product is treated non-continuously in dipping baths. Above all, it is possible
for the product or the flow devices or the product and the flow devices, or also the
counter electrodes to be moved in an oscillating manner.
[0043] In this case, more especially, a complete movement cycle can always be carried out
and ended in order always to create reproducible conditions with regard to the sequence
of the guiding of a treatment agent jet.
[0044] The frequency for the relative movement is normally 0.1 - 1 Hz, but it can also be
0.01 - 10 Hz.
[0045] In addition, the means for generating the oscillating relative movement are designed
such that the relative movement is not able to take place exclusively in one direction
but rather in two directions that are orthogonal one relative to the other. More especially,
the relative movement can be a circular movement, which means that the means for generating
the oscillating relative movement, in this case, are designed so that the relative
movement can be a circular movement. Above all, the product or the flow devices or
the product and the flow devices can be moved on a circular path parallel to a treatment
surface.
[0046] Each flow device includes at least one nozzle. The term nozzle refers to an opening,
out of which the treatment agent exits in order to flow onto the product. In a simple
case, it is an opening, more especially a bore, in the direction of flow. The nozzle
can, however, be used in any arbitrary specific embodiment, for example in the form
of a complicatedly constructed component that is able to form the treatment agent
jet in a desired manner.
[0047] A plurality of flow devices can be provided situated opposite one side of the product.
The nozzles of these flow devices on one side of the product together form a nozzle
field. The term nozzle field refers to an arrangement where at least two nozzles are
distributed on one flow device or over several flow devices. A nozzle field can be
at least as large as the surface area to be treated on the product, less the path
of movement of the product. This specific embodiment is more especially of interest
to a method of operation where the plate-shaped work pieces for treatment are immersed
in vertical orientation into a treatment bath (vertical technique).
[0048] For example, several nozzles of one flow device or of several adjacent flow devices
can be disposed in one nozzle matrix,
i.e., in an arrangement disposed substantially in rows and columns. More especially,
several rows of nozzles can be disposed on one flow device, for example a nozzle holder.
Even more preferable, adjacent nozzles of a flow device can be disposed in a staggered
manner. However, the nozzles can also be disposed in a circular or other type of arrangement.
In a strongly preferred specific embodiment of the invention, a nozzle matrix comprises
n x m nozzles, n and m being integers in a range of greater than 3. The spacings between
several nozzles are essentially the same size, even if adjacent nozzles are disposed
on different flow devices. The spacing between two adjacent nozzles can be less than
100 mm, more preferred it is less than 50 mm and most preferred it is less than 30
mm. If the nozzle is simply a hole in the flow device, the hole diameter can be smaller
than 5 mm, more preferred smaller than 3 mm and preferred most of all smaller than
2 mm. The minimum diameter is limited by production techniques.
[0049] The nozzles in the edge region of the nozzle field can also point inwards. They can
also have a greater hole density than in the inside region in order to obtain a flow
that is more uniform in the centre.
[0050] The exit speed of the treatment agent at the nozzles, measured at a nozzle opening,
is preferably more than 3 m/s, more strongly preferred more than 5 m/s and preferred
most of all more than 8 m/s. The flow exiting from the nozzle can be continuous or
pulsed.
[0051] Slotted nozzles and corresponding slotted holes are also conceivable in the counter
electrodes, only a one-dimensional relative movement of the product then needing to
take place. This is particularly suitable for products which are continuously transported
in one direction, such as in a continuous conveyorized system.
[0052] The flow device can have any arbitrary form. In a simple specific embodiment, it
can be a tube with nozzles mounted along the outside surface. It can also be a plate-shaped
or also cuboid-shaped body that is preferably in the form of a hollow body for guiding
the treatment agent. Thus the flow devices can be, for example, cuboid-shaped devices,
with nozzles disposed in the form of openings, for example, in a matrix-type manner
(flow register) in one of the side faces. The flow devices are disposed in the apparatus
according to the invention such that the treatment agent is output in the direction
of the product.
