(19)
(11) EP 2 396 809 A1

(12)

(43) Date of publication:
21.12.2011 Bulletin 2011/51

(21) Application number: 09840155.7

(22) Date of filing: 12.08.2009
(51) International Patent Classification (IPC): 
H01L 21/265(2006.01)
(86) International application number:
PCT/US2009/053520
(87) International publication number:
WO 2010/093380 (19.08.2010 Gazette 2010/33)
(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

(30) Priority: 11.02.2009 WO PCT/US2009/033754

(71) Applicant: Advanced Technology Materials, Inc.
Danbury, CT 06810-4169 (US)

(72) Inventors:
  • SWEENEY, Joseph, D.
    Winsted CT 06098 (US)
  • YEDAVE, Sharad, N.
    Danbury CT 06811 (US)
  • BYL, Oleg
    Southbury CT 06488 (US)
  • KAIM, Robert
    Brookline MA 02446 (US)
  • ELDRIDGE, David
    Liberty Hill TX 78642 (US)
  • FENG, Lin
    Orange CT 06477 (US)
  • BISHOP, Steven, E.
    Corrales NM 87048 (US)
  • OLANDER, W., Karl
    Indian Shores FL 33785 (US)
  • TANG, Ying
    Danbury CT 06811 (US)

(74) Representative: ABG Patentes, S.L. 
Avenida de Burgos 16D Edificio Euromor
28036 Madrid
28036 Madrid (ES)

   


(54) ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS