(19)
(11) EP 2 281 296 A2

(12)

(88) Date of publication A3:
10.12.2009

(43) Date of publication:
09.02.2011 Bulletin 2011/06

(21) Application number: 09732178.0

(22) Date of filing: 15.04.2009
(51) International Patent Classification (IPC): 
H01J 37/317(2006.01)
(86) International application number:
PCT/EP2009/054468
(87) International publication number:
WO 2009/127659 (22.10.2009 Gazette 2009/43)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR
Designated Extension States:
AL BA RS

(30) Priority: 15.04.2008 US 45243

(71) Applicant: Mapper Lithography IP B.V.
2628 XK Delft (NL)

(72) Inventors:
  • WIELAND, Jan Jaco
    NL-2612 GD (NL)
  • VAN VEEN, Alexander Hendrik Vincent
    NL-3039 ER Rotterdam (NL)

(74) Representative: Mooij, Maarten 
Howrey LLP Rembrandt Tower Amsterplein 1 31st Floor
1096 HA Amsterdam
1096 HA Amsterdam (NL)

   


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