(19)
(11) EP 2 176 879 A1

(12)

(43) Date of publication:
21.04.2010 Bulletin 2010/16

(21) Application number: 08771155.2

(22) Date of filing: 16.06.2008
(51) International Patent Classification (IPC): 
H01L 21/31(2006.01)
H01L 29/78(2006.01)
H01L 21/336(2006.01)
H01L 29/423(2006.01)
(86) International application number:
PCT/US2008/067079
(87) International publication number:
WO 2009/017888 (05.02.2009 Gazette 2009/06)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated Extension States:
AL BA MK RS

(30) Priority: 30.07.2007 US 830331

(71) Applicant: Freescale Semiconductor, Inc.
Austin, TX 78735 (US)

(72) Inventors:
  • HEGDE, Rama I.
    Austin, Texas 78759 (US)
  • SAMAVEDAM, Srikanth B.
    Fishkill, New York 12524 (US)

(74) Representative: Ferro, Frodo Nunes et al
Freescale Semiconductor, Inc. c/o Impetus IP Limited Suite 57a, Basepoint Business Park Caxton Close, Andover
Hampshire SP10 3FG
Hampshire SP10 3FG (GB)

   


(54) METHOD OF PROCESSING A HIGH-K DIELECTRIC FOR CET SCALING