LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION - Patent 2619629

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EP 2 619 629 A1

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(43)	Date of publication:
	31.07.2013 Bulletin 2013/31

(21)	Application number: 11761728.2

(22)	Date of filing: 20.09.2011

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International Patent Classification (IPC):

G03F 7/20^(2006.01)

F16F 15/04^(2006.01)

(86)	International application number:
	PCT/NL2011/050630

(87)	International publication number:
	WO 2012/039606 (29.03.2012 Gazette 2012/13)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

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Priority:

20.09.2010 US 384690 P
20.09.2010 NL 2005374

(71)	Applicant: Mapper Lithography IP B.V.
	2628 XK Delft (NL)

(72)	Inventor:
	PEIJSTER, Jerry NL-3738 VS Maartensdijk (NL)

(74)	Representative: Geurts, Franciscus Antonius
	Octrooibureau Vriesendorp & Gaade B.V. Dr. Kuyperstraat 6 2514 BB Den Haag 2514 BB Den Haag (NL)

(54)	LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION