HIGH INTENSITY X-RAY BEAM SYSTEM

Description

BACKGROUND

[0001] The present invention relates to x-ray optical systems.

[0002] Researchers have long employed focusing x-ray optics in x-ray diffraction experiments to increase the flux incident on a sample and to thereby increase the signal to noise ratio. A focusing optic increases the flux through a sample by directing a large number of photons from a source. Moreover, by positioning a detector near or at the focus of the optic, resolution of the system can be greatly improved.

[0003] The intensity of conventional x-ray beam systems, however, is limited by the brilliance of the source that can be achieved without damaging the source target. Although a large optic, such as an ellipsoidal optic or a parabolic optic with a large capture angle, can deliver high flux, the cross section of the x-ray beam and divergence tends to be too large to be fully utilized. Improving the performance of an x-ray beam system by increasing the brilliance of the source is typically limited or too costly.

[0004] JP 7 235472 A discloses a high performance illuminator in which the intensity in an arcuate illuminating area is sustained substantially constant regardless of the illuminating position while improving the illumination efficiency significantly, and an aligner equipped with the illuminator. Therefore, the illuminator of JP 7 235472 comprises a reflector that is formed by revolving a section of a parabola about an axis that is perpendicular to the symmetric axis of the parabola.

[0005] US Patent US 3,982,824 discloses different species of catoptric lens arrangements, each one of the disclosed species being characterized by use of a quadratic conic mirror having real or virtual focal points displaced from a lens axis. With a quadratic conic mirror having such a characteristic, the image points of axial, or paraxial, rays are similarly displaced so that aperture blockage may be eliminated and achromatic aberrations may be reduced to such an extent as to make the lens arrangement diffraction limited. The system of US Patent US 3,982,824 comprises at least two reflective surfaces. Especially, many of the embodiments of US Patent US 3,982,824 show a reflective surface formed by revolving an elliptical contour about a revolving axis intersecting the symmetric axis at the first focus of the contour, wherein the source is located in the first focus. According to another embodiment the revolving axis does not pass through either focus of the elliptical contour.

[0006] In view of the above there is a need for an improved x-ray optical system that produces high-intensity x-ray beams.

SUMMARY

[0007] In satisfying the above need, as well as overcoming the enumerated drawbacks and other limitations of the related art, the present invention provides an x-ray optical system according to claim 1 or 2 for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic and a source that has a circular emission profile.

[0008] The axis can be a beam axis, the cord of geometric contour of the optic, or a line near the cord of the geometric contour. The optic can be a total reflection mirror or a reflector with performance enhancement coating such as a multilayer coating. The source can be a rotating anode or a sealed tube x-ray generator.

[0009] Further features and advantages will be apparent from the following description and from the claims.

BRIEF DESCRIPTION OF THE DRAWINGS

[0010] 

FIG. 1 is a schematic drawing of an x-ray optical system.

FIG. 2 is perspective view of an optic of the x-ray optical system of FIG. 1.

FIG. 3 is a schematic drawing of an elliptical x-ray optical system in accordance with the present invention.

FIG. 4 is a perspective view of a target for an x-ray point source.

FIG. 5 is a front view of a target for a circular rotating x-ray source.

FIG. 6 is a schematic view illustrating a range of revolving axis positions for the optic of FIG. 3.

FIG. 7 is a schematic view of an x-ray optical system illustrating a convex and concave optic.

FIG. 8 is a schematic view of a parabolic x-ray optical system illustrating an axis of rotation different than the geometric axis of the optic.

FIG. 9 is a schematic view of a multi energy or multi wavelength system.

DETAILED DESCRIPTION

[0011] The invention provides x-ray optical system that produces high intensity x-ray beams. FIG. 1 illustrates an x-ray optical system 10 including an x-ray source 12 and an optic 14. The x-ray source 12 can be a laboratory source, such as a high brilliance rotating anode, a sealed tube x-ray generator, or a microfocusing source. The optic 14 can be a reflector with a performance enhancement coating, such as a multilayer coating, a total reflection optic, or an x-ray reflective crystal.

