| (19) |
 |
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(11) |
EP 2 233 977 A8 |
| (12) |
CORRECTED EUROPEAN PATENT APPLICATION |
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published in accordance with Art. 153(4) EPC |
| (15) |
Correction information: |
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Corrected version no 1 (W1 A1) |
| (48) |
Corrigendum issued on: |
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03.11.2010 Bulletin 2010/44 |
| (43) |
Date of publication: |
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29.09.2010 Bulletin 2010/39 |
| (22) |
Date of filing: 10.12.2008 |
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| (51) |
International Patent Classification (IPC):
|
| (86) |
International application number: |
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PCT/JP2008/072432 |
| (87) |
International publication number: |
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WO 2009/078322 (25.06.2009 Gazette 2009/26) |
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| (84) |
Designated Contracting States: |
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AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL
PT RO SE SI SK TR |
| (30) |
Priority: |
14.12.2007 JP 2007323198
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| (71) |
Applicant: AZ Electronic Materials USA Corp. |
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Somerville, New Jersey 08876 (US) |
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| (72) |
Inventors: |
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- AKIYAMA, Yasushi
Kakegawa-shi
Shizuoka 437-1412 (JP)
- NOYA, Go
Kakegawa-shi
Shizuoka 437-1412 (JP)
- KURAMOTO, Katsutoshi
Kawaguchi-shi
Saitama 332-0011 (JP)
- TAKANO, Yusuke
Kakegawa-shi
Shizuoka 437-1412 (JP)
|
| (74) |
Representative: Féaux de Lacroix, Stefan et al |
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Isenbruck Bösl Hörschler LLP
Eastsite One
Seckenheimer Landstrasse 4
68163 Mannheim
68163 Mannheim (DE) |
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| |
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| (54) |
COMPOSITION FOR FORMATION OF TOP ANTIREFLECTIVE FILM, AND PATTERN FORMATION METHOD
USING THE COMPOSITION |
(57) Disclosed is a composition for forming a top antireflective film, which comprises
at least one fluorine-containing compound and a quaternary ammonium compound represented
by the formula (1) [wherein at least one of R
1, R
2, R
3, and R
4 represents a hydroxyl group or an alkanol group, and the others independently represent
a hydrogen or an alkyl group having 1 to 10 carbon atoms; and X
- represents a hydroxyl group, a halide ion or a sulfate ion], and optionally a water-soluble
polymer, an acid, a surfactant and an aqueous solvent. The composition for forming
a top antireflective film can exhibit the same levels of functions as those of conventional
top antireflective film-forming compositions when applied in a smaller amount. [General
formula (1)]