APPARATUS AND METHOD FOR MONITORING DEPOSITION IN SYSTEMS CONTAINING PROCESS LIQUIDS - Patent 2188611

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EP 2 188 611 A1

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(43)	Date of publication:
	26.05.2010 Bulletin 2010/21

(21)	Application number: 08805434.1

(22)	Date of filing: 15.09.2008

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International Patent Classification (IPC):

G01N 11/04^(2006.01)

G01N 15/00^(2006.01)

(86)	International application number:
	PCT/FI2008/050511

(87)	International publication number:
	WO 2009/034236 (19.03.2009 Gazette 2009/12)

(84)	Designated Contracting States:
	AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
	Designated Extension States:
	AL BA MK RS

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Priority:

14.09.2007 FI 20070706

(71)	Applicant: Kemira OYJ
	00180 Helsinki (FI)

(72)	Inventor:
	DAHL, Rainer FI-65450 Sulva (FI)

(74)	Representative: Knuth-Lehtola, Sisko Hillevi et al
	Berggren Oy Ab Antinkatu 3 C, P.O. Box 16 FIN-00101 Helsinki FIN-00101 Helsinki (FI)

(54)	APPARATUS AND METHOD FOR MONITORING DEPOSITION IN SYSTEMS CONTAINING PROCESS LIQUIDS