[0012] In operation, the source 12 emits an x-ray beam 16 toward the optic 14. The optic 14 includes an optical surface 26 that directs the x-ray beam 16 onto a sample S, for example by focusing or collimating the x-ray beam 16. The optic 14 may serve to converge the x-ray beam 16 as it is directed onto the sample S thereby increasing the amount of flux provided to the sample S. The detector 18 may collect radiation 22 from the x-ray beam 16 that is transmitted and diffracted through the sample S. The detector 18 may provide a signal 24 to a processor 20 corresponding to the radiation 22 collected by the detector 18. The optic 14 has an elliptical or parabolic contour along the optical surface 26 in the direction of x-ray beam propagation.

[0013] The optical surface 26 is formed by revolving a defined contour around a revolving axis 30. Typically, the contour is revolved around the geometric symmetric axis of the contour. However, in Figure 1, the optical surface 26 is formed by rotating the contour around a revolving axis 30 that is different than the geometric symmetric axis of the contour. The revolving axis 30 is chosen to provide a beam with a small cross section. Such an axis can be the beam axis 32, a cord of the geometric contour, or a line near the cord of the geometric contour. In addition, the revolving axis is in plane with the geometric axis of the contour.

[0014] Since the geometric contour will be revolved about the revolving axis 30, the profile of the optical surface 26 will be circular in a cross-section perpendicular to the revolving axis. As such, the cross section will not be perpendicular to the geometric axis of the contour.

[0015] The optic 14 may have various geometric profiles longitudinally along the length of the optic 14, depending on the requirements of the particular application. In certain implementations, the optic 14 is a semi-circular concave multilayer focusing/collimating optic and the source 12 has a circular emission profile. In other implementations, the optic 14 is a full circular convex multilayer focusing/collimating optic. In yet other implementations, the optic surface is a total reflection surface produced, for example, by controlled pulling from a glass tubing or by replicating technology.

[0016] A particular feature of the system 10 is that it provides increased flux while maintaining the same beam divergence or convergence. As described above, optical surface 26 of the optic 14 is a 2D surface. This may also be referred to a 3D surface meaning the surface is in 3-dimensional space. The optical surface 26 can be described by its curvature in the "longitudinal" direction 28 and in the "cross" direction (which is perpendicular to Figure 1 and shown as 34 in Figure 2). The optical surface 26 along the longitudinal direction 22 is an elliptical or parabolic curve. The optical surface 26 in the cross direction 34 is formed by revolving the longitudinal curve about a revolving axis 30.

[0017] In conventional systems, if the revolving axis 30 is defined by two focuses of an elliptical curve, it is an ellipsoidal surface, or if the axis 30 is defined by the symmetric axis of a parabola, it is a parabolic surface. However, the surface 26 is formed by revolving the longitudinal curve (or contour) around an axis 30 that is equal or close to the intended beam axis 32. Thus, rather than producing a large ring with conventional ellipsoidal/paraboloidal surfaces, the optic 14 delivers a small ring, a semi-circular ring, or a round beam if the revolving axis 30 is the beam axis 32. The specific shape of the x-ray beam 16 depends on the relative relationship between the revolving axis 30 and the contour.

[0018] The optic 14 can have a concave surface, a convex surface, or a combination of a concave surface and a convex surface. If the optic 14 is concave surface, the surface many not be a fully closed surface (depending on where the revolving axis is). If the optic 14 is convex, a 2Π surface can be formed. The source 12 may have a circular or a partial circular profile. The diameter of the partial-circular source (or full circular source) profile depends on the optic design. If the optic is a combination of convex and concave, one part can be a 2Π surface while the other part may be a semi-circular Π surface.

[0019] A system 310 according to one aspect of the invention utilizing an optic 314 with an elliptical surface 326 is provided in Figure 3. In an elliptical system, the origin of the x-ray source 312 is located at one focus 340 of the ellipse 344 while the detector is generally located at or near the second focus 342 of the ellipse 344. The system has a revolving axis 330 different from the geometric axis 350. The revolving axis 330 passes the second focal point Typical systems use an optic with a surface that is rotated about the geometric symmetric axis 350 of the contour. (The revolving axis 330 is the same as the geometric axis 350). In the case of an elliptical surface 326, the geometric symmetric axis 350 passes between the two focuses 340, 342. This geometry works particularly well with an x-ray source that emulates a point source.

