BACKGROUND
1. Field of the Invention
[0001] The present invention relates to a pressure-sensitive adhesive film, and a method
of manufacturing an organic electronic device using the same.
2. Discussion of Related Art
[0002] An organic electronic device (OED) refers to a device including an organic material
layer generating alternation of charges using holes and electrons, and may include,
for example, a photovoltaic device, a rectifier, a transmitter and an organic light
emitting diode (OLED).
[0003] A representative OED, which is an OLED, has less power consumption and a higher response
speed, and forms a thinner display device or light than a conventional light source.
In addition, the OLED has excellent space utilization, and is expected to be applied
in various fields including all kinds of portable devices, monitors, notebook computers
and TVs.
[0004] To extend commercialization and use of the OLED, a major problem is durability. Organic
materials and metal electrodes included in the OLED are very easily oxidized by external
factors such as water. Accordingly, a product including the OLED is very sensitive
to environmental factors. Therefore, various methods for preventing penetration of
oxygen or water from an external environment with respect to an organic electronic
device such as the OLED have been suggested.
[0005] In
Korean Unexamined Patent No. 2008-0088606, an adhesive capsulating composition and an organic electroluminescence device are
provided, and have poor processability as a pressure-sensitive adhesive based on polyisobutylene
(PIB), and low reliability at high temperature and high humidity.
[0006] Accordingly, in an organic electronic device, it is required to develop an encapsulant
ensuring a required life span, excellently preventing penetration of moisture, maintaining
reliability at high temperature and high humidity, and having excellent optical characteristics.
SUMMARY OF THE INVENTION
[0007] The present invention is directed to providing a pressure-sensitive adhesive film
which can have a structure effectively preventing moisture or oxygen penetrated into
an organic electronic device from an external environment, and excellent mechanical
characteristics such as handleability and processability and excellent transparency.
[0008] In one aspect, the present invention provides a pressure-sensitive adhesive film.
The pressure-sensitive adhesive film may be applied to, for example, encapsulation
or capsulation of an organic electronic device such as an OLED.
[0009] The term "organic electronic device" used herein refers to a product or device having
a structure including an organic material layer generating alternation of charges
using holes and electrons between a pair of electrodes facing each other, and may
include, but is not limited to, for example, a photovoltaic device, a rectifier, a
transmitter and an organic light emitting diode (OLED). In one example, the organic
electronic device may be an OLED.
[0010] The exemplary pressure-sensitive adhesive film may include a pressure-sensitive adhesive
having an elastic portion (Ep; unit:%) calculated by Equation 1 of 20 to 80:

[0011] In Equation, 1, σ1 is the maximum stress value measured when 50% strain is applied
to the film by applying approximately 200 gf of normal force with a parallel plate
in a relaxation test mode at 80 °C using an advanced rheometric expression system
(ARES) while a pressure-sensitive adhesive film is manufactured to have a thickness
of 600 µm, and σ2 is a stress value measured after the film is maintained for 180
seconds while the strain is applied to the film.
[0012] The pressure-sensitive adhesive film, as described above, may be applied to encapsulation
or capsulation of an organic electronic device such as an OLED. The pressure-sensitive
adhesive film in the range of the above-described value (Ep) may have an encapsulation
or capsulation structure having excellent durability without bubbles under a high
temperature durability test condition when being applied to an encapsulation or capsulation
process. In one example, the pressure-sensitive adhesive film may be used to form
an encapsulation or capsulation structure covering all of top and side surfaces of
an element of the organic electronic device that will be described below.
[0013] The term "ARES" used herein is a rheology measurer evaluating viscoelastic properties
such as viscosity, shear modulus, loss factor, and storage modulus of a material.
The measurer is a mechanical measuring device that can measure a transfer torque to
an extent that a sample is resistant to an applied stress as described above after
a dynamic state and a normal state are applied to the sample.
[0014] The exemplary pressure-sensitive adhesive film, as described above, may have a value
(Ep) calculated by Equation 1 of 20 to 80. The lower limit of the value (Ep) may be,
in another example, 25, 27, 29, 31 or 33. In addition, the upper limit of the value
(Ep) may be, in another example, 75, 70, 65, 60, 55, 50, 45, 40 or 37. When a composition
or crosslinking condition constituting a pressure-sensitive adhesive film is controlled
to have such a value (Ep), a pressure-sensitive adhesive film that can realize an
encapsulation or capsulation structure having excellent durability with respect to
an electronic device may be provided.
[0015] FIG. 4 shows a result of a high temperature durability test measured with respect
to an encapsulation structure realized by a pressure-sensitive adhesive film having
an Ep level of approximately 35, and FIG. 5 shows a result of a high temperature durability
test measured with respect to an encapsulation structure realized by a pressure-sensitive
adhesive film having an Ep level of approximately 16.7. As seen by comparing FIGS.
4 and 5, when the Ep level is in the range of 20 to 80, a structure having excellent
durability without bubbles is realized, but when the Ep level is in the range of approximately
16.7, a lot of bubbles are observed, resulting in a decrease in durability.
[0016] In one example, the pressure-sensitive adhesive film of the present invention may
include a pressure-sensitive adhesive having a gel content represented by Equation
2 of 50% or more.

[0017] In Equation 2, A is a mass of the pressure-sensitive adhesive, and B is a dry mass
of an insoluble content of the pressure-sensitive adhesive remaining after being dipped
in toluene at 60 °C for 24 hours and filtered through a 200-mesh sieve (pore size
of 200 µm).
[0018] The gel content represented by Equation 2 may be 50 to 99%, 50 to 90%, 50 to 80%,
or 50 to 70%. That is, in the present invention, a pressure-sensitive adhesive film
having excellent moisture barrier characteristic, reliability and optical characteristic
may be realized by determining a crosslinking structure and a degree of crosslinking
in a suitable range of the pressure-sensitive adhesive film through a gel content.
[0019] FIG. 4 is a result of a high temperature durability test measured with respect to
an encapsulation structure realized by a pressure-sensitive adhesive film having a
gel content of approximately 65, and FIG. 5 is a result of a high temperature durability
test measured with respect to an encapsulation structure realized by a pressure-sensitive
adhesive film having a gel content of approximately 40. As seen by comparing FIGS.
4 and 5, when the gel content is 50 or more, a structure having excellent durability
without bubbles is realized, and when a gel content is less than 50, a lot of bubbles
are observed, resulting in a decrease in durability.
[0020] In an exemplary embodiment of the present invention, before or after the pressure-sensitive
adhesive film has a crosslinked structure, when the pressure-sensitive adhesive film
has a width of 1 inch, and maintained at 25 °C and a relative humidity of 50% for
1 hour, the film may have a peeling strength of 1,000 gf/inch (peeling rate: 5 mm/sec,
peeling angle: 180 degrees) with respect to a glass substrate. The peeling strength
may be measured using a texture analyzer according to ASTM3330. When a composition
or crosslinking structure of the pressure-sensitive adhesive composition constituting
the pressure-sensitive adhesive film is controlled to have such a peeling strength,
a pressure-sensitive adhesive composition that can realize an encapsulation or capsulation
structure having excellent durability with respect to an electronic device may be
provided.
