(19)
(11) EP 2 818 928 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
30.11.2016 Bulletin 2016/48

(45) Mention of the grant of the patent:
28.09.2016 Bulletin 2016/39

(21) Application number: 14179101.2

(22) Date of filing: 24.08.2010
(51) International Patent Classification (IPC): 
G03F 7/20(2006.01)
G01B 11/27(2006.01)
 G03F 9/00(2006.01)
H01L 21/68(2006.01)

(54)

Exposure method, exposure apparatus, and device manufacturing method

Belichtungsverfahren, Belichtungsapparat sowie Verfahren zur Herstellung einer Vorrichtung

Procédé d'exposition, appareil d'exposition et procédé de fabrication d'un dispositif

(84) Designated Contracting States:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

(30) Priority: 25.08.2009 US 236704 P
20.08.2010 US 860097

(43) Date of publication of application:
31.12.2014 Bulletin 2015/01

(60) Divisional application:
16166162.4 / 3098655

(62) Application number of the earlier application in accordance with Art. 76 EPC:
10752443.1 / 2470961

(73) Proprietor: Nikon Corporation
Tokyo 108-6290 (JP)

(72) Inventor:
  • Shibazaki, Yuichi
    Tokyo 108-6290 (JP)

(74) Representative: Hoffmann Eitle 
Patent- und Rechtsanwälte PartmbB Arabellastraße 30
81925 München
81925 München (DE)


(56) References cited: : 
EP-A1- 1 762 897
DE-A1-102007 046 927
US-A1- 2008 094 592
 EP-A2- 1 826 615
US-A1- 2007 263 197
   
       
    Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).