[0020] However, point sources are limited in the amount of power per unit area that can be generated. This is further illustrated in Figure 4. A typical x-ray point source 410 generates a line 412 on a target 414 that is then viewed at a very shallow angle 418 that may appear as a point source 416. However, to increase the brilliance of the source, more energy must be projected into the area. Since the tolerable heat generated by the electrons projected on the target 414 is limited, it is useful to generate an optical system that can use a large area than a point source. For example, an x-ray source with a circular emission profile may be used to maintain a brilliance not much lower than a point source, but can be loaded with much higher power due to the larger area.

[0021] As shown in Figure 5, a circular x-ray source may be developed by projecting accelerated electrons 510 onto a rotating anode target 512 with a semicircular profile 514. In this scenario, the x-ray source and the optic will need to be designed as a matching pair based on the particular configuration. One embodiment, may include a partial-circular concave multilayer optic and a source with a partial circular emission profile. Another embodiment may include a full circular convex/concave multilayer focusing optic and a source with a circular emission profile. Yet another embodiment, may include either geometry of the sources or optic but utilizing a total reflection surface, which may be formed by controlled pulling from a glass tubing. It is also valid that such an optic would be able to take advantage of a large source provided that source size is large enough the perceived circular source is included within the large source.

[0022] Referring now to FIG. 6, there is shown a schematic relationship between the revolving axis and the resulting reflecting surface 602. In each case shown, the axis of rotation passes through the focus 606 and is aligned in plane with the geometric symmetric axis of the contour. If the axis of rotation is beyond the far edge of the reflecting surface 602 as shown by revolving axis 610, the reflecting surface 602 is a convex surface, and the cross section of the beam formed has a ring with a center hole. If the revolving axis rotation is at the far edge of the reflecting surface 602 as shown by revolving axis 612, the reflecting surface 602 is a convex surface, and the beam formed has a partial or full round cross section, depending on the revolving angle.

[0023] The reflecting surface 602 may be a combination of a concave surface and a convex surface, if the axis of rotation is between the near edge of the reflecting surface 602 and the far edge of the reflecting surface 602 as shown by revolving axis 614. The concave surface is at most a Π surface. The cross section of the beam is round if the revolving angle is Π. An illustration of the optic and x-ray beam projection is provided in Figure 7. The optic 710 has a convex portion 712 and a concave portion 714. To utilize the convex portion 712 of the optic 710, the x- ray source 716 must be a partial circle. This allows more flux to be directed to the sample without concentrating more energy into a small area of target on the x-ray source 716. A trace of the x-ray beam is denoted by reference numeral 718.

[0024] If the axis of rotation is at the near edge of the reflecting surface 602 as shown by axis of rotation 616, the reflecting surface 602 is a concave surface. The revolving angle is at most Π. As such, the beam has a semi-circular cross section. If the axis of rotation is between the source 604 and the near edge of the reflecting surface 602 as shown by axis 618, the reflecting surface is a concave surface. The beam has a cross section of a partial ring with an inner diameter that is smaller than that provided by the typical case shown by revolving axis 620. If the revolving axis 620 passes through the origin of the source 604 and the focus 606 as the reflecting surface is an ellipsoidal surface. The beam has a cross section of a ring or a part of a ring.

[0025] A system 810 according to the second aspect of the invention utilizing a parabolic surface is provided in Figure 8. In a parabolic system, the origin of the x-ray source 812 is located at the focus of the parabola 844. Typical parabolic systems use an optic 814 with a surface 826 that is revolved about the geometric axis 850 of the surface 826. However, in the system according to this embodiment of the invention, the revolving axis 830 is different than the geometric symmetric axis 850 of the surface 826. As discussed above, this serves to substantially increase the flux delivered to the sample in an efficient and effective manner if the axis 830 is between the axis 850 and the optic. Axis 830 is in parallel to axis 850.

