(19)
(11) EP 2 267 526 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
16.01.2013 Bulletin 2013/03

(43) Date of publication A2:
29.12.2010 Bulletin 2010/52

(21) Application number: 10166659.2

(22) Date of filing: 21.06.2010
(51) International Patent Classification (IPC): 
G03F 1/14(0000.00)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR
Designated Extension States:
BA ME RS

(30) Priority: 24.06.2009 JP 2009149776

(71) Applicants:
  • Shin-Etsu Chemical Co., Ltd.
    Tokyo (JP)
  • Intel Corporation (INTEL)
    Santa Clara, CA 95052 (US)

(72) Inventors:
  • Shirasaki, Toru
    Gunmy (JP)
  • Mushell, David
    Santa Clara, CA 95052 (US)
  • Chakravorty, Kishore
    Santa Clara, CA 95052 (US)
  • Ng, Grace
    Santa Clara, CA 95052 (US)

(74) Representative: Vossius & Partner 
Siebertstrasse 4
81675 München
81675 München (DE)

   


(54) Pellicle frame and lithographic pellicle


(57) A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section are parallel to each other and each of side edges of the basic quadrilateral has one quadrilateral recess. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.







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