[0021] In addition, when being manufactured to have a thickness of 100 µm, the pressure-sensitive
adhesive film according to the present invention may have a water vapor transmission
rate (WVTR) measured in a thickness direction of the film at 100 °F and a relative
humidity of 100% of 50, 40, 30, 20 or 10 g/m
2·day or less. As a composition or crosslinking structure of a pressure-sensitive adhesive
is controlled to have such a WVTR, an encapsulation or capsulation structure that
can stably protect an element by effectively blocking moisture or oxygen penetrated
from an external environment when being applied to the encapsulation or capsulation
structure of the electronic device. As the WVTR is decreased, excellent moisture barrier
ability may be exhibited, and the lower limit may be, for example, 0 g/m
2·day, but the present invention is not particularly limited.
[0022] The pressure-sensitive adhesive film of the present invention may include a pressure-sensitive
adhesive, and may be formed in layers. A material of the pressure-sensitive adhesive
composition constituting the pressure-sensitive adhesive is not particularly limited
as long as it satisfies Equation 1, and may be suitably designed by one of ordinary
skill in the art according to a purpose of the present invention within the range
satisfying Equation 1. For example, the pressure-sensitive adhesive composition may
include an encapsulating resin and a multifunctional active energy ray-polymerizable
compound that can be polymerized by irradiation of an active energy ray.
[0023] In one exemplary embodiment of the present invention, the encapsulating resin may
have a glass transition temperature of less than 0, -10, -30, - 50, or -60 °C. Here,
the glass transition temperature may refer to a glass transition temperature after
a UV ray is irradiated at a dose of approximately 1 J/cm
2 or more, or a glass transition temperature after thermal curing is additionally performed
after UV irradiation.
[0024] In one example, the encapsulating resin may include a styrene-based resin or an elastomer,
a polyolefin-based resin or an elastomer, other elastomers, a polyoxyalkylene-based
resin or an elastomer, a polyester-based resin or an elastomer, a polyvinylchloride-based
resin or an elastomer, a polycarbonate-based resin or an elastomer, a polyphenylenesulfide-based
resin or an elastomer, a mixture of hydrocarbon, a polyamide-based resin or an elastomer,
an acrylate-based resin or an elastomer, an epoxy-based resin or an elastomer, a silicone-based
resin or an elastomer, a fluorine-based resin or an elastomer, or a mixture thereof
[0025] Here, the styrene-based resin or an elastomer may be, for example, a styrene-ethylene-butadiene-styrene
(SEBS) block copolymer, a styrene-isoprene-styrene (SIS) block copolymer, an acrylonitrile-butadiene-styrene
(ABS) block copolymer, an acrylonitrile-styrene-acrylate (ASA) block copolymer, a
styrenebutadiene-styrene (SBS) block copolymer, a styrene-based homopolymer or a mixture
thereof The olefin-based resin or an elastomer may be, for example, a high density
polyethylene-based resin or an elastomer, a low density polyethylene-based resin or
an elastomer, a polypropylene-based resin or an elastomer or a mixture thereof. The
elastomer may be, for example, an ester-based thermoplastic elastomer, an olefin-based
elastomer, a silicone-based elastomer, an acrylic elastomer or a mixture thereof.
Among these, the olefin-based thermoplastic elastomer may be a polybutadiene resin
or an elastomer or a polyisobutylene resin or an elastomer. The polyoxyalkylene-based
resin or an elastomer may be, for example, a polyoxymethylene-based resin or an elastomer,
a polyoxyethylene-based resin or an elastomer or a mixture thereof. The polyester-based
resin or an elastomer may be, for example, a polyethylene terephthalate-based resin
or an elastomer, a polybutylene terephthalate-based resin or an elastomer or a mixture
thereof. The polyvinylchloride-based resin or an elastomer may be, for example, polyvinylidene
chloride. The encapsulating resin may include a mixture resin of hydrocarbon, for
example, hexatriacontane or paraffin. The polyamide-based resin or an elastomer may
be, for example, nylon. The acrylate-based resin or an elastomer may be, for example,
polybutyl(meth)acrylate. The epoxy-based resin or an elastomer may be, for example,
a bisphenol-type such as a bisphenol A-type, a bisphenol F-type, a bisphenol S-type,
and a hydrogenated product thereof; a novolac-type such as a phenolnovolac-type or
a cresolnovolac-type; a nitrogen-containing ring-type such as a triglycidylisocyanurate-type
or a hydantoin-type; an alicyclic-type; an aliphatic-type; an aromatic-type such as
a naphthalene-type or a biphenyl-type; a glycidyl-type such as a glycidylether-type,
a glycidylamine-type, or a glycidylester-type; a dicyclo-type such as dicyclopentadiene-type;
an ester-type; an etherester-type; or a mixture thereof. The silicone-based resin
or an elastomer may be, for example, polydimethylsiloxane. In addition, the fluorine-based
resin or an elastomer may be a polytrifluoroethylene resin or an elastomer, a polytetrafluoroethylene
resin or an elastomer, a polychlorotrifluoroethylene resin or an elastomer, a polyhexafluoropropylene
resin or an elastomer, polyvinylidene fluoride, polyvinyl fluoride, polyethylenepropylene
fluoride, or a mixture thereof.
[0026] The above-listed resins or elastomers may be grafted to, for example, maleic anhydride,
copolymerized with another one of the listed resins or elastomers or a monomer for
preparing the resin or elastomer, or modified by a compound, other than the above-used
resins or elastomers. The compound may be a carboxyl-terminated butadiene-acrylonitrile
copolymer.
[0027] In one example, the pressure-sensitive adhesive composition is an encapsulating resin,
which may include an olefin-based elastomer, a silicone-based elastomer or an acrylic
elastomer of the above-described types, but the present invention is not limited thereto.
[0028] Specifically, the encapsulating resin may be a copolymer of a diene and an olefin-based
compound having one carbon-carbon double bond. Here, the olefin-based compound may
include isobutylene, propylene or ethylene, and the diene may be a monomer capable
of being polymerized with the olefin-based compound, for example, 1-butene, 2-butene,
isoprene or butadiene. That is, the encapsulating resin of the present invention may
be, for example, a homopolymer of an isobutylene monomer; a copolymer prepared by
copolymerizing an isobutylene monomer with a monomer capable of being polymerized
therewith; or a mixture thereof. In one example, the copolymer of the diene and the
olefin-based compound having one carbon-carbon double bond may be a butyl rubber.
When a specific resin is used as described above, moisture barrier ability that would
be achieved in the present invention may be satisfied. In addition, the present invention
may improve humidity resistance and heat resistance by preparing a specific composition
satisfying an elastic portion according to Equation 1 described above due to low heat
resistance, while a conventional isobutylene polymer has low moisture permeability.
[0029] In the pressure-sensitive adhesive composition, the resin or elastomer component
may have a weight average molecular weight (Mw) to an extent that the pressure-sensitive
adhesive composition can be plasticized in a film type. For example, the resin or
elastomer may have a weight average molecular weight (Mw) of approximately 100,000
to 2,000,000, 100,000 to 1,500,000 or 100,000 to 1,000,000. The term "weight average
molecular weight" used herein refers to a converted value with respect to standard
polystyrene measured by gel penetration chromatography (GPC). However, the resin or
elastomer component is not necessary to have the above-mentioned weight average molecular
weight. For example, when a molecular weight of the resin or elastomer component is
not sufficient for forming a film, a separate binder resin may be blended in the pressure-sensitive
adhesive composition.
[0030] In addition, the pressure-sensitive adhesive composition of the present invention
may include an active energy ray-polymerizable compound having high compatibility
with the encapsulating resin, and capable of forming a specific crosslinking structure
with the encapsulating resin.
