(19)
(11) EP 2 681 625 A1

(12)

(43) Date of publication:
08.01.2014 Bulletin 2014/02

(21) Application number: 11802413.2

(22) Date of filing: 21.12.2011
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)
G21K 1/06(2006.01)
(86) International application number:
PCT/EP2011/073537
(87) International publication number:
WO 2012/119672 (13.09.2012 Gazette 2012/37)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

(30) Priority: 04.03.2011 US 201161449381 P

(71) Applicant: ASML Netherlands BV
5504 DR Veldhoven (NL)

(72) Inventors:
  • BANINE, Vadim
    NL-5751 SB Deurne (NL)
  • LOOPSTRA, Erik
    NL-5613 ES Eindhoven (NL)
  • MOORS, Roel
    NL-5709 MT Helmond (NL)
  • VAN SCHOOT, Jan
    NL-5632 XN Eindhoven (NL)
  • SWINKELS, Gerardus
    NL-5623 LT Eindhoven (NL)
  • YAKUNIN, Andrei
    NL-5731 KA Mierlo (NL)
  • VAN DIJSSELDONK, Antonius
    NL-5527 BH Hapert (NL)
  • DE BOEIJ, Wilhelmus
    NL-5508 TL Veldhoven (NL)

(74) Representative: Siem, Max Yoe Shé 
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven
5500 AH Veldhoven (NL)

   


(54) LITHOGRAPIC APPARATUS, SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD