BACKGROUND OF THE INVENTION
Field of the Invention
[0001] The present invention relates to a photosensitive lithographic printing plate precursor
and more specifically relates to a positive-working photosensitive lithographic printing
plate precursor. The present invention in particular relates to an infrared laser-adapted
photosensitive lithographic printing plate precursor and more particularly relates
to an infrared laser-adapted photosensitive lithographic printing plate precursor
that makes possible direct platemaking by scanning with infrared laser radiation based
on a digital signal from, for example, a computer.
Description of the Related Art
[0002] Lasers have undergone remarkable growth in recent years, and in particular progress
has been made in boosting the output and reducing the size of solid-state lasers and
semiconductor lasers that emit in the near-infrared to infrared region. As a consequence,
these lasers are very useful as photoexposure light sources for direct platemaking
from digital data from, for example, a computer.
[0003] A binder resin and an IR dye that generates heat by absorbing light are essential
components in an infrared laser-adapted photosensitive lithographic printing plate
precursor that can utilize the aforementioned infrared lasers that emit in the infrared
region as photoexposure light sources. When such an infrared laser-adapted lithographic
printing plate precursor is photoexposed with such an infrared laser, and assuming
the presence of a positive-working photosensitive layer, the IR dye in the non-photoexposed
region (image area) in such an infrared laser-adapted lithographic printing plate
precursor acts through its interaction with the binder resin as a dissolution inhibitor
that substantially reduces the solubility of the binder resin. In the photoexposed
region (non-image area), on the other hand, the IR dye absorbs light and produces
heat, causes the interaction between the IR dye and the binder resin to become weak.
As a consequence, during development the photoexposed region (non-image area) is dissolved
in alkali developer solution, thus forming the lithographic printing plate.
[0004] Among the various problems that still remain with such infrared laser-adapted lithographic
printing plate precursors is the problem of the balance between developability and
chemical resistance. Thus, in a positive-working system, where it is the photoexposed
regions that undergo development, the resistance to the developer solution and various
chemicals deteriorates in the non-photoexposed regions when an increase in the solubility
in the developer solution is brought about, and the issue is then how to balance the
two.
[0005] There have been several attempts to date to deal with these problems. For example,
the use of polyvinyl acetal has been introduced (refer, for example, to
US Patent Application Publication No. 2004/0020484). It has also been proposed that the structure of the resin layer of the lithographic
printing plate be split into at least two layers and that, for example, a polymer
compound comprising a maleimide compound as a constituent component be used in the
lower layer (refer, for example, to
US Patent Application Publication No. 2004/0067432). The use of a copolymer having a special functional group has also been proposed
(refer, for example, to European Patent Application Publication No.
1826001). However, none of these can perform up to a satisfactory level and a better outcome
has been desired.
DISCLOSURE OF THE INVENTION
Problem to be solved by the Invention
[0006] An object of the present invention is to provide an infrared-sensitive positive-working
photosensitive lithographic printing plate precursor - and particularly an infrared
laser-adapted positive-working photosensitive lithographic printing plate precursor
- that exhibits both an excellent chemical resistance in the image area and an excellent
developability. An additional object of the present invention is to provide an infrared
laser-adapted photosensitive lithographic printing plate precursor that exhibits an
excellent development latitude and that can also provide a substantial improvement
in printing durability when subjected to a high-temperature heat treatment after development.
Means to Solve the Problem
[0007] As a result of intensive investigations, the present inventor discovered that the
preceding tasks are accomplished by the infrared laser-adapted photosensitive lithographic
printing plate precursor described herebelow.
[0008] That is, the present invention is a positive-working photosensitive lithographic
printing plate precursor comprising a support having a hydrophilic surface, and a
recording layer disposed on the support and comprising an alkali-soluble or alkali-swellable
polymer having a structural unit represented by general formula (1) below, a novolac
resin, an infrared absorber, and at least one member selected from aromatic group-containing
sulfonium salts and iodonium salts. The recording layer in the positive-working photosensitive
lithographic printing plate precursor according to the present invention can be composed
of a plurality of layers. Accordingly, the present invention is also directed to a
positive-working photosensitive lithographic printing plate precursor comprising a
support having a hydrophilic surface, a recording layer disposed on the support and
comprising an alkali-soluble or alkali-swellable polymer having a structural unit
represented by general formula (1) below, and a recording layer further disposed thereon
and comprising a novolac resin, an infrared absorber, and at least one member selected
from aromatic group-containing sulfonium salts and iodonium salts.

[0009] In the formula R
1 represents a hydrogen atom or methyl group.
[0010] X represents a single bond, -COO-, or -CONH-.
[0011] Ar
1 and Ar
2 each represent an optionally substituted aromatic group or an optionally substituted
heteroaromatic group in which one or two of the carbon atoms participating in the
aromaticity is or are replaced by the N atom, O atom, or S atom.
[0012] Y represents -SO
2NH- or -NHSO
2-.
Effect of the Invention
[0013] The present invention can provide an infrared laser-adapted photosensitive lithographic
printing plate precursor that exhibits both an excellent chemical resistance in the
image area and an excellent developability. This infrared laser-adapted photosensitive
lithographic printing plate precursor also exhibits an excellent development latitude
and can also provide a substantial improvement in printing durability when subjected
to a high-temperature heat treatment after development.
[0014] The mechanism that enables the structure of the present invention to balance an excellent
chemical resistance in the image areas with an excellent developability in platemaking
is believed to be as follows. The special polymer according to the present invention,
the novolac resin, and the aromatic group-containing sulfonium salt or iodonium salt
interact because each contains a conjugated system, such as aromaticity, and this
makes it possible to raise the chemical resistance of the image areas and to increase
their ability to resist the developer solution above that exhibited by the individual
compounds. In addition, the sulfonium salt or iodonium salt is decomposed by heat
and its interaction is thereby extinguished, which is believed to raise the developability
of the photoexposed areas as a whole and to thereby result in an increase in the development
latitude.
Mode for Carrying Out the Invention
[0015] The structural elements of the lithographic printing plate precursor of the present
invention will be consecutively described herebelow.
The recording laver
[0016] The recording layer of the lithographic printing plate precursor of the present invention
may be executed as a single layer (monolayer) or as a plurality of layers (multilayer).
The recording layer is preferably executed as two layers when it is executed as a
plurality of layers. The alkali-soluble or alkali-swellable polymer having a structural
unit represented by general formula (1) is also referred to in the following as the
special polymer.
<The special polymer>
[0017] The special polymer is a polymer that contains the structural unit represented by
the following general formula (1). More particularly, the special polymer is a polymer
that contains the structural unit represented by the following general formula (1)
as a copolymerized component.

[0018] R
1 in general formula (1) represents a hydrogen atom or methyl group. X represents a
single bond, -COO-, or -CONH- wherein -COO- and -CONH- are preferred. Ar
1 and Ar
2 each represent an optionally substituted aromatic group or an optionally substituted
heteroaromatic group in which one or two of the carbon atoms participating in the
aromaticity is or are replaced by the N atom, O atom, or S atom. Ar
1 is preferably a five- or six-membered ring and more preferably is a six-membered
ring. Ar
2 is preferably a five- or six-membered ring. Preferably at least one of Ar
1 and Ar
2 is a heteroaromatic ring.
[0019] A specific example of this structural unit is a structural unit in which Ar
1 represents an aromatic ring and Ar
2 is a heteroaromatic ring in which one or two of the carbon atoms participating in
the aromaticity is or are replaced by the N atom, O atom, or S atom.
[0020] C
1-4 alkyl and C
1-4 alkoxyl are preferred substituents on the aromatic group or heteroaromatic group
Ar
1 and Ar
2.
[0021] The aromatic groups and heteroaromatic groups represented by Ar
1 and Ar
2 may be selected from hydrocarbon aromatic rings, for example, benzene, naphthalene,
anthracene, and so forth, and from heteroaromatic rings, for example, furan, thiophene,
pyrrole, imidazole, 1,2,3-triazole, 1,2,4-triazole, tetrazole, oxazole, isoxazole,
thiazole, isothiazole, thiadiazole, oxadiazole, pyridine, pyridazine, pyrimidine,
pyrazine, 1,3,5-triazine, 1,2,4-triazine, 1,2,3-triazine, and so forth.
[0022] A condensed ring configuration, provided by the condensation of a plurality of the
previously described rings, may also be employed, for example, benzofuran, benzothiophene,
indole, indazole, benzoxazole, quinoline, quinazoline, benzimidazole, and benzotriazole.
[0024] The special polymer is an alkali-soluble or alkali-swellable polymer that contains
the structural unit with general formula (1) as a copolymerization component. The
special polymer may contain only one species of structural unit with general formula
(1) or may contain two or more species.
[0025] The content of the structural unit with general formula (1) in the special polymer
is suitably 20 to 90 mol%, preferably 30 to 80 mol%, and more preferably 30 to 70
mol%.
[0026] The other structural units in the special polymer can be exemplified by hydrophobic
monomers that have a substituent such as alkyl or aryl in the side chain structure
of the monomer, and by hydrophilic monomers that have, for example, an acidic group,
amide group, hydroxy group, or ethylene oxide group in the side chain structure of
the monomer, and are selected as appropriate from such monomers in accordance with
the particular goal. The selection of the monomer that copolymerizes with the monomer
that provides the aforementioned structural unit with general formula (1) must be
made within a range that does not impair the alkali solubility of the special polymer.
[0027] Polymerizable compounds that contain an acidic group are examples of the other comonomer
in the special polymer used by the present invention in addition to the monomer that
provides the structural unit with general formula (1). This acidic group can be exemplified
by the following (1) to (6).
- (1) the phenol group (-Ar-OH)
- (2) the sulfonamide group (-SO2NH-R)
- (3) substituted sulfonamide-type acid groups (referred to below as "active imide groups")
(-SO2NHCOR, -SO(2NHSO2R, -CONHSO2R)
- (4) the carboxylic acid group (-CO2H)
- (5) the sulfonic acid group (-SO3H)
- (6) the phosphoric acid group (-OPO3H2)
[0028] Ar in the preceding (1) to (6) represents an optionally substituted divalent aryl
linking group, while R represents an optionally substituted hydrocarbyl group.
[0029] The following are examples of acidic group-containing polymerizable compounds selected
from (1) to (6).
- (1) Compounds containing the phenol group in side chain position, for example, phenol
group-containing acrylamide, methacrylamide, acrylate esters, and methacrylate esters;
also, hydroxystyrene.
- (2) Sulfonamide group-containing compounds, for example, compounds that contain in
the molecule at least one polymerizable unsaturated group and at least one sulfonamide
group in which at least one hydrogen atom is bonded to the nitrogen atom. Preferred
thereamong are low molecular weight compounds that contain in the molecule the acryloyl
group, allyl group, or vinyloxy group as well as a unsubstituted or monosubstituted
aminosulfonyl group or substituted sulfonylimino group; these compounds can be exemplified
by the compounds represented by the following formulas (i) to (v).

