[0001] The present invention relates to an ElectroStatic Discharge(ESD) protection device,
especially an ESD protection device useful in the application of a high-speed transmission
system or the integration with common mode filters.
BACKGROUND
[0002] Recently, the downsizing and performance improvement of the electric devices are
under rapid development. Also, the improvement of the frequency on the transmission
speed and the lowering of driving voltage are remarkable, as seen in the high-speed
transmission systems such as USB 2.0, S-ATA2, HDMI or the like. On the contrary, with
the downsizing or the lowering of driving voltage of the electric devices, the breakdown
voltage of the electric components which are used in the electric devices is decreased.
In this respect, the protection of the electric components from overvoltage becomes
an important technical subject, for example, protecting the electric components against
the electrostatic pulses derived from the contact between the human body and the terminal
of an electric device.
[0003] In the past, in order to protect electric components from such electric pulse, a
method of providing a varistor between the ground and a line to be subjected to static
electricity has generally been used. As the signal frequency of the signal line is
being rapidly increased in recent years, the signal quality deteriorates when the
electrostatic capacitance of the ESD protection device is large. Thus, when the transmission
speed is up to several hundreds of Mbps or more, a protection device with a low electrostatic
capacitance (1 pF or less) is needed. In addition, an ESD protection device with a
large electrostatic capacitance cannot be used in an antenna circuit and an RF module.
[0004] It has been suggested that an ESD protection device with a discharge inducing section
filled between two separately and oppositely arranged electrodes can be used as an
ESD device with a low electrostatic capacitance. This device is arranged between the
ground and a line to be subjected to static electricity in the same way of a laminated
varistor. If a much too high voltage is applied, discharge will happen between the
oppositely arranged electrodes of the ESD protection device and then the static electricity
will be led to the ground side. Such ESD protection device of gap type possesses properties
such as a high insulation resistance, a low electrostatic capacitance and a good responsiveness.
[0005] In another respect, as an important property of the ESD protection device, the property
of electrostatic adsorption is also presented as a subject of the present invention.
If the discharging process occurs under a low voltage, it is necessary to restrain
the peak voltage during the discharging process. If the peak voltage cannot be suppressed
to a certain level, a device becoming the protection object may be destroyed. In this
respect, it is necessary to restrain the peak voltage to a low level. Further, the
durability issue related to repeated operations is presented here. The peak voltage
should still be restrained after a plurality of discharging processes. In order to
solve these technical problems, a circuit protection device, in which cavities are
disposed around the oppositely arranged electrodes, is disclosed.
Prior Art Document
Patent Document
SUMMARY
[0007] However, although the ESD protection device disclosed in Patent Document 1 can adsorb
the heat or stress generated in the discharging process by the hole portion which
is disposed above the two opposite electrodes, the discharge inducing section (the
ESD protection material) is only formed below the two opposite electrodes so that
stable discharges may not happen.
[0008] In the technology disclosed in Patent Document 2, an ESD protection material is provided
by filling composite particles between two oppositely disposed electrodes. In the
composite particles, the conductive particles have their surfaces covered by inorganic
glasses. Thus, it is not able to obtain an ESD protection device with high performance
which is applicable to the high-speed transmission systems. In addition, the heat
or stress derived from the discharge cannot be completely absorbed by small holes
formed among composite particles. Thus, breakage occurs around the electrodes and
fused materials are generated between electrodes. In this way, short-circuiting will
happen between electrodes due to the agglomeration of fused materials.
[0009] The ESD protection device disclosed in Patent Document 3 has such a structure that
the discharge inducing section are provided on the upper and lower surfaces of the
oppositely disposed electrodes and a hole is formed in the middle. In such a structure,
as the hole is quite long in width, stable discharges may not happen. When the conductive
substances on the surfaces of the discharge inducing section are melted, the short-circuiting
between electrodes may occur due to the agglomeration of fused materials.
[0010] In the ESD protection device disclosed in Patent Document 4, conductive powder form
auxiliary electrode are dispersed between the discharge electrodes which exposed to
the inside of the hole portion. This ESD protection device can adsorb the heat or
stress derived by discharge. However, the accessorial electrode materials may be destroyed
during the discharge.
[0011] From Patent Document 5 ESD protection devices with a void forming material horizontally
arranged between two electrodes are known.
[0012] From Patent Document 6 EDS protection devices with a polycrystalline material vertically
arranged between two electrodes are known.
[0013] In view of the problems mentioned above, the present invention aims to provide an
ESD protection device with a low electrostatic capacitance, an excellent electrostatic
adsorption property and an excellent durability. Also, such an ESD protection device
can inhibit the damage from the short-circuiting and heat resistance and climate resistance
as well as excellent productivity and economical efficiency.
[0014] In order to solve the technical problems mentioned above, the inventors provide a
discharge inducing section around two oppositely disposed electrodes as defined in
claim 1. This discharge inducing section consists of a conductive inorganic material
and an insulating inorganic material and has a structure in which microscopic voids
are dispersed. In addition, the discharge inducing section has a hollow space inside,
wherein the hollow space is in a direction that two oppositely disposed electrodes
are connected. Thus, an ESD protection device can be provided with a decreased short-circuiting
rate or a reduced peak voltage because it has a low electrostatic capacitance, an
excellent durability and can inhibit the damage from short-circuiting.
[0015] The hollow space is formed in a direction that the two oppositely disposed electrodes
are connected, and the length of the hollow space necessarily ranges from a level
that is half of the interval between two opposite electrodes to a level that is less
than the length of the discharge inducing section. In addition, the width of the hollow
space should be less than that of the discharge inducing section. In other words,
the hollow space has to be formed inside the discharge inducing section. On the plane
of the discharge inducing section where the hollow space is formed, a composite structure
has to be employed in which conductive substances are discontinuously dispersed in
the insulating material. With such a structure, the discharge occurs at the boundary
between the discharge inducing section and the hollow space. Further, when a static
voltage is applied, the plane formed with a hollow structure may be broken. However,
in the condition that such breakage happened, the plane has a dense structure so that
the drop off of the surface portion can be inhibited. In this way, after multiple
discharge, the electrostatic adsorption property can be maintained. In addition, when
excessive static voltage is applied, the discharge function can be maintained even
if part of the surface portion of the plane formed with a hollow structure is melted
during the discharge. This is because the inner side of this plane is exposed.