[0053] Over and above this, structures can be included in the flow devices, such structures
serving to influence the guiding of the treatment agent within a flow device, such
that all nozzles are impinged upon substantially at the identical flow rate of treatment
agent. The treatment agent can be distributed in a suitable manner either inside the
flow devices or also before it enters a flow device. It is advantageous in this case
to ensure a uniform flow speed in the respective supply lines. This also obtains uniformity
in the treatment effect on all the surface regions of the product as this leads to
a uniform flow over the surface regions on a treatment surface. This type of uniformity
of supply of treatment agent to all nozzles of a flow device can also be achieved
by supplying the flow devices in a suitable manner, for instance by providing a plurality
of supply lines to one flow device at different points on the device so as to guarantee
a uniform supply of all regions of the flow device.
[0054] The flow speed can also be adjusted in order to control the overall volume flow of
the treatment agent. Consequently, different conditions can be set for the flow depending
on the requirements.
[0055] In addition, the flow devices can be provided more especially such that it is possible
to direct a flow of the treatment agent away from a treatment surface. This can be
achieved, for example, by the treatment agent that is directed from the flow device
in a jet onto the treatment surface of the plate-shaped work piece being reflected
on the treatment surface and the reflected jet then being able to continue flowing,
essentially unimpeded, in the opposite direction without being obstructed by the flow
devices. This naturally assumes that the flow devices are dimensioned and disposed
in such a manner one relative to another that free cross-sections are provided between
the flow devices, through which the reflected treatment agent can flow. To this end,
adjacent flow devices can be disposed in a preferred specific embodiment of the invention
with spacings in between. This means that extensive uniformity of the treatment on
the treatment surface is obtained.
[0056] In order to strengthen the reverse flow even more, suction devices, for example intake
connections or intake registers, can be additionally disposed more especially centrally
in the rear side of the flow devices or between the flow devices. The said suction
devices can preferably be operated with the same pumps that also serve to supply the
flow devices with treatment agent.
[0057] In a particularly preferred specific embodiment of the invention, simultaneously
operable flow devices are provided disposed situated opposite on each side of the
product. Consequently, it can be guaranteed that the flow in the region of the treatment
surface is substantially constant in time, without having to interrupt it as in
US-A 4,622,917.
[0058] In this specific embodiment the flow devices can also be disposed as in another preferred
specific embodiment of the invention such that the flow is staggered on the front
side and the rear side of the product. This can more especially be achieved through
nozzles that are disposed staggered on both sides of the product. The aim of this,
above all, is to treat through-holes in an efficient manner. Particularly thin plates
and foil-like products can be treated very well as on account of the uniform flow
distribution, the overall forces are the same size on the front and the rear side
and consequently the foil is not moved out of the plane. Then again, closely defined
but continuously changing regions have different pressures on the front and rear side
such that the holes are efficiently traversed with the treatment agent and efficient
treatment is possible.
[0059] The flow devices on the front and rear side can each be supplied by their own pumps.
[0060] More especially the number of nozzles in the flow devices or respectively the number
of nozzles per unit area in a flow device, in addition the arrangement of the nozzles,
the individual treatment surface area on the product supplied by means of each nozzle,
wherein the treatment surface area results from the geometry of the jet, and the relative
movement between the product and a flow device are all interrelated, such that within
one movement cycle of the relative movement (for example within a complete circular
path of the moved product, or superposed circular paths), each surface region of the
product (or respectively of a use in the case of printed circuit boards) is traversed
at least once. In this way a time averaged, sufficiently uniform flow over the product
is achieved.
[0061] Further, in addition to the flow of treatment fluid substantially perpendicularly
to the surface of the product the treatment fluid may also have a movement component
substantially parallel to the surface of the product,
i.e., there may be a superposition of perpendicular and parallel movements.
[0062] With the aforementioned measures it is possible, without more ado, to charge all
regions on at least one treatment surface in the time average with the identical amount
(± 30%) of the treatment agent, a constancy here being understood within a range of
≤ ± 30% (with reference to a unweighted average), preferably of ≤ ± 20% and particularly
preferred of ≤ ±10%.
