(19)
(11) EP 2 752 714 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
28.10.2015 Bulletin 2015/44

(45) Mention of the grant of the patent:
16.09.2015 Bulletin 2015/38

(21) Application number: 14163526.8

(22) Date of filing: 19.01.2007
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)

(54)

Exposure apparatus and exposure method

Belichtungsvorrichtung und Belichtungsverfahren

Appareil et procédé d'exposition

(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

(30) Priority: 19.01.2006 JP 2006011506
21.02.2006 JP 2006044599
31.08.2006 JP 2006236878

(43) Date of publication of application:
09.07.2014 Bulletin 2014/28

(60) Divisional application:
14191452.3 / 2857902
15178235.6

(62) Application number of the earlier application in accordance with Art. 76 EPC:
07707109.0 / 1983555

(73) Proprietor: Nikon Corporation
Tokyo 108-6290 (JP)

(72) Inventor:
  • Shibazaki, Yuichi
    Tokyo 108-6290 (JP)

(74) Representative: Hoffmann Eitle 
Patent- und Rechtsanwälte PartmbB Arabellastraße 30
81925 München
81925 München (DE)


(56) References cited: : 
EP-A2- 1 182 509
US-A1- 2005 029 981
 US-A1- 2004 240 513
US-B1- 6 260 282
   
  • DEY J: "PRECISION WAFER STEPPER UTILIZING A TWO-DIMENSIONAL OPTICAL ENCODER", PROCEEDINGS OF SPIE, S P I E - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, vol. 275, 1 January 1981 (1981-01-01), pages 29-34, XP009039090, ISSN: 0277-786X ISBN: 978-0-8194-9580-8
   
Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).