[0031] For example, the pressure-sensitive adhesive composition of the present invention
may include a multifunctional active-energy ray polymerizable compound that can be
polymerized with the encapsulating resin by irradiation of an active energy ray. The
active energy ray-polymerizable compound may refer to, for example, a compound including
at least two of functional groups that can participate in a polymerization reaction
by irradiation of an active energy ray, for example, a functional group including
an ethylene-like unsaturated double bond such as an acryloyl group or a methacryloyl
group, and a functional group such as an epoxy group or an oxetane group.
[0032] As the multifunctional active energy ray-polymerizable compound, for example, a multifunctional
acrylate (MFA) may be used.
[0033] In addition, the multifunctional active energy ray-polymerizable compound that can
be polymerized by the irradiation of an active energy ray may satisfy Formula 1. In
addition, the active energy ray-polymerizable compound may be included at 5 to 30,
5 to 25, 8 to 20, 10 to 18 or 12 to 18 parts by weight relative to 100 parts by weight
of the encapsulating resin.

[0034] In Formula 1, R
1 is hydrogen or an alkyl group having 1 to 4 carbon atoms, n is an integer of 2 or
more, and X is a residue induced from a linear, branched or cyclic alkyl group having
3 to 30 carbon atoms. Here, when X is a residue induced from a cyclic alkyl group,
X may be, for example, a residue induced from a cyclic alkyl group having 3 to 30,
6 to 28, 8 to 22, or 12 to 20 carbon atoms. In addition, when X is a residue induced
from a linear alkyl group, X may be a residue induced from a linear alkyl group having
3 to 30, 6 to 25, or 8 to 20 carbon atoms. In addition, when X is a residue induced
from a branched alkyl group, X may be a residue induced from a branched alkyl group
having 3 to 30, 5 to 25, or 6 to 20 carbon atoms.
[0035] The term "residue induced from an alkyl group" used herein may refer to a residue
of a specific compound composed of an alkyl group. In one example, in Formula 1, when
n is 2, X may be an alkylene group. In addition, when n is 3 or more, at least two
hydrogens of the alkyl group may be released from X, and then bind to a (meth)acryloyl
group of Formula 1.
[0036] The term "alkyl group" used herein may refer to, but is not particularly defined
otherwise, an alkyl group having 1 to 30, 1 to 25, 1 to 20, 1 to 16, 1 to 12, 1 to
8 or 1 to 4 carbon atoms. The alkyl group may have a linear, branched or cyclic structure,
and may be optionally substituted by at least one substituent.
[0037] The term "alkylene group" used herein may be, but is not particularly defined otherwise,
an alkylene group having 2 to 30, 2 to 25, 2 to 20, 2 to 16, 2 to 12, 2 to 10 or 2
to 8 carbon atoms. The alkylene group may have a linear, branched or cyclic structure,
and may be optionally substituted by at least one substituent.
[0038] The term "alkoxy group" used herein may be, unless particularly defined otherwise,
an alkoxy group having 1 to 20, 1 to 16, 1 to 12, 1 to 8 or 1 to 4 carbon atoms. The
alkoxy group may be a linear, branched or cyclic type. In addition, the alkoxy group
may be optionally substituted by at least one substituent.
[0039] The multifunctional active energy ray-polymerizable compound that can be polymerized
by the irradiation of an active energy ray may be any one satisfying Formula 1 without
limitation. For example, the compound may be 1,4-butanediol di(meth)acrylate, 1,3-butylene
glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,8-octanediol di(meth)acrylate,
1,12-dodecanediol di(meth)acrylate, neopentylglycol di(meth)acrylate, dicyclopentanyl
di(meth)acrylate, cyclohexane-1,4-dimethanol di(meth)acrylate, tricyclodecanedimethanol
(meth)diacrylate, dimethylol dicyclopentane di(meth)acrylate, neopentyl glycol modified
trimethylpropane di(meth)acrylate, adamantane di(meth)acrylate, trimethylolpropane
tri(meth)acrylate, or a mixture thereof.
[0040] As the multifunctional active energy ray-polymerizable compound, for example, a compound
having a molecular weight of less than 1,000 and including at least two functional
groups may be used. In this case, the molecular weight may refer to a weight average
molecular weight or a conventional molecular weight. A cyclic structure included in
the multifunctional active energy ray-polymerizable compound may be any one of a carbocyclic
structure, a heterocyclic structure, a monocyclic structure and a polycyclic structure.
[0041] In one exemplary embodiment of the present invention, the pressure-sensitive adhesive
composition may include a silane compound satisfying Formula 2:

[0042] In Formula 2, R
1 is hydrogen or an alkyl group. R
1 may be, for example, an alkyl group having 1 to 4 or 1 to 2 carbon atoms. In addition,
in Formula 2, R
2 and R
3 are each independently hydrogen, or a linear, branched or cyclic alkyl group, or
R
2 is linked with R
3, thereby forming a cyclic alkyl group. For example, R
2 and R
3 may be each independently hydrogen, or a linear, branched or cyclic alkyl group.
Here, the linear alkyl group may have 1 to 10, 1 to 6, or 1 to 4 carbon atoms, the
branched alkyl group may have 3 to 10, 3 to 6 or 3 to 4 carbon atoms, and the cyclic
alkyl group may have 3 to 10, 3 to 8, 3 to 6, or 3 to 4 carbon atoms. In addition,
R
2 may be linked with R
3, thereby forming a cyclic alkyl group having 2 to 10, 3 to 10, 4 to 9, or 4 to 8
carbon atoms. In addition, in Formula 2, R
4, R
5 and R
6 are each independently hydrogen, an alkyl group or an alkoxy group, at least one
of R
4, R
5 and R
6 is an alkoxy group, and n is an integer of 1 or more. Particularly, R
4, R
5 and R
6 are each independently an alkyl group having 1 to 10, 1 to 6, 1 to 4 or 1 to 2 carbon
atoms; or an alkoxy group having 1 to 10, 1 to 8, 1 to 4 or 1 to 2 carbon atoms. Here,
at least one of R
4, R
5 and R
6 may be an alkoxy group, and all of R
4, R
5 and R
6 may be alkoxy groups, but the present invention is not limited thereto.
[0043] In one example, the silane compound is not particularly limited, as long as it satisfies
Formula 2, and may be, for example, 3-methacryloxypropyl trimethoxysilane, 3-methacryloxy
propyl triethoxysilane, 3-acryloxy propyl trimethoxysilane, 3-acryloxy propyl triethoxysilane,
3-methacryloxy methyl triethoxysilane, 3-methacryloxy methyl trimethoxysilane, 3-acryloxy
propyl methyldimethoxysilane, methacryloxy methyl methyldimethoxysilane, methacryloxy
methyl methyldiethoxysilane, methacryloxy propyl methyldimethoxysilane, methacryloxy
propyl methyldiethoxysilane, methacryloxy propyl dimethylmethoxysilane or methacryloxy
propyl dimethylethoxysilane. An acryl group of the silane compound may serve to increase
an interface pressure-sensitive adhesive strength and to ensure reliability at high
temperature and high humidity by being crosslinked with the encapsulating resin or
active energy ray-polymerizable compound of the pressure-sensitive adhesive composition.