(In the formulas, X
1 and X
2 each independently represent -O- or -NR
7. R
1 and R
4 each independently represent the hydrogen atom or -CH
3. R
2, R
5, R
9, R
12, and R
16 each independently represent C
1-12 alkylene, cycloalkylene, arylene, or aralkylene. R
3, R
7, and R
13 each independently represent the hydrogen atom or C
1-12 alkyl, cycloalkyl, aryl, or aralkyl. R
6 and R
17 each independently represent C
1-12 alkyl, cycloalkyl, aryl, or aralkyl. R
8, R
10, and R
14 each independently represent the hydrogen atom or -CH
3. R
11 and R
15 each independently represent a single bond or C
1-12 alkylene, cycloalkylene, arylene, or aralkylene. Y
1 and Y
2 each independently represent a single bond or CO. The aforementioned alkylene, cycloalkylene,
arylene, aralkylene, alkyl, cycloalkyl, aryl, and aralkyl may be substituted, and
alkyl is the preferred substituent.)
[0030] Among the compounds represented by formulas (i) to (v), m-aminosulfonylphenyl methacrylate,
N-(p-aminosulfonylphenyl)methacrylamide, N-(p-aminosulfonylphenyl)acrylamide, and
so forth, are particularly suitable for use with the lithographic printing plate precursor
of the present invention.
(3) The active imide group-containing compounds can be exemplified by compounds that
contain in the molecule at least one polymerizable unsaturated group and at least
one active imide group as represented by the structural formula given below.

Specific examples that can be suitably used are N-(p-toluenesulfonyl)methacrylamide,
N-(p-toluenesulfonyl)acrylamide, and so forth.
(4) Carboxyl acid group-containing compounds can be exemplified by compounds that
contain in the molecule at least one polymerizable unsaturated group and at least
one carboxyl acid group, wherein acrylic acid, methacrylic acid, maleic acid, and
itaconic acid are particularly suitable for use.
(5) The sulfonic acid group-containing compounds can be exemplified by compounds that
contain in the molecule at least one polymerizable unsaturated group and at least
one sulfonic acid group.
(6) Phosphoric acid group-containing polymer compounds can be exemplified by compounds
that contain in the molecule at least one polymerizable unsaturated group and at least
one phosphoric acid group.
[0031] Other examples in addition to the preceding are polymerizable unsaturated compounds
that contain an acidic group from (1) to (6) in side chain position and that have
a urea bond as the linking group. Among polymerizable compounds that contain an acidic
group according to (1) to (6), compounds that contain an acidic group according to
(1), (2), or (4) are preferred, and compounds containing an acidic group according
to (2) that contain the sulfonamide in terminal position are particularly preferred.
[0032] Any polymerizable monomer may also be copolymerized in the special polymer. There
are no particular limitations on this other constituent component as long as it is
monomer capable of copolymerizing with the monomer component already described above,
and this other constituent component can be exemplified by (meth)acrylate esters,
N-substituted (meth)acrylamides, acrylonitrile, styrenic compounds, maleimides, (meth)acrylamide,
glycidyl (meth)acrylate, N-substituted maleimides, (meth)acrylate esters that have
a polyoxyethylene chain, 2-hydroxyethyl (meth)acrylate, vinylpyridine, N-vinylcaprolactam,
and N-vinylpyrrolidine.
[0033] The weight-average molecular weight (Mw) of the special polymer is 5,000 to 1,000,000
and preferably is 7,000 to 500,000 and most preferably is in the range from 10,000
to 300,000. This molecular weight can be measured by gel permeation chromatography
using N-methylpyrrolidone as the developing solvent. Monodisperse polystyrene can
be used here as the molecular weight standard material.
[0035] The content of the special polymer in the recording layer, expressed with reference
to the total solids in the recording layer, is preferably 5 mass% to 95 mass% and
more preferably is 10 mass% to 90 mass%.
[0036] In those instances in which the recording layer in the lithographic printing plate
precursor of the present invention is a recording layer with a multilayer structure,
the special polymer is preferably contained in the lower recording layer that is located
adjacent to the support, and the content of the special polymer in this lower recording
layer in this embodiment, expressed with reference to the total solids in the lower
recording layer, is preferably 40 mass% to 95 mass% and is more preferably 50 mass%
to 95 mass%. The novolac resin is preferably not present in the lower layer.
<The novolac resin>
[0037] In a broad sense, a novolac resin is a resin obtained by the reaction of a phenol
with formaldehyde. The phenol can be exemplified by phenol, o-cresol, m-cresol, p-cresol,
2,3-xylenol, 2,5-xylenol, 3,5-xylenol, resorcinol, pyrogallol, and bisphenol. These
may be used individually or a mixture of a plurality of these may be used. Among the
preceding, the use is preferred of phenol, o-cresol, m-cresol, p-cresol, and 2,3-xylenol,
either individually or as the mixture of a plurality of these.
[0038] The novolac resin used by the present invention preferably has a weight-average molecular
weight of 500 to 20,000 and a number-average molecular weight of 200 to 10,000, as
measured by GPC.
[0039] Specific examples are given below.
- (i) novolac resin comprising phenol/m-cresol/p-cresol = 50/30/20 (molar ratio), with
a weight-average molecular weight of 8,000
- (ii) novolac resin comprising m-cresol/p-cresol = 60/40 (molar ratio), with a weight-average
molecular weight of 6,000
- (iii) novolac resin comprising 2,3-xylenol/m-cresol/p-cresol = 10/40/50 (molar ratio),
with a weight-average molecular weight of 5,000
- (iv) novolac resin comprising 2,5-xylenol/phenol/m-cresol = 20/40/40 (molar ratio),
with a weight-average molecular weight of 8,000
[0040] For the case of a monolayer recording layer, the content of the novolac resin in
the recording layer is preferably 3 mass% to 50 mass% and more preferably 5 mass%
to 40 mass%, in each case expressed with reference to the total solids in the recording
layer.
[0041] For the case of a recording layer that is a recording layer with a multilayer structure,
the novolac resin is preferably contained in the upper recording layer that is positioned
in proximity to the surface (side exposed to light), and the content of the novolac
resin in this upper recording layer in this embodiment, expressed with reference to
the total solids in the upper recording layer, is preferably 10 mass% to 95 mass%
and is more preferably 20 mass% to 90 mass%.
<The infrared absorber>
[0042] The positive-working recording layer in the present invention contains an infrared
absorber, which is a constituent component that has a photothermal conversion capacity.
This infrared absorber has the capacity to convert absorbed infrared radiation into
heat, and as a result laser scanning causes, for example, an extinction of interactions,
degradation of a development inhibitor, the generation of acid, and so forth, which
brings about a significant increase in the solubility in the developer solution. In
addition, in some cases this infrared absorber itself may also interact with the alkali-soluble
resin and thereby restrain the alkali solubility.
[0043] When the recording layer has a multilayer structure, the infrared absorber may be
present in the upper recording layer and/or the lower recording layer, but viewed
from the standpoint of sensitivity it is preferably contained in the upper recording
layer.
[0044] In addition, when contained in the lower recording layer, and when the special polymer
is used in combination with an alkali-soluble polymer that is incompatible with the
special polymer, the infrared absorber is contained in the other alkali-soluble polymer
that forms a dispersed phase. The infrared absorber then becomes localized in the
dispersed phase, and this is thought to increase the interaction-extinguishing capacity
and to improve the degradability of an acid generator when an acid generator is present.
[0045] The infrared absorber used in the present invention is a dye or pigment that effectively
absorbs infrared radiation at a wavelength from 760 nm to 1200 nm. It is preferably
a dye or pigment that has an absorption maximum at a wavelength from 760 nm to 1200
nm.
[0046] Infrared absorbers that can be suitably used in the lithographic printing plate precursor
of the present invention are described herebelow.
[0047] Usable dyes can be exemplified by commercially available dyes and by known dyes described
in the literature, for example,
Dye Handbook (edited by The Society of Synthetic Organic Chemistry, Japan, 1970). Specific examples are dyes such as azo dyes, metal complex salt azo dyes, pyrazolone
azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium
dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts,
metal thiolate complexes, and so forth.
[0048] Preferred dyes can be exemplified by the cyanine dyes described in Japanese Patent
Application Publication Nos.
S58-125246,
S59-84356,
S59-202829, and
S60-78787; the methine dyes described in Japanese Patent Application Publication Nos.
S58-173696,
S58-181690, and
S58-194595; the naphthoquinone dyes described in Japanese Patent Application Publication Nos.
S58-112793,
S58-224793,
S59-48187,
S59-73996,
S60-52940, and
S60-63744; the squarylium dyes described in Japanese Patent Application Publication No.
S58-112792; and the cyanine dyes described in British Patent No.
434,875.
[0049] The use is also preferred of the near infrared absorbers/sensitizers described in
US Patent No. 5,156,938; the substituted arylbenzo(thio)pyrylium salts described in
US Patent No. 3,881,924; the trimethine thiapyrylium salts described in Japanese Patent Application Publication
No.
S57-142645 (
US Patent No. 4,327,169); the pyrylium compounds described in Japanese Patent Application Publication Nos.
S58-181051,
S58-220143,
S59-41363,
S59-84248,
S59-84249,
S59-146063, and
S59-146061; the cyanine dyes described in Japanese Patent Application Publication No.
S59-216146; the pentamethine thiopyrylium salts described in
US Patent No. 4,283,475; and the pyrylium compounds disclosed in Japanese Examined Patent Publication Nos.
H5-13514 and
H5-19702.
[0050] Other preferred dye examples are the near infrared-absorbing dyes represented by
formulas (I) and (II) in
US Patent No. 4,756,993.
[0051] The following are particularly preferred among the dyes cited above: cyanine dyes,
squarylium dyes, pyrylium dyes, and nickel thiolate complexes.
[0053] With regard to type, the pigment can be, for example, a black pigment, yellow pigment,
orange pigment, brown pigment, red pigment, purple pigment, blue pigment, green pigment,
fluorescent pigment, metal powder pigment, or polymer-bonded dye. Specific examples
are insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo
pigments, phthalocyanine-based pigments, anthraquinone-based pigments, perylene-based
pigments, perinone-based pigments, thioindigo-based pigments, quinacridone-based pigments,
dioxazine-based pigments, isoindolinone-based pigments, quinophthalone-based pigments,
dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments,
fluorescent pigments, inorganic pigments, carbon black, and so forth.
[0054] These pigments may be used without a surface treatment or may be used after a surface
treatment. Examples of the surface treatment method include coating the surface with
a resin or wax, attaching a surfactant, and bonding a reactive material (e.g., silane
coupling agent, epoxy compound, polyisocyanate, and so forth) to the surface of the
pigment. These surface treatment methods are described in
Properties and Applications of Metal Soaps (Saiwai Shobo),
Printing Ink Technology (CMC, 1984), and
Modern Pigment Applications Technology (CMC, 1986).