[0026] In x-ray analysis, being able to deliver multiple wavelengths or energies onto a sample may be useful. As such, the x-ray source 12 may be optionally configured to deliver a beam of multiple wavelengths or multiple energy.

[0027] Alternatively, the circular shaped source may be further segmented into multiple sections of different target materials, as shown in Figure 9. For example, the target 910 has four sections 912, 914, 916, and 918 each made of a different material. Such a source-optic combination would deliver a beam of multiple wavelengths.

[0028] The optic 920 of a multiple wavelength system may be a total reflection optic in nature or a diffraction optic in nature, such as multilayer optics or crystal optics. If the reflection surface is in nature of the multilayer or crystal surfaces, the corresponding sections 922, 924, 926, and 928 for different energies will follow their Bragg's law governed contours and layer structures. In one example, the optic includes corresponding sections for different energies and each section follows Bragg's law with its own contour and coating structure which include layer thickness and variation of the layer thickness. In another example, each section has the same contour for each section but different coating structure for each section. In yet another example, each section of the optic has the same coating structure but different contours. In again another alternative example, the optic is a crystal optic with different sections, each of them has its own contour and crystal structure so that Bragg's law can be satisfied for its energy.

Claims

1. An x-ray optical system (310) comprising:

a source (312) that emits an x-ray beam (316); and

an optic (314) that receives and reflects the beam (316), the optic (314) having an optical reflecting surface (326), the optical reflecting surface (326) being defined by revolving an elliptical contour around a revolving axis (330) that is different than the geometric symmetric axis (350) of said elliptical contour, wherein the elliptical contour comprising a first and second focus (340;342) and the geometric symmetric axis (350) of the elliptical contour passing between the two focuses (340;342), wherein said revolving axis (30;330) passing through the second focus (342) of the elliptical contour and characterized in that the source being located at the first focus (340).

2. An x-ray optical system (810) comprising:

a source (812) that emits an x-ray beam, the source (812) comprising an origin; and

an optic (814) that receives and reflects the beam, the optic (814) having an optical reflecting surface (826), the optical reflecting surface being defined by revolving a parabolic contour around a revolving axis that is different than the geometric symmetric axis of said parabolic contour, said revolving axis being parallel to the geometric symmetric axis, wherein the parabolic contour comprising a focus and characterised in that the origin of the source (812) being located at the focus of the parabolic contour.

3. The system of claim 1 or 2, wherein the system comprises a sample (S) and, wherein the optic (314;814) is arranged for directing the beam (316) toward the sample (S), and the system (310;810) further comprising a detector arranged for characterizing the sample (S).

4. The system of claim 1 or 2, wherein the source (312;812) has at least a partial circular emission profile.

5. The system of claim 4, wherein the source (312;812) has a full circular emission profile.

6. The system of claim 1 or 2, wherein the reflecting surface (326;826) is a concave surface.

7. The system of claim 6, wherein the source (312;812) has an emission profile with an at least partial circular cross section.

8. The system of claim 1 or 2, wherein the reflecting surface (326;826) is a convex surface.

9. The system of claim 8, wherein the source (312;812) has an emission profile with a circular cross section.

10. The system of claim 8, wherein the source (312;812) has an emission profile with an at least partial circular cross section.

11. The system of claim 1 or 2, wherein the reflecting surface (326;826) includes a convex portion and a concave portion.

12. The system of claim 1 or 2, wherein the source (312;812) is a rotating anode.

13. The system of claim 1 or 2, wherein the source (312;812) is a sealed tube x-ray generator.

14. The system of claim 1 or 2, wherein the source (312;812) is a microfocusing source.

15. The system of claim 1 or 2, wherein the optic (314;814) is a total reflection optic.

16. The system of claim 1 or 2, wherein the optic (314;814) is a multilayer optic.

17. The system of claim 1 or 2, wherein the optic (314;814) is a reflective crystal.

18. The system of claim 1 or 2, wherein the x-ray source (312;812) is segmented into multiple sections of different target materials.

