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<ep-patent-document id="EP10000408A3" file="EP10000408NWA3.xml" lang="en" country="EP" doc-number="2211594" kind="A3" date-publ="20110202" status="n" dtd-version="ep-patent-document-v1-4">
<SDOBI lang="en"><B000><eptags><B001EP>ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIROMKCYALTRBGCZEEHUPLSKBAHRIS..MTNORS..SM..................</B001EP><B005EP>J</B005EP><B007EP>DIM360 Ver 2.15 (14 Jul 2008) -  1620000/0</B007EP></eptags></B000><B100><B110>2211594</B110><B120><B121>EUROPEAN PATENT APPLICATION</B121></B120><B130>A3</B130><B140><date>20110202</date></B140><B190>EP</B190></B100><B200><B210>10000408.4</B210><B220><date>20100118</date></B220><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>2009010691</B310><B320><date>20090121</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>20110202</date><bnum>201105</bnum></B405><B430><date>20100728</date><bnum>201030</bnum></B430></B400><B500><B510EP><classification-ipcr sequence="1"><text>H05G   2/00        20060101AFI20100428BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>Extrem ultraviolette Lichtquellenvorrichtung</B542><B541>en</B541><B542>Extreme ultraviolet light source device</B542><B541>fr</B541><B542>Dispositif de source lumineuse à ultraviolet extrême</B542></B540><B590><B598>2</B598></B590></B500><B700><B710><B711><snm>Ushiodenki Kabushiki Kaisha</snm><iid>101073584</iid><irf>U.P 766 EP</irf><adr><str>6-1 Ohtemachi 2-chome</str><city>Chiyoda-ku
100 Tokyo</city><ctry>JP</ctry></adr></B711></B710><B720><B721><snm>Yokohama, Takuma</snm><adr><str>c/o Ushio Inc.
1-90 Komakado</str><city>Gotenba-shi
Shizuoka-ken</city><ctry>JP</ctry></adr></B721></B720><B740><B741><snm>Tomerius, Isabel</snm><sfx>et al</sfx><iid>100038050</iid><adr><str>Lang &amp; Tomerius 
Patentanwälte 
Landsberger Strasse 300</str><city>80687 München</city><ctry>DE</ctry></adr></B741></B740></B700><B800><B840><ctry>AT</ctry><ctry>BE</ctry><ctry>BG</ctry><ctry>CH</ctry><ctry>CY</ctry><ctry>CZ</ctry><ctry>DE</ctry><ctry>DK</ctry><ctry>EE</ctry><ctry>ES</ctry><ctry>FI</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>GR</ctry><ctry>HR</ctry><ctry>HU</ctry><ctry>IE</ctry><ctry>IS</ctry><ctry>IT</ctry><ctry>LI</ctry><ctry>LT</ctry><ctry>LU</ctry><ctry>LV</ctry><ctry>MC</ctry><ctry>MK</ctry><ctry>MT</ctry><ctry>NL</ctry><ctry>NO</ctry><ctry>PL</ctry><ctry>PT</ctry><ctry>RO</ctry><ctry>SE</ctry><ctry>SI</ctry><ctry>SK</ctry><ctry>SM</ctry><ctry>TR</ctry></B840><B844EP><B845EP><ctry>AL</ctry></B845EP><B845EP><ctry>BA</ctry></B845EP><B845EP><ctry>RS</ctry></B845EP></B844EP><B880><date>20110202</date><bnum>201105</bnum></B880></B800></SDOBI>
<abstract id="abst" lang="en">
<p id="pa01" num="0001">The invention relates to an extreme ultraviolet light source device, comprising a pair of discharge electrodes (11, 12) arranged oppositely to each other, a pulsed power supply means (8) supplying pulsed power to said discharge electrodes (11, 12), a raw material supply means (11b, 12b) supplying a liquid or solid raw material for the emission of extreme ultraviolet radiation to said discharge electrodes (11, 12) and onto these electrodes (11, 12), and an energy beam radiating means (23a) radiating a focused energy beam (23) towards said raw material (11a) having been supplied onto said discharge electrodes (11, 12) to gasify said raw material (11a) and to start a discharge between said pair of electrodes (11, 12).The surface of said raw material (11a) is arranged at a position shifted from the focal point (P) of the energy beam (23) towards the irradiation entrance side of the energy beam (23).
<img id="iaf01" file="imgaf001.tif" wi="78" he="85" img-content="drawing" img-format="tif"/></p>
</abstract>
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</ep-patent-document>