The silane compound may be included at, for example, 0.1 to 10, 0.5 to 8, 0.8 to 5,
1 to 5, 1 to 4.5, or 1 to 4 parts by weight relative to 100 parts by weight of the
encapsulating resin.
[0044] In one example, the active energy ray-polymerizable compound may form a crosslinking
structure with the silane compound satisfying Formula 2, and the crosslinking structure
may form a semi-interpenetrating polymer network (semi-PIN) with the encapsulating
resin. That is, the pressure-sensitive adhesive composition may include a semi-IPN.
The term "semi-IPN" includes at least one polymer crosslinking structure (polymer
network) and at least one linear or branched polymer, and at least a part of the linear
or branched polymer has a structure penetrated into the polymer crosslinking structure.
The semi-IPN may be distinguished from an IPN structure since the linear or branched
polymer can be theoretically separated from the polymer crosslinking structure without
loss of a chemical bond.
[0045] In one exemplary embodiment, the crosslinking structure may be a crosslinking structure
formed by application of heat, a crosslinking structure formed by irradiation of an
active energy ray or a crosslinking structure formed by aging at room temperature.
Here, in the category of the "active energy ray", a microwave, an infrared (IR) ray,
an ultraviolet (UV) ray, an X ray and a gamma ray, and a particle beam such as an
alpha-particle beam, a proton beam, a neutron beam or an electron beam, and conventionally,
an UV ray and an electron beam may be included. As such a semi-IPN structure is introduced,
a mechanical property such as processability of the pressure-sensitive adhesive composition
may be increased, humidity-resistant adhesive performance is improved, transparency
is realized, high moisture barrier performance that cannot be achieved so far, and
an excellent panel life span may be realized.
[0046] In one example, the active energy ray-polymerizable compound may form a crosslinking
structure with the silane compound satisfying Formula 2, and the encapsulating resin
may form a crosslinking structure with the active energy ray-polymerizable compound
or the silane compound satisfying Formula 2, thereby forming an interpenetrating polymer
network (IPN) structure. In addition, the term "IPN structure" refers to a state in
which at least two crosslinking structures are present in a pressure-sensitive adhesive.
In one example, the IPN structure may refer to a structure including at least two
crosslinking structures in an intertwining, entanglement or penetrating state. For
example, the composition of the present invention may include a crosslinking structure
by an encapsulating resin (hereinafter, referred to as a "first crosslinking structure")
and a crosslinking structure formed by a reaction of an active energy ray-polymerizable
compound and the silane compound satisfying Formula 1 (hereinafter, referred to as
a "second crosslinking structure"), and the first and second crosslinking structures
may be in an intertwining state or an entanglement state. That is, as the pressure-sensitive
adhesive composition includes a semi-IPN or IPN structure in a crosslinked state,
a pressure-sensitive adhesive strength of the pressure-sensitive adhesive is increased
at high temperature and high humidity, and moisture barrier ability and heat resistance
may be improved.
[0047] In an exemplary embodiment of the present invention, the pressure-sensitive adhesive
composition may further include a radical initiator that can induce a polymerization
reaction of the above-described active energy ray-polymerizable compound. The radical
initiator may be a photoinitiator or a thermal initiator. A specific type of the photoinitiator
may be suitably selected in consideration of a curing rate and possibility of yellowing.
For example, as the photoinitiator, a benzoin-, hydroxy ketone-, amino ketone- or
phosphine oxide-based photoinitiator, and specifically, benzoin, benzoin methylether,
benzoin ethylether, benzoin isopropylether, benzoin n-butylether, benzoin isobutylether,
acetophenone, dimethylamino acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone,
2-hydroxy-2-methyl-1-phenylpropane-1one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-propane-1-one
, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl)ketone, benzophenone, p-phenylbenzophenone,
4,4'-diethylaminobenzophenone, dichlorobenzophenone, 2-methylanthraquinone, 2-ethylanthraquinone,
2-t-butylanthraquinone, 2-aminoanthraquinone, 2-methyl thioxanthone, 2-ethylthioxanthone,
2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, benzyldimethylketal,
acetophenone dimethylketal, p-dimethylamino benzoic acid ester, oligo[2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propanone],
or 2,4,6-trimethylbenzoyl-diphenyl-phosphineoxide may be used.
[0048] The radical initiator may be included at 0.2 to 20, 0.5 to 18, 1 to 15, or 2 to 13
parts by weight relative to 100 parts by weight of the active energy ray-polymerizable
compound. Accordingly, the reaction of the active energy ray-polymerizable compound
is effectively induced, and degradation of physical properties of the pressure-sensitive
adhesive composition due to remaining components after curing may be prevented.
[0049] In one example, the pressure-sensitive adhesive composition may further include a
tackifier. The tackifier may be a hydrogenated cyclic olefin-based polymer. As the
tackifier, for example, a hydrogenated petroleum resin obtained by hydrogenating a
petroleum resin may be used. The hydrogenated petroleum resin may be partially or
completely hydrogenated, and may be a mixture of such resins. Such a tackifier may
have a high compatibility with the pressure-sensitive adhesive composition, excellent
moisture barrier ability, and a small content of an organic volatile component. A
specific example of the hydrogenated petroleum resin may be a hydrogenated terpene-based
resin, a hydrogenated ester-based resin or a hydrogenated dicyclopentadiene-based
resin. The tackifier may have a weight average molecular weight of approximately 200
to 5,000. A content of the tackifier may be suitably controlled as needed. For example,
the content of the tackifier may be selected in consideration of a gel content that
will be described below. According to one example, the tackifier may be included at
5 to 100, 8 to 95, 10 to 93 of 15 to 90 parts by weight relative to 100 parts by weight
of a solid content of the pressure-sensitive adhesive composition.
[0050] The pressure-sensitive adhesive composition may further include a moisture absorbent
when needed. The term "moisture absorbent" may refer to a material that can remove
moisture or vapor penetrated into the following pressure-sensitive adhesive film through
a chemical reaction. When the pressure-sensitive adhesive composition of the present
invention includes a moisture absorbent, to be formed in a film, the following light
transmittance may not be realized, but excellent moisture barrier ability may be realized.
Specifically, the pressure-sensitive adhesive composition may be formed in a film
to be applied to encapsulation of an organic electronic device. In this case, when
the pressure-sensitive adhesive composition does not include a moisture absorbent,
and exhibits excellent transparency, it may be applied to encapsulation of a top-emissive
organic electronic device, or when the pressure-sensitive adhesive composition includes
a moisture absorbent, and exhibit excellent moisture barrier ability, it may be applied
to encapsulation of a bottom-emissive organic electronic device. However, the present
invention is not limited thereto. That is, when the pressure-sensitive adhesive composition
does not include a moisture absorbent, and exhibits excellent transparency, it may
be applied to encapsulation of a bottom-emissive organic electronic device.
