(19)
(11) EP 2 234 495 A1

(12)

(43) Date of publication:
06.10.2010 Bulletin 2010/40

(21) Application number: 08871664.2

(22) Date of filing: 30.12.2008
(51) International Patent Classification (IPC): 
A01N 59/00(2006.01)
A01P 7/00(2006.01)
 A01N 25/04(2006.01)
(86) International application number:
PCT/EP2008/068348
(87) International publication number:
WO 2009/095142 (06.08.2009 Gazette 2009/32)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated Extension States:
AL BA MK RS

(30) Priority: 31.01.2008 DE 102008006884

(71) Applicant: Evonik Degussa GmbH
45128 Essen (DE)

(72) Inventors:
  • SCHEFFLER, Jochen
    63755 Alzenau (DE)
  • SCHÄFFNER, Dirk
    76756 Bellheim (DE)
  • PERLET, Gabriele
    63538 Grosskrotzenburg (DE)
  • LORTZ, Wolfgang
    63607 Wächtersbach (DE)

   


(54) SILICON DIOXIDE DISPERSION