Technical Field
[0001] The present invention relates to a plasma generator and, more particularly, to a
so-called atmospheric plasma generator.
Background Art
[0002] The present inventors previously developed atmospheric plasma generators and filed
patent applications therefor (see Patent Documents 1 and 2). In the plasma generators,
electrode surfaces facing each other are provided with micro-scale recesses, to thereby
induce hollow cathode electric discharge, through which a plasma is generated. When
a plasma-generating gas is caused to pass through the plasma-generating zone, a gas
containing at least a plasma can be jetted. Through employment of such a plasma generator,
high-density plasma can be readily generated under atmospheric pressure with a high-frequency
voltage of about some kilovolts obtained from a single-phase commercial power source
(100 V) by means of a voltage booster.
Patent Document 1: Japanese Patent Application Laid-Open (kokai) No. 2006-196210
Patent Document 2: Japanese Patent Application Laid-Open (kokai) No. 2006-272039
Disclosure of the Invention
Problems to be Solved by the Invention
[0003] In generating plasma under atmospheric pressure, when a short inter-electrode distance
is employed, electric discharge is unstable, whereas when the distance is 1 cm or
longer, electric discharge cannot be maintained. Thus, according to Patent Documents
1 and 2, in the case where the plasma-generating zone is, for example, a longitudinally
elongated zone, electrodes having a certain length and extending in the longitudinal
direction are employed. However, when such long electrodes are provided to face each
other, uniformity in density of the generated plasma is problematically impaired.
Specifically, electric discharge start at spots on the electrode surfaces, and electric
discharge cannot be uniformly generated in the relevant electrode surfaces. Due to
unstable electric discharge, the plasma generators cannot be effectively employed
for the plasma treatment of a considerable wide area of an object such as a surface
portion of a liquid-crystal panel or the like. Furthermore, difficulty is encountered
in increasing the volume of the plasma-generating zone. Therefore, limitations are
imposed on the effective uses of the aforementioned plasma generators, although the
plasma generators can generate high-density plasma under atmospheric pressure.
[0004] The present invention has been conceived in order to solve the aforementioned problem,
and an object of the invention is to provide an atmospheric plasma generator having
an elongated plasma-generating zone.
Means for Solving the Problems
[0005] In a first aspect of the present invention, there is provided an atmospheric plasma
generator comprising:
a longitudinally extending casing which is made of an insulator and which defines
a columnar plasma-generating zone;
a gas intake section for supplying a plasma-generating gas to the plasma-generating
zone in a direction normal to the longitudinal direction of the plasma-generating
zone so as to attain a uniform gas distribution, in the longitudinal direction, over
the plasma-generating zone;
a pair of electrodes disposed in the plasma-generating zone with a spacing in the
longitudinal direction of the plasma-generating zone; and
a gas discharge section for discharging the plasma generated in the plasma-generating
zone, which section is connected to the plasma-generating zone, which section is disposed
along the longitudinal direction of the plasma-generating zone, and which section
comprises a number of elongate holes that extend in the direction of the flow of the
generated gas-form plasma.
[0006] The present invention is directed to an apparatus for generating linear plasma under
atmospheric pressure and for irradiating an object to be treated (hereinafter may
be referred to as treatment object) with the linearly extended plasma. The holes of
the gas discharge section may be provided in a line or a plurality of lines along
the longitudinal direction. The diameter of each hole at the base (i.e., the end connecting
to the plasma-generating zone) may be different from that at the tip, and the diameter
at the tip may be smaller than that at the base. Alternatively, the diameter at the
tip may be larger than that at the base. The hole may be tapered, or the diameter
of the hole may be varied stepwise. When the apparatus of the invention is employed
with the tip of each hole being apart from the treatment object, no electric discharge
occurs between the gas discharge section and the treatment object, even though the
length of the hole is shortened. In this case, the treatment effect is weak. However,
through increasing the amount of gas flow, a satisfactory treatment effect can be
attained, even when the tips are apart from the treatment object.