[0055] Viewed from the perspective of the stability of the coating fluid used for the recording
layer and the uniformity of the recording layer that is formed, the particle diameter
of the pigment is preferably from 0.01 µm to 10 µm, more preferably from 0.05 µm to
1 µm, and particularly preferably from 0.1 µm to 1 µm.
[0056] The known dispersion technologies used, for example, for ink production or toner
production, can be used as the method of dispersing the pigment. The dispersing apparatus
can be exemplified by ultrasonic dispersers, sand mills, attritors, pearl mills, super
mills, ball mills, impellers, dispersers, KD mills, colloid mills, dynatrons, three-roll
mills, and pressure kneaders. The details are described in
Modern Pigment Applications Technology (CMC, 1986).
[0057] Since the lithographic printing plate precursor of the present invention has a positive-working
recording layer, the use is preferred of an infrared absorber that produces a positive
action (dissolution of non-photoexposed areas in the alkali developer solution is
inhibited, while this dissolution-inhibiting action is extinguished in the photoexposed
regions) by interaction with a binder polymer that has a specific functional group;
from this standpoint an infrared absorber having an onium salt structure is particularly
preferred. In specific terms, cyanine dyes and pyrylium salts are particularly preferred
among the previously described infrared absorbers. The details for these cyanine dyes
and pyrylium salts are as previously provided.
[0058] The anionic infrared absorber described in Japanese Patent Application Publication
No.
H11-338131 can also be suitably used. This anionic infrared absorber indicates that the dye's
parent nucleus that substantially absorbs the infrared radiation has an anionic structure
and lacks a cationic structure.
[0059] Examples are (a-1) anionic metal complexes and (a-2) anionic phthalocyanines.
[0060] Here, the (a-1) anionic metal complex denotes an anionic metal complex in which the
central metal and ligands of the complex moiety that substantially absorbs the light
form an anion as a whole.
[0061] The (a-2) anionic phthalocyanine denotes a phthalocyanine in which an anionic group,
e.g., a sulfonic acid group, carboxylic acid group, phosphonic acid group, and so
forth, is bonded as a substituent on the phthalocyanine skeleton with the formation
of an anion as a whole.
[0062] An example is the anionic infrared absorber represented by [Ga-M-Gb]
mX
m+ (Ga- represents an anionic substituent; Gb represents a neutral substituent; X
m+ represents a cation with a valence of 1 to m, including the proton; and m is an integer
from 1 to 6) described in [0014] to [0105] in Japanese Patent Application Publication
No.
H11-338131.
[0063] The infrared absorber is preferably a dye, and the infrared absorbers having an onium
salt structure described in paragraph numbers [0018] to [0034] of Japanese Patent
Application Publication No.
H11-291652 are preferred examples.
[0064] An infrared absorber that exhibits a dissolution-inhibiting behavior, e.g., the previously
described cyanine dyes, pyrylium salts, anionic dyes, and so forth, can also be used
in the recording layer in combination with other dyes or pigments with the goal of
obtaining additional improvements in the sensitivity and development latitude.
[0065] In the case of a monolayer recording layer, the infrared absorber content in the
present invention is preferably 2 mass% to 20 mass% and more preferably is 3 mass%
to 15 mass%, in each case expressed with reference to the total solids in the monolayer
recording layer. In the case of a recording layer with a multilayer structure, and
based on a consideration of the image formability and the inhibition of scumming in
non-image areas, the addition of 0.01 to 50 mass%, expressed with reference to the
total solids in the particular recording layer, in the lower recording layer and other
recording layer(s) is preferred, while 0.1 to 20 mass% is preferred and 0.5 to 15
mass% is more preferred.
[0066] When the infrared absorber is present in a recording layer in which a dispersed phase
is formed due to the combined use of two or more types of polymers, the infrared absorber
may be present in either the matrix phase or dispersed phase or may be present in
both phases. When desired components, e.g., initiator, infrared absorber, and so forth,
are present in a latex constituting a dispersed phase as described above, these may
be added with the starting materials when the latex particles are formed or may be
introduced after latex formation.
[0067] As an example of the method of introduction after latex formation, the desired components
that are to be introduced into the latex dispersed in an aqueous system, e.g., initiator,
dye, crosslinker, and so forth, are dissolved in an organic solvent and this is added
to the dispersion medium.
<The aromatic group-containing sulfonium salt/iodonium salt>
[0068] When the recording layer has a multilayer structure, the aromatic group-containing
sulfonium salt and/or iodonium salt may be contained in the upper recording layer
and/or the lower recording, but is preferably contained in the upper recording layer
from the standpoint of the sensitivity.
[0069] The compounds described in, for example, Japanese Patent Application Publication
Nos.
2001-133969 and
2002-268217, can be used as the aromatic group-containing sulfonium salt and iodonium salt. The
aromatic group-containing sulfonium salt and iodonium salt can be respectively exemplified
by compounds with the structures given by the following general formulas.

[0070] R
11 to R
16 in the preceding formulas each represent a freely selectable substituent and preferably
represent the hydrogen atom, a halogen atom, C
1-6 straight-chain alkyl, C
1-6 branched alkyl, or C
1-6 alkoxy. They particularly preferably represent the hydrogen atom, C
1-3 alkyl, C
1-3 alkoxyl, the chlorine atom, or the bromine atom. X represents an organic or inorganic
counteranion. Sulfonium salts are particularly preferred.
[0072] In the case of a monolayer recording layer, at least one member selected from these
aromatic group-containing sulfonium salts and iodonium salts is suitably present in
this invention at from 0.01 to 50 mass%, expressed with reference to the total solids
in the monolayer recording layer, from the standpoint of image formability and preventing
scumming in the non-image areas, while 0.1 to 25 mass% is preferred and 0.5 to 20
mass% is more preferred. In the case of a recording layer with a multilayer structure,
0.01 to 50 mass%, expressed with reference to the total solids in the particular layer,
is suitable while 0.1 to 25 mass% is preferred and 0.5 to 20 mass% is more preferred.
[0073] In addition to the previously described special polymer and novolac resin, other
known alkali-soluble polymers can be used on a purpose-adapted basis in the recording
layer of the lithographic printing plate precursor of the present invention. Other
polymer compounds may also be incorporated. The polymer compounds described in [0027]
to [0044] of Japanese Patent Application Publication No.
2008-64959 are examples of polymer compounds that may be incorporated.
[0074] A fluoropolymer is preferably added to each recording layer for the purpose of improving
the development resistance of the image regions. The fluoropolymers used in image-recording
layers are exemplified by the copolymers of fluorine-containing monomers as described
in Japanese Patent Application Publication Nos.
H11-288093 and
2000-187318.
[0075] Preferred specific examples of fluoropolymers are the P-1 to P-13 acrylic-type fluoropolymers
described in Japanese Patent Application Publication No.
H11-288093 and fluoropolymers obtained by the copolymerization of a freely selected acrylic
monomer with fluorine-containing acrylic monomers A-1 to A-33 as described in Japanese
Patent Application Publication No.
2000-187318.
[0076] With regard to the molecular weight of these fluoropolymers, the weight-average molecular
weight is preferably at least 2,000 and the number-average molecular weight is preferably
at least 1,000. More preferably, the weight-average molecular weight is 5,000 to 300,000
and the number-average molecular weight is 2,000 to 250,000.
[0077] In addition, commercial fluorosurfactants that are compounds having the preferred
molecular weight cited above can also be used as the fluoropolymer. Specific examples
in this regard are MEGAFACE F-171, F-173, F-176, F-183, F-184, F-780, and F-781 (all
trade names) from DIC Corporation.
[0078] A single one of these fluoropolymers may be used or two or more may be used in combination.
A suitable quantity of addition is at least 1.4 mass% with reference to the solids
in the image-recording layer. A preferred quantity of addition is 1.4 to 5.0 mass%.
At less than 1.4 mass%, a satisfactory improvement in the development latitude of
the image-recording layer - which is the goal of fluoropolymer addition - may not
be obtained. The improvement in the development latitude does not increase when the
addition exceeds 5.0 mass%, while the fluoropolymer-induced resistance to solubilization
by the surface of the image-recording layer continues to increase, creating the risk
of a lower sensitivity.
[0079] An underlying recording layer or other recording layer may also optionally contain
a dissolution inhibitor in the present invention; this is a substance that is thermally
degradable and that when undegraded has the ability to substantially lower the solubility
of aqueous alkali-soluble polymer compounds. Examples are diazonium salts, ammonium
salts, phosphonium salts, o-quinonediazide compounds, aromatic sulfone compounds,
and aromatic sulfonate ester compounds. The addition of a dissolution inhibitor can
improve the ability of image areas to resist dissolution in the developer solution
and can also make it possible to use an infrared absorber that does not interact with
alkali-soluble resins.
[0080] Suitable examples are the diazonium salts described by
S. I. Schlesinger, Photogr. Sci. Eng., 18, 387 (1974),
T. S. Bal et al., Polymer, 21, 423 (1980), and Japanese Patent Application Publication No.
H5-158230; the ammonium salts described in
US Patent Nos. 4,069,055 and
4,069,056 and in the Specification of Japanese Patent Application Publication No.
H3-140140; and the phosphonium salts described in
D. C. Necker et al., Macromolecules, 17, 2468 (1984),
C. S. Wen et al., "The Proc. Conf. Rad. Curing ASIA", p. 478, Tokyo, October (1988), and
US Patent Nos. 4,069,055 and
4,069,056.
[0081] Diazonium salts are particularly preferred for the dissolution inhibitors that can
be used by the present invention. The diazonium salts described in Japanese Patent
Application Publication No.
H5-158230 are particularly preferred.
[0082] The counterion for the onium salt can be exemplified by tetrafluoroboric acid, hexafluorophosphoric
acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5-sulfosalicylic
acid, 2,5-dimethylbenzenesulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic
acid, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic
acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methox-y-4-hydroxy-5-benzoylbenzenesulfonic
acid, and para-toluenesulfonic acid. Particularly suitable among the preceding are
hexafluorophosphoric acid and alkyl aromatic sulfonic acids such as triisopropylnaphthalenesulfonic
acid and 2,5-dimethylbenzenesulfonic acid.
[0083] Suitable quinonediazides can be exemplified by o-quinonediazide compounds. The o-quinonediazide
compounds used in the present invention are compounds that have at least one o-quinonediazide
group and that upon thermal degradation undergo an increase in alkali solubility,
and compounds with various structures can be used. Thus, the o-quinonediazides assist
the solubility of the photosensitive material system through the following two effects:
upon thermal degradation, the solubility-inhibiting action on the binder is abolished
and the o-quinonediazide itself is converted into an alkali-soluble substance.