19. The system of claim 18, wherein the optic (314;814) is a total reflection optic with corresponding sections for different energies.

20. The system of claim 18, wherein the optic (314;814) is a multilayer optic with corresponding sections for different energies, each section follows Bragg's law with its own contour and coating structure which include coating material combinations, layer thickness and variation of the layer thickness.

21. The system of claim 20, wherein the optic (314;814) has the same contour for different sections but different coating structure.

22. The system of claim 20, wherein the optic (314;814) has the same coating structure but different contours.

23. The system of claim 18, wherein the optic (314;814) is a crystal optic with different sections, each of them has its own contour and crystal structure so that Bragg's law can be satisfied for its energy.

24. A method for analyzing a sample (S) using a system (310;810) according to one of the foregoing claims including:

generating an x-ray beam (316);

directing the x-ray beam (316) to the sample (S) using said optic (314;814) with said reflecting surface (326;826);

detecting the x-rays from the sample (S); and

generating an electrical signal corresponding to the x-rays detected.

Ansprüche

1. Röntgenoptisches System (310), welches aufweist:

eine Quelle (312), die einen Röntgenstrahl (316) emittiert, und

eine Optik (314), die den Strahl (316) empfängt und reflektiert, wobei die Optik (314) eine optisch reflektierende Fläche (326) aufweist, wobei die optisch reflektierende Fläche (326) durch Drehen einer elliptischen Kontur um eine Drehachse (330), die von der geometrischen Symmetrieachse (350) der elliptischen Kontur verschieden ist, definiert ist, wobei die elliptische Kontur einen ersten und einen zweiten Fokus (340, 342) aufweist und die geometrische Symmetrieachse (350) der elliptischen Kontur zwischen den beiden Foki (340, 342) hindurchläuft, wobei die Drehachse (30, 330) durch den zweiten Fokus (342) der elliptischen Kontur hindurchläuft,

dadurch gekennzeichnet, dass

sich die Quelle am ersten Fokus (340) befindet.

2. Röntgenoptisches System (810), welches aufweist:

eine Quelle (812), die einen Röntgenstrahl emittiert, wobei die Quelle (812) einen Ursprung aufweist, und

eine Optik (814), die den Strahl empfängt und reflektiert, wobei die Optik (814) eine optisch reflektierende Fläche (826) aufweist, wobei die optisch reflektierende Fläche durch Drehen einer parabolischen Kontur um eine Drehachse, die von der geometrischen Symmetrieachse der parabolischen Kontur verschieden ist, definiert ist, wobei die Drehachse zu der geometrischen Symmetrieachse parallel ist, wobei die parabolische Kontur einen Fokus aufweist,

dadurch gekennzeichnet, dass

sich der Ursprung der Quelle (812) am Fokus der parabolischen Kontur befindet.

3. System nach Anspruch 1 oder 2, wobei das System eine Probe (S) aufweist und wobei die Optik (314, 814) dafür eingerichtet ist, den Strahl (316) auf die Probe (S) zu richten, und wobei das System (310, 810) ferner einen Detektor aufweist, der dafür eingerichtet ist, die Probe (S) zu kennzeichnen.

4. System nach Anspruch 1 oder 2, wobei die Quelle (312, 812) mindestens ein teilweise kreisförmiges Emissionsprofil hat.

5. System nach Anspruch 4, wobei die Quelle (312, 812) ein vollständig kreisförmiges Emissionsprofil hat.

6. System nach Anspruch 1 oder 2, wobei die reflektierende Fläche (326, 826) eine konkave Fläche ist.

7. System nach Anspruch 6, wobei die Quelle (312, 812) ein Emissionsprofil mit einem zumindest teilweise kreisförmigen Querschnitt hat.

8. System nach Anspruch 1 oder 2, wobei die reflektierende Fläche (326, 826) eine konvexe Fläche ist.

9. System nach Anspruch 8, wobei die Quelle (312, 812) ein Emissionsprofil mit einem kreisförmigen Querschnitt hat.

10. System nach Anspruch 8, wobei die Quelle (312, 812) ein Emissionsprofil mit einem zumindest teilweise kreisförmigen Querschnitt hat.

