HIGH-PURITY FLUORINE GAS, THE PRODUCTION AND USE THEREOF, AND A METHOD FOR MONITORING IMPURITIES IN A FLUORINE GAS - Patent 2488448

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EP 2 488 448 A1

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(43)	Date of publication:
	22.08.2012 Bulletin 2012/34

(21)	Application number: 10773873.4

(22)	Date of filing: 13.10.2010

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International Patent Classification (IPC):

C01B 7/20^(2006.01)

G01N 21/01^(2006.01)

(86)	International application number:
	PCT/EP2010/065334

(87)	International publication number:
	WO 2011/045338 (21.04.2011 Gazette 2011/16)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

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Priority:

16.10.2009 EP 09173332

(71)	Applicant: Solvay Fluor und Derivate GmbH
	30173 Hannover (DE)

(72)	Inventors:
	PERNICE, Holger 28790 Schwanewede (DE) EICHER, Johannes 31319 Sehnde (DE) FEYS, Francis 30173 Hannover (DE) BALTHASART, Dominique B-1120 Brussels (BE) SOMMER, Christoph 74172 Neckarsulm (DE) KRUEGER, Harald 74206 Bad Wimpfen (DE)

(74)	Representative: Mross, Stefan P.M. et al
	Solvay S.A. Departement Propriété Industrielle 310, rue de Ransbeek 1120 Bruxelles 1120 Bruxelles (BE)

(54)	HIGH-PURITY FLUORINE GAS, THE PRODUCTION AND USE THEREOF, AND A METHOD FOR MONITORING IMPURITIES IN A FLUORINE GAS