[0084] For example, the compounds described in
J. Kosar (author), "Light-Sensitive Systems", pages 339 to 352 (John Wiley & Sons,
Inc.) can be used as the o-quinonediazide compounds employed in the present invention,
wherein the o-quinonediazide sulfonate esters or sulfonamides provided by reaction
with various aromatic polyhydroxy compounds or aromatic amino compounds are particularly
suitable. Also suitable for use are the esters between a pyrogallol acetone resin
and benzoquinone-(1,2)-diazide sulfonyl chloride or naphthoquinone-(1,2)-diazide-5-sulfonyl
chloride, as described in Japanese Examined Patent Publication No.
S43-28403, and the esters between a phenol-formaldehyde resin and benzoquinone-(1,2)-diazide
sulfonyl chloride or naphthoquinone-(1,2)-diazide-5-sulfonyl chloride, as described
in
US Patent Nos. 3,046,120 and
3,188,210.
[0085] Similarly, the esters between a phenol-formaldehyde resin or cresolformaldehyde resin
and naphthoquinone-(1,2)-diazide-4-sulfonyl chloride and the esters between a pyrogallol
acetone resin and naphthoquinone-(1,2)-diazide-4-sulfonyl chloride are also suitable
for use. Other useful o-quinonediazide compounds are reported in and known from a
large number of patents. Examples in this regard are the o-quinonediazide compounds
described in the Specifications of Japanese Patent Application Publication Nos.
S47-5303,
S48-63802,
S48-63803,
S48-96575,
S49-38701, and
S48-13354; Japanese Examined Patent Publication Nos.
S41-11222,
S45-9610, and
S49-17481;
US Patent Nos. 2,797,213,
3,454,400,
3,544,323,
3,573,917,
3,674,495, and
3,785,825; British Patent Nos.
1,227,602,
1,251,345,
1,267,005,
1,329,888, and
1,330,932; and German Patent No.
854,890.
[0086] The quantity of addition of the o-quinonediazide compounds, expressed with reference
to the total solids in the particular recording layer, is preferably in the range
from 1 to 50 mass%, more preferably in the range from 5 to 30 mass%, and particularly
preferably in the range from 10 to 30 mass%. A single one of these compounds can be
used or a mixture of a plurality of these compounds may be used.
[0087] The quantity of addition of additives other than the o-quinonediazide compounds is
preferably 1 to 50 mass%, more preferably 5 to 30 mass%, and particularly preferably
10 to 30 mass%.
[0088] A polymer having as a polymerization component a (meth)acrylate monomer that contains
two or three C
3-20 perfluoroalkyl groups in the molecule, as described in the Specification of Japanese
Patent Application Publication No.
2000-87318, can also be incorporated with the goals of strengthening image discrimination and
strengthening the capacity to resist surface marring.
[0089] Cyclic acid anhydrides, phenols, and organic acids can also be used with the goal
of obtaining additional improvements in the sensitivity. For example, the phthalic
acid anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-endooxy-Δ4-tetrahydrophthalic
anhydride, trichlorophthalic anhydride, maleic anhydride, chloromaleic anhydride,
α-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride, and so forth,
described in
US Patent Specification No. 4,115,128 can be used as the cyclic acid anhydride. The phenols can be exemplified by bisphenol
A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4,-trihydroxybenzophenone,
4-hydroxybenzophenone, 4,4',4"-trihydroxytriphenylmethane, and 4,4',3",4"-tetrahydroxy-3,5,3',5'-tetramethyltriphenylmethane.
The organic acid can be the sulfonic acids, sulfinic acids, alkyl sulfates, phosphonic
acids, phosphate esters, and carboxylic acids described in, for example, Japanese
Patent Application Publication Nos.
S60-88942 and
H2-96755, and can be specifically exemplified by p-toluenesulfonic acid, dodecylbenzenesulfonic
acid, p-toluenesulfinic acid, ethyl sulfate, phenylphosphonic acid, phenylphosphinic
acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic
acid, p-toluyl acid, 3,4-methoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene-1,2-dicarboxylic
acid, erucic acid, lauric acid, n-undecanoic acid, ascorbic acid, and so forth. The
proportion of the aforementioned cyclic acid anhydrides, phenols, and organic acids
in the recording layer solids is preferably 0.05 to 20 mass%, more preferably 0.1
to 5 mass%, and particularly preferably 0.1 to 10 mass%.
[0090] For example, a dye that exhibits substantial absorption in the visible light region
can be added to the recording layer in the present invention as an image colorant.
Specific examples are Oil Yellow #101, Oil Yellow #103, Oil Pink #312, Oil Green BG,
Oil Blue BOS, Oil Blue #603, Oil Black BY, Oil Black BS, and Oil Black T-505 (the
preceding are products of Orient Chemical Industries Co., Ltd.); Victoria Pure Blue,
Crystal Violet (CI 42555), Methyl Violet (CI 42535), Ethyl Violet, Rhodamine B (CI
145170B), Malachite Green (CI 42000), Methylene Blue (CI 52015), Eisen Spiron Blue
C-RH (Hodogaya Chemical Co., Ltd.) and so forth; and the dyes described in Japanese
Patent Application Publication No.
S62-293247.
[0091] The addition of these dyes provides a sharp delineation between the image areas and
non-image areas after image formation, and for this reason the addition of these dyes
is preferred. The quantity of addition is preferably in the range of 0.01 to 10 mass%
with reference to the total solids in the recording layer.
[0092] In order to broaden the processing stability with respect to the developing conditions,
the recording layer of the present invention can also incorporate a nonionic surfactant
as described in Japanese Patent Application Publication Nos.
S62-251740 and
H3-208514; an amphoteric surfactant as described in Japanese Patent Application Publication
Nos.
S59-121044 and
H4-13149; a siloxane-type compound as described in
EP 950,517; or a fluoromonomer-containing copolymer as described in Japanese Patent Application
Publication No.
H11-288093.
[0093] The nonionic surfactant can be specifically exemplified by sorbitan tristearate,
sorbitan monopalmitate, sorbitan trioleate, monoglyceryl stearate, polyoxyethylene
nonylphenyl ether, and so forth. The amphoteric surfactant can be specifically exemplified
by alkyldi(aminoethyl)glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium
betaine, and N-tetradecyl-N,N-betaine types (for example, Amogen K (trade name) from
Dai-ichi Kogyo Seiyaku Co., Ltd.). Block copolymers of dimethylsiloxane and polyalkylene
oxide are preferred for the siloxane-type compound, and specific examples are polyalkylene
oxide-modified silicones such as DBE-224, DBE-621, DBE-712, DBP-732, and DBP-534 from
the Chisso Corporation and Tego Glide 100 from the German firm Tego.
[0094] The proportion of the nonionic surfactant and amphoteric surfactant in the recording
layer is preferably 0.05 to 15 mass% and is more preferably 0.1 to 5 mass%.
[0095] In order to obtain a visible image immediately after the photoexposure-induced heating,
the lithographic printing plate precursor of the present invention can incorporate
a dye or pigment as an image colorant or can incorporate a print-out agent. A typical
example of the print-out agent is the combination of a salt-forming organic dye with
a compound that releases acid in response to the photoexposure-induced heating (a
photoacid releasing agent).
[0096] Specific examples are the salt-forming organic dye/o-naphthoquinonediazide-4-sulfonyl
halide combinations described in Japanese Patent Application Publication Nos.
S50-36,209 and
S53-8128 and the salt-forming organic dye/trihalomethyl compound combinations described in
Japanese Patent Application Publication Nos.
S53-36223,
S54-74728,
S60-3626,
S61-143748,
S61-151644, and
S63-58440. These trihalomethyl compounds include oxazole-type compounds and triazine-type compounds,
and both types exhibit an excellent timewise stability and provide a sharp print-out
image. Other photoacid releasing agents can be exemplified by the various o-naphthoquinonediazide
compounds described in Japanese Patent Application Publication No.
S55-62444; the 2-trihalomethyl-5-aryl-1,3,4-oxacliazole compounds described in Japanese Patent
Application Publication No.
S55-77742; and diazonium salts.
The coating solvent and coating method
[0097] In the case of a monolayer structure, the lithographic printing plate precursor of
the present invention can be produced and formed by preparing a coating fluid in which
the components, such as polymer compounds, infrared absorber, and so forth, are dissolved
in a solvent and applying this coating fluid on a support that has a hydrophilic surface.
[0098] In the case of a multilayer structure, a coating fluid is prepared in which the components
in the previously described lower layer, such as polymer compounds, infrared absorber,
and so forth, are dissolved in a solvent; a coating fluid is similarly prepared for
the previously described upper layer; and lower and upper layers are then produced
and formed on a support having a hydrophilic surface by consecutive application of
the lower layer coating fluid and the upper layer coating fluid on the support.
[0099] A protective layer, intermediate resin layer, backcoat layer, and so forth, vide
infra, may also be similarly formed depending on the particular goal.
[0100] The solvent used here can be exemplified by ethylene dichloride, cyclohexanone, methyl
ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol,
2-methoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxyethane, methyl lactate,
ethyl lactate, N,N-dimethylacetamide, N,N-dimethylformamide, tetramethylurea, N-methylpyrrolidone,
dimethyl sulfoxide, sulfolane, γ-butyrolactone, toluene, and so forth, but the solvent
is not limited to these examples. A single one of these solvents or a mixture of these
solvents may be used.
[0101] The concentration of the components (total solids including additives) in the coating
fluid is preferably 1 to 50 mass%.
[0102] In the case of a monolayer, the quantity of applied solids on the support after coating
and drying is preferably 0.5 to 3.0 g/m
2 and is particularly preferably 0.8 to 2.0 g/m
2.
[0103] In the case of a multilayer structure, 0.05 to 2.0 g/m
2 is preferred for the upper layer and 0.3 to 5.0 g/m
2 is preferred for the lower layer, while 0.1 to 1.0 g/m
2 is more preferred for the upper layer and 0.5 to 3.0 g/m
2 is more preferred for the lower layer. The ratio between the quantity of application
for the upper layer and the quantity of application for the lower layer (upper layer/lower
layer) is preferably 0.05 to 1 and more preferably is 0.1 to 0.8.
[0104] Various methods can be used to apply the individual coating fluids, for example,
bar coater application, spin coating, spray coating, curtain coating, dip coating,
air knife coating, blade coating, roll coating, and so forth. The apparent sensitivity
increases as the quantity of application declines, but the film properties of the
photosensitive film also decline with a declining quantity of application.
The support
[0105] A support that has a hydrophilic surface is employed as the support used for the
lithographic printing plate precursor of the present invention.
[0106] The support is a dimensionally stable sheet or plate that has satisfactory properties
in terms of, for example, the required strength and flexibility, but is not otherwise
particularly limited. The support can be exemplified by paper, plastic-laminated paper
(the plastic can be exemplified by polyethylene, polypropylene, polystyrene, and so
forth), metal plate or sheet (e.g., aluminum, zinc, copper, and so forth), plastic
film (e.g., cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose
butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate,
polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, and so
forth), and paper or plastic film on which any of the aforementioned metals has been
laminated or vapor-deposited.