11. System nach Anspruch 1 oder 2, wobei die reflektierende Fläche (326, 826) einen konvexen Abschnitt und einen konkaven Abschnitt aufweist.

12. System nach Anspruch 1 oder 2, wobei die Quelle (312, 812) eine rotierende Anode ist.

13. System nach Anspruch 1 oder 2, wobei die Quelle (312, 812) ein Röntgenstrahlgenerator mit einer gedichteten Röhre ist.

14. System nach Anspruch 1 oder 2, wobei die Quelle (312, 812) eine mikrofokussierende Quelle ist.

15. System nach Anspruch 1 oder 2, wobei die Optik (314, 814) eine total reflektierende Optik ist.

16. System nach Anspruch 1 oder 2, wobei die Optik (314, 814) eine Mehrschichtoptik ist.

17. System nach Anspruch 1 oder 2, wobei die Optik (314, 814) ein reflektierender Kristall ist.

18. System nach Anspruch 1 oder 2, wobei die Röntgenquelle (312, 812) in mehrere Abschnitte verschiedener Targetmaterialien segmentiert ist.

19. System nach Anspruch 18, wobei die Optik (314, 814) eine total reflektierende Optik mit entsprechenden Abschnitten für verschiedene Energien ist.

20. System nach Anspruch 18, wobei die Optik (314, 814) eine Mehrschichtoptik mit entsprechenden Abschnitten für verschiedene Energien ist, wobei jeder Abschnitt mit seiner eigenen Kontur und Beschichtungsstruktur, welche Beschichtungsmaterialkombinationen, Schichtdicken und die Variation der Schichtdicke einschließt, dem Braggschen Gesetz folgt.

21. System nach Anspruch 20, wobei die Optik (314, 814) für verschiedene Abschnitte die gleiche Kontur, jedoch eine unterschiedliche Beschichtungsstruktur hat.

22. System nach Anspruch 20, wobei die Optik (314, 814) die gleiche Beschichtungsstruktur, jedoch unterschiedliche Konturen hat.

23. System nach Anspruch 18, wobei die Optik (314, 814) eine Kristalloptik mit verschiedenen Abschnitten ist, wobei jeder von ihnen seine eigene Kontur und Kristallstruktur aufweist, so dass das Braggsche Gesetz für seine Energie erfüllt werden kann.

24. Verfahren zum Analysieren einer Probe (S) unter Verwendung eines Systems (310, 810) nach einem der vorhergehenden Ansprüche mit folgenden Schritten:

Erzeugen eines Röntgenstrahls (316),

Richten des Röntgenstrahls (316) auf die Probe (S) unter Verwendung der Optik (314, 814) mit der reflektierenden Fläche (326, 826),

Detektieren der Röntgenstrahlen von der Probe (S) und

Erzeugen eines elektrischen Signals, das den detektierten Röntgenstrahlen entspricht.

Revendications

1. Système optique à rayons X (310) comprenant :

une source (312) qui émet un faisceau de rayons X (316) ; et

une optique (314) qui reçoit et réfléchit le faisceau (316), l'optique (314) ayant une surface réfléchissante optique (326), la surface réfléchissante optique (326) étant définie par rotation d'un contour elliptique autour d'un axe de rotation (330) qui est différent de l'axe de géométrie symétrique (350) dudit contour elliptique, dans lequel le contour elliptique comprend un premier et un second foyers (340 ; 342) et l'axe de géométrie symétrique (350) du contour elliptique passe entre les deux foyers (340 ; 342), dans lequel ledit axe de rotation (30 ; 330) passe par le second foyer (342) du contour elliptique et caractérisé en ce que la source est située sur le premier foyer (340).

2. Système optique à rayons X (810) comprenant :

une source (812) qui émet un faisceau de rayons X, la source (812) comprenant une origine ; et

une optique (814) qui reçoit et réfléchit le faisceau, l'optique (814) ayant une surface réfléchissante optique (826), la surface réfléchissante optique étant définie par rotation d'un contour parabolique autour d'un axe de rotation qui est différent de l'axe de géométrie symétrique dudit contour parabolique, ledit axe de rotation étant parallèle à l'axe de géométrie symétrique, dans lequel ledit contour parabolique comprend un foyer et caractérisé en ce que l'origine de la source (812) est située sur le foyer du contour parabolique.