[0016] The discharge inducing section consists of a conductive inorganic material and an
insulating inorganic material. In the discharge inducing section, microscopic voids
are necessarily formed. The microscopic voids may adsorb the impact during the discharging
process and can inhibit damage derived from short-circuiting by absorbing fused materials
in the voids in the condition that the conductive particles are melted during the
discharge. Such an effect can be achieved if the size of the gap is set to be 0.1
to 2 times of the average particle size of the conductive particles.
[0017] The distance between two oppositely disposed electrodes can be appropriately set
as long as the desired discharging property is considered. Such a distance is usually
about 1 to 50 µm. This distance is preferably about 7 to 30 µm, in terms of decreasing
peak voltage.
[0018] After the measurements of performance of the ESD protection device mentioned above,
the inventors confirmed that this ESD protection device has excellent electrostatic
adsorption property, durability and peak voltage compared to the conventional ones.
The functions owned by an ESD protection device can be still maintain after multiple
discharge.
[0019] In the past, in such a gap type ESD protection device, discharge usually occurs in
a place between the opposite electrodes where discharge occurs easily. Thus, once
the discharge occurs, the next discharge will occur in the other. Thus, the discharging
property tends to fluctuate. In anther respect, the place for discharging will be
focused by providing a structure that a hollow space is formed in the discharge inducing
section along the direction that the opposite electrodes are connected. Accordingly,
the fluctuation of the discharging property will be decreased.
[0020] In conventional devices, if much excessive static voltage is applied and the discharge
inducing section is subject to arc discharge, conductive fused materials are formed
between opposite electrodes which occur short-circuiting between the opposite electrodes.
In another respect, microscopic voids are formed in the discharge inducing section
itself. Even if the discharge inducing section is melted due to the discharging process,
the fused materials can run into the microscopic voids so that the short-circuiting
between opposite electrodes due to the fused materials can be inhibited. In other
words, when the discharge happens at the boundary between the discharge inducing section
and the hollow space and fused materials are formed accordingly, let the fused materials
loose into the microscopic voids in the inner side of the discharge induction section
so that the short-circuiting at the discharging place can be inhibited. Further, as
the surface portion of the discharge inducing section at the boundary between the
discharge inducing section and the hollow space has a dense structure, damages can
be prevented which may be caused by the dropping off of the discharging place due
to the impact during the discharge. In this respect, especially the peak voltage can
be suppressed to a low level, and the functions owned by an ESD protection device
can be maintained after multiple discharge. A dense structure is used for the surface
portion of the discharge inducing section while the discharge inducing section is
porous with microscopic voids. Here, in order to provide the surface portion of the
discharge inducing section with a dense structure, glass is used so that the region
confined by the surface part has less voids. The ratio of the glass in the surface
portion of the discharge inducing section should be 20 vol% or more so as to form
such a structure.
[0021] The ESD protection device of the present invention possesses a substrate with a insulting
surface, electrodes separately and oppositely disposed on the insulating surface with
each other and a discharge inducing section which at least arranged between two electrodes,
wherein the discharge inducing section has a composite structure that conductive particles,
insulating particles and microscopic voids are dispersed therein. The discharge inducing
section has a hollow structure which has a hollow space in a direction that the opposite
electrodes are connected. An ESD protection device which has an excellent electrostatic
adsorption property and an excellent durability and can inhibit the damage derived
from short-circuiting or the peak voltage can be provided by forming a composite structure
with conductive substances of the surface portion of the discharge inducing section
discontinuously dispersed in the insulating materials and providing the surface portion
of the discharge inducing section (at the boundary between the discharge inducing
section and the hollow space) with a dense structure.
[0022] The other embodiments of the present invention involve composite electric components
integrated with the ESD protection device of the present invention, i.e., the composite
electric components have an inductance element in a magnetic substrate, which is integrated
with the ESD protection device. The inductance element has a conductor pattern in
the magnetic substrate. The ESD protection device has a structure having separately
and oppositely disposed electrodes in the insulating substrate integrated with the
magnetic substrate, and a functional layer with at least part of which disposed between
the electrodes.
[0023] Based on such a structure, the ESD protection device of the present invention has
a low electrostatic capacitance, a low rate of short-circuiting and an excellent durability.
Also, the ESD protection device can inhibit the damage derived from short-circuiting
or the peak voltage.
BRIEF DESCRIPTION OF THE DRAWINGS
[0024]
Figure 1 is a stereogram schematically showing the ESD protection device 100.
Figure 2 is a sectional view schematically showing the ESD protection device 100.
Figure 3 is a sectional view along the line II-II shown in Figure 2.
Figure 4 is a stereogram schematically showing the surface portion 32 of the discharge
inducing section.
Figure 5 is a sectional view along the line III-III shown in Figure 2.
Figure 6 is a stereogram schematically showing the preparation process of the ESD
protection device 100.
Figure 7 is a stereogram schematically showing the preparation process of the ESD
protection device 100.
Figure 8 is a stereogram schematically showing the preparation process of the ESD
protection device 100.
Figure 9 shows the circuit diagram in the ESD discharge test.
Figure 10 is a schematic sectional view showing a first modification.
Figure 11 is a schematic sectional view showing a second modification.
Figure 12 is a schematic sectional view showing a third modification.
DETAILED DESCRIPTION OF EMBODIMENTS
[0025] Hereinafter, the embodiments of the present invention will be described. The same
reference number is used for the same element, and the repeated descriptions will
be omitted. The positional relationship is based on the drawings unless otherwise
specified. In addition, the dimensional proportions are not limited to those shown
in the drawings. Although the following embodiments are used to describe the present
invention, the present invention is not limited to these embodiments.
