(19)
(11) EP 2 760 791 A1

(12)

(43) Date of publication:
06.08.2014 Bulletin 2014/32

(21) Application number: 12835547.6

(22) Date of filing: 25.09.2012
(51) International Patent Classification (IPC): 
C01B 33/027(2006.01)
C01B 33/03(2006.01)
C23C 16/01(2006.01)
C01B 33/029(2006.01)
C01B 33/035(2006.01)
C23C 16/24(2006.01)
(86) International application number:
PCT/NO2012/050184
(87) International publication number:
WO 2013/048258 (04.04.2013 Gazette 2013/14)
(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

(30) Priority: 26.09.2011 NO 20111304

(71) Applicant: Dynatec Engineering AS
1814 Askim (NO)

(72) Inventors:
  • FILTVEDT, Werner O.
    1825 Tomter (NO)
  • FILTVEDT, Josef
    Tomter 1825 (NO)

(74) Representative: Protector IP Consultants AS 
Oscarsgate 20
0352 Oslo
0352 Oslo (NO)

   


(54) REACTOR AND METHOD FOR PRODUCTION OF SILICON BY CHEMICAL VAPOR DEPOSITION