[0051] For example, the moisture absorbent may be present while being uniformly dispersed
in the pressure-sensitive adhesive composition or the following pressure-sensitive
adhesive. Here, the uniformly dispersed state may mean that the state in which the
moisture absorbent is present even in any part of the pressure-sensitive adhesive
composition or the pressure-sensitive adhesive at the same or substantially the same
density. As the moisture absorbent used herein, for example, a metal oxide, a sulfate
or an organic metal oxide may be used. Specifically, the sulfate may be magnesium
sulfate, sodium sulfate or nickel sulfate, and the organic metal oxide may be aluminum
oxide octylate. Here, the metal oxide may be phosphorous pentoxide (P
2O
5), lithium oxide (Li
2O), sodium oxide (Na
2O), barium oxide (BaO), calcium oxide (CaO) or magnesium oxide (MgO), and the metal
salt may be a sulfate such as lithium sulfate (Li
2SO
4), sodium sulfate (Na
2SO
4), calcium sulfate (CaSO
4), magnesium sulfate (MgSO
4), cobalt sulfate (CoSO
4), gallium sulfate (Ga
2(SO
4)
3), titanium sulfate (Ti(SO
4)
2) or nickel sulfate (NiSO
4); a metal halide such as calcium chloride (CaCl
2), magnesium chloride (MgCl
2), strontium chloride (SrCl
2), yttrium chloride (YCl
3), copper chloride (CuCl
2), cesium fluoride (CsF), tantalum fluoride (TaF
5), niobium fluoride (NbF
5), lithium bromide (LiBr), calcium bromide (CaBr
2), cesium bromide (CeBr
3), selenium bromide (SeBr
4), vanadium bromide (VBr
3), magnesium bromide (MgBr
2), barium iodide (BaI
2) or magnesium iodide (MgI
2); or a metal chlorate such as barium perchlorate (Ba(ClO
4)
2 or magnesium perchlorate (Mg(ClO
4)
2) but the present invention is not limited thereto. As the moisture absorbent that
can be included in the pressure-sensitive adhesive composition, one or at least two
of the above-described materials may be used. In one example, when at least two of
the above materials are used, the moisture absorbent may be calcined dolomite.
[0052] Such a moisture absorbent may be controlled in a suitable size according to its use.
In one example, an average diameter of the moisture absorbent may be controlled to
approximately 10 to 15000 nm. A moisture absorbent having the above range of the average
diameter may be easy to be stored due to a not too high reaction speed with moisture,
and may effectively remove moisture without damage to an element to be encapsulated.
[0053] A content of the moisture absorbent may be suitably selected without particular limitation
in consideration of a desired barrier characteristic.
[0054] The pressure-sensitive adhesive composition may further include a moisture blocker
when needed. The term "moisture blocker" used herein may refer to a material that
can block or prevent migration of moisture or vapor in the film while having no or
low reactivity with moisture. As the moisture blocker, one or at least two of clay,
talc, acicular silica, planar silica, porous silica, zeolite, titania and zirconia
may be used. In addition, a surface of the water blocker may be treated with an organic
modifier to facilitate penetration of an organic material. Such an organic modifier,
dimethyl benzyl hydrogenated tallow quaternary ammonium, dimethyl hydrogenated tallow
quaternary ammonium, methyl tallow bis-2-hydroxyethyl quaternary ammonium, dimethyl
hydrogenated tallow 2-ethylhexyl quaternary ammonium, dimethyl dehydrogenated tallow
quaternary ammonium or a mixture thereof may be used.
[0055] A content of the moisture blocker may be suitably selected without particular limitation
in consideration of a desired blocking characteristic.
[0056] In addition to the above-described components, various additives may be included
in the pressure-sensitive adhesive composition according to its use and a process
of manufacturing a pressure-sensitive adhesive film that will be described below.
For example, the pressure-sensitive adhesive composition may include a curable material,
a crosslinking agent or a filler in a suitable range of content according to a desired
physical property.
[0057] In an exemplary embodiment of the present invention, the pressure-sensitive adhesive
film may be formed in a monolayer structure including a pressure-sensitive adhesive
as described above, or may be formed of at least two layers that will be described
below. For example, the pressure-sensitive adhesive film may include a first layer
containing the above-described pressure-sensitive adhesive and a second layer including
a pressure-sensitive adhesive resin or an adhesive resin. The pressure-sensitive adhesive
resin or adhesive resin included in the second layer may be the same as or different
from the above-described encapsulating resin, and may be suitably selected by a conventional
technician according to a purpose. In addition, the first and second layers may or
may not include a moisture absorbent.
[0058] In one example, the pressure-sensitive adhesive resin included in the second layer
may include a curable resin including at least one heat-curable functional group such
as a glycidyl group, an isocyanate group, a hydroxyl group, a carboxyl group or an
amide group, or an electromagnetic wave-curable functional group such as an epoxide
group, a cyclic ether group, a sulfide group, an acetal group or a lactone group,
which may be cured to exhibit an adhesive characteristic. In addition, a specific
type of such a resin may be, but is not limited to, an acryl resin, a polyester resin,
an isocyanate resin, or an epoxy resin.
[0059] In the present invention, as the curable resin, an aromatic or aliphatic, or linear
or branched epoxy resin may be used. In one exemplary embodiment of the present invention,
an epoxy resin containing at least two functional groups and having an epoxy equivalent
of 180 to 1,000 g/eq may be used. When the epoxy resin having the above range of epoxy
equivalent is used, characteristics of the cured product such as adhesive performance
and a glass transition temperature may be effectively maintained. Such an epoxy resin
may be one or a mixture of at least two of a cresol novolac epoxy resin, a bisphenol
A-type epoxy resin, a bisphenol A-type novolac epoxy resin, a phenol novolac epoxy
resin, a tetrafunctional epoxy resin, a biphenyl-type epoxy resin, a triphenol methane-type
epoxy resin, an alkyl-modified triphenol methane epoxy resin, a naphthalene-type epoxy
resin, a dicyclopentadiene-type epoxy resin, and a dicyclopentadiene modified phenol-type
epoxy resin.
[0060] In an exemplary embodiment of the present invention, the first or second layer may
include another component such as an active energy ray-polymerizable compound, a radical
initiator, a tackifier, a moisture absorbent, a moisture blocker, a dispersing agent
or a silane compound in addition to the above-described resin, and components of the
first and second layers may be the same as or different from each other. In addition,
the second layer may include a curable material, a curing agent or a filler in a suitable
range of content according to a desired physical property.
[0061] A sequence of laminating the first and second layers is not particularly limited,
and thus the second layer may be formed on the first layer, or the first layer may
be formed on the second layer. In addition, the pressure-sensitive adhesive film may
be formed of at least three layers, and for example, the first layer may include at
least two layers, and the second layer may include at least two layers.
[0062] In one example, the pressure-sensitive adhesive film may include a barrier film on
one surface of the pressure-sensitive adhesive. The barrier film may be formed of
any material generally used in the art without limitation. For example, here, the
barrier film may include a base layer, an organic undercoating layer, an inorganic
deposition layer and an organic top-coating layer, and the organic top-coating layer
may be in contact with the pressure-sensitive adhesive.
[0063] In addition, the pressure-sensitive adhesive film may have an excellent light transmittance
with respect to a visible-ray region. In one example, the pressure-sensitive adhesive
film of the present invention may have a light transmittance of 85% or more with respect
to the visible-ray region. For example, the pressure-sensitive adhesive film may have
a light transmittance of 85%, 87% or 90% or more with respect to a visible-ray region.
In addition, the pressure-sensitive adhesive film of the present invention may have
a low haze in addition to the excellent light transmittance. In one example, the pressure-sensitive
adhesive film may have a haze of 3%, 2%, 1%, 0.8%, 0.5%, or 0.3% or less. That is,
as an elastic portion of the pressure-sensitive adhesive film according to the present
invention is limited within a specific range according to Equation 1 as described
above, the film may realize excellent optical characteristics as well as reliability
at high temperature and high humidity.