In a second aspect of the present invention, which is directed to a specific embodiment
of the first aspect, the gas intake section has a diffusion section for supplying
the plasma-generating gas over the plasma-generating zone uniformly in the longitudinal
direction, the diffusion section having a number of guide portions for guiding the
plasma-generating gas in a direction normal to the longitudinal direction of the plasma-generating
zone. Through this configuration, a plasma-generating gas can be supplied over the
plasma-generating zone uniformly in the longitudinal direction. These guide portions
may be formed as a grid-like pattern or formed of a plurality of walls of the holes.
In a third aspect of the present invention, which is directed to a specific embodiment
of the first or second aspect, said holes of the gas discharge section have such a
length that no electric discharge occurs with respect to an object to be irradiated
with plasma. Through this configuration, the object is not damaged. In consideration
of deactivation of radicals, the length of the hole is most preferably the shortest
length, so long as no such discharge occurs.
[0007] In a fourth aspect of the present invention, which is directed to a specific embodiment
of any of the first to third aspects, said holes of the gas discharge section have
a tip having a diameter of 0.1 mm to 1 mm. Through this configuration, a treatment
object can be irradiated selectively with only radicals among the plasma particles.
That is, electrons are absorbed by the walls of the holes.
[0008] In a fifth aspect of the present invention, which is directed to a specific embodiment
of any of the first to fourth aspects, said holes of the gas discharge section have
a length which is 1/2 times or more the distance between said pair of electrodes.
In this case, electric discharge with respect to a treatment object can be prevented.
In a sixth aspect of the present invention, which is directed to a specific embodiment
of any of the first to fifth aspects, said holes of the gas discharge section have
an oblique portion which is oblique with respect to a direction normal to the longitudinal
direction. Through this configuration, electrons can be efficiently absorbed by the
inner walls of the oblique holes, whereby a treatment object can be irradiated with
radicals of higher purity. In addition, irradiation of the treatment object with UV
rays, vacuum UV rays, visible light, etc. can be prevented. UV rays emitted in the
plasma-generating zone are intercepted by the inner walls of the oblique holes. Thus,
irradiation of the treatment object with UV rays, which would otherwise be emitted
through the tips of the holes, can be prevented. Therefore, damage of the treatment
object, which would otherwise be caused by the light (e.g., UV light) emitted in the
plasma-generating zone, can be prevented.
In a seventh aspect of the present invention, which is directed to a specific embodiment
of any of the first to sixth aspects, said pair of electrodes are disposed with a
spacing of 1 cm to 50 cm.
In an eighth aspect of the present invention, which is directed to a specific embodiment
of any of the first to seventh aspects, at least one electrode of said pair of electrodes
is provided with hollow portions on a surface thereof which face the other electrode.
In a ninth aspect of the present invention, which is directed to a specific embodiment
of any of the first to seventh aspects, the longitudinal length L (cm) of the columnar
plasma-generating zone and the cross-sectional area σ (mm
2) normal to the longitudinal direction satisfy the following relationships: 2 ≤ Lσ
≤ 200 and 3 ≤ σ ≤ 25. When the conditions are satisfied, plasma can be effectively
generated. More preferred conditions are 2 ≤ Lσ ≤ 100 and 3 ≤ σ ≤ 25.
In a tenth aspect of the present invention, said holes of the gas discharge section
have a cross-section normal to a direction of gas flow, the cross-section being at
least one selected from a group consisting of a circle, an oval, and a rectangle or
a slit-like pattern having a longer side normal to the line of arrangement of the
holes.
Effects of the Invention
[0009] In the present invention, an atmospheric plasma is generated in the space defined
(or surrounded) by the casing made of an insulator. In the columnar space defined
(or surrounded) by the insulator casing, an elongated plasma zone is realized. In
the present invention, a conceivable role of the insulator is such that the inner
surfaces of the casing are electrically charged, to thereby stabilize plasma generation
occurring in the entire plasma-generating zone extending in the longitudinal direction
and having a large volume.
[0010] The plasma-generating gas is supplied through the gas intake section to the plasma-generating
zone in a direction normal to the longitudinal direction of the zone, and discharged
through a number of holes included in the gas discharge section. In this manner of
gas flow, radicals are generated at a uniform density over the zone along the longitudinal
direction thereof, and a treatment object is irradiated with the thus-generated radicals
which are jetted straight through the tips of the holes. Through employment of hollow
cathode electric discharge provided by means of electrodes having a recessed surface
disclosed in Patent Document 1 or 2, plasma can be readily generated under atmospheric
pressure. When the holes of the gas discharge section have a length which is 1/2 times
or more the distance between said pair of electrodes, electric discharge with respect
to a plasma treatment object is prevented. The hole length is most preferably 1/2
times the distance between said pair of electrodes. When the length is longer than
the 1/2 length; that is, when the length from the plasma-generating zone to the treatment
object is long, the generated radicals are deactivated, which is not preferred. In
the case where the inter-electrode distance is 40 mm, the most preferred hole length
has been found to be 20 mm. The columnar plasma-generating zone of the invention has
a longitudinal length L (cm) of 1 to 50, and a cross-sectional area σ (mm
2) normal to the longitudinal direction is 3 to 25. In the columnar plasma-generating
zone, the smaller the cross-sectional area σ, the longer the length L. The length
L can be increased, when the casing is substantially tubular. Some experiments have
revealed that stable plasma can be formed under the relationship: 2 ≤ Lσ ≤ 200. For
more effective generation of plasma, the following relationships: 2 ≤ Lσ ≤ 100 and
3 ≤ σ ≤ 25, are satisfied.
Brief description of the Drawings
[0011]
[FIG. 1] A cross-section of the structure of an embodiment of the plasma generator
according to the present invention.
[FIG. 2] A cross-section of a part of the embodiment of the plasma generator.
[FIG. 3] A cross-section of the electrode configuration of the embodiment of the plasma
generator.
[FIG. 4] A cross-section of the structure of another specific embodiment of the plasma
generator according to the present invention.
Best Modes for Carrying Out the Invention
[0012] The casing must be made from a material which has high resistance to plasma generated
in the inside thereof. For example, a ceramic material such as sintered boron nitride
(PBN) is preferred. The electrodes may be formed from stainless steel, molybdenum,
tantalum, nickel, copper, tungsten, platinum, or an alloy thereof. The electrode surface
in which hollow portions for providing hollow cathode electric discharge are provided
preferably has a thickness (in the Y-axis direction in FIG. 1; i.e., the gas flow
direction) of about 1 to about 5 mm. When the surface has a sufficient thickness,
hollow portions can be formed to have different depths along the gas flow direction,
to thereby enhance gas flow rate and density of the generated plasma. The electrode
surfaces facing each other preferably have a rectangular shape, which is similar to
a cross-section of the plasma-generating zone normal to the longitudinal direction.
A hollow portion for providing hollow cathode electric discharge preferably has a
depth of, for example, about 0.5 mm. The hollow portions may be formed non-continuously
(i.e., dot-like) or continuously (i.e., groove-like, extending along the perpendicular
direction in FIG. 1). However, continuous hollow portions are preferred. When the
hollow portions are formed in a dot-like manner, the electrodes may have a cross-section
normal to the inter-electrode direction (i.e., x-axis direction in FIG. 1) which cross-section
has a shape of, for example, columnar, semi-spherical, prismatic, pyramidal, etc.
[0013] Examples of the gas which may be used at atmospheric pressure for generating plasma
include air, oxygen, rare gas (He, Ne, Ar, etc.), nitrogen, and hydrogen. By use of
air or oxygen, active oxygen radicals are formed, and organic contaminants can be
effectively removed. Use of air is advantageous in view of economy. In the case where
Ar gas (rare gas) is used, oxygen radicals are generated from oxygen molecules existing
in an atmosphere around a treatment object by the Ar plasma during irradiation of
a treatment object with the Ar plasma. By the mediation of oxygen radicals, organic
contaminants present on the surface of the treatment object can be effectively removed.
