| (19) |
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(11) |
EP 2 508 428 A8 |
| (12) |
CORRECTED EUROPEAN PATENT APPLICATION |
|
Note: Bibliography reflects the latest situation |
| (15) |
Correction information: |
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Corrected version no 1 (W1 A1) |
| (48) |
Corrigendum issued on: |
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02.01.2013 Bulletin 2013/01 |
| (43) |
Date of publication: |
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10.10.2012 Bulletin 2012/41 |
| (22) |
Date of filing: 10.04.2012 |
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| (51) |
International Patent Classification (IPC):
|
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| (84) |
Designated Contracting States: |
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AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL
NO PL PT RO RS SE SI SK SM TR |
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Designated Extension States: |
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BA ME |
| (30) |
Priority: |
08.04.2011 IT TO20110323
|
| (71) |
Applicant: Thales Alenia Space Italia S.p.A. Con Unico Socio |
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Roma (IT) |
|
| (72) |
Inventors: |
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- Bresciani, Fulvio
10146 Torino (IT)
- Musso, Fabio
10146 Torino (IT)
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| (74) |
Representative: Jorio, Paolo et al |
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Studio Torta S.p.A.
Via Viotti, 9
10121 Torino
10121 Torino (IT) |
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| |
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| (54) |
Coarse and fine projective optical metrology system |
(57) Described herein is a projective optical metrology system including: a light target
(2) formed by a first number of light sources (4a-4c) having a pre-set spatial arrangement;
and an optical unit (6) including an optoelectronic image sensor (10), which receives
a light signal (R
1, R
2) coming from the light target (2) and defines two different optical paths for the
light signal towards the optoelectronic image sensor (10). The two optical paths are
such that the light signal forms on the optoelectronic image sensor at most an image
(I
1;I
2) of the light target that can be processed for determining at least one quantity
indicating the mutual arrangement between the light target and the optical unit.