(19)
(11)
EP 2 760 791 A1
(12)
(43)
Date of publication:
06.08.2014
Bulletin 2014/32
(21)
Application number:
12835547.6
(22)
Date of filing:
25.09.2012
(51)
International Patent Classification (IPC):
C01B
33/027
(2006.01)
C01B
33/03
(2006.01)
C23C
16/01
(2006.01)
C01B
33/029
(2006.01)
C01B
33/035
(2006.01)
C23C
16/24
(2006.01)
(86)
International application number:
PCT/NO2012/050184
(87)
International publication number:
WO 2013/048258
(
04.04.2013
Gazette 2013/14)
(84)
Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
(30)
Priority:
26.09.2011
NO 20111304
(71)
Applicant:
Dynatec Engineering AS
1814 Askim (NO)
(72)
Inventors:
FILTVEDT, Werner O.
1825 Tomter (NO)
FILTVEDT, Josef
Tomter 1825 (NO)
(74)
Representative:
Protector IP Consultants AS
Oscarsgate 20
0352 Oslo
0352 Oslo (NO)
(54)
REACTOR AND METHOD FOR PRODUCTION OF SILICON BY CHEMICAL VAPOR DEPOSITION