(19)
(11)
EP 2 399 272 A1
(12)
(43)
Date of publication:
28.12.2011
Bulletin 2011/52
(21)
Application number:
10708159.8
(22)
Date of filing:
22.02.2010
(51)
International Patent Classification (IPC):
H01J
37/16
(2006.01)
H01L
21/677
(2006.01)
H01J
37/317
(2006.01)
H01J
37/18
(2006.01)
H01L
21/00
(2006.01)
(86)
International application number:
PCT/EP2010/052218
(87)
International publication number:
WO 2010/094801
(
26.08.2010
Gazette 2010/34)
(84)
Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR
(30)
Priority:
22.02.2009
US 154415 P
23.12.2009
US 289407 P
19.02.2010
US 306333 P
(71)
Applicant:
Mapper Lithography IP B.V.
2628 XK Delft (NL)
(72)
Inventor:
BALTUSSEN, Sander
NL-4824 GB Breda (NL)
(74)
Representative:
Mooij, Maarten
Hoyng Monégier LLP Rembrandt Tower, 31st Floor Amstelplein 1
NL-1096 HA Amsterdam
NL-1096 HA Amsterdam (NL)
(54)
A METHOD AND ARRANGEMENT FOR REALIZING A VACUUM IN A VACUUM CHAMBER