[0107] A polyester film or an aluminum plate is preferred for the support used for the lithographic
printing plate precursor. Aluminum plate is particularly preferred therebetween for
its excellent dimensional stability and relatively low cost.
[0108] The aluminum plate is preferably a pure aluminum plate, an alloy plate containing
aluminum as its main component along with trace amounts of heteroelements, or a plastic
film on which aluminum has been laminated or vapor deposited.
[0109] Heteroelements that may be present in the aluminum alloy can be exemplified by silicon,
iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, titanium, and
so forth. The heteroelement content in the alloy is preferably no more than 10 mass%.
[0110] Although pure aluminum is a particularly suitable aluminum for the present invention,
the production of absolutely pure aluminum is problematic from the standpoint of refining
technology, and the aluminum plate may therefore contain trace amounts of heteroelements.
[0111] The aluminum plate that can be used in the present invention is not limited with
regard to composition, and any aluminum plate of material in the public domain can
be used as appropriate. The thickness of the aluminum plate used in the present invention
is preferably from about 0.1 mm to 0.6 mm and more preferably from about 0.12 mm to
0.4 mm.
[0112] Prior to its use, the aluminum plate is subjected to a roughening treatment and its
surface is subjected to a hydrophilicizing treatment. Prior to executing the roughening
treatment, the aluminum plate may as desired be submitted to a degreasing treatment
with, for example, surfactant, organic solvent, aqueous alkali solution, and so forth,
in order to remove rolling oil from the surface.
[0113] Various methods can be employed to roughen the surface of the aluminum plate, for
example, mechanical surface roughening, electrochemical dissolution roughening of
the surface, and selective chemical dissolution of the surface.
[0114] Known methods, such as ball grinding, brush grinding, blast grinding, and buff grinding,
can be used for the mechanical method. Electrochemical roughening can be carried out,
for example, using alternating current or direct current in a hydrochloric acid or
nitric acid electrolytic bath. Also usable is a method that combines both as described
in Japanese Patent Application Publication No.
S54-63902.
[0115] Among the preceding, at least a step of roughening in a hydrochloric acid electrolyte
is preferably employed.
[0116] The surface-roughened aluminum plate may optionally be subjected to an alkali etching
treatment and neutralization treatment and then as desired an anodic oxidation treatment
in order to improve the abrasion resistance and water retentivity of the surface.
[0117] The various electrolytes that can bring about the formation of a porous oxide film
can be used as the electrolyte employed for anodic oxidation of the aluminum plate,
and sulfuric acid, phosphoric acid, oxalic acid, chromic acid, or a mixed acid of
the preceding is typically used.
[0118] The concentration of these electrolytes is determined as appropriate in accordance
with the type of electrolyte.
[0119] The anodic oxidation conditions vary as a function of the electrolyte used and thus
cannot be unconditionally specified; however, the following are generally suitable:
electrolyte concentration = 1 to 80 mass% solution, bath temperature = 5 to 70°C,
current density = 5 to 60 A/dm
2, voltage = 1 to 100 V, electrolysis time = 10 seconds to 5 minutes.
[0120] When the quantity of anodic oxidation film formation is smaller than 1.0 g/m
2, the printing durability is unsatisfactory and the non-image areas of the lithographic
printing plate precursor are susceptible to damage, which causes ink uptake in damaged
regions - or so-called "scratch scumming" - to readily occur during printing.
[0121] As necessary, the aluminum surface may be subjected to a hydrophilization treatment
after the anodic oxidation treatment has been performed. The hydrophilization treatment
used by the present invention can employ, for example, the alkali metal silicate method
(for example, an aqueous sodium silicate solution) described in
US Patent Nos. 2,714,066,
3,181,461,
3,280,734, and
3,902,734. In this method, the support is treated, by immersion or electrolysis, in an aqueous
solution of sodium silicate. Examples of other methods are treatment with potassium
fluozirconate as described in Japanese Examined Patent Publication No.
S36-22063 and treatment with polyvinylphosphonic acid as described in
US Patent Nos. 3,276,868,
4,153,461, and
4,689,272.
The undercoat layer
[0122] The lithographic printing plate precursor of the present invention has a lower layer
disposed as described above on a support, but may as necessary be provided with an
undercoat layer between the lower layer and the support.
[0123] When this undercoat layer is present, the undercoat layer, residing between the support
and the lower layer, functions as a heat insulating layer, and as a consequence the
heat generated by photoexposure with the infrared laser is prevented from diffusing
to the support and is thereby efficiently utilized, accruing the advantage of supporting
an increase in the sensitivity.
[0124] In addition, even when this undercoat layer is present, the sensitivity to the infrared
laser is well maintained since the lower layer according to the present invention
is positioned on the photoexposed side or in the vicinity thereof.
[0125] In the non-photoexposed areas, it is thought that the lower layer, which will not
be permeable to the alkali developer solution, itself functions as a protective layer
for the undercoat layer, and due to this an excellent development stability is obtained,
an image is formed that exhibits an excellent discrimination, and timewise stability
is also secured.
[0126] In the photoexposed regions, the components of the lower layer, in which the dissolution-inhibiting
behavior had been extinguished, rapidly dissolve or disperse in the developer solution.
In addition, since the undercoat layer itself, which is present adjacent to the support,
comprises an alkali-soluble polymer, it exhibits an excellent solubility in the developer
solution. For example, even when a reduced-activity developer solution is employed,
the undercoat layer is thought to be useful because dissolution occurs rapidly without
the generation of a residual film and it also contributes to an improved developability.
[0127] Various organic compounds can be used for the undercoat layer components, for example,
a selection from carboxymethyl cellulose; dextrin; gum arabic; organophosphonic acids
such as amino group-containing phosphonic acids (e.g., 2-aminoethylphosphonic acid
and so forth) and optionally substituted phenylphosphonic acid, naphthylphosphonic
acid, alkylphosphonic acid, glycerophosphonic acid, methylenediphosphonic acid, ethylenediphosphonic
acid, and so forth; organophosphoric acids such as optionally substituted phenylphosphoric
acid, naphthylphosphoric acid, alkylphosphoric acid, glycerophosphoric acid, and so
forth; organophosphinic acids such as optionally substituted phenylphosphinic acid,
naphthylphosphinic acid, alkylphosphinic acid, glycerophosphinic acid, and so forth;
amino acids such as glycine, β-alanine, and so forth; and the hydrochlorides of hydroxy
group-containing amines, e.g., the hydrochloride of triethanolamine and so forth.
Mixtures of two or more may also be employed.
[0128] An undercoat layer is also preferred that contains at least one compound selected
from the group consisting of organic polymer compounds that have a structural unit
with the following formula.

[0129] In the formula, R
11 represents the hydrogen atom, a halogen atom, or an alkyl group and R
12 and R
13 each independently represent the hydrogen atom, the hydroxyl group, a halogen atom,
alkyl, substituted alkyl, aryl, substituted aryl, -OR
14, -COOR
15, -CONHR
16, -COR
17, or -CN. R
12 and R
13 may also be bonded with the formation of a ring. R
14 to R
17 each independently represent alkyl or aryl and X represents the hydrogen atom, a
metal atom, or NR
18R
19R
20R
21 wherein R
18 to R
21 each independently represent the hydrogen atom, alkyl, substituted alkyl, aryl, or
substituted aryl or R
18 and R
19 may be bonded with the formation of a ring. m represents an integer from 1 to 3.
[0130] The polymer compound described in Japanese Patent Application Publication No.
2000-241962, which contains an acid group-containing structural unit and an onium group-containing
structural unit, is also a suitable component for the undercoat layer in the present
invention.
[0131] A specific example is a copolymer from an acid group-containing monomer and an onium
group-containing monomer.
[0132] Acid groups having an acid dissociation constant (pKa) of at least 7 are preferred
for the acid group. -COOH, -SO
3H, -OSO
3H, -PO
3H
2, -OPO
3H
2, - CONHSO
2-, and -SO
2NHSO
2- are preferred and -COOH is particularly preferred.
[0133] The acid group-containing monomer can be specifically exemplified by acrylic acid,
methacrylic acid, crotonic acid, isocrotonic acid, itaconic acid, maleic acid, maleic
anhydride, and styrene containing an acid group as described above.
[0134] An onium group containing an atom from Group V or VI of the Periodic Table is preferred
for the onium group, while an onium group containing a nitrogen atom, phosphorus atom,
or sulfur atom is more preferred and a nitrogen atom-containing onium group is particularly
preferred. Onium group-containing monomers can be specifically exemplified by methacrylates
and methacrylamides that have the ammonium group in side chain position and by styrene
having an onium group-containing substituent, e.g., a substituent containing an onium
group such as the quaternary ammonium group.
[0135] Compounds as described in Japanese Patent Application Publication No.
2000-108538 and Japanese Patent Application Nos.
2002-257484 and
2003-78699 can also be used as necessary.
[0136] The undercoat layer can be put in place by methods such as the following. Thus, the
previously described organic compounds can be dissolved in water or an organic solvent
(e.g., methanol, ethanol, methyl ethyl ketone, and so forth) or a mixed solvent therefrom
and this solution can be coated and dried on an aluminum plate to provide the undercoat
layer; or, the previously described organic compounds can be dissolved in water or
an organic solvent (e.g., methanol, ethanol, methyl ethyl ketone, and so forth) or
a mixed solvent therefrom and an aluminum plate can be dipped in this solution in
order to adsorb the organic compounds and can then be rinsed (for example, with water)
and dried to provide the undercoat layer.
[0137] In the former method, the solution, which is to have an organic compound concentration
of 0.005 to 10 mass%, can be applied by various procedures.
[0138] In the latter method, the concentration of the solution is 0.01 to 20 mass% and preferably
0.05 to 5 mass%; the dipping temperature is 20 to 90°C and preferably 25 to 50°C;
and the dipping time is 0.1 second to 20 minutes and preferably 2 seconds to 1 minute.
The solution used here may also be adjusted into the pH range of 1 to 12 using a base
such as ammonia, triethanolamine, potassium hydroxide, and so forth, or an acid such
as hydrochloric acid, phosphoric acid, and so forth.
[0139] A yellow dye can also be added to the undercoat layer in order to improve the tone
reproducibility of the image-recording material.
[0140] The coating rate by the undercoat layer is suitably 2 to 200 mg/m
2 and preferably is 5 to 100 mg/m
2. A satisfactory printing durability performance is not obtained when this coating
rate is less than 2 mg/m
2, and the same is also true for a coating rate in excess of 200 mg/m
2.
Photoexposure
[0141] Image formation with the lithographic printing plate precursor of the present invention
is performed by the application of heat. In specific terms, image formation is performed
by photoexposure with a high-output solid-state infrared laser that emits infrared
radiation at a wavelength of 700 to 1200 nm, for example, a semiconductor laser, YAG
laser, and so forth.