[0063] The apparatus according to the invention is preferably dimensioned and designed such
that just one product item can be treated therein. This results in the treatment effect
on all treated work pieces also being substantially constant.
[0064] In another preferred specific embodiment of the invention, the device for retaining
the product can be simultaneously designed to transfer the current to the product.
[0065] In another preferred specific embodiment of the invention, devices can be provided
by means of which the product can be charged with an electric potential when being
moved into or removed from the apparatus.
[0066] The apparatus according to the invention can preferably be designed such that it
is operable both with direct current and with pulse current with all conceivable implementations.
In operation, the typical average current density for the deposition of copper is
≥ 5 A/dm
2, preferably a maximum of 15 A/dm
2, for the panel plating process, and is ≥ 4 A/dm
2, preferably a maximum of 10 A/dm
2, for the pattern plating process. In the case of pulse current, the typical peak
current density can be up to 15 A/dm
2, preferably a maximum of 60 A/dm
2, for the panel plating process, and up to 10 A/dm
2, preferably a maximum of 60 A/dm
2, for the pattern plating process.
[0067] It may be advantageous to apply an electric potential, a cathodic potential for example,
to the product relative to the counter electrodes at the onset of an electrolytic
treatment and just before electrolytic treatment stops. Furthermore, it may be advantageous
to impinge treatment agent to the surface of the product during it being charged with
an electric potential. Impingement should not continue for a time period longer than
10 s without applying such potential. The electric potential may amount to between
virtually zero and the potential required for the treatment operation.
[0068] To make the treatment effect even more uniform, screens can be mounted more especially
in the edge region of the product. These can be circumferential strips. They can be
disposed parallel or vertically to a plane defined by the plate-shaped product. These
screens serve to optimise the distribution of the flux line and/or the flow. The said
screens may be provided with holes. The screening edges of the screens may have a
shape different from a straight line and may, for example, have a comb-like structure.
[0069] Wetting nozzles can be provided on the apparatus according to the invention, the
said wetting nozzles being operated when the boards are introduced into the treatment
agent in order to wet small holes in reliable manner.
[0070] In a first variant of the vertical technique, a nozzle field can be formed with nozzles
from one or a plurality of flow devices, the nozzles creating round or elliptical
flow faces and the spacings between the nozzles being substantially identical (30%:
variance) in one direction of the nozzle field and also being substantially identical
(30%: variance) in another direction of the nozzle field. In this case, a nozzle field
can comprise a matrix arrangement of at least 4 x 4 nozzles, preferably at least 7
x 7 nozzles. The relative movement, preferably the exclusive movement of the product
parallel to the treatment surface, is preferably two-dimensional,
i.e., takes place in two directions. In order to allow a flow in the direction opposing
the direction of the jet of the nozzles, a free cross-section can be provided in each
case between adjacent flow devices, through which free cross-section it is possible
for the flow to pass away from the product,
i.e., in the opposite direction to the nozzle flow.
[0071] In a second variant of the vertical technique, a nozzle field with nozzles can also
be formed by one or a plurality of flow devices, the nozzles in this case, however,
creating linear flow faces (for example the length is multiple times greater than
the width thereof) and the spacings between the nozzles transversely relative to the
flow direction being substantially the same size (30%: variance). In this case, a
nozzle field can comprise at least three, preferably at least seven nozzles. The relative
movement and preferably the movement of the product take place preferably exclusively
in one direction (one-dimensional). As in the case of the first variant, a free cross-section
can be provided between each pair of adjacent flow devices, through which a flow is
possible away from the product,
i.e., in the opposite direction to the nozzle flow, in order to allow a flow in the direction
opposing the jet direction of the nozzles.
[0072] The spacing between nozzle opening and plate surface is preferably a maximum of 100
mm, more preferably a maximum of 60mm, even more preferably a maximum of 40 mm, even
more preferably a maximum of 20 mm and most preferred a maximum of 10 mm. The spacing
may be at least 5 mm.