3. Système selon la revendication 1 ou 2, dans lequel le système comprend un échantillon (S) et dans lequel l'optique (314 ; 814) est disposée pour diriger le faisceau (316) vers l'échantillon (S), et le système (310 ; 810) comprenant en outre un détecteur disposé pour caractériser l'échantillon (S).

4. Système selon la revendication 1 ou 2, dans lequel la source (312 ; 812) présente au moins un profil d'émission partiellement circulaire.

5. Système selon la revendication 4, dans lequel la source (312 ; 812) présente un profil d'émission totalement circulaire.

6. Système selon la revendication 1 ou 2, dans lequel la source réfléchissante (326 ; 826) est une surface concave.

7. Système selon la revendication 6, dans lequel la source (312 ; 812) présente un profil d'émission avec une section transversale au moins partiellement circulaire.

8. Système selon la revendication 1 ou 2, dans lequel la source réfléchissante (326 ; 826) est une surface convexe.

9. Système selon la revendication 8, dans lequel la source (312 ; 812) présente un profil d'émission avec une section transversale circulaire.

10. Système selon la revendication 8, dans lequel la source (312 ; 812) présente un profil d'émission avec une section transversale au moins partiellement circulaire.

11. Système selon la revendication 1 ou 2, dans lequel la source réfléchissante (326 ; 826) comprend une partie convexe et une partie concave.

12. Système selon la revendication 1 ou 2, dans lequel la source (312 ; 812) est une anode rotative.

13. Système selon la revendication 1 ou 2, dans lequel la source (312 ; 812) est un générateur de rayons X à tube scellé.

14. Système selon la revendication 1 ou 2, dans lequel la source (312 ; 812) est une source à microfoyer.

15. Système selon la revendication 1 ou 2, dans lequel l'optique (314 ; 814) est une optique à réflexion totale.

16. Système selon la revendication 1 ou 2, dans lequel l'optique (314 ; 814) est une optique multicouche.

17. Système selon la revendication 1 ou 2, dans lequel l'optique (314 ; 814) est un cristal réfléchissant.

18. Système selon la revendication 1 ou 2, dans lequel la source de rayons X (312 ; 812) est segmentée en de multiples sections de différents matériaux cibles.

19. Système selon la revendication 18, dans lequel l'optique (314 ; 814) est une optique à réflexion totale avec des sections correspondantes pour différentes énergies.

20. Système selon la revendication 18, dans lequel l'optique (314 ; 814) est une optique multicouche avec des sections correspondantes pour différentes énergies, chaque section suivant la loi de Bragg avec son propre contour et sa propre structure de revêtement qui comprennent des combinaisons de matériaux de revêtement, une épaisseur de couche et une variation de l'épaisseur de couche.

21. Système selon la revendication 20, dans lequel l'optique (314 ; 814) présente le même contour pour différentes sections mais une structure de revêtement différente.

22. Système selon la revendication 20, dans lequel l'optique (314 ; 814) présente la même structure de revêtement mais différents contours.

23. Système selon la revendication 18, dans lequel l'optique (314 ; 814) est une optique à cristal avec différentes sections, chacune d'entre elles présentant son propre contour et sa propre structure de cristal de sorte que la loi de Bragg puisse être satisfaite pour son énergie.

24. Procédé d'analyse d'un échantillon (S) en utilisant un système (310 ; 810) selon l'une quelconque des revendications précédentes, comprenant les étapes suivantes :

la génération d'un faisceau de rayons X (316) ;

la direction du faisceau de rayons X (316) vers l'échantillon (S) en utilisant ladite optique (314 ; 814) avec ladite surface réfléchissante (326 ; 826) ;

la détection des rayons X à partir de l'échantillon (S) ; et

la génération d'un signal électrique correspondant aux rayons X détectés.

Drawing