[0064] The pressure-sensitive adhesive film may further include a base film or release film
(hereinafter, can be referred to as a "first film"), and the pressure-sensitive adhesive
may be formed on the base or release film. The structure may further include a base
or release film formed on the pressure-sensitive adhesive (hereinafter, can be referred
to as a "second film").
[0065] FIGS. 1 and 2 are cross-sectional views of exemplary pressure-sensitive adhesive
films.
[0066] The pressure-sensitive adhesive film 1, as shown in FIG. 1, may include a pressure-sensitive
adhesive 11 formed on a base or release film 12. Another exemplary pressure-sensitive
adhesive film 2, as shown in FIG. 2, may further include a base or release film 21
formed on a pressure-sensitive adhesive 11. Although not shown in FIGS. 1 and 2, the
pressure-sensitive adhesive film may also have the pressure-sensitive adhesive composition
without a supporting base such as a base or release film, and therefore have a structure
only including a pressure-sensitive adhesive formed in a film or sheet maintaining
a solid phase or a semi-solid phase at room temperature, or a structure in which a
pressure-sensitive adhesive is formed on both surface of one base or release film.
[0067] A specific type of the first film is not particularly limited. As the first film,
for example, a plastic film may be used. The first film may be a polyethyleneterephthalate
film, a polytetrafluoroethylene film, a polyethylene film, a polypropylene film, a
polybutene film, a polybutadiene film, a vinyl chloride copolymer film, a polyurethane
film, an ethylene-vinyl acetate film, an ethylenepropylene copolymer film, an ethylene-ethyl
acrylate copolymer film, an ethylene-methyl acrylate copolymer film or a polyimide
film.
[0068] When the first film is a release film, suitable release treatment may be performed
on one or both surfaces of such a plastic film. As a releasing agent used for release
treatment, an alkyde-based releasing agent, a silicone-based releasing agent, a fluorine-based
releasing agent, an unsaturated ester-based releasing agent, a polyolefin-based releasing
agent or a wax-based releasing agent may be used. In consideration of heat resistance,
an alkyde-based releasing agent, a silicone-based releasing agent or a fluorine-based
releasing agent among the above examples is conventionally used, but the present invention
is not limited thereto.
[0069] As the first film, for example, a plastic film in which a gas barrier layer is formed
on a top or side surface of a base may be used. Such a film may directly constitute,
for example, a substrate of an organic electronic device to be used for realizing
a flexible element.
[0070] A type of the second film is not particularly limited, either. For example, as the
second film, within the category of the first film listed above, one that is the same
as or different from the first film may be used.
[0071] A thickness of the first or second film is not particularly limited. In one example,
the thickness of the first film may be approximately 50 to 500 or 100 to 200 µm. In
such a range, a process of preparing or manufacturing a pressure-sensitive adhesive
or an organic electronic device may be effectively automated, and advantageous effects
in terms of economic feasibility may be achieved.
[0072] The thickness of the second film is not particularly limited, either. For example,
the thickness of the second film may be the same as, or relatively smaller or larger
than that of the first film.
[0073] The pressure-sensitive adhesive of the pressure-sensitive adhesive film includes
the pressure-sensitive adhesive composition, and is formed in a film or sheet. In
the pressure-sensitive adhesive, the pressure-sensitive adhesive composition may be
in a crosslinked or non-crosslinked state. The pressure-sensitive adhesive may be
in a solid or semi-solid phase at room temperature. Such a pressure-sensitive adhesive
resin may be formed in a crosslinked structure in an encapsulation structure of an
organic electronic element, which will be described below.
[0074] A thickness of the pressure-sensitive adhesive is not particularly limited, and may
be suitably selected in consideration of its uses. For example, the pressure-sensitive
adhesive may have a thickness of approximately 5 to 200 µm. The thickness of the pressure-sensitive
adhesive may be controlled in consideration of, for example, embeddability when being
used as an encapsulant of an organic electronic element and processability or economic
feasibility.
[0075] In still another aspect, the present invention provides a method of manufacturing
a pressure-sensitive adhesive film. The exemplary pressure-sensitive adhesive film
may be manufactured by plasticizing the pressure-sensitive adhesive composition in
a film or sheet.
[0076] In one example, the method may include applying a coating solution including the
pressure-sensitive adhesive composition on a base or release film in a sheet or film,
and drying the applied coating solution. The method may further include adhering an
additional base or release film to the dried coating solution.
[0077] The coating solution including the pressure-sensitive adhesive composition may be
prepared by, for example, dissolving or dispersing a component of each pressure-sensitive
adhesive composition described above in a suitable solvent. In one example, the pressure-sensitive
adhesive composition may be prepared by dissolving or dispersing the moisture absorbent,
blocker or filler in a solvent when needed, grinding the resulting product, and mixing
the moisture absorbent, blocker or filler with an encapsulating resin.
[0078] A type of a solvent used in preparation of the coating solution is not particularly
limited. However, when time to dry the solvent is too long, or it is necessary to
dry the solvent at high temperature, there may have some problems in workability or
durability of a pressure-sensitive adhesive film. For this reason, a solvent having
a volatile temperature of 150 °C or less may be used. In consideration of film moldability,
a small amount of the solvent having the above range or more of the volatile temperature
may be mixed to be used. The solvent may be, but is not limited to, one or at least
two of methylethylketone (MEK), acetone, toluene, dimethyl formamide (DMF), methyl
cellosolve (MCS), tetrahydrofuran (THF), xylene, and N-methylpyrrolidone (NMP).
[0079] A method of applying the coating solution to the base or release film may be, but
is not particularly limited to, a known coating method such as knife coating, roll
coating, spray coating, gravure coating, curtain coating, comma coating or lip coating.
[0080] The applied coating solution may be dried to volatilize the solvent, thereby forming
a pressure-sensitive adhesive. The drying may be performed, for example, at 70 to
150 °C for 1 to 10 minutes. The drying condition may be changed in consideration of
a type of the used solvent.
[0081] After drying, an additional base or release film may be formed on the pressure-sensitive
adhesive.
[0082] In another aspect, the present invention provides a product for encapsulating an
organic electronic device. The product for encapsulating an organic electronic device
may include a substrate; an organic electronic element formed on the substrate; and
a pressure-sensitive adhesive film encapsulating an entire surface, for example, both
top and side surfaces of the organic electronic element. The pressure-sensitive adhesive
film may include a pressure-sensitive adhesive containing a pressure-sensitive adhesive
composition in a crosslinked state. The product for encapsulating an organic electronic
device may further include a cover substrate formed on a top surface of the pressure-sensitive
adhesive.
[0083] Here, the organic electronic element may be, for example, an organic light emitting
element.
[0084] In addition, in yet another aspect, the present invention provides a method of manufacturing
an organic electronic device. The product for encapsulating an organic electronic
device may be manufactured using, for example, the pressure-sensitive adhesive film.
[0085] The pressure-sensitive adhesive may be formed as an encapsulating layer for a structure
exhibiting excellent moisture barrier property and optical property in the organic
electronic device, effectively fixing and supporting the substrate and a cover substrate.
[0086] In addition, the pressure-sensitive adhesive may exhibit excellent transparency,
and may be stable regardless of a type of the organic electronic device, for example,
a top-emissive or bottom-emissive organic electronic device.
[0087] The term "encapsulating layer" used herein may refer to a pressure-sensitive adhesive
covering top and side surfaces of the organic electronic element.