This process is economical because a sole gas of Ar is used. For the aforementioned
reasons, a mixture of air and Ar may also be used. The flow rate and supply amount
of the gas and the degree of vacuum may be selected as desired. In the present invention,
plasma is not generated by high-frequency voltage. The power source connected to each
electrode may be a DC power source, an AC power source, a pulse power source, or another
power source, and no particular limitation is imposed on the frequency.
[0014] When a plasma gas is jetted through the outlets (i.e., a number of holes included
in the gas discharge section) to a treatment object, the distance between each jetting
outlet and the treatment object, which depends on the gas flow rate, is preferably,
for example, 2 mm to 20 mm, more preferably 3 mm to 12 mm, most preferably 4 mm to
8 mm. When oxygen radicals are generated, the distance is preferably adjusted so that,
on the surface of the treatment object, the oxygen radical density is maximized and
the electron density is minimized. Through employment of the above conditions, charge-up
damage of the treatment object can be prevented, and the treatment object can be cleaned
in the most effective manner. Alternatively, the treatment object may be irradiated
with plasma in a direction slanted from the gas flow direction. Through plasma irradiation
in this manner, impairment of products caused by irradiation of plasma to a polarized
film, a liquid crystal-sealant, etc. can be prevented. Onto an area where plasma irradiation
should be avoided, a gas such as plasma-free air may be sprayed, so as to prevent
diffusion of plasma.
[0015] Oxidation of the electrodes is preferably prevented through lowering the oxygen concentration
by use of a gas containing nitrogen, Ar, or hydrogen (reducing gas). Alternatively,
a plurality of plasmas may be generated so as to remove organic contaminants and prevent
reaction with the remaining area. Also, a gas generated from the portion of the treatment
object irradiated with plasma after reaction is preferably removed via suction. Through
removal of the gas, deposition of the molecules which have been reacted with organic
contaminants on remaining areas of the treatment object can be prevented. The temperature
and density of the plasma, which are measured through, for example, laser beam absorption
spectrometry, are preferably adjusted to predetermined levels by feed-back-controlling
of applied voltage, duty ratio (in the case of pulse voltage application), irradiation
time, gas flow rate, etc.
[0016] Through performing control in the aforementioned manner, high-quality cleaning and
shortened cleaning time can be realized. In the case where a plurality of outlets
of the holes are disposed in a line, irradiation with plasma can be limited only to
a required portion of the treatment object by appropriately adjusting the diameters
and lengths of the holes. Also preferred is cooling of the plasma-generating gas supplied
to the plasma generator of the invention. Through cooling, elevation of the plasma
temperature to a level higher than the required level can be prevented, and impairment
of products such as liquid crystal displays; e.g., damage to polarized film, can be
prevented. According to the present invention, a very small-scale plasma generator
can be realized. Thus, in one possible mode, a plurality of plasma jetting holes are
provided in the gas discharge section, and irradiation with high-density plasma can
be confined to an anisotropic conductive film (ACF)-attached substrate portion. Also,
the present cleaning device can be effectively installed in a very narrow space of
a liquid crystal display fabrication apparatus. A hole of the gas discharge section
may have an oblique angle with respect to the imaginary line which is normal to the
longitudinal direction of the plasma-generating zone, and the oblique direction may
be any direction within 360° along the imaginary line.
Throughout the above-described aspects of the invention, plasma generation is preferably
performed under atmospheric pressure. However, reduced or increased pressure may be
employed. The term "atmospheric pressure" herein encompasses about 0.5 to about 2
atm. The holes of the gas discharge section may have a tip diameter of 0.1 mm to 1
mm. When the hole diameter is shorter, the gas flow rate increases. In this case,
the treatment object is irradiated at high possibility with plasma without deactivation
of radicals, which is preferred, and suitable radical irradiation can be realized.
When the holes of the gas discharge section have a length which is 1/2 times or more
the distance between said pair of electrodes, electric discharge with respect to a
treatment object can be effectively prevented.