(First Embodiment)
[0026] Figure 1 is a stereogram schematically showing the ESD protection device of the present
embodiment. Figure 2 is a sectional view schematically showing the ESD protection
device of the present embodiment. Figure 3 is a sectional view along the line II-II
shown in Figure 2.
[0027] The ESD protection device 100 comprises an insulating substrate 11, a pair of electrodes
21 and 22 disposed on the insulating substrate 11, a discharge inducing section 31
arranged between the electrodes 21 and 22, terminal electrodes 41 electrically connected
to the electrodes 21 and 22 (see Figure 8) and an insulating protection layer 51 which
covers the discharge inducing section 31. The discharge inducing section 31 has microscopic
voids discontinuously dispersed therein. Also, it has a hollow structure in which
one or more hollow space 31a and 31b are contained. Here, the pair of electrodes 21
and 22 is arranged that their front ends portion are exposed in these hollow space
31a and 31b. Further, in the ESD protection device 100, the discharge inducing section
31 functions as an ESD protection material which discharges at a low voltage. When
an overvoltage such as static electricity is applied, the initial discharge between
electrodes 21 and 22 can be ensured via the discharge inducing section 31 (hollow
space 31a and 31b). Hereinafter, each constituent element will be specifically described.
[0028] The size and shape of the insulating substrate 11 are not particularly restricted
as long as the insulating substrate can at least support the electrodes 21 and 22
and the discharge inducing section 31. Here, besides the substrate composed of an
insulating material, the insulating substrate 11 also contains the concept of a substrate
with an insulating film prepared on part or the whole surface.
[0029] The specific example of the insulating substrate 11 can be a ceramic substrate or
a single crystal substrate which uses materials with a low dielectric constant such
as Al
2O
3, SiO
2, MgO, AlN, Mg
2SiO
4 or the like with a dielectric constant being 50 or less, preferably 20 or less. In
addition, a substrate with an insulating film composed of materials with a low dielectric
constant (such as Al
2O
3, SiO
2, MgO, AlN, Mg
2SiO
4 or the like with a dielectric constant being 50 or less, preferably 20 or less) can
be appropriately used on the surface of the ceramic substrate or the single crystal
substrate. Then, for the insulating protection layer 51, a same substrate as the insulating
substrate 11 can be used. The repeated description will be omitted below.
[0030] On the insulating substrate 11, a pair of electrodes 21 and 22 is separately arranged.
In the present embodiment, the pair of electrodes 21 and 22 is separately disposed
with a gap distance ΔG in almost the middle portion of the flat plane of the insulating
substrate 11. Here, the gap distance ΔG refers to the shortest distance between electrodes
21 and 22. Further, ΔM refers to the major axis of the hollow space 31a and ΔL represents
the length of the discharge inducing section 31.
[0031] As for the material for electrodes 21 and 22, it can be at least one metal selected
from the group consisting of C, Ni, Al, Fe, Cu, Ti, Cr, Au, Ag, Pd and Pt or the alloy
thereof However, the material is not limited thereto. Also, in the present embodiment,
the electrodes 21 and 22 can be rectangular in shape when viewed from top. However,
this shape is not particularly restricted.
[0032] There is no particular restriction on the gap distance ΔG between the electrode 21
and 22, and the gap distance can be appropriately set based on the desired discharging
property. Specifically, the ΔG is usually about 1 to 50 µm and is preferably 7 to
30 µm from the perspective that the initial discharge voltage is low level. In addition,
the thickness of the electrodes 21 and 22 is not specifically restricted and generally
ranges from 1 to 20 µm.
[0033] The method for forming the electrodes 21 and 22 are not particularly restricted,
and well known methods can be appropriately selected. Specifically, the method can
be enumerate as the coating method, transfer printing, electroplating, electroless
plating, vapor plating or sputtering and the like for patterning the electrode layer
with a desired thickness on the insulating laminate 11. In addition, the size of the
electrodes 21 and 22 or gap distance ΔG can be processed by well-known methods such
as ion milling, or etching. Also, the precursor of the metal or alloy can be patterned
on the substrate by the screen printing with the use of a plate for patterning the
gap portion between the electrodes 21 and 22. Thereafter, a firing process is provided
so that the electrodes 21 and 22 are formed. Alternatively, the electrodes 21 and
22 can be formed by simultaneously firing the object that electrodes 21 and 22 are
formed on a green sheet composed of insulators by screen printing. In addition, the
gap portion between electrodes 21 and 22 can be formed by laser processing after the
precursor of metal or alloy is coated by, for example, the electrode paste.
[0034] The discharge inducing section 31 is arranged between the electrodes 21 and 22. In
the present embodiment, the discharge inducing section 31 is laminated on the insulating
substrate 11 and electrodes 21 and 22. There are not particular restrictions on the
size, shape and the position of the discharge inducing section 31 as long as the discharging
process occurs between the electrodes 21 and 22 via the discharge inducing section
31 when an overvoltage is applied.
[0035] Figure 4 is a view schematically showing the surface portion 32 of the discharge
inducing at the boundary between the discharge inducing section and the hollow space
in the present embodiment. Figure 5 is a sectional view along the line III-III shown
in Figure 2. The discharge inducing section 31 has a hollow structure in which hollow
space 31a and 31b are contained. In the present embodiment, a composite with conductive
inorganic material 33 uniformly or randomly dispersed in the insulating inorganic
material 32 can be used as the discharge inducing section 31. As shown in Figure 5,
the discharge inducing section 31 has microscopic voids 35 discontinuously dispersed
therein. In other words, the discharge inducing section 31 of the present embodiment
has a hollow structure by forming hollow space 31a and 31b and on the other hand the
discharge inducing section 31 has microscopic voids 35 discontinuously dispersed therein.
In addition, the surface portion of the discharge inducing section has dense structure.
[0036] The surface portion 32 of the discharge inducing section contains glass at a ratio
of 20 vol% or more. If the ratio of the glass is less than 20 vol%, the surface portion
of the discharge inducing section is expected to not able to have a dense structure,
leading to damage around the surface portion of discharge inducing section at the
boundary between the discharge inducing section and the hollow space during the discharge.
That is, durability is evidently deteriorated. Thus, in order to form a dense structure,
the ratio of the glass in the surface portion of the discharge inducing section is
preferably more than 40 vol%. The range of the dense structure that the surface portion
of the discharge inducing section has is not particularly restricted. Considering
that the melting of conductive particles generate during the discharge, the thickness
of the surface portion with dense structure having glass is preferred to be about
1 to 4 µm.
[0037] The specific examples of the insulating inorganic material 34 can be metal oxides
but will not limited thereto. In view of the electrical insulation or cost issues,
Al
2O
3, SrO, CaO, BaO, TiO
2, SiO
2, ZnO, In
2O
3, NiO, CoO, SnO
2, V
2O
5, CuO, MgO and ZrO
2 are preferred as the metal oxides. These materials can be used alone, or two or more
of them can be used together. The character of the insulating inorganic material 32
is not particularly restricted. Specifically, it can be a uniform film of the insulating
inorganic material 32, or it can be the particle agglomerates of the insulating material
32. Among these materials, Al
2O
3, SiO
2, Mg
2SiO
4 or the like are more preferable in view of insulation property. In order to provide
the insulating matrix with semiconductor related properties, TiO
2 or ZnO is more preferable. An ESD protection device with a lower discharge starting
voltage can be obtained by providing the insulating matrix with semiconductor related
properties.
[0038] The specific examples of the conductive inorganic material 33 can be metal, alloy,
metal oxide, metal nitride, metal carbide, metal boride or the like but are not limited
thereto. In view of the electrical conductivity, C, Ni, Al, Fe, Cu, Ti, Cr, Au, Ag,
Pd and Pt or the alloy thereof are preferable.
[0039] The surface portion 32 of discharge inducing section viewed from the hollow structure
side of the discharge inducing section 31 is as shown in Figure 4. Also, it is characterized
in that it has a composite structure in which conductive inorganic material 33 is
discontinuously dispersed in the insulator and the surface portion 32 of the discharge
inducing section has a dense structure. With such a composite portion, the discharge
is likely to occur and proceed under a low voltage. Further, as the composite portion
is one with conductive inorganic material dispersed in the insulator, the insulation
of the device can be maintained before or after the discharge.
[0040] The microscopic voids 35 make the discharge inducing section 31 porous and adsorb
the heat or stress generated during the discharge. In this way, the damage due to
the melting or deformation of the electrodes 21 and 22 and their peripheral substances
can be alleviated. Here, in the present specification, the microscopic voids 35 refers
to a gap with a size of 0.1 to 5 µm. Further, in the present specification, the size
of the microscopic voids 35 refers to the median size (D50) of a globular shape with
an aspect ratio of 1 to 5, or refers to the arithmetic mean of the major axis or minor
axis in other shapes. That is, the size is the mean from randomly chosen 50 points.
The size of the microscopic voids 35 or the volume ratio of the microscopic voids
35 to the discharge inducing section 31 is not particularly restricted and can be
appropriately set based on desired electrostatic adsorption property, durability against
repeated discharges and prevention of short-circuiting between electrodes 21 and 22.
The size of the microscopic voids 35 is preferably 0.1 to 2 µm, and the microscopic
voids are preferably contained with a ratio of 1 to 40 vol%, and more preferably 5
to 20 vol%.
[0041] The surface portion of the discharge inducing section at the boundary between the
discharge inducing section 31 and the hollow space has a dense structure, and this
structure is obtained by providing glass. The surface portion of the discharge inducing
section preferably contains 20 vol% or more of glass components. With such a dense
structure of the surface portion of the discharge inducing section, the breakage due
to the stress generated during discharge can be inhibited. In this way, a device can
be obtained with an excellent electrostatic adsorption property, an excellent durability
against repeated discharges or a low peak voltage. Further, the region of the surface
portion of the discharge inducing section with a dense structure preferably has a
thickness of 1 to 4 µm in a direction in depth from the hollow space to the discharge
inducing section as shown in the sectional view of Figure 2.
[0042] The number of the hollow space in the discharge induction section 31 is not particularly
limited. In the present embodiment, a hollow structure is employed with two hollow
spaces 31a and 31b. However, the number of the hollow space is not limited and can
be one or several. As the number of the hollow space increases, the frequency of discharge
will decrease relative to one hollow space, resulting in further improved durability
against repeated uses. In addition, when several hollow space are disposed, the shape
and size of each one can be the same or different.
[0043] Also, there is no particular restriction on the shape of the hollow space 31a and
31b. Any shape can be used such as the sphere and ellipsoid-like shape, and the hollow
space can also be indefinite shape. Especially, the hollow space 31a and 31b are preferred
to be a shape extending in a direction that the electrodes 21 and 22 are connected.
With such hollow space 31a and 31b, the discharge generated between electrodes 21
and 22 is performed at the boundary between the hollow space and the surface portion
of the discharge inducing section. Thus, the deterioration of the discharge inducing
section becomes less and the durability is improved. Further, the fluctuation of the
peak voltage or the discharge starting voltage can be inhibited.
[0044] In another respect, the size of the hollow space 31a,31b is not particularly restricted.
However, if the disruption due to discharges is to be inhibited and the durability
is to be improved, the ΔM (the length of the hollow space 31a,31b in a direction that
the hollow space connects the electrodes 21 and 22) preferably ranges from a half
of the gap distance ΔG between electrodes 21 and 22 to a level less than the length
ΔL of the discharge inducing section 31. In addition, the length of the hollow space
31a,31b in a direction that the hollow space connects the electrodes 21 and 22 refers
to the longest length of the hollow space 31a,31b in a direction that the hollow space
connects the electrodes 21 and 22. The length of discharge inducing section 31 refers
to the longest length of the discharge inducing section 31 in a direction that the
hollow space connects the electrodes 21 and 22. For example, when the gap distance
ΔG is about 10 to 20 µm in the ESD protection device 100, the length of the hollow
space 31a,31b in a direction that the hollow space connects the electrodes 21 and
22 is 5 to 10 µm or more and this length is less than the length of the discharge
inducing section 31. As shown in Figure 2 and Figure 3, the length of the hollow space
31a, 31b in a direction that the hollow space connects the electrodes 21 and 22 is
set to be the gap distance ΔG between electrodes 21 and 22 or more so that the front
ends of electrodes 21 and 22 protrude from the hollow space 31a and 31b respectively.
