METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY - Patent 2681760

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EP 2 681 760 A2

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(88)	Date of publication A3:
	06.12.2012

(43)	Date of publication:
	08.01.2014 Bulletin 2014/02

(21)	Application number: 12751849.6

(22)	Date of filing: 15.02.2012

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International Patent Classification (IPC):

H01L 21/027^(2006.01)

G03F 1/36^(2012.01)

(86)	International application number:
	PCT/US2012/025149

(87)	International publication number:
	WO 2012/118616 (07.09.2012 Gazette 2012/36)

(84)	Designated Contracting States:
	AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

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Priority:

28.02.2011 US 201113037263
18.12.2011 US 201113329315
18.12.2011 US 201113329314

(71)	Applicant: D2S, Inc.
	San Jose, CA 95117 (US)

(72)	Inventors:
	FUJIMURA, Akira Saratoga, California 95070 (US) ZABLE, Harold Robert Palo Alto, California 94306 (US)

(74)	Representative: Williams, Lisa Estelle
	Haseltine Lake LLP Redcliff Quay 120 Redcliff Street Bristol BS1 6HU Bristol BS1 6HU (GB)

(54)	METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY