(19)
(11) EP 2 511 911 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
13.11.2013 Bulletin 2013/46

(43) Date of publication A2:
17.10.2012 Bulletin 2012/42

(21) Application number: 12164090.8

(22) Date of filing: 13.04.2012
(51) International Patent Classification (IPC): 
G21K 1/06(2006.01)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME

(30) Priority: 15.04.2011 JP 2011090607

(71) Applicant: Hitachi High-Tech Science Corporation
Tokyo 105-0003 (JP)

(72) Inventors:
  • Nakagawa, Yoshitomo
    Chiba-shi, Chiba (JP)
  • Shirakawabe, Yoshiharu
    Chiba-shi, Chiba (JP)
  • Nakayama, Satoshi
    Chiba-shi, Chiba (JP)

(74) Representative: Miller Sturt Kenyon 
9 John Street
London WC1N 2ES
London WC1N 2ES (GB)

   


(54) Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer


(57) A diffraction grating (20) for an X-ray Talbot interferometer includes: a plurality of ridge-like X-ray absorbing portions (20b) made of a metal and formed on a substrate (22) along one direction at predetermined intervals; and a resin (26) interposed in a groove portion (20a) between neighboring X-ray absorbing portions of the plurality of ridge-like X-ray absorbing portions. The plurality of ridge-like X-ray absorbing portions are each formed of at least two unit metal layers (2b, 4b, and 6b) laminated perpendicularly to a surface of the substrate. The at least two unit metal layers are formed through cutting of a metal film.







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