In this respect, the damage to the discharge inducing section due to the discharge
between electrodes 21 and 22 can be inhibited. Thus, the deterioration of the discharge
inducing section becomes less and the durability is improved. Further, the fluctuation
of the peak voltage or the discharge starting voltage can be inhibited.
[0045] There is no particular restriction on the thickness of the discharge inducing section
31. That is, the thickness can be properly set and preferably ranges from the thickness
of the corresponding electrode to half of the thickness of the device or less if the
durability is to be improved.
[0046] The method for forming the discharge inducing section 31 is not particularly restricted.
For example, the well known process for film formation as well as the lamination process
can be used. The method described below is also suitable. Specifically, in a construction
which contains a specified ratio of microscopic voids 35 with a desired size, in order
to well reproduce the discharge inducing section 31 in an easy way, a mixture is coated
which contains insulating inorganic materials, conductive inorganic materials and
resins, wherein the resin is used to form microscopic voids 35 and will be removed
during the firing process. Thereafter, the resultant product obtained by mixing the
removable material, which is used to form the hollow space 31a and 31 b on the desired
position of the mixture, and glass, which makes the surface portion of the hollow
space dense, is coated in a required shape. Then, a firing process is provided so
that the removable material disappear. In this way, a porous structure with microscopic
voids 35 is formed and a hollow structure is defined and formed in which the surface
portion of the discharge inducing section at the boundary with the hollow space is
provided with a dense structure. The method for providing the surface portion of the
discharge inducing section with a dense structure can be one in which the resin paste
for forming the hollow structure contains glass and the removable materials is volatized
during the firing process in order to make the surface portion of the discharge inducing
section dense. Alternatively, another method can be used that the discharge inducing
section contains glass and the glass precipitate at the boundary between the hollow
space and the discharge inducing section during the firing process so that the surface
portion of the discharge inducing section becomes dense. However, the method is not
limited thereto. Hereinafter, the preferable method for forming the discharge inducing
section 31 will be described.
[0047] In this method, a mixture is prepared to contain insulating inorganic materials,
conductive inorganic materials and a removable material which is used to form the
microscopic voids 35, and the mixture is coated or printed on the gap between electrodes
21 and 22. Then, the mixture of the removable material which is used to form the hollow
space 31a and 31b and the glass is coated or printed to a desired shape on a specified
position of the mixture provided to the gap between electrodes 21 and 22. Thereafter,
alternatively, the mixture mentioned above can be provided via coating or printing
on a specified position of the paste for forming the discharge inducing section and
the paste for forming the microscopic voids. Then, a firing process is provided so
that the removable material is thermally degraded or volatized. A structure containing
a specified ratio of microscopic voids 35 with a desired size can be obtained by removing
the removable material during the firing process. Further, a discharge inducing section
31 can be obtained with a hollow structure in which the hollow space 31a and 31b with
a desired shape are formed on a desired position and the surface portion of the discharge
inducing section has a dense structure. Here, the treatment conditions during the
firing process are not particularly restricted. In view of the productivity and economical
efficiency, the firing process is preferably performed under air atmosphere at 500
to 1200°C for 10 minutes to 5 hours.
[0048] Furthermore, these is no particular restriction on the removable material as long
as this material will disappear (thermally degraded or volatized) during the firing
process. Well known materials can be appropriately selected. The specific examples
of such materials are not particularly restricted and can be resin particles or a
mixed substance of a medium and resins (i.e., the resin paste). The representative
resin particle can be a resin particle with an excellent thermal decomposability such
as acrylic resins. Further, the shape of the resin particle is not particularly restricted
and can be any one of the hammer-like shape, the column-like shape, the sphere-like
shape with an aspect ratio of 1 to 5, the ellipsoid-like shape with an aspect ratio
above 5 or the like. Also, the resin particle can be indeterminate form. Further,
the representative resin pastes can be pastes obtained by mixing resins such as the
acrylic resin, ethyl cellulose and polypropylene in a well known medium, wherein said
resins are thermally degraded, volatized and then disappear during the firing process.
Here, when the microscopic voids 35 are formed by resin particles, the particle size
of the resin particles can be appropriately set in order to get the microscopic voids
35 with a desired size. The particle size is not particularly limited and is preferably
0.1 to 4 µm. Furthermore, in the present specification, the particle size of the resin
particles refers to the median diameter (D50) in a sphere-like shape and refers to
the arithmetic mean of the major axis and minor axis in other shapes. In this respect,
the ratio of the resin particles is not particularly restricted and can be properly
set based on the ratio of microscopic voids 35 contained in the discharge inducing
section 31. This ratio is preferably about 1 to 30 vol%. During the preparation of
the mixture, various additives such as the solvent and the binder can be added. When
resin paste is used to form the hollow space 31a and 31b, the solid concentration
or the viscosity of the resin paste can be properly adjusted in order to get the hollow
space 31a and 31b with a desired shape or size. Further, during the preparation of
the resin paste or the coating or printing process of the resin paste, various additives
can be added such as a solvent or a surfactant or a tackifier. The hollow space 31
a and 31b can also be prepared by a construction formed by resins or fibers, wherein
this construction has a shape corresponding to the hollow space 31a and 31b with a
desired shape and size and will be thermally degraded, volatized or removed during
the firing process, and this construction can be used to replace the removable material
or can be used together with the removable material.
[0049] In the ESD protection device 100 of the present embodiment, the composite (i.e.,
the discharge inducing section 31) with the conductive inorganic material 33 discontinuously
dispersed in the insulating inorganic material functions as an ESD protection material
with a large insulation resistance, a low electrostatic capacitance and an excellent
discharging property. Then, the discharge inducing section 31 is composed of the structure
that microscopic voids discontinuously disperse and has a hollow structure in which
hollow space 31a and 31b are contained therein. Thus, the damage to the periphery
of the electrodes and the damage to the discharge inducing section are alleviated.
