ATBECHDEDKESFRGBGRITLILUNLSEMCPTIESILTLVFIRO..CY..TRBGCZEEHUPLSK....IS..............................JJDIM360 Ver 1.28 (29 Oct 2014) - 2999001/02752714CORRECTED EUROPEAN PATENT SPECIFICATIONB8B120151028W172deBibliographieenBibliographyfrBibliographieEP14163526.82007011920140404enenen200601150620060119JP200604459920060221JP200623687820060831JP2015102820154420140709201428201509162015382015062220151028201544G03F 7/20 20060101AFI20140603BHEP deBelichtungsvorrichtung und BelichtungsverfahrenenExposure apparatus and exposure methodfrAppareil et procédé d'expositionEP-A2- 1 182 509US-A1- 2004 240 513US-A1- 2005 029 981US-B1- 6 260 282DEY J: "PRECISION WAFER STEPPER UTILIZING A TWO-DIMENSIONAL OPTICAL ENCODER", PROCEEDINGS OF SPIE, S P I E - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, vol. 275, 1 January 1981 (1981-01-01), pages 29-34, XP009039090, ISSN: 0277-786X ISBN: 978-0-8194-9580-807707109.019835552007011914191452.328579022014110315178235.620150724Shibazaki, Yuichic/o Nikon Corporation 15-3, Konan 2-chome Minato-ku,Tokyo 108-6290JPNikon Corporation101538193171 929 a/jme15-3, Konan 2-chome Minato-kuTokyo 108-6290JPHoffmann Eitle100061036Patent- und Rechtsanwälte PartmbB Arabellastraße 3081925 MünchenDEATBEBGCHCYCZDEDKEEESFIFRGBGRHUIEISITLILTLULVMCNLPLPTROSESISKTR20140709201428