Gantry stage orthogonality error measurement method and error compensation method

(19)

(11)

EP 2 299 237 A3

(12)	EUROPEAN PATENT APPLICATION

(88)	Date of publication A3:
	30.03.2011 Bulletin 2011/13

(43)	Date of publication A2:
	23.03.2011 Bulletin 2011/12

(21)	Application number: 10009314.5

(22)	Date of filing: 08.09.2010

(51)

International Patent Classification (IPC):

G01B 21/04^(2006.01)

H01L 21/68^(2006.01)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR
	Designated Extension States:
	BA ME RS

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Priority:

14.09.2009 KR 20090086527

(71)	Applicant: Soonhan Engineering Corp.
	Jungwon-Gu Sungnam-City Kyungki do 482-806 (KR)

(72)	Inventor:
	Ko, Byoung gwan Songpa-gu, Seoul 138-863 (KR)

(74)	Representative: Hofmann, Ernst
	Dr. Johannes Heidenhain GmbH, Patentabteilung, Postfach 12 60 83292 Traunreut 83292 Traunreut (DE)

(54)	Gantry stage orthogonality error measurement method and error compensation method

(57) The present invention relates to a Gantry stage orthogonality error measurement method and error compensation method for homing processing: more specifically, it relates to a Gantry stage orthogonality error measurement method and error compensation method for homing processing with an enhanced level of homing processing repeatability and a capability for minimizing orthogonality errors at the time of Gantry stage homing processing used with semiconductors, FPD equipment or precision machining equipment (Fig. 4).

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