[0073] Further, the spacing between adjacent nozzle openings is preferably a maximum of
100 mm, more preferably a maximum of 60 mm, even more preferably a maximum of 40 mm,
even more preferably a maximum of 20 mm and most preferred a maximum of 5 mm. The
spacing may be at least 1 mm, even more preferably at least 2 mm.
[0074] In principle, the present invention can also be applied to the treatment of plate-shaped
work pieces in a continuous conveyorized system, in which the work pieces are continuously
conveyed either in vertical or horizontal orientation in the horizontal direction
(horizontal technique). For this technique the same features are selected for the
execution of the invention as for the vertical technique, however, the relative movement
is realised by an exclusively one-dimensional product movement. This refers to continuous
plate transport.
[0075] To illustrate further, the invention is described in more detail by way of the following
figures:
- Fig. 1
- is a schematic top view of an apparatus according to the invention for electrolytic
metal-plating;
- Fig. 2
- is a schematic side view of an apparatus according to the invention;
- Fig. 3
- is a side view of a flow device.
[0076] Identical reference numbers in the figures refer to the same elements.
[0077] Fig. 1 shows a top view of an apparatus according to the invention with four flow
devices 10 (10.1, 10.2, 10.3, 10.4), which are retained on a frame 20. The frame 20,
in addition, serves for supplying treatment agent to the flow devices 10 (see arrow
that represents the entry of the treatment agent into the frame 20). Nozzles 15 (15.1,
15.2, 15.3, 15.4) are provided at the flow devices 10. Treatment agent jets, symbolised
by the respective arrows, exit from the nozzles 15.
[0078] The treatment agent is conveyed to a printed circuit board L and there contacts the
treatment surface. The printed circuit board L is retained in a first holder 40 and
a second holder 42 with a bearing 44, the second holder 42 being driven such that
the holders 40, 42 carry out a circular movement parallel to the treatment surface
of the printed circuit board L. The bearing 44 is connected to an eccentric motor
(not shown here). This is shown schematically by way of arrow R. This means that the
printed circuit board L performs a movement relative to the flow devices 20.
[0079] Between the flow devices 10 and the printed circuit board L there is a counter electrode
30, which, in the present case, is polarised as an anode. The said anode 30 includes
several openings 35 (35.1, 35.2, 35.3, 35.4), which are in alignment with the nozzles
15 of the flow devices 10, which means that the treatment agent jets can pass through
them unimpeded. The anode 30 is made up of several layers of an expanded metal.
[0080] Fig. 2 shows a side view of the apparatus in Fig. 1. This representation clearly
shows that the openings 35 in the anode 30 are in alignment with the nozzles 15.
[0081] Fig. 3 represents a single flow device 10, which includes two rows of nozzles 15.
The nozzles 15 are simply openings in the flow device 10 with a longitudinal form,
which means that the flow surface on the product has a linear form. Several flow devices
10 of this type can be disposed in a treatment apparatus situated opposite one side
of the printed circuit board L, by their longitudinal sides being spaced apart and
parallel to each other. A nozzle field is formed by the nozzles 15 in, for example,
eight of these types of the flow devices 10.
[0082] It is understood that the examples and embodiments described herein are for illustrative
purpose only and that various modifications and changes in light thereof as well as
combinations of features described in this application will be suggested to persons
skilled in the art and are to be included within the scope of the appended claims.
1. Apparatus for the electrolytic treatment of a plate-shaped product (L), which is disposed
in the apparatus and has at least one substantially planar treatment surface, using
a treatment agent, wherein the apparatus comprises:
i) devices for retaining (40, 42) the product (L) in the apparatus,
ii) one or a plurality of flow devices (10), which each include at least one nozzle
(16) and are disposed situated opposite the product (L),
iii) one or a plurality of counter electrodes (30), which are inert relative to the
treatment agent and are disposed parallel to at least one treatment surface,
iv) means for generating a relative movement (44) between the product (L), on the
one side, and the flow devices (10) and/or the counter electrodes (30), on the other
side, in directions parallel to a treatment surface, wherein the means for generating
the relative movement are designed to move the product, wherein the relative movement
is an oscillating movement and wherein the means for generating the oscillating movement
are designed such that the relative movement takes place in two directions that are
orthogonal to each other.