Embodiment 1
[0017] FIG. 1 is a cross-section of the configuration of a plasma generator 100, which is
a specific embodiment of the present invention. FIG. 2 is a cross-section (partial
view) of the plasma generator 100 shown in FIG. 1, cut along a direction normal to
the longitudinal direction of a plasma-generating zone P.
[0018] The plasma generator 100 shown in FIG. 1 has a casing 10 made of a sintered ceramic
produced from alumina (Al
2O
3) as a raw material. In the casing 10, there is disposed the plasma-generating zone
P extending along the longitudinal direction (hereinafter referred to as a "x-axis
direction"). The casing 10 has a gas intake section 12 including a hole 15 having
a diameter of 8 mm, two holes 13 having a diameter of 5 mm, a diffusion plate 14 provided
with the holes 13, and a guide portion 16. Each hole 13 may have a rectangular shape
having a longer side along the x-axis, or a slit-like shape. A gas is supplied through
the hole 15 and divided into two flows in the x-axis direction by means of the diffusion
plate 14. The two gas flows are transferred through the holes 13 and guided to the
plasma-generating zone P. The guide portion 16 has a number of holes having a diameter
of 1.5 mm which are provided for allowing the gas to flow in a direction normal to
the x-axis direction (hereinafter this gas flow direction is referred to as a "Y-axis
direction) so as to attain a uniform gas distribution, in the x-axis direction, over
the plasma-generating zone P. The guide portion 16 is provided with a plurality of
holes disposed therein as a grid-like pattern and defined by corresponding wall surfaces.
The holes and the wall surfaces form a diffusion section 18. On the downstream side
of the plasma-generating zone P, there is provided a gas discharge section 20 which
is formed of a first gas discharge section 21 and a second gas discharge section 22.
The first gas discharge section 21 is provided with a number of holes 23 which extend
along the y-axis direction and which are disposed along the x-axis direction. The
second gas discharge section 22 is provided with a number of holes 24 which extend
along the y-axis direction and which are disposed along the x-axis direction. The
holes 23 and 24 have a diameter of 0.5 mm. The holes 23 have a length of 4 mm, and
the holes 24 have a length of 16 mm. The holes 23 and 24 have x-axis intervals of
2.5 mm, and are provided in a number of 16 holes 23 and 16 holes 24.
[0019] The plasma-generating zone P has a rectangular cross-section (short side: 2 mm, long
side 5 mm) in a direction normal to the x-axis direction. The long side is along the
y-axis direction. The x-axis length of the zone P is 4 cm. As shown in FIG. 3, electrodes
2a, 2b each have a rectangular cross-section in a direction parallel to the gas flow
in FIG. 1 (i.e., a cross-section parallel to the y-axis in FIG. 1). The electrodes
2a, 2b each have a rectangular cross-section in a direction normal to the x-axis direction,
the cross-section being similar to the cross-section of the plasma-generating zone
P in a direction normal to the x-axis direction. As shown in FIG. 3, the electrodes
2a, 2b have a roughened surfaces which are provided with numerous hollow portions
H having a depth of about 0.5 mm on the surfaces thereof facing each other. The power
sources employed in Embodiment 1 supply about 9 kV, which is obtained by boosting
a commercial AC voltage of 100 V (60 Hz), and a voltage of 9 kV is applied to the
electrodes 2a, 2b. The current flowing between the electrodes 2a and 2b is 20 mA.
When argon gas is supplied through the gas intake section 12, a plasma was generated,
even when the electrodes 2a, 2b were separated at a maximum spacing of 4 cm along
the x-axis direction.
The plasma generator 110 can enhance adhesion between the glass substrate of a liquid-crystal
display and anisotropic conductive film (ACF), in the case where an area of the glass
substrate to which ACF is attached is cleaned by the plasma generator before attachment
of ACF to the substrate.
Then, through varying the length of the side of the cross-section normal to the x-axis
direction of the plasma-generating zone P while the distance (along the x-axis) between
the electrodes 2a and 2b was fixed to 4 cm, stable electric discharge was generated
when the side length was 5 mm or less. When the distance between the electrodes 2a
and 2b was varied while the length of the side of the cross-section of the plasma-generating
zone P was fixed to 5 mm, stable linear electric discharge was generated when the
distance was 4 cm or shorter.
[0020] Subsequently, through employment of the above apparatus, the surface of a glass substrate
of a liquid-crystal display was hydrophilicized with argon gas plasma. The contact
angle of the surface before the treatment was 50°, but was reduced to 7° after the
treatment. When the same apparatus as shown in FIG. 1, except that no second gas discharge
section 22 was provided, was employed, electric discharge was observed between the
glass substrate and the tips of the holes 23. In contrast, when the apparatus of Embodiment
1 shown in FIG. 1 was employed, no such electric discharge was observed. Therefore,
the apparatus allows plasma treatment of a treatment object without damaging the object.
Separately, oxygen radical concentration was measured when the same apparatus as shown
in FIG. 1, except that no second gas discharge section 22 was provided, or the apparatus
shown in FIG. 1 having the second gas discharge section 22 was employed. Specifically,
a plasma-generating gas containing oxygen and argon was supplied to each apparatus,
and the oxygen radical concentration was measured at a point 5 mm from the tips of
the holes. The oxygen content was varied from 0% to 4%. The oxygen radical density
was measured by vacuum UV absorption spectrometry. When the second gas discharge section
22 was provided, the oxygen radical density was found to be 3×10
14/cm
3 to 7×10
14/cm
3. When the apparatus having no second gas discharge section 22 was employed, the oxygen
radical density was found to be 3×10
14/cm
3 to 2.4×10
15/cm
3. Therefore, provision of the second gas discharge section 22 does not considerably
impair the effect of hydrophilicization. The electron density in the plasma-generating
zone P was found to be 2×10
16/cm
3, when the oxygen content was 3% and the gas flow rate was 3 Liter/min.
Embodiment 2
[0021] With reference to FIG. 4, a second embodiment of the apparatus of the present invention
will next be described. In Embodiment 2, the second gas discharge section 22 of Embodiment
1 was changed to a second discharge section which consists of an oblique gas discharge
section 27 including holes 26 that are oblique with respect to the y-axis, and an
upright gas discharge section 25 that is disposed upright along the Y-axis. Other
members were the same as those employed in Embodiment 1. The oblique gas discharge
section 27 had an oblique angle (with respect to the Y-axis) of 10°. The oblique angle
is preferably 3° to 30°, more preferably 5° to 20°. In other words, preferably, the
lower opening of a hole 23 cannot be seen from the lower opening of a hole 24; i.e.,
the two openings are not on the same axis. The projection length of the oblique gas
discharge section with respect to the Y-axis is 12 mm, and the upright gas discharge
section 25 has a length of 4 mm. Through this configuration, electrons can be reliably
absorbed by the walls of the holes in the gas discharge section 20, and only radicals
can be emitted through the tips of the holes 24. When a treatment object was irradiated
with plasma for hydrophlicization by means of the apparatus of Embodiment 2, the surface
of the object exhibited a contact angle of 9.5°, which is slightly larger than that
obtained by the apparatus of Embodiment 1. However, electric discharge to the treatment
object was thoroughly prevented. By provision of the oblique gas discharge section
27, the plasma-generating zone P cannot be visually identified through the openings
of the holes 24. Thus, UV rays generated in the plasma-generating zone P are intercepted
by the walls of the holes 26, whereby the treatment object is not irradiated with
UV rays. As a result, the treatment subject was prevented from damaging by UV rays.