Accordingly, the repeating durability is significantly improved. The durability is
further improved by making the surface portion of the discharge inducing section a
dense structure. In addition, the discharge inducing section 31 is composed of a composite
consisting of an inorganic material, so the heat resistance is further improved. Further,
the properties will hardly change in accordance with the environment such as the temperature
or humidity, so the reliability is elevated. The discharge inducing section 31 has
a structure that the fused materials generated during the discharging process will
hardly agglomerate on one site, so the short-circuiting between the electrodes 21
and 22 can be effectively prevented. In view of the reasons above, an ESD protection
device 100 with good performance will be obtained which has a low electrostatic capacitance,
an excellent electrostatic adsorption property. Also, in such an ESD protection device,
the discharge durability is improved, the peak voltage is suppressed to a low level,
and the short-circuiting between electrodes after discharges is inhibited, and an
excellent heat resistance and an excellent climate resistance can be obtained.
Examples
[0050] Hereinafter, the present invention will be specifically described based on Examples.
However, the present invention will not be limited thereto.
(Example 1)
[0051] First of all, a green sheet obtained by making the materials consisting of the main
component Al
2O
3 and the glass component into a sheet was used as an insulating substrate 11 shown
in Figure 6. An Ag paste was printed with a thickness of 20 µm on one insulating surface
11 a by screen printing so as to pattern and form a pair of oppositely disposed strip-like
electrodes 21 and 22. As for the pair of printed electrodes, the length of each of
electrodes 21 and 22 was both 0.5 mm and the width was 0.4 mm, and the gap distance
ΔG between two electrodes 21 and 22 was 40 µm.
[0052] As shown in Figure 7, a discharge inducing section 31 was formed on the insulating
substrate 11 and the electrodes 21 and 22 in the following orders.
[0053] First of all, glass particles with SiO
2 as the main component (which are used as the insulating inorganic material 34) (trade
name: ME13, prepared by Nihon Yamamura Glass Co., Ltd)being 10 vol%, Al
2O
3 with an average particle size of 1 µm (which is used as the insulating inorganic
material 34) (trade name: AM-27, prepared by Sumitomo Chemical Co., Ltd) being 60
vol%, Ag particles with an average particle size of 1 µm (which are used as the conductive
inorganic material 33) (trade name: SPQ05S, prepared by Mitsui Kinzoku Co., Ltd) being
30 vol% and spherical acrylic resin particles with an average particle size of 1 µm
(which are used to form microscopic voids 35) being 30 vol% (trade name: MX-150, prepared
by Soken Chemical & Engineering Co., Ltd.) were measured and mixed to obtain a mixture.
Besides, a lacquer with a solid concentration of 8 mass% was prepared by mixing the
ethyl cellulose-based resin as a binder and the terpineol as a solvent. Next, the
lacquer was added into the obtained mixture mentioned above. Then, they were mixed
to prepare a paste mixture for the formation of discharge inducing section.
[0054] Thereafter, the acrylic resin was mixed into the butyl carbitol, and a resin paste
with a solid concentration of 40 mass% was formed for the preparation of hollow space
31a and 31b. The glass particles mentioned above were mixed in the resin paste, and
a paste-like mixture mixed with the glass ,which was for the formation of the hollow
space, was prepared.
[0055] Then, the obtained paste-like mixture (which was for the formation of discharge inducing
section) was coated in a small amount by screen printing to cover the insulating surface
11 a of the insulating substrate 11 between electrodes 21 and 22. In order to form
hollow space 31a and 31b on the coated mixture and electrodes 21 and 22, the paste-like
mixture for the formation of hollow space was screen printed on two sites in an ellipsoid-like
shape. After that, a screen printing was performed to cover the paste-like mixture
for the formation of the discharge inducing section and the coated ellipsoidal paste-like
mixture for the formation of the hollow space so that a precursor of the discharge
inducing section 31 similar to that shown in Figure 1 was formed. After the green
sheet was laminated on the precursor of the discharge inducing section 31, a laminate
was prepared by a hot pressing. Thereafter, the obtained laminate was cut into individual
pieces with a specified size. The individual pieces of laminates were subjected to
the thermal treatment at 200 °C for 1 hour (the process of removing the binder). Then,
the temperature was raised with a rate of 10°C/min and the individual pieces of laminates
were kept under air atmosphere at 950°C for 30 minutes. With such a firing treatment,
the acrylic resins, ethyl cellulose based resins and the solvent were removed from
the precursor of the discharge inducing section 31. As a result, a construction was
formed with microscopic voids 35 discontinuously dispersed therein. Then, a discharge
inducing section 31 was prepared in which a hollow structure was formed (which has
hollow space 31a and 31b formed therein) and the surface portion of the discharge
inducing section has a dense structure. Further, the gap distance ΔG between the pair
of fired electrodes 21 and 22 was about 30 µm and the length ΔM of each of the hollow
space 31a and 31b was 40 µm in a direction that the electrodes 21 and 22 are connected.
[0056] As shown in Figure 8, a terminal electrode 41 with Ag as the main component was formed
by connecting to the outside ends of the electrodes 21 and 22. In this way, the ESD
protection device 100 of Example 1 was obtained.
(Example 2)
[0057] A discharge inducing section 31 (which was formed by a construction with microscopic
voids 35 discontinuously dispersed and had a hollow structure in which one hollow
space 31a was contained) was prepared in the same way as in Example 1 except that
the screen printing was applied to only one site in an ellipsoid-like shape during
the screen printing process of the paste-like mixture for the formation of the hollow
space. In this way, the ESD protection device 100 of Example 2 was obtained.
(Comparative Example 1)
[0058] A discharge inducing section without a hollow structure (which was formed by a construction
with microscopic voids 35 discontinuously dispersed) was prepared in the same way
as in Example 1 except that, while the paste-like mixture for formation of hollow
space is screen printed, the paste-like mixture for the formation of discharge inducing
section was used instead of the paste-like mixture for formation of hollow space.