2. Apparatus for the electrolytic treatment according to claim 1, characterised in that the counter electrodes (30) are disposed between the flow devices (10) and a respective
treatment surface.
3. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that there are openings (35) in the counter electrodes (30) enabling the treatment agent
jet to pass through unimpeded.
4. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the openings (35) in the counter electrodes (30) are coated so as to be conductive.
5. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the means for generating the relative movement (44) and the flow devices (10) are
designed such that all regions on at least one treatment surface are impingible with
the same amount of treatment agent in the time average.
6. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the means for generating the oscillating relative movement (44) are designed such
that the relative movement can be a circular movement (R).
7. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the nozzles (15) are disposed in a matrix of n x m nozzles, wherein n and m are integers
in a range of greater than 3.
8. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the flow devices (10) are provided such that it is possible to direct a flow of the
treatment agent away from a treatment surface.
9. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that simultaneously operable flow devices (10) are provided disposed situated opposite
on each side of the product (L).
10. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the apparatus is dimensioned and designed such that just one product item (L) can
be treated therein.
11. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the devices for retaining (40, 42) the product (L) are designed simultaneously for
transferring the current onto the product (L).
12. Apparatus for the electrolytic treatment according to any one of the preceding claims,
characterised in that the openings in the nozzles are situated in a region between a plane that is formed
by the rear side of a counter electrode and the treatment surface.
13. Method for the electrolytic treatment of a plate-shaped product (L) that comprises
at least one substantially planar treatment surface, using a treatment agent, the
said method comprising the following method steps:
a. providing an apparatus which comprises:
i. devices for retaining (40, 42) the product (L),
ii. one or a plurality of flow devices (10), which each comprise at least one nozzle
(15) and are disposed situated opposite the product (L),
iii. one or a plurality of counter electrodes (30), which are inert relative to the
treatment agent and are disposed parallel to at least one treatment surface,
iv. means to generate a relative movement (44) between the product (L), on one side,
and the flow devices (10) and/or the counter electrodes (30), on the other side, in
directions parallel to the treatment surface;
b. immersing the product (L) into the treatment agent; and
c. moving the product (L) in two directions parallel to the treatment surface, wherein
the two directions into which the product is moved are orthogonal to each other and
wherein the product (L) is moved in an oscillating manner.
14. Method for the electrolytic treatment according to claim 13, characterized in that the product (L) is moved on a circular path (R) parallel to the treatment surface.
1. Vorrichtung zum elektrolytischen Behandeln von in der Vorrichtung angeordneter plattenförmiger,
mindestens eine im Wesentlichen ebene Behandlungsoberfläche aufweisender Ware (L)
mit einem Behandlungsmittel, wobei die Vorrichtung umfasst:
i) Einrichtungen zum Halten (40,42) der Ware (L) in der Vorrichtung,
ii) eine oder mehrere jeweils mindestens eine Düse (15) aufweisende und der Ware (L)
gegenüberstehend angeordnete Anströmeinrichtungen (10),
iii) eine oder mehrere gegenüber dem Behandlungsmittel inerte Gegenelektroden (30),
die parallel zu mindestens einer Behandlungsoberfläche angeordnet sind,
iv) Mittel zum Erzeugen einer Relativbewegung (44) zwischen der Ware (L) einerseits
und den Anströmeinrichtungen (10) und/oder den Gegenelektroden (30) andererseits in
Richtungen parallel zu einer Behandlungsoberfläche, wobei dass die Mittel zum Erzeugen
der Relativbewegung zum Bewegen der Ware ausgebildet sind, wobei die Relativbewegung
eine oszillierende Bewegung ist und wobei die Mittel zum Erzeugen der oszillierenden
Bewegung so ausgebildet sind, dass die Relativbewegung in zwei zueinander orthogonalen
Richtungen stattfindet.
2. Vorrichtung zum elektrolytischen Behandeln nach Anspruch 1, dadurch gekennzeichnet, dass die Gegenelektroden (30) zwischen den Anströmeinrichtungen (10) und jeweils einer
Behandlungsoberfläche angeordnet sind.
3. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass sich in den Gegenelektroden (30) Öffnungen (35) befinden, die einen ungehinderten
Durchtritt des Behandlungsmittelstrahls ermöglichen.
4. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Öffnungen (35) in den Gegenelektroden (30) leitfähig beschichtet sind.
5. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Mittel zum Erzeugen der Relativbewegung (44) und die Anströmeinrichtungen (10)
so ausgebildet sind, dass alle Bereiche auf mindestens einer Behandlungsoberfläche
im zeitlichen Mittel mit der gleichen Menge des Behandlungsmittels beaufschlagbar
sind.
6. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Mittel zum Erzeugen der oszillierenden Relativbewegung (44) so ausgebildet sind,
dass die Relativbewegung eine Kreisbewegung (R) sein kann.
7. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Düsen (15) in einer Matrix von n x m Düsen angeordnet sind, wobei n und m ganze
Zahlen in einem Bereich von größer als 3 sind.
8. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Anströmeinrichtungen (10) so beschaffen sind, dass eine von einer Behandlungsoberfläche
weg gerichtete Strömung des Behandlungsmittels ermöglicht ist.
9. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass an jeder Seite der Ware (L) gegenüberstehend angeordnete und gleichzeitig betreibbare
Anströmeinrichtungen (10) vorgesehen sind.
10. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Vorrichtung so dimensioniert und ausgebildet ist, dass genau ein Warenstück (L)
darin behandelt werden kann.
11. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass die Einrichtungen zum Halten (40, 42) der Ware (L) gleichzeitig zur Übertragung des
Stromes auf die Ware (L) ausgebildet sind.
12. Vorrichtung zum elektrolytischen Behandeln nach einem der vorstehenden Ansprüche,
dadurch gekennzeichnet, dass sich die Öffnungen in den Düsen in einem Bereich zwischen einer durch die Rückseite
einer Gegenelektrode gebildeten Ebene und der Behandlungsoberfläche befinden.
13. Verfahren zum elektrolytischen Behandeln von plattenförmiger, mindestens eine im Wesentlichen
ebene Behandlungsoberfläche aufweisender Ware (L) mit einem Behandlungsmittel, umfassend
die folgenden Verfahrensschritte:
a. Vorsehen einer Vorrichtung, die umfasst:
i. Einrichtungen zum Halten (40, 42) der Ware (L),
ii. eine oder mehrere jeweils mindestens eine Düse (15) aufweisende und der Ware (L)
gegenüberstehend angeordnete Anströmeinrichtungen (10),
iii. eine oder mehrere gegenüber dem Behandlungsmittel inerte Gegenelektrode (30),
die parallel zu mindestens einer Behandlungsoberfläche angeordnet sind,
iv. Mittel zum Erzeugen einer Relativbewegung (44) zwischen der Ware (L) einerseits
und den Anströmeinrichtungen (10) und/oder den Gegenelektroden (30) andererseits in
Richtungen parallel zu der Behandlungsoberfläche;
b. Eintauchen der Ware (L) in das Behandlungsmittel; und
c. Bewegen der Ware (L) in zwei Richtungen parallel zu der Behandlungsoberfläche,
wobei die zwei Richtungen, in denen die Ware bewegt wird, orthogonal zueinander sind
und wobei die Ware (L) oszillierend bewegt wird.
14. Verfahren zum elektrolytischen Behandeln nach Anspruch 13, dadurch gekennzeichnet, dass die Ware (L) auf einer Kreisbahn (R) parallel zu der Behandlungsoberfläche bewegt
wird.