[0142] Also usable are infrared lamp photoexposure, high-illuminance flash photoexposure
using, for example, a xenon discharge lamp, and direct imagewise recording using a
thermal recording head.
[0143] The infrared laser preferably has an output of at least 100 mW, and a multibeam laser
device is preferably used in order to shorten the photoexposure time. In addition,
the photoexposure time per pixel is preferably not more than 20 microseconds and the
energy irradiated onto the lithographic printing plate precursor is preferably from
10 to 500 mJ/cm
2.
Development
[0144] The lithographic printing plate precursor is preferably developed in the present
invention with an aqueous alkali solution that has a pH of at least 12 and that substantially
does not contain organic solvent. This "substantially does not contain organic solvent"
means that the aqueous alkali solution does not contain organic solvent sufficient
to produce problems with regard to environmental hygiene, safety, workability, and
so forth. However, the developer solution in the present invention may contain not
more than 0.5 mass% organic solvent, wherein not more than 0.3 mass% is preferred
and the complete absence of organic solvent is most preferred. While the pH is to
be at least 12.0, 12.0 to 14.0 is more preferred.
[0145] The developer solution (referred to below as the developer solution inclusive of
replenishing solution) can be the heretofore known aqueous alkali solutions. Examples
are inorganic alkali salts such as sodium silicate, potassium silicate, tertiary sodium
phosphate, tertiary potassium phosphate, tertiary ammonium phosphate, secondary sodium
phosphate, secondary potassium phosphate, secondary ammonium phosphate, sodium carbonate,
potassium carbonate, ammonium carbonate, sodium bicarbonate, potassium bicarbonate,
ammonium bicarbonate, sodium borate, potassium borate, ammonium borate, sodium hydroxide,
ammonium hydroxide, potassium hydroxide, lithium hydroxide, and so forth. Other examples
are organic bases such as monomethylamine, dimethylamine, trimethylamine, monoethylamine,
diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine,
n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine,
diisopropanolamine, ethyleneimine, ethylenediamine, pyridine, and so forth. A single
one of these aqueous alkali solutions may be used or two or more may be used in combination.
[0146] Among these aqueous alkali solutions, aqueous solutions, known as "silicate developer
solutions", having a pH of at least 12 and containing alkali silicate as the base
or containing a mixture of a silicon compound in base as the alkali silicate, are
one type of developer solution that enables the appearance of the effects according
to the present invention. So-called "nonsilicate developer solutions", which do not
contain alkali silicate, but rather contain a base and a nonreducing sugar (an organic
compound that has a buffering action), are another and more preferred type of developer
solution that enables the appearance of the effects according to the present invention.
[0147] Considering the aforementioned silicate developer solutions, the developability with
an aqueous alkali metal silicate solution can be adjusted using the concentration
and the ratio between the silicon dioxide SiO
2 and alkali metal oxide M
2O (generally given by the [SiO
2]/[M
2O] molar ratio) that are the components of the silicate. Suitable for use in this
regard are the aqueous sodium silicate solution disclosed in Japanese Patent Application
Publication No.
S54-62004, which has an SiO
2/Na
2O molar ratio of 1.0 to 1.5 (i.e., [SiO
2]/[Na
2O] = 1.0 to 1.5) and an SiO
2 content of 1 to 4 mass%, and the aqueous alkali metal silicate solution described
in Japanese Examined Patent Publication No.
S57-7427, wherein [SiO
2]/[M] is 0.5 to 0.75 (i.e., [SiO
2]/[M
2O] = 1.0 to 1.5), the SiO
2 concentration is 1 to 4 mass%, and the developer solution contains at least 20% potassium
with reference to the total gram-atoms of alkali metal present therein.
[0148] With regard to the so-called "nonsilicate development solutions", which contain nonreducing
sugar and base but lack alkali silicate, these preferably contain a nonreducing sugar
that has a buffering capacity that can inhibit pH variations.
[0149] Nonreducing sugars are sugars that lack a free aldehyde or ketone group and therefore
do not exhibit a reducing activity and may be classified into trehalose-type oligosaccharides,
in which the reducing groups are bonded to each other; glycosides in which a nonreducing
sugar is bonded to the reducing group of a sugar; and sugar alcohols, which are sugars
that have been reduced by hydrogenation. The present invention can use any of these.
The nonreducing sugar described in Japanese Patent Application Publication No.
H8-305039 can be suitably used in the present invention.
[0150] The trehalose-type oligosaccharides can be exemplified by saccharose, trehalose,
and so forth. The aforementioned glycosides can be exemplified by alkylglycosides,
phenol glycosides, mustard oil glycosides, and so forth. The sugar alcohols can be
exemplified by D,L-arabitol, ribitol, xylitol, D,L-sorbitol, D,L-mannitol, D,L-iditol,
D,L-talitol, dulcitol, allo-dulcitol, and so forth. Other suitable examples are maltitol,
obtained by the hydrogenation of the disaccharide maltose, and the reduced products
(reduced starch syrup) obtained by the hydrogenation of oligosaccharides. Among these
nonreducing sugars, trehalose-type oligosaccharides and sugar alcohols are preferred,
while D-sorbitol, saccharose, and reduced starch syrup are preferred thereamong because
they are inexpensive and have a buffering activity in a suitable pH range.
[0151] A single one of these nonreducing sugars may be used or two or more may be used in
combination.
[0152] The nonreducing sugar content in the nonsilicate developer solution is preferably
0.1 to 30 mass% and more preferably is 1 to 20 mass%. A content in the range of 0.1
to 30 mass% is preferred from the standpoint of obtaining a suitable buffering capacity
and a reduced unit cost and enabling the preparation of high concentrations.
[0153] The base used in combination with the nonreducing sugar can be exemplified by the
heretofore known bases, for example, inorganic bases and organic bases. The inorganic
bases can be exemplified by sodium hydroxide, potassium hydroxide, lithium hydroxide,
trisodium phosphate, tripotassium phosphate, triammonium phosphate, disodium phosphate,
dipotassium phosphate, diammonium phosphate, sodium carbonate, potassium carbonate,
ammonium carbonate, sodium bicarbonate, potassium bicarbonate, ammonium bicarbonate,
sodium borate, potassium borate, ammonium borate, and so forth.
[0154] The organic bases can be exemplified by monomethylamine, dimethylamine, trimethylamine,
monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine,
triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine,
monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine, pyridine,
and so forth.
[0155] A single such base may be used or two or more may be used in combination. Sodium
hydroxide and potassium hydroxide are preferred among these bases. The present invention
can also make use of a nonsilicate developer solution in which the main component
is an alkali metal salt of a nonreducing sugar rather than the combination of a nonreducing
sugar and a base.
[0156] In addition to the nonreducing sugar, the nonsilicate developer solution may also
employ an alkaline buffer solution comprising a weak acid and a strong base. This
weak acid preferably has a dissociation constant (pKa) of 10.0 to 13.2 and can be
selected from the weak acids described in, for example, "
Ionization Constants of Organic Acids In Aqueous Solution" (Pergamon Press).
[0157] Preferred specific examples are alcohols such as 2,2,3,3-tetrafluoropropanol-1, trifluoroethanol,
trichloroethanol, and so forth; aldehydes such as pyridine-2-aldehyde, pyridine-4-aldehyde,
and so forth; compounds that contain a phenolic hydroxyl group, e.g., salicylic acid,
3-hydroxy-2-naphthoic acid, catechol, gallic acid, sulfosalicylic acid, 3,4-dihydroxybenzenesulfonic
acid, 3,4-dihydroxybenzoic acid, hydroquinone (pKa: 11.56), pyrogallol, o-, m-, and
p-cresol, resorcinol, and so forth; oximes such as acetoxime, 2-hydroxybenzaldehyde
oxime, dimethylglyoxime, ethanediamide dioxime, acetophenone oxime, and so forth;
nucleic acid-related substances such as adenosine, inosine, guanine, cytosine, hypoxanthine,
xanthine, and so forth; and also diethylaminomethylphosphonic acid, benzimidazole,
barbituric acid, and so forth.
[0158] As necessary, the aforementioned developer solutions may also incorporate various
surfactants and organic solvents in order to accelerate or inhibit development, improve
the dispersion of development scum, or improve the ink receptivity of the image areas
on the printing plate. The surfactant is preferably an anionic, cationic, nonionic,
or amphoteric surfactant. As necessary, the aforementioned developer solution may
also incorporate a reducing agent, e.g., hydroquinone, resorcinol, the sodium and
potassium salts of an inorganic acid such as sulfurous acid and hydrosulfurous acid,
and so forth, and may also incorporate an organic carboxylic acid, defoamer, hard
water softener, and so forth.
[0159] Once the lithographic printing plate precursor has been developed using the previously
described developer solution, it is subjected to post-treatment with rinse water,
rinse solution containing surfactant and so forth, and/or desensitizing solution containing
gum arabic or a starch derivative. Various combinations of these treatments can be
used for the post-treatment when the previously described image-forming materials
are used for the printing plate.
[0160] Furthermore, when development is performed using automatic developing equipment,
it is known that, by using a developer solution provided by the addition to the developer
solution of an aqueous solution (a replenishing solution) that has a higher alkalinity
than the developer solution, a large number of PS plates can be processed without
having to change the developer solution in the development tank over a long period
of time. This replenishment procedure is preferably also used in the present invention.
[0161] Once the lithographic printing plate has been developed using the previously described
developer solution, it is submitted to post-treatment with rinse water, rinse solution
containing surfactant and so forth, and/or a desensitizing solution containing gum
arabic or a starch derivative. Various combinations of these treatments can be used
for the post-treatment of the lithographic printing plate precursor of the present
invention.
[0162] Automatic printing plate developing equipment has entered into widespread use in
recent years in the platemaking and printing sectors in order to rationalize and standardize
the platemaking operation. This automatic developing equipment generally comprises
a development section and a post-treatment section, a printing plate transport device,
a tank for each processing solution, and spraying units. While the already photoexposed
printing plate is being horizontally transported, each processing solution is pumped
up and sprayed through spray nozzles to perform development. A method has quite recently
become known in which processing is carried out by transporting the printing plate
while it is immersed in a processing solution tank filled with processing solution;
transport is effected by, for example, submerged guide rolls. Processing in this automatic
regime may also be performed while replenishing the processing solution with replenishing
solution in accordance with the processing load, the operating time, and so-forth.
A so-called disposable processing procedure may also be used in which processing is
done with substantially unused processing solutions.
[0163] Erasure of the unwanted image area is performed on the lithographic printing plate
precursor of the present invention in those instances in which an unwanted image area
(for example, film edge traces of the original image film) is present on the lithographic
printing plate precursor obtained by imagewise photoexposure, development, water rinsing,
and/or rinsing and/or gumming. This erasure is preferably preformed, for example,
as described in Japanese Examined Patent Publication No.
H2-13293, by coating an erasing fluid on the unwanted image area following by standing in
this state for a prescribed period of time and then rinsing with water. However, the
method described in Japanese Patent Application Publication No.
