(19)
(11) EP 2 391 591 A1

(12)

(43) Date of publication:
07.12.2011 Bulletin 2011/49

(21) Application number: 10767459.0

(22) Date of filing: 27.01.2010
(51) International Patent Classification (IPC): 
C04B 33/26(2006.01)
(86) International application number:
PCT/US2010/022173
(87) International publication number:
WO 2010/123602 (28.10.2010 Gazette 2010/43)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

(30) Priority: 28.01.2009 US 206139 P

(71) Applicants:
  • Applied Thin Films, Inc.
    Evanston, IL 60201 (US)
  • Sambasivan, Sankar
    Chicago, Illinois 60645 (US)
  • Kaul, Vikram Sharad
    Chicago, Illinois 60654 (US)
  • Chapman Jr., Francis Richard
    Mount Prospect, Illinois 60056 (US)
  • Donelan, Jeffrey William
    Highland Park, Illinois 60035 (US)

(72) Inventors:
  • SAMBASIVAN, Sankar
    Chicago, Illinois 60645 (US)
  • KAUL, Vikram Sharad
    Chicago, Illinois 60654 (US)
  • CHAPMAN JR., Francis Richard
    Mount Prospect, Illinois 60056 (US)
  • DONELAN, Jeffrey William
    Highland Park, Illinois 60035 (US)

(74) Representative: Hamer, Christopher K. 
Mathys & Squire LLP 120 Holborn
London EC1N 2SQ
London EC1N 2SQ (GB)

   


(54) HIGH TEMPERATURE STABLE AMORPHOUS SILICA-RICH ALUMINOSILICATES