[0088] FIG. 3 is a schematic diagram of an exemplary organic electronic device in which
an organic electronic element is an organic light emitting element.
[0089] To manufacture the organic electronic device, for example, applying the above-described
pressure-sensitive adhesive film to the substrate on which the organic electronic
element is formed in order to cover the organic electronic element; and curing the
pressure-sensitive adhesive film may be included.
[0090] The term "curing" used herein may refer to preparing a pressure-sensitive adhesive
by forming the pressure-sensitive adhesive composition of the present invention to
have a crosslinking structure through heating or UV irradiation.
[0091] Specifically, an organic electronic element 32 may be formed by forming a transparent
electrode on a glass or polymer film 31 used as a substrate by a method such as vacuum
deposition or sputtering, forming layers of emissive organic materials, composed of,
for example, a hole transport layer, an emitting layer and an electron transport layer
on the transparent electrode, and further forming an electrode layer thereon. Subsequently,
a pressure-sensitive adhesive of the pressure-sensitive adhesive film is disposed
to cover an entire surface of the organic electronic element 32 of the substrate 31
which has gone through the above-described process.
[0092] Subsequently, an encapsulating layer may be formed by compressing the pressure-sensitive
adhesive on the organic electronic element using a laminator while being heated to
provide mobility, and crosslinking a resin in the pressure-sensitive adhesive.
[0093] In one example, a pressure-sensitive adhesive 33 disposed to cover an entire surface
of the organic electronic element 32 may be previously transferred to a cover substrate
34 such as a glass or a polymer film. The transfer of the pressure-sensitive adhesive
to the cover substrate 34 may be performed using a vacuum press or vacuum laminator
while being heated in a state in which the pressure-sensitive adhesive is in contact
with the cover substrate 34 after a first or second film is peeled from the pressure-sensitive
adhesive film. When a pressure-sensitive adhesive includes a heat-curable pressure-sensitive
adhesive resin, and a curing reaction is excessively performed during the process,
a cohesive strength or pressure-sensitive adhesive strength of the encapsulating layer
is probably reduced. Therefore, a process temperature may be controlled to approximately
100 °C or less, and a process time may be controlled within 5 minutes.
[0094] An encapsulating layer may be formed by disposing the cover substrate 34 to which
the pressure-sensitive adhesive is transferred on the organic electronic element 32,
and performing the heat compression process.
[0095] An encapsulating layer may be formed by curing the pressure-sensitive adhesive 33.
The curing process may be performed in a suitable heating chamber or UV chamber, for
example, according to a method of curing a curable pressure-sensitive adhesive resin.
A heating condition or a condition of irradiating an active energy ray maybe suitably
selected in consideration of stability of the organic electronic element and curability
of the pressure-sensitive adhesive resin, and to increase compression efficiency,
autoclaving may also be performed with application of heat and pressure.
[0096] Here, one example of the method of manufacturing an organic electronic device has
been described, but the organic electronic device may be manufactured by a different
method. For example, while the manufacture of the device is performed by the above-described
method, a sequence or condition of the process may be changed. For example, the encapsulating
layer may be formed by previously transferring the pressure-sensitive adhesive to
the organic electronic element on the substrate 31, not to the cover substrate 34,
and performing a curing process while the cover substrate 34 is laminated.
EFFECTS
[0097] A pressure-sensitive adhesive film of the present invention can be applied to encapsulation
or capsulation of an organic electronic device such as an OLED. Particularly, the
pressure-sensitive adhesive film can be applied to such encapsulation or capsulation
to prevent bubbles at high temperature and high humidity, thereby forming an encapsulation
or capsulation structure having excellent durability and reliability. The film can
form a structure effectively blocking moisture or oxygen penetrated into an organic
electronic device from an external environment, and have excellent mechanical properties
such as handleability and processability and excellent transparency. The pressure-sensitive
adhesive film may be applied to, for example, encapsulation or capsulation of a top
emissive OLED.
BRIEF DESCRIPTION OF THE DRAWINGS
[0098]
FIGS. 1 and 2 are cross-sectional views of pressure-sensitive adhesive films according
to exemplary embodiments of the present invention;
FIG. 3 is a cross-sectional view of a product for encapsulating an organic electronic
device according to an exemplary embodiment of the present invention; and
FIGS. 4 and 5 are planar views showing results of high temperature durability tests
performed on pressure-sensitive adhesive films according to exemplary embodiments
of the present invention.
[Description of Reference Numerals]
[0099]
1, 2: pressure-sensitive adhesive film
11: pressure-sensitive adhesive
12: first film
21: second film
3: organic electronic device
31: substrate
32: organic electronic element
33: pressure-sensitive adhesive or encapsulating layer
34: cover substrate
DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS
[0100] Hereinafter, the present invention will be described in detail with reference to
Examples and Comparative Examples, but the scope of the present invention is not limited
to the following Examples.
Example 1
[0101] A coating solution was prepared by adding 80 g of a butyl rubber as an encapsulating
resin, 20 g of tricyclodecane dimethanol diacrylate (SR833S, Sartomer Company Inc.)
as an active energy ray-polymerizable compound, 0.2 g of 3-methacryloxypropyl trimethoxysilane
(Sigma-Aldrich Co. LLC.) as a silane compound, and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one
(Irgacure651, Ciba Specialty Chemicals Corporation) as a radical initiator, and diluting
the mixture in toluene to have a solid content of approximately 20 wt%.
[0102] The prepared solution was coated on a released surface of release PET, and dried
in an oven at 100 °C for 5 minutes, thereby manufacturing a pressure-sensitive adhesive
film including a pressure-sensitive adhesive having a thickness of 30 µm. Physical
properties of the sample were measured after a UV ray was irradiated at 2 J/cm
2 on the manufactured film.
Example 2
[0103] A coating solution was prepared by adding 50 g of a butyl rubber as an encapsulating
resin, 35 g of a hydrogenated DCPD-based tackifier (SU-125, Kolon Industries, Inc.)
as a tackifier, 15 g of tricyclodecane dimethanol diacrylate (SR833S, Sartomer Company
Inc.) as an active energy ray-polymerizable compound, 0.2 g of 3-methacryloxypropyl
trimethoxysilane (Sigma-Aldrich Co. LLC.) as a silane compound, and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one
(Irgacure651, Ciba Specialty Chemicals Corporation) as a radical initiator, and diluting
the mixture in toluene to have a solid content of approximately 30 wt%. Here, a coating
solution was prepared by adding 10 g of calcium oxide (Sigma-Aldrich Co. LLC.) ball-milled
with 10 g of toluene to the above solution.
[0104] The prepared solution was coated on a released surface of release PET, and dried
in an oven at 100 °C for 5 minutes, thereby manufacturing a pressure-sensitive adhesive
film having a thickness of 30 µm. Physical properties of the sample were measured
after a UV ray was irradiated at 3 J/cm
2 on the manufactured film.
Example 3
[0105] A coating solution was prepared by adding 60 g of a butyl rubber as an encapsulating
resin, 30 g of a hydrogenated DCPD-based tackifier (SU-125, Kolon Industries, Inc.)
as a tackifier, 10 g of tricyclodecane dimethanol diacrylate (SR833S, Sartomer Company
Inc.) as an active energy ray-polymerizable compound, 0.2 g of 3-methacryloxypropyl
trimethoxysilane (Sigma-Aldrich Co. LLC.) as a silane compound, and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one
(Irgacure651, Ciba Specialty Chemicals Corporation) as a radical initiator, and diluting
the mixture in toluene to have a solid content of approximately 20 wt%.