S59-174842 can also be used; in this method, development is carried out after the unwanted image
area has been irradiated by actinic light guided by an optical fiber.
[0164] After the optional application of a desensitizing gum, the lithographic printing
plate precursor obtained as described in the preceding is provided to the printing
process; however, as desired a burning process can be performed in those instances
where a lithographic printing plate precursor with an even higher printing durability
is desired.
[0165] When a burning process is to be performed on the lithographic printing plate precursor,
treatment with a counter-etch solution, as described in Japanese Examined Patent Publication
Nos.
S61-2518 and
S55-28062 and Japanese Patent Application Publication Nos.
S62-31859 and
S61-159655, is preferably carried out prior to burning.
[0166] Methods that can be used here include application of the counter-etch solution onto
the lithographic printing plate precursor using a sponge or absorbent cotton impregnated
with the counter-etch solution, application of the counter-etch solution by dipping
the printing plate in a vat filled with the counter-etch solution, or application
of the counter-etch solution using an automatic coater. In addition, a more uniform
effect is imparted by bringing about a uniform coating rate using a squeegee or squeegee
roller post-application.
[0167] A suitable coating rate for the counter-etch solution is generally 0.03 to 0.8 g/m
2 (dry mass). The counter-etch solution-coated lithographic printing plate precursor
is then dried when necessary and is thereafter heated to a high temperature using
a burning processor (for example, a commercially available burning processor such
as the "BP-1300" from FUJIFILM Corporation). The heating temperature and time here
will depend on the nature of the image-forming components, but the ranges of 180 to
300°C and 1 to 20 minutes are preferred.
[0168] The burned-in lithographic printing plate precursor may as necessary and appropriate
be submitted to those processes that have been carried out at this point in the past,
such as a water rinse and gumming; however, a so-called desensitization treatment,
such as gumming, can be omitted when a counter-etch solution has been used that contains
a water-soluble polymer compound. The lithographic printing plate precursor obtained
by the hereinabove described processing is mounted on, for example, an offset press
and is used for long-run printing.
EXAMPLES
[0169] The present invention is described herebelow using examples, but the scope of the
present invention is not limited to these examples.
Example 1
[0170] A support A was fabricated from 0.3 mm-thick JIS-A-1050 aluminum plate by processing
using the steps described in the following.
[0171] An etching treatment was performed by spraying the aforementioned aluminum plate
with an aqueous NaOH solution (concentration = 26 mass%, aluminum ion concentration
= 6.5 mass%) having a temperature of 70°C; this resulted in the dissolution of 6 g/m
2 of the aluminum plate. The etching treatment was followed by a water rinse by spraying
with well water.
[0172] A desmutting treatment was then carried out by spraying with a 1 mass% aqueous solution
of nitric acid (aluminum ion content = 0.5 mass%) having a temperature of 30°C; this
was followed by a water rinse by spraying.
[0173] A continuous electrochemical surface roughening treatment was carried out using 60
Hz alternating current voltage. The electrolyte used here was an aqueous solution
of 7.5 g/L hydrochloric acid (aluminum ion content = 5 g/L) and had a temperature
of 35°C. The electrochemical surface roughening treatment was carried out using an
alternating current power source with a square waveform and using a carbon electrode
as the counterelectrode. Ferrite was used for the auxiliary anode. A radial cell type
electrolysis tank was used.
[0174] The current density was 25 A/dm
2 as the peak current value, while the quantity of electricity was 450 C/dm
2 as the total quantity of electricity during the time in which the aluminum plate
was the anode.
[0175] This was followed by a water rinse by spraying with well water.
[0176] The aluminum plate was then subjected to an etching treatment at 32°C by spraying
with 26 mass% sodium hydroxide and 6.5 mass% aluminum ion, thereby dissolving 0.10
g/m
2 of the aluminum plate. This resulted in removal of the smut component, which was
composed mainly of aluminum hydroxide, that had been produced during the alternating
current electrochemical surface roughening treatment in the previous step, and also
resulted in a smoothing of the edge regions by dissolution of the edge regions of
the pits that had been produced. This was followed by a water rinse by spraying with
well water.
[0177] Desmutting was then carried out by spraying with a 25 mass% aqueous solution (aluminum
ion content = 0.5 mass%) of sulfuric acid having a temperature of 60°C, followed by
a water rinse by spraying with well water.
[0178] An anodic oxidation treatment was then performed. The electrolyte was nitric acid
at a concentration of 170 g/L (aluminum ion content = 0.5 mass%) and the temperature
was 43°C. This was followed by a water rinse by spraying using well water.
[0179] The surface roughness of the aluminum plate obtained up to this point was 0.45 µm
as the Ra reading as measured using a Surfcom from Tokyo Seimitsu Co., Ltd., with
a stylus tip radius of 2 µm.
[0180] The current density was approximately 30 A/dm
2. The final oxidation film weight was 2.7 g/m
2.
[0181] The anodically oxidized aluminum plate was then immersed for 5 seconds in a solution
provided by heating an aqueous 0.5% polyvinylphosphonic acid solution to 60°C and
was subsequently washed with water by spraying.
[0182] The procedure described above provided a support A for a photosensitive lithographic
printing plate.
[0183] The support obtained as described above was coated using a wire bar with the lower
layer coating solution A with the composition indicated below, after which drying
was performed for 70 seconds in a drying oven set to 140°C to obtain a lower layer.
The post-drying coating weight was 1.0 g/m
2.
<The lower layer coating solution A>
[0184]
- special polymer
(structural example (1) from above) 0.80 g
- naphthalenesulfonic acid salt of Crystal Violet 0.10 g
- fluorosurfactant F-780-F
(product of DIC Corporation) 0.01 g
- methyl ethyl ketone 5.00 g
- 1-methoxy-2-propanol 5.00 g
- N,N-dimethylformamide 10.00 g
[0185] The lower layer obtained as described above was coated using a wire bar with the
upper layer coating solution B with the composition indicated below, after which drying
was performed for 60 seconds in a drying oven set to 130°C to obtain an upper layer.
The post-drying coating weight was 0.5 g/m
2.
<The upper layer coating solution B>
[0186]
- the novolac resin (i) described above
(novolac resin comprising phenol/m-cresol/p-cresol = 50/30/20 (molar ratio), weight-average
molecular weight = 8,000) 0.80 g
- aromatic group-containing sulfonium salt
(the previously described example (A)) 0.20 g
- cyanine dye P with the structure given below 0.10 g

- fluorosurfactant F-780-F
(product of DIC Corporation) 0.02 g
- methyl ethyl ketone 10.00 g
- 1-methoxy-2-propanol 10.00 g
[0187] The preceding process yielded a photosensitive lithographic printing plate precursor
in which the recording layer had a multilayer structure.
Examples 2 to 14
[0188] Photosensitive lithographic printing plate precursors were obtained as in Example
1, but changing the special polymer (1) for the lower layer, the novolac resin (i)
for the upper layer, and the sulfonium salt (A) used in Example 1 to the compounds
shown in Table 1.
Example 15
[0189] A photosensitive lithographic printing plate precursor was obtained as in Example
1, but in this case also adding to the lower layer 0.10 g of the cyanine dye P that
was used in the upper layer in Example 1.
Example 16
[0190] A photosensitive lithographic printing plate precursor was obtained as in Example
15, but in this case omitting the cyanine dye P from the upper layer in Example 15
and changing its addition to the lower layer to 0.15 g.
Example 17
[0191] A photosensitive lithographic printing plate precursor was obtained as in Example
1, but in this changing the electrolyte used in the electrochemical surface roughening
treatment in the fabrication of support A in Example 1 from the aqueous solution of
7.5 g/L hydrochloric acid (aluminum ion content = 5 g/L) to an aqueous solution of
10 g/L nitric acid (aluminum ion content = 5 g/L) and making the amount of electricity
300 C/dm
2 as the total quantity of electricity during the time in which the aluminum plate
was the anode (the resulting support is referred to as support B in the following).
The surface roughness of this support B was 0.25 µm as the Ra reading when measured
using a Surfcom from Tokyo Seimitsu Co., Ltd., with a stylus tip radius of 2 µm.
Example 18
[0192] The support A obtained in Example 1 was coated using a wire bar with the coating
solution C with the composition indicated below, after which drying was performed
for 80 seconds in a drying oven set to 140°C to obtain a recording layer. The post-drying
coating weight was 1.5 g/m
2.
<Coating solution C>
[0193]
- special polymer
(structural example (1) from above) 0.50 g
- the novolac resin (i) described above 0.50 g
- aromatic group-containing sulfonium salt (A) 0.10 g
- cyanine dye P with the structure given below 0.10 g

- naphthalenesulfonic acid salt of Crystal Violet 0.10 g
- fluorosurfactant F-780-F
(product of Dainippon Ink and Chemicals, Incorporated) 0.02 g
- methyl ethyl ketone 5.00 g
- 1-methoxy-2-propanol 5.00 g
- N,N-dimethylformamide 10.00 g
[0194] The preceding process yielded a photosensitive lithographic printing plate precursor
in which the recording layer was a single layer.
Examples 19 to 31
[0195] Photosensitive lithographic printing plate precursors were obtained as in Example
18, but changing the special polymer (1), the novolac resin (i), and the sulfonium
salt (A) of Example 18 to the compounds shown in Table 1.
Example 32
[0196] A photosensitive lithographic printing plate precursor was obtained as in Example
18, but using the support B described in Example 17 in place of the support A used
in Example 18.
Comparative Example 1
[0197] A photosensitive lithographic printing plate precursor was obtained as in Example
1, but in this case using an N-(p-aminosulfonylphenyl)methacrylamide/methyl methacrylate/acrylonitrile
= 35/35/30 (molar ratio) copolymer (weight-average molecular weight = 65,000, referred
to below as polymer (X)) in place of the special polymer (1) used in the lower layer
in Example 1.
Comparative Example 2
[0198] A photosensitive lithographic printing plate precursor was obtained as in Example
1, but in this case using an N-phenylmaleimide/methacrylamide/methacrylic acid = 45/35/20
(molar ratio) copolymer (weight-average molecular weight = 20,000, referred to below
as polymer (Y)) in place of the special polymer (1) used in the lower layer in Example
1.
Comparative Example 3
[0199] A photosensitive lithographic printing plate precursor was obtained as in Example
1, but in this case without using the sulfonium salt (A) used in the lower layer in
Example 1.
Comparative Example 4
[0200] A photosensitive lithographic printing plate precursor was obtained as in Example
18, but in this case using the polymer (X) of Comparative Example 1 in place of the
special polymer (1) in Example 18.
Comparative Example 5
[0201] A photosensitive lithographic printing plate precursor was obtained as in Example
18, but in this case using the polymer (Y) of Comparative Example 2 in place of the
special polymer (1) in Example 18.
