(19)
(11) EP 2 646 602 A1

(12)

(43) Date of publication:
09.10.2013 Bulletin 2013/41

(21) Application number: 11731520.0

(22) Date of filing: 10.06.2011
(51) International Patent Classification (IPC): 
C25D 5/02(2006.01)
C25D 7/12(2006.01)
H01L 21/768(2006.01)
 C25D 7/00(2006.01)
G21K 1/06(2006.01)
(86) International application number:
PCT/JP2011/063989
(87) International publication number:
WO 2012/073545 (07.06.2012 Gazette 2012/23)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

(30) Priority: 29.11.2010 JP 2010265093

(71) Applicant: Canon Kabushiki Kaisha
Tokyo 146-8501 (JP)

(72) Inventors:
  • WANG, Shinan
    Tokyo 146-8501 (JP)
  • NAKAMURA, Takashi
    Tokyo 146-8501 (JP)
  • TESHIMA, Takayuki
    Tokyo 146-8501 (JP)
  • SETOMOTO, Yutaka
    Tokyo 146-8501 (JP)
  • WATANABE, Shinichiro
    Tokyo 146-8501 (JP)

(74) Representative: TBK 
Bavariaring 4-6
80336 München
80336 München (DE)

   


(54) METHOD OF MANUFACTURING AN X-RAY DIFFRACTION GRATING MICROSTRUCTURE FOR IMAGING APPARATUS