(19)
(11) EP 2 801 864 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
04.11.2015 Bulletin 2015/45

(45) Mention of the grant of the patent:
09.09.2015 Bulletin 2015/37

(21) Application number: 14169254.1

(22) Date of filing: 19.01.2007
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)

(54)

Exposure apparatus, exposure method and device manufacturing method

Belichtungsvorrichtung, Belichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung

Appareil d'exposition, procédé d'exposition et procédé de fabrication d'un dispositif

(84) Designated Contracting States:
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

(30) Priority: 19.01.2006 JP 2006011506
21.02.2006 JP 2006044599
31.08.2006 JP 2006236878

(43) Date of publication of application:
12.11.2014 Bulletin 2014/46

(62) Application number of the earlier application in accordance with Art. 76 EPC:
07707109.0 / 1983555

(73) Proprietor: Nikon Corporation
Tokyo 108-6290 (JP)

(72) Inventor:
  • Shibazaki, Yuichi
    Tokyo, 108-6290 (JP)

(74) Representative: Hoffmann Eitle 
Patent- und Rechtsanwälte PartmbB Arabellastraße 30
81925 München
81925 München (DE)


(56) References cited: : 
EP-A2- 0 482 553
US-A1- 2004 263 846
 EP-A2- 1 014 199
   
       
    Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).