[0106] The prepared solution was coated on a released surface of release PET, and dried
in an oven at 100 °C for 5 minutes, thereby manufacturing a pressure-sensitive adhesive
film having a thickness of 30 µm. Physical properties of the sample were measured
after a UV ray was irradiated at 2 J/cm
2 on the manufactured film.
Example 4
[0107] A coating solution was prepared by adding 60 g of a butyl rubber as an encapsulating
resin, 20 g of a hydrogenated DCPD-based tackifier (SU-125, Kolon Industries, Inc.)
as a tackifier, 20 g of tricyclodecane dimethanol diacrylate (SR833S, Sartomer Company
Inc.) as an active energy ray-polymerizable compound, 0.2 g of 3-methacryloxypropyl
trimethoxysilane (Sigma-Aldrich Co. LLC.) as a silane compound, and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one
(Irgacure651, Ciba Specialty Chemicals Corporation) as a radical initiator, and diluting
the mixture in toluene to have a solid content of approximately 20 wt%.
[0108] The prepared solution was coated on a released surface of release PET, and dried
in an oven at 100 °C for 5 minutes, thereby manufacturing a pressure-sensitive adhesive
film having a thickness of 30 µm. Physical properties of the sample were measured
after a UV ray was irradiated at 2 J/cm
2 on the manufactured film.
Comparative Example 1
[0109] A pressure-sensitive adhesive film was manufactured by the same method as described
in Example 1, except that polyisobutylene was used as an encapsulating resin, instead
of a butyl rubber.
Comparative Example 2
[0110] A coating solution was prepared by adding 55 g of a butyl rubber as an encapsulating
resin, 20 g of a hydrogenated DCPD-based tackifier (SU-125, Kolon Industries, Inc.)
as a tackifier, 35 g of tricyclodecane dimethanol diacrylate (SR833S, Sartomer Company
Inc.) as an active energy ray-polymerizable compound, 0.2 g of 3-methacryloxypropyl
trimethoxysilane (Sigma-Aldrich Co. LLC.) as a silane compound, and 1 g of 2,2-dimethoxy-1,2-diphenylethane-1-one
(Irgacure651, Ciba Specialty Chemicals Corporation) as a radical initiator, and diluting
the mixture in toluene to have a solid content of approximately 20 wt%.
[0111] The prepared solution was coated on a released surface of release PET, and dried
in an oven at 100 °C for 5 minutes, thereby manufacturing a pressure-sensitive adhesive
film having a thickness of 30 µm. Physical properties of the sample were measured
after a UV ray was irradiated at 2 J/cm
2 on the manufactured film.
Comparative Example 3
[0112] A coating solution was prepared by adding and homogenizing 60 g of 2-ethylhexylacrylate
(Sigma-Aldrich Co. LLC.), 30 g of butyl acrylate (Sigma-Aldrich Co. LLC.) and 10 g
of hydroxyethylacrylate (Sigma-Aldrich Co. LLC.) as acrylic monomers, and 3 g of 2,2-dimethoxy-1,2-diphenylethane-1-one
(Irgacure651, Ciba Specialty Chemicals Corporation) as a radical initiator.
[0113] The prepared solution was coated on a released surface of release PET, thereby forming
a pressure-sensitive adhesive film having a thickness of 30 µm. Physical properties
of the sample were measured after a UV ray was irradiated at 2 J/cm
2 on the manufactured film.
1. Elastic portion (Ep measurement)
[0114] Values of the maximum stress σ1 were measured by laminating the pressure-sensitive
adhesive films manufactured by Examples 1 to 4 and Comparative Examples 1 to 3 to
have a thickness of 600 µm (pressure-sensitive adhesive layer: 600 µm), applying approximately
200 gf of normal force with a parallel plate in a relaxation test mode at 80 °C using
an advanced rheometric expression system (ARES; ARES-G2 produced by TA Instruments.)
to apply 50% of strain to the film. A value of stress σ2 was additionally measured
at the time of 180 seconds after the strain-applied film was maintained for 180 seconds,
and then Ep according to Equation 1 was calculated.

[0115] During the measurement, it was careful that there was no bubble when loading the
pressure-sensitive adhesive film.
2. Gel content
[0116] 
[0117] Here, A is a mass of the pressure-sensitive adhesive, and B is a dry mass of an insoluble
content of the pressure-sensitive adhesive remaining after the pressure-sensitive
adhesive was dipped in toluene at 60 °C for 24 hours and filtered through a 200-mesh
sieve (pore size: 200 µm).
3. Water vapor transmission rate (WVTR)
[0118] A resin composition was prepared by dissolving the resin used in Example or Comparative
Example in a solvent. The resin composition was applied to a base film (release polyester
film) having a thickness of 38 µm. Subsequently, the composition was dried at 110
°C for 10 minutes, thereby forming a film-type pressure-sensitive adhesive layer having
a thickness of 100 µm, and then 2 J/cm
2 of a UV ray was irradiated. Afterward, the base film was peeled, and then a WVTR
of the film-type layer was measured in a thickness direction, while a nylon mesh was
attached to the film-type pressure-sensitive adhesive layer and the layer was maintained
at 100 °F and a relative humidity of 100%. The WVTR was measured according to a specification
of ASTM F1249.
4. Evaluation of reliability
[0119]
- (1) A sample was prepared by laminating the film manufactured in Example or Comparative
Example on a barrier film (serving as a cover substrate), laminating the resulting
product on a glass substrate, and pressure and heat-compressing the resulting product
using an autoclave at 50 °C and 5 atm. Afterward, the sample was maintained in a constant
temperature and constant humidity chamber at 85 °C and a relative humidity of 85%
for approximately 500 hours, and observed whether lifting, bubbles or hazes were generated
at an interface between a glass substrate and a pressure-sensitive adhesive layer.
When being viewed with the naked eye, at the interface between the glass substrate
and the pressure-sensitive adhesive layer, if at least one lifting, bubble or haze
was generated, it was represented as X, and if no lifting, bubble or haze was generated,
it was represented as O.
- (2) A sample was manufactured by the same method, except that a polarizing plate was
further laminated on a barrier film in a method of evaluating reliability at 85 °C
and a relative humidity of 85%, and observed to check whether lifting or bubbles were
generated at an interface between a glass substrate and a pressure-sensitive adhesive
while being maintained in a 80 °C chamber for approximately 500 hours. When being
viewed with a naked eye, if there was at least one lifting or bubble at the interface
between the glass substrate and the pressure-sensitive adhesive layer, it was represented
as X, and if there was no lifting or bubble, it was represented as O.
[Table 1]
| |
Ep(%) |
Gel(%) |
WVTR (g/m2·day) |
High temperature & high humidity reliability (85 °C, 85% RH) |
High temperature reliability (80 °C, Polarizing plate) |
| Example1 |
25 |
51 |
4 |
O |
O |
| Example2 |
35 |
59 |
4 |
O |
O |
| Example3 |
45 |
67 |
4 |
O |
O |
| Example4 |
72 |
80 |
5 |
O |
O |
| Comparative Example1 |
16 |
0 |
4 |
O |
X |
| Comparative Example2 |
84 |
85 |
4 |
X |
X |
| Comparative Example3 |
50 |
80 |
>500 |
X |
O |