[0022] In the aforementioned Embodiments, a plurality of said plasma generators may be provided
along the longitudinal direction (x-axis direction) or in parallel to the x-axis,
whereby an object having a wide area can be treated. When n units of plasma generators
are provided along the x-axis direction, an object can be treated in a width of 4n
cm (in the above Embodiments). In this case, through conveying the treatment object
along the axis normal to the X-axis and Y-axis, a wider area of the object can be
treated. When a plurality of plasma generators are provided in parallel to the x-axis,
through conveying the treatment object along the axis normal to the X-axis and Y-axis,
thorough plasma irradiation can be performed. The holes 23, 24, and 26 have a cross-section
normal to the gas flow direction, which cross-section is a circle or an oval, or a
rectangle or slit-like pattern having a longitudinal axis normal to the x-axis and
y-axis (an axis normal to the sheet of each drawing) in FIG. 1 or 4.
[0023] In the above Embodiments, when the cross-section of the plasma-generating zone P
normal to the x-axis is a rectangle, a side thereof preferably has a length of 2 mm
to 5 mm, and the cross-section preferably has an area of 3 mm
2 to 25 mm
2.
Industrial Applicability
[0024] The apparatus of the present invention can allow an object to be irradiated with
linear plasma for the surface treatment of the object. Description of Reference Numerals
[0025]
100: Plasma generator
10: Casing
12: Gas intake section
P: Plasma-generating zone
16: Guide portion
18: Diffusion section
23, 25, 26: hole
20: Diffusion section
21: First diffusion section
22: Second diffusion section
27: Oblique gas discharge section
24: Straight gas discharge section
1. An atmospheric plasma generator
characterized in that: the atmospheric plasma generator comprises:
a longitudinally extending casing which is made of an insulator and which defines
a columnar plasma-generating zone;
a gas intake section for supplying a plasma-generating gas to the plasma-generating
zone in a direction normal to the longitudinal direction of the plasma-generating
zone so as to attain a uniform gas distribution, in the longitudinal direction, over
the plasma-generating zone;
a pair of electrodes disposed in the plasma-generating zone with a spacing in the
longitudinal direction of the plasma-generating zone; and
a gas discharge section for discharging the plasma generated in the plasma-generating
zone, which section is connected to the plasma-generating zone, which section is disposed
along the longitudinal direction of the plasma-generating zone, and which section
comprises a number of elongate holes that extend in the direction of the flow of the
generated gas-form plasma.
2. A plasma generator according to claim 1, wherein the gas intake section has a diffusion
section for supplying the plasma-generating gas over the plasma-generating zone uniformly
in the longitudinal direction, the diffusion section having a number of guide portions
for guiding the plasma-generating gas in a direction normal to the longitudinal direction
of the plasma-generating zone.
3. A plasma generator according to claim 1 or 2, wherein said holes of the gas discharge
section have such a length that no electric discharge occurs with respect to an object
to be irradiated with plasma.
4. A plasma generator according to any one of claims 1 to 3, wherein said holes of the
gas discharge section have a tip having a diameter of 0.1 mm to 1 mm.
5. A plasma generator according to any one of claims 1 to 4, wherein said holes of the
gas discharge section have a length which is 1/2 times or more the distance between
said pair of electrodes.
6. A plasma generator according to any one of claims 1 to 5, wherein said holes of the
gas discharge section have an oblique portion which is oblique with respect to a direction
normal to the longitudinal direction.
7. A plasma generator according to any one of claims 1 to 6, wherein said pair of electrodes
are disposed with a spacing of 1 cm to 50 cm.
8. A plasma generator according to any one of claims 1 to 7, wherein at least one electrode
of said pair of electrodes is provided with hollow portions on a surface thereof which
face the other electrode.
9. A plasma generator according to any one of claims 1 to 8, wherein the longitudinal
length L (cm) of the columnar plasma-generating zone and the cross-sectional area
σ (mm
2) normal to the longitudinal direction satisfy the following relationships:
2 ≤ Lσ ≤ 200 and 3 ≤ σ ≤ 25.
10. A plasma generator according to any one of claims 1 to 9, wherein said holes of the
gas discharge section has a cross-section normal to a direction of gas flow, the cross-section
being at least one selected from a group consisting of a circle, an oval, and a rectangle
or a slit-like pattern having a longer side normal to the line of arrangement of the
holes.