1. Appareil pour le traitement électrolytique d'un produit en forme de plaque (L), qui
est disposé dans l'appareil et comporte au moins une surface de traitement sensiblement
plane, en utilisant un agent de traitement, où l'appareil comprend :
i) des dispositifs permettant de retenir (40, 42) le produit (L) dans l'appareil,
ii) un ou une pluralité de dispositifs d'écoulement (10), qui incluent chacun au moins
une buse (15) et sont disposés à l'opposé du produit (L),
iii) une ou une pluralité de contre-électrodes (30), qui sont inertes vis-à-vis de
l'agent de traitement et sont disposées parallèlement à au moins une surface de traitement,
iv) des moyens permettant de générer un mouvement relatif (44) entre le produit (L),
d'un côté, et les dispositifs d'écoulement (10) et/ou les contre-électrodes (30),
de l'autre côté, dans des directions parallèles à une surface de traitement, où les
moyens permettant de générer le mouvement relatif sont conçus pour déplacer le produit,
où le mouvement relatif est un mouvement oscillant et où les moyens permettant de
générer le mouvement oscillant sont conçus de telle sorte que le mouvement relatif
se produise dans deux directions qui sont orthogonales l'une à l'autre.
2. Appareil pour le traitement électrolytique selon la revendication 1, caractérisé en ce que les contre-électrodes (30) sont disposées entre les dispositifs d'écoulement (10)
et une surface de traitement respective.
3. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce qu'il existe des ouvertures (35) dans les contre-électrodes (30) permettant au jet de
l'agent de traitement de traverser sans obstacle.
4. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les ouvertures (35) dans les contre-électrodes (30) sont revêtues de façon à être
conductrices.
5. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les moyens permettant de générer le mouvement relatif (44) et les dispositifs d'écoulement
(10) sont conçus de sorte que toutes les régions sur au moins une surface de traitement
peuvent être frappées avec la même quantité d'agent de traitement en moyenne dans
le temps.
6. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les moyens permettant de générer le mouvement relatif oscillant (44) sont conçus
de telle sorte que le mouvement relatif puisse être un mouvement circulaire (R).
7. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les buses (15) sont disposées dans une matrice de n x m buses, où n et m sont des
nombres entiers dans une plage plus grande que 3.
8. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les dispositifs d'écoulement (10) sont disposés de telle sorte qu'il soit possible
de diriger un écoulement de l'agent de traitement en éloignement d'une surface de
traitement.
9. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que des dispositifs d'écoulement (10) pouvant être actionnés simultanément sont prévus,
disposés à l'opposé de chaque côté du produit (L).
10. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que l'appareil est dimensionné et conçu de telle sorte que juste un article de produit
(L) puisse y être traité.
11. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les dispositifs permettant de retenir (40, 42) le produit (L) sont conçus simultanément
pour transférer le courant sur le produit (L).
12. Appareil pour le traitement électrolytique selon l'une quelconque des revendications
précédentes, caractérisé en ce que les ouvertures dans les buses sont situées dans une région entre un plan qui est
formé par le côté arrière d'une contre-électrode et la surface de traitement.
13. Procédé pour le traitement électrolytique d'un produit en forme de plaque (L) qui
comprend au moins une surface de traitement sensiblement plane, en utilisant un agent
de traitement, ledit procédé comprenant les étapes de procédé suivantes comprenant
:
a. fournir un appareil qui comprend :
1. des dispositifs permettant de retenir (40, 42) le produit (L),
ii. un ou une pluralité de dispositifs d'écoulement (10), qui incluent chacun au moins
une buse (15) et sont disposés à l'opposé du produit (L),
iii. une ou une pluralité de contre-électrodes (30), qui sont inertes vis-à-vis de
l'agent de traitement et sont disposées parallèlement à au moins une surface de traitement,
iv. des moyens permettant de générer un mouvement relatif (44) entre le produit (L),
d'un côté, et les dispositifs d'écoulement (10) et/ou les contre-électrodes (30),
de l'autre côté, dans des directions parallèles à la surface de traitement ;
b. immerger le produit (L) dans l'agent de traitement ; et
c. déplacer le produit (L) dans deux directions parallèles à la surface de traitement,
où les deux directions dans lesquelles le produit est déplacé sont orthogonales l'une
à l'autre et où le produit (L) est déplacé de manière oscillante.
14. Procédé pour le traitement électrolytique selon la revendication 13, caractérisé en ce que le produit (L) est déplacé sur une trajectoire circulaire (R) parallèle à la surface
de traitement.