(19)
(11) EP 2 511 912 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
06.11.2013 Bulletin 2013/45

(43) Date of publication A2:
17.10.2012 Bulletin 2012/42

(21) Application number: 12164092.4

(22) Date of filing: 13.04.2012
(51) International Patent Classification (IPC): 
G21K 1/06(2006.01)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated Extension States:
BA ME

(30) Priority: 15.04.2011 JP 2011090606

(71) Applicant: Hitachi High-Tech Science Corporation
Tokyo 105-0003 (JP)

(72) Inventors:
  • Nakagawa, Yoshitomo
    Chiba-shi, Chiba (JP)
  • Shirakawabe, Yoshiharu
    Chiba-shi, Chiba (JP)
  • Nakayama, Satoshi
    Chiba-shi, Chiba (JP)
  • Nagata, Atsushi
    Chiba-shi, Chiba (JP)
  • Umemoto, Takeshi
    Chiba-shi, Chiba (JP)
  • Watanabe, Mayu
    Chiba-shi, Chiba (JP)

(74) Representative: Miller Sturt Kenyon 
9 John Street
London WC1N 2ES
London WC1N 2ES (GB)

   


(54) Diffraction grating for X-ray Talbot interferometer, method of manufacturing the same, and X-ray Talbot interferometer


(57) Provided are a diffraction grating for an X-ray Talbot interferometer, a method of manufacturing the same, and an X-ray Talbot interferometer, the method enabling easy and highly accurate manufacturing of a diffraction grating having grooves with a high aspect ratio. The diffraction grating for an X-ray Talbot interferometer includes a plurality of ridge-like X-ray absorbing portions (20b) formed on a substrate (22) along one direction at predetermined intervals through cutting of a metal film.







Search report









Search report