In this way, the ESD protection device of Comparative Example 1 was obtained.
(Comparative Example 2)
[0059] A discharge inducing section without a hollow space (which was formed by a construction
with microscopic voids 35 discontinuously dispersed) was prepared in the same way
as in Example 1 except that spherical acrylic resin particles with an average particle
size of 2.0 µm (trade name: MX-200, prepared by Soken Chemical & Engineering Co.,
Ltd.) was used to form microscopic voids 35 instead of spherical acrylic resin particles
with an average particle size of 1.0 µm (trade name: MX-150, prepared by Soken Chemical
& Engineering Co., Ltd.). In this way, the ESD protection device of Comparative Example
2 was obtained.
(Example 3)
[0060] A discharge inducing section 31 (which was formed by a construction with microscopic
voids 35 discontinuously dispersed and had a hollow structure in which hollow space
31a and 31b were contained) was prepared in the same way as in Example 1 except that
spherical acrylic resin particles with an average particle size of 1.0 µm (trade name:
MX-150, prepared by Soken Chemical & Engineering Co., Ltd.) for formation of microscopic
voids 35 were used and the discharge inducing section is changed to 10 vol% of glass
particles, 50 vol% of Al
2O
3, 30 vol% of Ag particles and 10 vol% of acrylic resin particles. In this way, the
ESD protection device 100 of Example 3 was obtained.
(Example 4)
[0061] A discharge inducing section 31 (which was formed by a porous construction with microscopic
voids 35 discontinuously dispersed and had a hollow structure in which one hollow
space 31a was contained) was prepared in the same way as in Example 2 except that
10 vol% of glass particles, 50 vol% of Al
2O
3 and 30 vol% of Ag particles were used to form the discharge inducing section and
10 vol% of acrylic resin particles MX-150 was replaced by 10 vol% of spherical acrylic
resin particles with an average particle size of 2.0 µm (trade name: MX-300, prepared
by Soken Chemical & Engineering Co., Ltd.). In this way, the ESD protection device
100 of Example 4 was obtained.
(Example 5)
[0062] A discharge inducing section 31 (which was formed by a construction with microscopic
voids 35 discontinuously dispersed and had a hollow structure in which hollow space
31a and 31b were contained) was prepared in the same way as in Example 3 except that
10 vol% of glass particles, 50 vol% of Al
2O
3 and 30 vol% of Ag particles were used to form the discharge inducing section, and
10 vol% of acrylic resin particles MX-150 were used and two hollow space were contained.
In this way, the ESD protection device 100 of Example 5 was obtained.
(Comparative Example 3)
[0063] A discharge inducing section without a hollow structure (which was formed by a construction
with microscopic voids 35 discontinuously dispersed) was prepared in the same way
as in Comparative Example 1 except that 10 vol% of glass particles, 50 vol% of Al
2O
3 and 30 vol% of Ag particles were used to form the discharge inducing section and
10 vol% of acrylic resin particles MX-150 were used. In this way, the ESD protection
device 100 of Comparative Example 3 was obtained.
(Comparative Example 4)
[0064] A discharge inducing section without a hollow structure (which was formed by a construction
with microscopic voids 35 discontinuously dispersed) was prepared in the same way
as in Comparative Example 3 except that 10 vol% of acrylic resin particles MX-150
were replaced with 10 vol% of spherical acrylic resin particles with an average particle
size of 3.0 µm (trade name: MX-300, prepared by Soken Chemical & Engineering Co.,
Ltd.). In this way, the ESD protection device of Comparative Example 4 was obtained.
(Comparative Example 5)
[0065] A discharge inducing section 31 (which was formed by a construction with microscopic
voids 35 discontinuously dispersed and had a hollow structure in which one hollow
space 31a was contained and the surface portion of discharge inducing section does
not have a dense structure) was prepared in the same way as in Example 3 except that
the process of adding glass is omitted during the preparation of paste-like mixture
for formation of hollow space. In this way, the ESD protection device 100 of Comparative
Example 5 was obtained.
(Comparative Example 6)
[0066] A discharge inducing section without microscopic voids 35 or a hollow space was prepared
in the same way as in Comparative Example 1 except that the acrylic resin particles
were not added and the ratios for each component were changed to 15 vol% of glass
particles, 55 vol% of Al
2O
3 and 30 vol% of Ag particles. In this way, the ESD protection device 100 of Comparative
Example 5 was obtained.
<Observation on Structure>
[0067] In each ESD protection devices 100 of Examples 1 to 5 obtained above, the section
of the discharge inducing section 31 was polished and then observed by SEM. It had
been determined that all were constructions with microscopic voids 35 discontinuously
dispersed. Further, a hollow structure was contained with 1 or 2 hollow space and
the surface portion of the discharge inducing section had a dense structure.
<Observation on Microstructure>
[0068] In each ESD protection devices 100 of Examples 1 to 5 obtained above, the section
of the discharge inducing section 31 (the section where hollow space 31a and 31b were
not formed) was polished. These sections were observed by SEM and photos were taken.
In the photos, the images of the microscopic voids were processed and the sum of the
areas of these microscopic voids was calculated. Then, the ratio of the microscopic
voids was obtained by dividing the sum by the total areas.
<Electrostatic discharge test >
[0069] The electrostatic discharge test was performed for the ESD protection devices 100
of Examples 1 to 5 and Comparative Examples 1 to 6 by using the circuit shown in Figure
9. The test results were shown in Table 1 and Table 2.
[0070] The electrostatic discharge test was carried out following the human body model (discharge
resistance was 330 Ω, discharge capacitance was 150 pF, applied voltage was 8.0 kV,
contact discharge) based on the IEC61000-4-2 electrostatic discharge immunity test
and the noise test. Specifically, as shown in the circuit for electrostatic test in
Figure 9, one terminal electrode of the ESD protection device as the evaluation subject
was connected to the ground while the other terminal electrode was connected to the
electrostatic pulse applying portion so that the electrostatic pulses were applied
when the electrostatic pulse applying portion contacted the discharge gun. Here, the
applied electrostatic pulse provides a voltage above the discharge starting voltage.