Comparative Example 6
[0202] A photosensitive lithographic printing plate precursor was obtained as in Example
18, but in this case omitting the use of the novolac resin (i) in Example 18 and using
1.00 g of the special polymer (1).
Comparative Example 7
[0203] A photosensitive lithographic printing plate precursor was obtained as in Example
18, but in this case omitting the use of the sulfonium salt (A) in Example 18.
Evaluation of the developability
[0204] Using a Luxel PLATESETTER T-9800HS from FUJIFILM Corporation at a beam output of
100% and a drum rotation rate of 150 rpm, the obtained photosensitive lithographic
printing plate was imaged (photoexposed) in accordance with a test pattern image that
had a chart with a 1 to 99% halftone dot area ratio at 175 lpi/2400 dpi.
[0205] Development was then carried out for a development time of 25 seconds at a development
bath temperature of 30°C using an Autolith PN85CE automatic developer from AGFA. The
developer solution used here was obtained by diluting developer concentrate 1 (composition
given below) with water to provide developer solutions in which the electroconductivity
varied from 80 to 100 mS/cm in intervals of 2 mS/cm. A solution provided by diluting
FG-1 (FUJIFILM Corporation) 1:1 with water was used as the gum solution. The developability
was evaluated using these conditions.
<Composition of developer concentrate 1>
[0206]
- #3 sodium silicate (38.5% aqueous solution) 150 g
- sodium hydroxide (50% aqueous solution) 70 g
- dipotassium salt of p-methylphenoxypolyoxyethylene phosphate 10 g
- Pluronic TR704 (ADEKA) 2 g
- Eleminol MON-2 (Sanyo Chemical Industries, Ltd., 48.5% aqueous solution) 1 g
- pure water 267 g
[0207] In the case of a developer solution with a low bath sensitivity, development of the
photoexposed areas is inadequate and a residual film will be produced in the non-image
areas. In the case of a developer solution with a high bath sensitivity, the surface
of the non-photoexposed areas undergoes development and film thinning occurs and a
good quality image is not obtained. Each lithographic printing plate precursor was
evaluated using as an index to the development latitude the electrical conductivity
interval for the developer solutions that produced neither a residual film in the
non-image areas nor film thinning in the image areas. The results are shown in Table
1.
[0208] As shown in Table 1, the lithographic printing plate precursors provided by the examples
according to the present invention in all instances exhibited a broad electrical conductivity
interval, i.e., exhibited a wide development latitude, and thus exhibited an excellent
developability. In contrast to this, the lithographic printing plate precursors provided
by the comparative examples exhibited a narrower electrical conductivity interval
than the lithographic printing plate precursors of the examples.
Evaluation of the chemical resistance
[0209] A lithographic printing plate was obtained by subjecting the obtained photosensitive
lithographic printing plate precursor to photoexposure and development as in the previously
described evaluation of developability. The developer solution used in this case was
the developer solution that had the electrical conductivity that was in the middle
of the electrical conductivity interval determined in the evaluation of developability.
[0210] Printing was then performed using the lithographic printing plate obtained as described
above. A Lithrone press from Komori Corporation was used as the press; Balius G black
ink from Dainippon Ink and Chemicals, Incorporated was used as the ink; and a solution
provided by diluting IF-102 from FUJIFILM Corporation with water to a 4% concentration
was used as the fountain solution. At each 5000 impressions, the plate surface was
wiped with Multicleaner (FUJIFILM Corporation). Printing was performed on high quality
paper, and the printing durability was evaluated based on the number of sheets printed
at the time point at which the beginning of attenuation of the black image density
could be visually recognized. A larger numerical value in this instance is indicative
of a better chemical resistance. The results are given in Table 1.
[0211] As shown in Table 1, all of the plates made from the lithographic printing plate
precursors provided by the examples according to the present invention exhibited an
excellent chemical resistance. In contrast to this, the plates made from lithographic
printing plate precursors provided by the comparative examples all had a poor chemical
resistance.
Burning evaluation
[0212] The photosensitive lithographic printing plate precursors of Examples 1 and 18 were
selected from among the obtained photosensitive lithographic printing plate precursors
and were used to obtain lithographic printing plates by photoexposure and development
as in the evaluation of chemical resistance.
[0213] After rinsing the plate with water to remove the gum solution, the plate was coated
with BC-5 (FUJIFILM Corporation) counter-etch solution held in a sponge and was then
allowed to dry spontaneously. This was followed by a heat treatment for 5 minutes
at 260°C in a burning oven from the Wisconsin Company. After cooling to room temperature,
the counter-etch solution was removed by a water rinse and gumming was performed using
a Gum Coater G-800 from FUJIFILM Corporation. A solution provided by diluting GU-7
(FUJIFILM Corporation) 1:1 with water was used as the gum.
[0214] Printing as in the evaluation of chemical resistance was performed with the burning-treated
plate in order to evaluate the printing durability. According to the results, 380,000
and 340,000 impressions could be obtained, respectively, which showed that the chemical
resistance could be further improved by burning.
Other evaluation
[0215] The photosensitive lithographic printing plate precursors of Examples 1 and 18 were
selected from among the obtained photosensitive lithographic printing plate precursors
and were used to obtain lithographic printing plates by photoexposure and development
as in the evaluation of developability, with the exception that the developer solution
was changed. The developer solution used was obtained by diluting developer concentrate
2 (composition given below) to provide an electrical conductivity of 43 mS/cm. According
to the results, an excellent lithographic printing plate was obtained that was free
of staining and film thinning, and an excellent printing plate could thus also be
obtained with a developer solution that did not contain a silicic acid component.
<Composition of developer concentrate 2>
[0216]
- potassium hydroxide (48% aqueous solution) 200 g
- sorbitol 450 g
- tripotassium citrate 100 g
- Paionim C-158G (Takemoto Oil & Fat Co., Ltd.) v10 g
- pure water 240 g
[0217] As shown in the preceding examples, the present invention can provide a photosensitive
lithographic printing plate precursor that exhibits both an excellent developability
and an excellent chemical resistance. In addition, this photosensitive lithographic
printing plate precursor can also provide an even higher printing durability through
burning.
Table 1
|
support |
recording layer |
special polymer |
novolac resin |
sulfonium salt / iodonium salt |
development latitude
(mS/cm) |
interval
(mS/cm) |
chemical resistance
(printing durability) |
Example 1 |
A |
multilayer |
(1) |
(i) |
(A) |
84-94 |
10 |
120,000 |
Example 2 |
A |
multilayer |
(2) |
(i) |
(A) |
86-96 |
10 |
160,000 |
Example 3 |
A |
multilayer |
(3) |
(i) |
(A) |
84-94 |
10 |
140,000 |
Example 4 |
A |
multilayer |
(4) |
(i) |
(A) |
86-96 |
10 |
140,000 |
Example 5 |
A |
multilayer |
(5) |
(i) |
(A) |
86-96 |
10 |
140,000 |
Example 6 |
A |
multilayer |
(6) |
(i) |
(A) |
84-92 |
8 |
80,000 |
Example 7 |
A |
multilayer |
(7) |
(i) |
(A) |
90-96 |
6 |
120,000 |
Example 8 |
A |
multilayer |
(1) |
(ii) |
(A) |
84-94 |
10 |
120,000 |
Example 9 |
A |
multilayer |
(1) |
(iii) |
(A) |
84-94 |
10 |
140,000 |
Example 10 |
A |
multilayer |
(1) |
(iv) |
(A) |
90-96 |
6 |
120,000 |
Example 11 |
A |
multilayer |
(1) |
(i) |
(B) |
84-94 |
10 |
120,000 |
Example 12 |
A |
multilayer |
(1) |
(i) |
(C) |
84-94 |
10 |
120,000 |
Example 13 |
A |
multilayer |
(1) |
(i) |
(D) |
84-92 |
8 |
90,000 |
Example 14 |
A |
multilayer |
(1) |
(i) |
(E) |
84-90 |
6 |
80,000 |
Example 15 |
A |
multilayer |
(1) |
(i) |
(A) |
84-94 |
10 |
120,000 |
Example 16 |
A |
multilayer |
(1) |
(i) |
(A) |
86-96 |
10 |
120,000 |
Example 17 |
B |
multilayer |
(1) |
(i) |
(A) |
84-94 |
10 |
120,000 |
Example 18 |
A |
monolayer |
(1) |
(i) |
(A) |
84-94 |
10 |
110,000 |
Example 19 |
A |
monolayer |
(2) |
(i) |
(A) |
86-96 |
10 |
140,000 |
Example 20 |
A |
monolayer |
(3) |
(i) |
(A) |
84-94 |
10 |
120,000 |
Example 21 |
A |
monolayer |
(4) |
(i) |
(A) |
86-96 |
10 |
120,000 |
Example 22 |
A |
monolayer |
(5) |
(i) |
(A) |
86-96 |
10 |
130,000 |
Example 23 |
A |
monolayer |
(6) |
(i) |
(A) |
84-92 |
8 |
60,000 |
Example 24 |
A |
monolayer |
(7) |
(i) |
(A) |
90-96 |
6 |
120,000 |
Example 25 |
A |
monolayer |
(1) |
(ii) |
(A) |
84-94 |
10 |
120,000 |
Example 26 |
A |
monolayer |
(1) |
(iii) |
(A) |
84-94 |
10 |
140,000 |
Example 27 |
A |
monolayer |
(1) |
(iv) |
(A) |
90-96 |
6 |
120,000 |
Example 28 |
A |
monolayer |
(1) |
(i) |
(B) |
84-94 |
10 |
120,000 |
Example 29 |
A |
monolayer |
(1) |
(i) |
(C) |
84-94 |
10 |
120,000 |
Example 30 |
A |
monolayer |
(1) |
(i) |
(D) |
84-92 |
8 |
80,000 |
Example 31 |
A |
monolayer |
(1) |
(i) |
(E) |
84-90 |
6 |
70,000 |
Example 32 |
B |
monolayer |
(1) |
(i) |
(A) |
84-94 |
10 |
120,000 |
Comp. Ex. 1 |
A |
multilayer |
(X) |
(i) |
(A) |
82-84 |
2 |
40,000 |
Comp. Ex. 2 |
A |
multilayer |
(Y) |
(i) |
(A) |
94-96 |
2 |
60,000 |
Comp. Ex. 3 |
A |
multilayer |
(1) |
(i) |
none |
86 |
0 |
30,000 |
Comp. Ex. 4 |
A |
monolayer |
(X) |
(i) |
(A) |
82-84 |
2 |
40,000 |
Comp. Ex. 5 |
A |
monolayer |
(Y) |
(i) |
(A) |
94-96 |
2 |
60,000 |
Comp. Ex. 6 |
A |
monolayer |
(1) |
none |
(A) |
86 |
0 |
60,000 |
Comp. Ex. 7 |
A |
monolayer |
(1) |
(i) |
none |
86 |
0 |
30,000 |
[0218] Examples 15 and 16 differ with regard to the layers containing the infrared-absorbing
dye.