[0071] The electrostatic discharge test was performed while the discharge starting voltage
was firstly set as 0.4 kV and then was increased by 0.2 kV at each round. The observed
waveforms of the electrostatic adsorption were recorded, and the voltage at which
the electrostatic adsorption effect was revealed was used as the discharge starting
voltage. The electrostatic capacitance was the electrostatic capacitance (pF) at 1
MHz. As for the short-circuiting rate, 100 samples for each were prepared, and the
electrostatic discharge test was repeated for 100 times at 8.0 kV The number of occurrence
of short-circuiting between electrodes was counted and was shown by its ratio (%).
With respect to the durability, 100 items were prepared for each sample, and the electrostatic
discharge test was repeated for 1000 times at 8.0 kV. The peak voltage at the 1000th
discharge was measured for each sample. The number of samples with the peak voltage
being 400V or less was counted and was shown by its ratio (%). Further, the same discharge
test was performed for the peak voltage. Specifically, the 1000th peak voltage was
measured for each sample and the mean was calculated. The lower the peak voltage was,
the better the electrostatic adsorption effect was, which was good for an ESD protection
device.
[Table 1]
| |
Comparative Example 1 |
Comparative Example 2 |
Example 1 |
Example 2 |
| Ratio of insulating inorganic materials [vol%] |
40 |
40 |
40 |
40 |
| Ratio of conductive inorganic materials [vol%] |
30 |
30 |
30 |
30 |
| Average diameter of microscopic voids [µm] |
1.0 |
2.0 |
1.0 |
1.0 |
| Ratio of microscopic voids [vol%] |
30 |
30 |
30 |
30 |
| With or without hollow space |
- |
- |
Two sites |
One site |
| With or without a dense structure in surface portion of hollow space |
- |
- |
with |
with |
| Discharge starting voltage [kV] |
2.6 |
3.4 |
3.0 |
2.6 |
| Electrostatic capacitance (pF) |
0.17 |
0.15 |
0.12 |
0.13 |
| Short-circuiting ratio [%] |
40 |
35 |
0 |
0 |
| Durability [%] |
60 |
60 |
95 |
85 |
| Peak voltage [V] |
470 |
460 |
260 |
250 |
[Table 2]
| |
Comparative Example 3 |
Comparative Example 4 |
Example 3 |
Example 4 |
Example 5 |
Comparative Example 5 |
Comparative Example 6 |
| Ratio of insulating inorganic materials [vol%] |
60 |
60 |
60 |
60 |
60 |
60 |
70 |
| Ratio of conductive inorganic materials [vol%] |
30 |
30 |
30 |
30 |
30 |
30 |
30 |
| Average diameter of microscopic voids[µm] |
1.0 |
2.0 |
1.0 |
2.0 |
1.0 |
1.0 |
- |
| Ratio of microscopic voids [vol%] |
10 |
10 |
10 |
10 |
10 |
10 |
- |
| With or without hollow space |
- |
- |
One site |
One site |
Two sites |
One site |
- |
| With or without a dense structure in surface portion of hollow space |
- |
- |
with |
with |
with |
without |
- |
| Discharge starting voltage [kV] |
2.0 |
2.4 |
2.0 |
2.6 |
2.2 |
2.0 |
1.6 |
| Electrostatic capacitance (pF) |
0.16 |
0.15 |
0.13 |
0.12 |
0.11 |
0.13 |
0.20 |
| Short-circuiting ratio [%] |
30 |
25 |
0 |
0 |
0 |
0 |
95 |
| Durability [%] |
50 |
50 |
85 |
85 |
90 |
50 |
30 |
| Peak voltage [V] |
450 |
470 |
270 |
250 |
260 |
400 |
800 |
[0072] It can be seen from Table 1 and Table 2 that the ESD protection devices of Examples
1 to 5 all had a discharge starting voltage lower than 2 kV and an electrostatic capacitance
lower than 0.2 pF. Thus, they had good performance and were applicable to high-speed
transmission system. Further, the occurrence of short-circuiting between electrodes
was significantly inhibited in the ESD protection devices from Examples 1 to 5. Also,
based on the results of the discharge test, for the ESD protection devices of Examples
1 to 5, the durability against repeated discharge was excellent and the peak voltage
was suppressed to a low level.
[0073] The number, shape, size and layout of the hollow space 31 a and 31 b can be changed.
Specifically, for example, as shown in Figure 10, two hollow space 31a and 31b can
be made in a prism-like shape. Further, three hollow space 31a, 31b and 31c can be
provided, as shown in Figure 11. Otherwise, as shown in Figure 12, one electrode 21
can be disposed on the insulting substrate 11 and the other electrode 22 can be arranged
on the insulating protection layer 51 so that the pair of electrodes 21 and 22 are
separately and oppositely disposed.
Industrial Application
[0074] As described above, the ESD protection device of the present invention has a low
electrostatic capacitance and an excellent durability against repeated discharge.
The short-circuiting between electrodes can be inhibited and the peak voltage can
be inhibited to a low level. In addition, the ESD protection device of the present
invention has an excellent heat resistance and an excellent climate resistance. Also,
the productivity and economical efficiency can be elevated. Thus, it can be widely
and effectively used in electric or electrical devices having ESD protection devices
and various machines, equipments and systems containing these electric or electrical
devices.
DESCRIPTION OF REFERENCE NUMERALS
[0075]
- 11
- insulating substrate
- 11 a
- insulating surface
- 21,22
- electrode
- 31
- discharge inducing section
- 31a-31c
- hollow space
- 32
- surface portion of the discharge inducing section
- 33
- conductive inorganic material
- 34
- insulating inorganic material
- 35
- microscopic voids
- 41
- terminal electrode
- 51
- insulating protection layer
- 100
- ESD protection device
- ΔG
- gap distance
- ΔM
- length of hollow space 31a, 31b in a direction that electrodes 21 and 22 are connected
- ΔL
- length of discharge inducing section 31